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1. 发明授权

US06893893B2 Method of preventing short circuits in magnetic film stacks 失效
标题翻译：防止磁性薄膜堆叠短路的方法
公开(公告)号：US06893893B2
公开(公告)日：2005-05-17
申请号：US10235100
申请日：2002-09-04
申请人： Padmapani C. Nallan , Ajay Kumar , Jeng H. Hwang , Guangxiang Jin , Ralph Kerns
发明人： Padmapani C. Nallan , Ajay Kumar , Jeng H. Hwang , Guangxiang Jin , Ralph Kerns
IPC分类号： H01L21/00 , H01L23/00 , H01L43/12
CPC分类号： H01L23/564 , H01L21/67069 , H01L43/12 , H01L2924/0002 , H01L2924/00
摘要： A method for preventing electrical short circuits in a multi-layer magnetic film stack comprises providing a film stack that includes a layer of magnetic material having an exposed surface. A protective layer is deposited on the exposed surface of the magnetic layer. The protective layer may comprise, for example, a fluorocarbon or a hydrofluorocarbon. The film stack is etched and the protective layer protects the exposed surface from a conductive residue produced while etching the film stack. The method may be used in film stacks to form a magneto-resistive random access memory (MRAM) device.
摘要翻译：一种用于防止多层磁性膜堆叠中的电短路的方法包括提供包括具有暴露表面的磁性材料层的膜堆叠。保护层沉积在磁性层的暴露表面上。保护层可以包括例如碳氟化合物或氢氟烃。蚀刻薄膜叠层并且保护层保护暴露的表面免受在蚀刻薄膜叠层时产生的导电残留物。该方法可以用于膜堆叠中以形成磁阻随机存取存储器（MRAM）装置。

2. 发明授权

US06806095B2 Method of plasma etching of high-K dielectric materials with high selectivity to underlying layers 失效
标题翻译：高K电介质材料的等离子体蚀刻方法，具有对底层的高选择性
公开(公告)号：US06806095B2
公开(公告)日：2004-10-19
申请号：US10092795
申请日：2002-03-06
申请人： Padmapani C. Nallan , Guangxiang Jin , Ajay Kumar
发明人： Padmapani C. Nallan , Guangxiang Jin , Ajay Kumar
IPC分类号： H01L2100
CPC分类号： H01L21/31116 , H01L21/31122
摘要： A method of etching high dielectric constant materials using halogen gas and reducing gas chemistry. An embodiment of the method is accomplished using a 20 to 300 sccm of chlorine and 2 to 200 sccm of carbon monoxide, regulated to a total chamber pressure of 2-100 mTorr to etch a hafnium oxide layer.
摘要翻译：使用卤素气体蚀刻高介电常数材料并减少气体化学的方法。该方法的一个实施方案是使用20至300sccm的氯和2至200sccm的一氧化碳来实现，调节至总室压力为2-100mTorr以蚀刻氧化铪层。

3. 发明授权

US07217665B2 Method of plasma etching high-K dielectric materials with high selectivity to underlying layers 失效
标题翻译：等离子体蚀刻高K电介质材料的方法，具有对底层的高选择性
公开(公告)号：US07217665B2
公开(公告)日：2007-05-15
申请号：US10301239
申请日：2002-11-20
申请人： Padmapani C. Nallan , Guangxiang Jin , Ajay Kumar
发明人： Padmapani C. Nallan , Guangxiang Jin , Ajay Kumar
IPC分类号： H01L21/302
CPC分类号： H01L21/31116 , H01L21/31122
摘要： A method of plasma etching a layer of dielectric material having a dielectric constant that is greater than four (4). The method includes exposing the dielectric material layer to a plasma comprising a hydrocarbon gas and a halogen containing gas.
摘要翻译：一种等离子体蚀刻具有大于四（4）的介电常数的介电材料层的方法。该方法包括将介电材料层暴露于包含烃气体和含卤素气体的等离子体。

4. 发明授权

US06767824B2 Method of fabricating a gate structure of a field effect transistor using an alpha-carbon mask 失效
公开(公告)号：US06767824B2
公开(公告)日：2004-07-27
申请号：US10338251
申请日：2003-01-06
申请人： Padmapani C. Nallan , Ajay Kumar , Guangxiang Jin , Wei Liu
发明人： Padmapani C. Nallan , Ajay Kumar , Guangxiang Jin , Wei Liu
IPC分类号： H01L214763
CPC分类号： H01L21/31144 , H01L21/0273 , H01L21/28123 , H01L21/31122 , H01L21/31138 , H01L21/32137 , H01L21/32139 , Y10S438/945
摘要： A method of fabricating a gate structure of a field effect transistor comprising processes of forming an &agr;-carbon mask and plasma etching a gate electrode and a gate dielectric using the &agr;-carbon mask. In one embodiment, the gate dielectric comprises hafnium dioxide.

5. 发明授权

US06692903B2 Substrate cleaning apparatus and method 有权
标题翻译：基板清洗装置及方法
公开(公告)号：US06692903B2
公开(公告)日：2004-02-17
申请号：US09737373
申请日：2000-12-13
申请人： Haojiang Chen , James S. Papanu , Mark Kawaguchi , Harald Herchen , Jeng H. Hwang , Guangxiang Jin , David Palagashvili
发明人： Haojiang Chen , James S. Papanu , Mark Kawaguchi , Harald Herchen , Jeng H. Hwang , Guangxiang Jin , David Palagashvili
IPC分类号： G03F736
CPC分类号： H01L21/02071 , G03F7/427 , H01L21/32136
摘要： A method of processing a substrate 30 comprises exposing the substrate 30 to an energized process gas to etch features 67 on the substrate 30 and exposing the substrate 30 to an energized cleaning gas to remove etchant residue 70 and/or remnant resist 60 from the substrate 30. To enhance the cleaning process, the substrate 30 may be treated before, during or after the cleaning process by exposing the substrate 30 to an energized treating gas comprising a halogen species.
摘要翻译：处理衬底30的方法包括将衬底30暴露于通电工艺气体以蚀刻衬底30上的特征67，并将衬底30暴露于通电的清洁气体以从衬底30去除蚀刻剂残留物70和/或残余抗蚀剂60 为了增强清洁过程，可以在清洁过程之前，之中或之后对衬底30进行处理，通过将衬底30暴露于包含卤素物质的通电处理气体中。

6. 发明授权

US06821907B2 Etching methods for a magnetic memory cell stack 失效
标题翻译：磁记忆体堆叠的蚀刻方法
公开(公告)号：US06821907B2
公开(公告)日：2004-11-23
申请号：US10092456
申请日：2002-03-06
申请人： Jeng H. Hwang , Guangxiang Jin , Xiaoyi Chen
发明人： Jeng H. Hwang , Guangxiang Jin , Xiaoyi Chen
IPC分类号： H01L21461
CPC分类号： B82Y25/00 , B82Y40/00 , H01F41/308 , H01L43/12
摘要： A method and apparatus for etching a magnetic memory cell stack are described. More particularly, HCl is used as a main etchant gas for etching a magnetic memory cell stack. HCl is used in part to reduce corrosion and improve selectivity. Additionally, use of an amorphous carbon or hydrocarbon based polymer resin for a hard mask is described, as well as a post-etch passivation with a water rinse, a water vapor plasma treatment or an ammonia plasma treatment. Moreover, in an embodiment, a diffusion barrier layer dispose most of the magnetic memory cell stack is etched with hydrogen and fluorine containing gas in a separate process chambers.
摘要翻译：描述了用于蚀刻磁存储单元堆栈的方法和装置。更具体地，HCl用作蚀刻磁存储单元堆叠的主蚀刻剂气体。 HCl部分用于减少腐蚀和提高选择性。另外，描述了使用无定形碳或烃基聚合物树脂作为硬掩模，以及用水冲洗，水蒸气等离子体处理或氨等离子体处理的蚀刻后钝化。此外，在一个实施例中，布置大部分磁存储单元堆叠的扩散阻挡层在单独的处理室中被氢气和含氟气体蚀刻。

7. 发明授权

US06730561B2 Method of forming a cup capacitor 失效
标题翻译：形成杯式电容器的方法
公开(公告)号：US06730561B2
公开(公告)日：2004-05-04
申请号：US09876282
申请日：2001-06-06
申请人： Jeng H. Hwang , Guangxiang Jin
发明人： Jeng H. Hwang , Guangxiang Jin
IPC分类号： H01L218242
CPC分类号： H01L28/91 , H01L21/32136 , H01L27/10852
摘要： A simple method of forming a cup capacitor is disclosed. The method typically involves only “dry” deposition and etching steps, allowing applicants' method to be performed in a single processing apparatus, if so desired. The method includes the following steps: a) providing a semiconductor structure including a dielectric layer overlying a semiconductor substrate, wherein a cup is present in the dielectric layer, the cup having an opening at an upper surface of the dielectric layer; b) depositing a conformal layer of a conductive material over the dielectric layer, including the sidewalls and bottom of the cup; c) depositing a layer of a sacrificial material over the conductive material, in an amount sufficient to fill the cup; d) removing sacrificial material present on an upper surface (field surface) of the conductive layer outside of and adjacent to the cup by plasma etching, using a plasma source gas which selectively etches the sacrificial material relative to the conductive material; e) removing conductive material present on an upper surface (field surface) of the dielectric layer outside of and adjacent to the cup by plasma etching, using a plasma source gas which selectively etches the conductive material relative to the sacrificial material remaining inside of the cup; and f) removing sacrificial layer material remaining inside of the cup by etching, using an etchant which selectively etches the sacrificial material inside of the cup relative to the conductive material inside of the cup.
摘要翻译：公开了一种形成杯式电容器的简单方法。该方法通常仅涉及“干”沉积和蚀刻步骤，如果需要，允许申请人的方法在单个处理设备中执行。该方法包括以下步骤：a）提供包括覆盖在半导体衬底上的电介质层的半导体结构，其中杯存在于电介质层中，该杯在电介质层的上表面具有开口; b）在介电层上沉积导电材料的保形层，包括杯的侧壁和底部; c）以足以填充杯子的量在导电材料上沉积牺牲材料层; d）通过使用等离子体源气体去除牺牲材料相对于导电材料的等离子体源气体去除存在于导电层的上表面（场表面）上的牺牲材料，该牺牲材料通过等离子体蚀刻在杯子外部和邻近的位置; e）使用等离子体源气体来除去存在于电介质层的上表面（场表面）上的外部和邻近杯子的导电材料，该等离子体源气体相对于保留在杯内的牺牲材料选择性地蚀刻导电材料 ; 以及f）通过蚀刻去除使用蚀刻剂去除在杯内残留的牺牲层材料，所述蚀刻剂相对于所述杯内的导电材料选择性地蚀刻所述杯内的所述牺牲材料。

8. 发明授权

US06368517B1 Method for preventing corrosion of a dielectric material 失效
标题翻译：防止电介质材料腐蚀的方法
公开(公告)号：US06368517B1
公开(公告)日：2002-04-09
申请号：US09251651
申请日：1999-02-17
申请人： Jeng H. Hwang , Kang-Lie Chiang , Guangxiang Jin
发明人： Jeng H. Hwang , Kang-Lie Chiang , Guangxiang Jin
IPC分类号： B44C122
CPC分类号： H01L21/02071 , H01L21/31122 , H01L28/55 , H01L28/60
摘要： Method for removing or inactivating corrosion-forming etch residues remaining on the surface of a dielectric material after etching a metal layer which is supported by the dielectric material. The surface of the dielectric material which supports the corrosion-forming etch residues is post-etch treated in order to remove the corrosion-forming etch residues. Post-etch treating of the surface of the dielectric material includes disposing the dielectric material in a vacuum chamber having microwave downstream treating gas plasma, or contacting the surface of the dielectric material with deionized water.
摘要翻译：在蚀刻由电介质材料支撑的金属层之后，去除或钝化留在电介质材料表面上的腐蚀形成蚀刻残留物的方法。支持腐蚀蚀刻残留物的电介质材料的表面进行后蚀刻处理以除去腐蚀形成蚀刻残留物。电介质材料的表面的蚀刻后处理包括将介电材料设置在具有微波下游处理气体等离子体的真空室中，或者将电介质材料的表面与去离子水接触。

9. 发明申请

US20070077767A1 METHOD OF PLASMA ETCHING OF HIGH-K DIELECTRIC MATERIALS 有权
标题翻译：高K电介质材料等离子体蚀刻方法
公开(公告)号：US20070077767A1
公开(公告)日：2007-04-05
申请号：US11464276
申请日：2006-08-14
申请人： Guangxiang Jin , Padmapani Nallan , Ajay Kumar
发明人： Guangxiang Jin , Padmapani Nallan , Ajay Kumar
IPC分类号： C23F1/00 , H01L21/302 , C03C15/00
CPC分类号： H01L21/31122
摘要： A method of etching high dielectric constant materials using a halogen gas, a reducing gas and an etch rate control gas chemistry.
摘要翻译：使用卤素气体，还原气体和蚀刻速率控制气体化学法蚀刻高介电常数材料的方法。

10. 发明授权

US07838434B2 Method of plasma etching of high-K dielectric materials 有权
标题翻译：高K电介质材料等离子体蚀刻方法
公开(公告)号：US07838434B2
公开(公告)日：2010-11-23
申请号：US11464276
申请日：2006-08-14
申请人： Guangxiang Jin , Padmapani Nallan , Ajay Kumar
发明人： Guangxiang Jin , Padmapani Nallan , Ajay Kumar
IPC分类号： H01L21/302
CPC分类号： H01L21/31122
摘要： A method of etching high dielectric constant materials using a halogen gas, a reducing gas and an etch rate control gas chemistry.
摘要翻译：使用卤素气体，还原气体和蚀刻速率控制气体化学法蚀刻高介电常数材料的方法。

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