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1. 发明授权

US5083865A Particle monitor system and method 失效
标题翻译：颗粒监测系统和方法
公开(公告)号：US5083865A
公开(公告)日：1992-01-28
申请号：US522606
申请日：1990-05-11
申请人： Patrick Kinney , Boris Fishkin , Jun Zhao , Anand Gupta , Robert Bendler
发明人： Patrick Kinney , Boris Fishkin , Jun Zhao , Anand Gupta , Robert Bendler
IPC分类号： G01N15/00 , G01N15/14 , G01N21/15 , G01N21/53 , G01N21/88 , G01N21/956 , H01L21/02 , H01L21/205 , H01L23/29 , H01L23/31
CPC分类号： G01N21/53 , G01N2021/155 , G01N2021/157 , G01N21/15
摘要： A particle monitor for a processing chamber exhaust line is disclosed which incorporates exhaust line heating, purge gas flow over surfaces such as optical windows in the exhaust gas line, and a thermally and electrically insulating particle monitor mounting arrangement. The features collectively protect the particle monitor from electrical disturbance and from the heated inlet and maintain the optical surfaces clean and free of depositions from the exhaust gas flow for an extended period. The arrangement also suppresses etching of the optical surfaces.

2. 发明授权

US5287725A Surface volatile material detector 失效
标题翻译：表面挥发性物质检测器
公开(公告)号：US5287725A
公开(公告)日：1994-02-22
申请号：US082142
申请日：1993-06-23
申请人： Jun Zhao , Laszlo Szalai , Boris Fishkin , Terry Francis
发明人： Jun Zhao , Laszlo Szalai , Boris Fishkin , Terry Francis
IPC分类号： G01N1/22 , G01N1/00 , G01N15/00 , G01N21/37 , H01L21/66
CPC分类号： G01N1/4022
摘要： Surface Volatile Material Detector including a vacuum chamber that is adapted to hold a silicon wafer for testing. The surface of the wafer is exposed to a heat source which evaporates the volatile contaminants on the surface of the wafer. A gas composition analyzer samples the atmosphere within the chamber to detect the evaporated contaminants. The device is designed such that the wafer is thermally insulated from the chamber, whereby the wafer is heated while the chamber walls remain cool, and any contaminants which might exist on the walls of the chamber are not evaporated. In the preferred embodiment, the wafer is heated by infrared light illumination.
摘要翻译：表面挥发性物质检测器，包括适于保持硅晶片进行测试的真空室。晶片的表面暴露于蒸发晶片表面上的挥发性污染物的热源。气体成分分析仪对室内的气氛进行采样，以检测蒸发的污染物。设备被设计成使得晶片与腔室隔热，由此在室壁保持冷却的同时加热晶片，并且可能存在于腔室壁上的任何污染物都不会蒸发。在优选实施例中，通过红外光照明来加热晶片。

3. 发明申请

US20070272278A1 APPARATUS FOR CLEANING AND DRYING SUBSTRATES 有权
标题翻译：用于清洁和干燥基板的装置
公开(公告)号：US20070272278A1
公开(公告)日：2007-11-29
申请号：US11834657
申请日：2007-08-06
申请人： Boris Fishkin , Michael Sherrard
发明人： Boris Fishkin , Michael Sherrard
IPC分类号： B08B3/04
CPC分类号： H01L21/67028 , Y10S134/902
摘要： A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of drying vapor is supplied to the interface line to achieve Marangoni drying. Thus, a large portion of the substrate is simultaneously dried. A preferred apparatus employs a tank of cleaning and/or rinsing fluid. Above the tank fluid a source of rinsing fluid directs rinsing fluid to the surface of a substrate forming a meniscus on the substrate surface as the substrate is lifted from the cleaning fluid, and a drying vapor source directs drying vapor to the meniscus. The drying vapor lowers the surface tension of the meniscus, inducing a Marangoni flow of rinsing fluid from the substrate's surface, and thereby drying the substrate. The cleaning fluid tank has a substrate receiving and cleaning portion and a substrate rinsing portion. The rinsing fluid source and the drying vapor source are enclosed by a drying enclosure above the rinsing portion of the tank. Thus, substrate loading, cleaning, rinsing, drying and unloading are performed with at least partial overlap in time.
摘要翻译：提供了一种用于清洗，漂洗和马兰戈尼干燥基材的方法和设备。沿着形成空气/流体界面线的基底表面喷射流体线，并且将一线干燥蒸气供应到界面线以实现马兰戈尼干燥。因此，大部分基板被同时干燥。优选的装置采用清洁和/或冲洗流体箱。在罐体流体上方，当衬底从清洁流体提升时，漂洗流体源将冲洗流体引导到在衬底表面上形成弯液面的衬底的表面，并且干燥蒸汽源将干燥蒸气引导到弯液面。干燥蒸汽降低了弯液面的表面张力，引起从基材表面冲洗流体的马兰戈尼流，从而干燥基材。清洗液槽具有基板接收和清洁部分和基板漂洗部分。冲洗流体源和干燥蒸气源由在罐的漂洗部分上方的干燥箱包围。因此，在时间上至少部分重叠地执行基板装载，清洁，漂洗，干燥和卸载。

4. 发明授权

US06328814B1 Apparatus for cleaning and drying substrates 有权
标题翻译：用于清洁和干燥基材的设备
公开(公告)号：US06328814B1
公开(公告)日：2001-12-11
申请号：US09280118
申请日：1999-03-26
申请人： Boris Fishkin , Michael Sherrard
发明人： Boris Fishkin , Michael Sherrard
IPC分类号： B08B304
CPC分类号： H01L21/67028 , Y10S134/902
摘要： A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of drying vapor is supplied to the interface line to achieve Marangoni drying. Thus, a large portion of the substrate is simultaneously dried. A preferred apparatus employs a tank of cleaning and/or rinsing fluid. Above the tank fluid a source of rinsing fluid directs rinsing fluid to the surface of a substrate forming a meniscus on the substrate surface as the substrate is lifted from the cleaning fluid, and a drying vapor source directs drying vapor to the meniscus. The drying vapor lowers the surface tension of the meniscus, inducing a Marangoni flow of rinsing fluid from the substrate's surface, and thereby drying the substrate. The cleaning fluid tank has a substrate receiving and cleaning portion and a substrate rinsing portion. The rinsing fluid source and the drying vapor source are enclosed by a drying enclosure above the rinsing portion of the tank. Thus, substrate loading, cleaning, rinsing, drying and unloading are performed with at least partial overlap in time.
摘要翻译：提供了一种用于清洗，漂洗和马兰戈尼干燥基材的方法和设备。沿着形成空气/流体界面线的基底表面喷射流体线，并且将一线干燥蒸气供应到界面线以实现马兰戈尼干燥。因此，大部分基板被同时干燥。优选的装置采用清洁和/或冲洗流体箱。在罐体流体上方，当衬底从清洁流体提升时，漂洗流体源将冲洗流体引导到在衬底表面上形成弯液面的衬底的表面，并且干燥蒸汽源将干燥蒸气引导到弯液面。干燥蒸汽降低了弯液面的表面张力，引起从基材表面冲洗流体的马兰戈尼流，从而干燥基材。清洗液槽具有基板接收和清洁部分和基板漂洗部分。冲洗流体源和干燥蒸气源由在罐的漂洗部分上方的干燥箱包围。因此，在时间上至少部分重叠地执行基板装载，清洁，漂洗，干燥和卸载。

5. 发明授权

US06241588B1 Cavitational polishing pad conditioner 失效
标题翻译：海洋抛光垫调理剂
公开(公告)号：US06241588B1
公开(公告)日：2001-06-05
申请号：US09643384
申请日：2000-08-21
申请人： Kyle A. Brown , Boris Fishkin
发明人： Kyle A. Brown , Boris Fishkin
IPC分类号： B24B100
CPC分类号： B24B53/017 , B24B1/04
摘要： A chemical mechanical polishing system comprising a moving polishing pad and an ultrasonic conditioning head. The head is positioned in close facing relationship to the pad surface and agitates a liquid on the rotating pad surface at an appropriate frequency and sufficient amplitude to produce cavitation of the slurry in the vicinity of the pad surface. The action of cavitational collapse vigorously conditions the pad, driving out contaminants and re-texturizing the pad.
摘要翻译：一种化学机械抛光系统，包括移动的抛光垫和超声波调节头。头部以与衬垫表面紧密相对的关系定位，以适当的频率和足够的幅度搅动旋转焊盘表面上的液体，以在焊盘表面附近产生浆料的空化。气蚀的作用大大地调节了垫子，排除污染物并重新组织了垫子。

6. 发明授权

US6149505A Cavitational polishing pad conditioner 失效
标题翻译：海洋抛光垫调理剂
公开(公告)号：US6149505A
公开(公告)日：2000-11-21
申请号：US368395
申请日：1999-08-04
申请人： Kyle A. Brown , Boris Fishkin
发明人： Kyle A. Brown , Boris Fishkin
IPC分类号： B24B1/04 , B24B53/007 , B24B53/017 , H01L21/304 , B24B1/00
CPC分类号： B24B53/017 , B24B1/04
摘要： A chemical mechanical polishing system comprising a moving polishing pad and an ultrasonic conditioning head. The head is positioned in close facing relationship to the pad surface and agitates a liquid on the rotating pad surface at an appropriate frequency and sufficient amplitude to produce cavitation of the slurry in the vicinity of the pad surface. The action of cavitational collapse vigorously conditions the pad, driving out contaminants and re-texturizing the pad.
摘要翻译：一种化学机械抛光系统，包括移动的抛光垫和超声波调节头。头部以与衬垫表面紧密相对的关系定位，以适当的频率和足够的幅度搅动旋转焊盘表面上的液体，以在焊盘表面附近产生浆料的空化。气蚀的作用大大地调节了垫子，排除污染物并重新组织了垫子。

7. 发明授权

US06148833A Continuous cleaning megasonic tank with reduced duty cycle transducers 失效
公开(公告)号：US06148833A
公开(公告)日：2000-11-21
申请号：US191058
申请日：1998-11-11
申请人： Jianshe Tang , Brian J. Brown , Boris Fishkin
发明人： Jianshe Tang , Brian J. Brown , Boris Fishkin
IPC分类号： B08B3/12 , H01L21/00 , H01L21/304
CPC分类号： H01L21/67057 , B08B3/12 , Y10S134/902
摘要： A sonic tank for cleaning substrates is provided. The tank has two or more upwardly angled walls. Arrays of one or more transducers are positioned along at least two of the two or more angled walls. The transducer arrays are alternately energized maintaining nearly 100% substrate surface cleaning at any given time, and 50% duty cycle (or less) for each transducer array. The substrate supports are positioned such that nearly every point along the substrate's surface is contacted by energy from at least one transducer, and transducer opposing walls are positioned to avoid interfering reflections therefrom.

8. 发明授权

US5957754A Cavitational polishing pad conditioner 失效
公开(公告)号：US5957754A
公开(公告)日：1999-09-28
申请号：US927113
申请日：1997-08-29
申请人： Kyle A. Brown , Boris Fishkin
发明人： Kyle A. Brown , Boris Fishkin
IPC分类号： B24B1/04 , B24B53/007 , B24B53/017 , H01L21/304 , B24B1/00
CPC分类号： B24B53/017 , B24B1/04
摘要： A chemical mechanical polishing system comprising a moving polishing pad and an ultrasonic conditioning head. The head is positioned in close facing relationship to the pad surface and agitates a liquid on the rotating pad surface at an appropriate frequency and sufficient amplitude to produce cavitation of the slurry in the vicinity of the pad surface. The action of cavitational collapse vigorously conditions the pad, driving out contaminants and re-texturizing the pad.

9. 发明授权

US06468362B1 Method and apparatus for cleaning/drying hydrophobic wafers 有权
标题翻译：用于清洁/干燥疏水性晶片的方法和装置
公开(公告)号：US06468362B1
公开(公告)日：2002-10-22
申请号：US09644177
申请日：2000-08-23
申请人： Youfel Chen , Brian J Brown , Boris Fishkin , Fred C Redeker
发明人： Youfel Chen , Brian J Brown , Boris Fishkin , Fred C Redeker
IPC分类号： B08B300
CPC分类号： B08B1/04 , B08B3/02 , B08B3/04 , H01L21/02052 , H01L21/67034
摘要： A method and an apparatus that uses a surfactant to clean a hydrophobic wafer is provided. In a first aspect, the method may clean and dry a wafer without applying pure DI water to the wafer. In a second aspect, the method may clean a wafer by applying pure DI water to the wafer only for a short duration of time such that the DI water application ceases prior to or as soon as a surfactant solution is rinsed from the wafer thereafter the wafer is dried. In a further aspect a hydrophobic wafer is maintained wetted with surfactant as it is transferred between cleaning apparatuses and is rinsed via diluted surfactant or via a brief DI water spray and is thereafter dried.
摘要翻译：提供了使用表面活性剂来清洁疏水性晶片的方法和装置。在第一方面，该方法可以清洁和干燥晶片，而不对晶片施加纯净的DI水。在第二方面，该方法可以通过仅在短时间内将纯DI水施加到晶片来清洁晶片，使得在从晶片冲洗表面活性剂溶液之前或之后立即停止DI水应用，之后晶片被干燥。在另一方面，当疏水性晶片在清洁装置之间转移时，保持用表面活性剂润湿，并通过稀释的表面活性剂或通过短暂的DI水喷雾冲洗，然后干燥。

10. 发明授权

US06464799B1 Method for managing a fluid level associated with a substrate processing tank 失效
标题翻译：用于管理与衬底处理槽相关联的液面的方法
公开(公告)号：US06464799B1
公开(公告)日：2002-10-15
申请号：US09580881
申请日：2000-05-30
申请人： Alexander Lerner , Brian J. Brown , Boris Fishkin , Jonathan S. Frankel
发明人： Alexander Lerner , Brian J. Brown , Boris Fishkin , Jonathan S. Frankel
IPC分类号： B08B310
CPC分类号： B08B3/00 , B08B3/12 , G05D9/12 , G05D21/02 , G05D23/19 , G05D27/02 , H01L21/67253
摘要： An improved method and apparatus for adjusting chemistry concentrations and temperatures within a substrate processing tank is provided. A first aspect may include checking the fluid level within the tank, and, if the level is higher than a predetermined upper level, bleeding an amount of fluid from the tank; if the level is lower than a predetermined lower level, flowing an amount of fluid to the tank, and if the level is between the predetermined upper and lower levels, bleeding an amount of fluid from the tank and flowing an amount of fluid to the tank. A second aspect may include flowing water into the tank at a flow rate at least equivalent to the flow rate of water required to achieve a chemistry spike of a predetermined concentration and volume prior to beginning the flow of chemicals. A third aspect may include a method and apparatus for heating or cooling chemistry to a predetermined temperature as the chemistry is recirculated.
摘要翻译：提供了用于调整基板处理槽内的化学浓度和温度的改进方法和装置。第一方面可以包括检查罐内的液位，并且如果液位高于预定的上限，则从罐中排出一定量的流体; 如果水平低于预定的较低水平，则将一定量的流体流向罐，并且如果水平在预定的上下水平之间，则从罐中排出一定量的流体并将一定量的流体流向罐。第二方面可以包括以至少等于在开始化学品流动之前实现预定浓度和体积的化学峰值所需的水的流速至少等于流量的水流入罐中。第三方面可以包括当化学物质再循环时将化学物质加热或冷却至预定温度的方法和装置。

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