专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2002073553A1 SUPPLY SYSTEM 审中-公开
标题翻译：供应系统
公开(公告)号：WO2002073553A1
公开(公告)日：2002-09-19
申请号：PCT/GB2001/001135
申请日：2001-03-14
申请人： PRI LIMITED , FIELDEN, John , SINGHAL, Sanjaya , JAMES, Andrew
发明人： FIELDEN, John , SINGHAL, Sanjaya , JAMES, Andrew
IPC分类号： G07F15/00
CPC分类号： G06Q20/127 , G06Q20/28 , G07F15/003 , G07F15/12 , G07F17/0014
摘要： A system for supplying pre-paid goods or services eg electricity to a user, comprising: a monitoring device locate at the user's premises for monitoring usage of goods or services, the device including a storage means for storing a signal indicative of the current amount of credit, a keyboard for entering an encoded message in the form of a data encryption standard code which includes information indicative of an amount of credit, decryption means for decrypting the encoded message, and processing means for processing the decoded message in order to determine the amount of credit and for updating the storage means; and a message generating device located remote from the user's premises for generating an encoded message in the form of a data encryption standard code in a discernable alpha-numeric format, the encoded message generating device and the decryption means utilising the same key, which key is changed for every transaction.
摘要翻译：一种用于向用户提供预付货物或服务（例如电力）的系统，包括：监视设备，位于用户的房屋处，用于监视商品或服务的使用，该设备包括存储装置，用于存储指示当前量的信用卡，用于以数据加密标准代码形式输入编码消息的键盘，该数据加密标准代码包括指示信用量的信息，用于解密编码消息的解密装置，以及用于处理解码消息的处理装置，以便确定数量的信用和更新存储手段; 以及位于远离用户场所的消息产生设备，用于以可辨别的字母数字格式生成以数据加密标准代码形式的编码消息，编码消息生成设备和使用相同密钥的解密装置，该密钥是改变了每一笔交易。

2. 发明申请

WO2013015940A2 LASER WITH HIGH QUALITY, STABLE OUTPUT BEAM, AND LONG LIFE HIGH CONVERSION EFFICIENCY NON-LINEAR CRYSTAL 审中-公开
标题翻译：具有高质量，稳定的输出光束和长寿命高转换效率非线性晶体的激光
公开(公告)号：WO2013015940A2
公开(公告)日：2013-01-31
申请号：PCT/US2012/044661
申请日：2012-06-28
申请人： KLA-TENCOR CORPORATION , DRIBINSKI, Vladimir , CHUANG, Yung-Ho Alex , ARMSTRONG, Joseph J , FIELDEN, John
发明人： DRIBINSKI, Vladimir , CHUANG, Yung-Ho Alex , ARMSTRONG, Joseph J , FIELDEN, John
IPC分类号： H01S3/098 , H01S3/109
CPC分类号： H01S5/0092 , C03B33/02 , C30B1/02 , C30B29/10 , C30B29/14 , C30B29/22 , C30B29/30 , C30B33/02 , G01N21/88 , G01N21/8806 , G01N21/94 , G01N21/9501 , G01N2201/06113 , G01N2201/0637 , G01N2201/068 , G02F1/353 , G02F1/3551 , G02F1/3553 , G02F1/37 , G02F2001/3505 , G02F2001/3507 , G02F2001/354 , G02F2202/20 , H01S3/0092 , H01S3/10 , H01S3/10038 , H01S3/10046 , H01S3/11
摘要： A mode-locked laser system operable at low temperature can include an annealed, frequency-conversion crystal and a housing to maintain an annealed condition of the crystal during standard operation at the low temperature. In one embodiment, the crystal can have an increased length. First beam shaping optics can be configured to focus a beam from a light source to an elliptical cross section at a beam waist located in or proximate to the crystal. A harmonic separation block can divide an output from the crystal into beams of different frequencies separated in space. In one embodiment, the mode-locked laser system can further include second beam shaping optics configured to convert an elliptical cross section of the desired frequency beam into a beam with a desired aspect ratio, such as a circular cross section.
摘要翻译：可在低温下操作的模式锁定激光系统可以包括退火的频率转换晶体和壳体，以在低温下的标准操作期间保持晶体的退火状态。在一个实施例中，晶体可以具有增加的长度。第一光束整形光学元件可以被配置成将来自光源的光束聚焦到位于或接近晶体的光束腰部处的椭圆形横截面。谐波分离块可以将来自晶体的输出分成在空间中分离的不同频率的波束。在一个实施例中，锁模激光系统还可以包括第二光束整形光学器件，其被配置为将期望的频率波束的椭圆形横截面转换成具有期望的纵横比的光束，例如圆形横截面。

3. 发明申请

WO2005114148A3 SYSTEMS AND METHODS FOR MEASUREMENT OR ANALYSIS OF A SPECIMEN 审中-公开
公开(公告)号：WO2005114148A3
公开(公告)日：2005-12-01
申请号：PCT/US2005/016843
申请日：2005-05-13
申请人： KLA-TENCOR TECHNOLOGIES CORP. , FIELDEN, John , JANIK, Gary , LEE, Shing , ZHAO, Qiang , KAACK, Torsten , YOO, Sungchul , TAN, Zhengquan
发明人： FIELDEN, John , JANIK, Gary , LEE, Shing , ZHAO, Qiang , KAACK, Torsten , YOO, Sungchul , TAN, Zhengquan
IPC分类号： G01J4/00
摘要： Various systems for measurement or analysis of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment (224). The purged environment (224) may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems. Some systems also include a cleaning subsystem configured to remove contaminants from a portion of a specimen prior to measurements at vacuum ultraviolet wavelengths.

4. 发明申请

WO2012134625A2 ILLUMINATING A SPECIMEN FOR METROLOGY OR INSPECTION 审中-公开
标题翻译：照射计量或检验样本
公开(公告)号：WO2012134625A2
公开(公告)日：2012-10-04
申请号：PCT/US2012/023205
申请日：2012-01-30
申请人： KLA-TENCOR CORPORATION , CHUANG, Yung-Ho, Alex , LEVINSKI, Vladimir , LIU, Xuefeng , FIELDEN, John
发明人： CHUANG, Yung-Ho, Alex , LEVINSKI, Vladimir , LIU, Xuefeng , FIELDEN, John
IPC分类号： G01N21/88 , G01N21/01
CPC分类号： G01N21/9501 , G01N2021/479
摘要： Illumination subsystems of a metrology or inspection system, metrology systems, inspection systems, and methods for illuminating a specimen for metrology measurements or for inspection are provided.
摘要翻译：提供了计量或检查系统的照明子系统，计量系统，检查系统和用于计量测量或检查的照明样本的方法。

5. 发明申请

WO2011106227A2 CELL FOR LIGHT SOURCE 审中-公开
标题翻译：光源的细胞
公开(公告)号：WO2011106227A2
公开(公告)日：2011-09-01
申请号：PCT/US2011/025198
申请日：2011-02-17
申请人： KLA-TENCOR CORPORATION , GROSS, Kenneth, P. , CHUANG, Yung-ho , FIELDEN, John
发明人： GROSS, Kenneth, P. , CHUANG, Yung-ho , FIELDEN, John
IPC分类号： H01J65/00 , H01J61/30 , H01J61/16
CPC分类号： H01J61/302 , H01J61/025 , H01J61/16 , H01J61/54 , H01J61/86 , H01J65/04 , H01J65/042 , H01J65/06
摘要： A cell for a vacuum ultraviolet plasma light source, the cell having a closed sapphire tube containing at least one noble gas. Such a cell does not have a metal housing, metal-to-metal seals, or any other metal flanges or components, except for the electrodes (in some embodiments). In this manner, the cell is kept to a relatively small size, and exhibits a more uniform heating of the gas and cell than can be readily achieved with a hybridized metal/window cell design. These designs generally result in higher plasma temperatures (a brighter light source), shorter wavelength output, and lower optical noise due to fewer gas convection currents created between the hotter plasma regions and surrounding colder gases. These cells provide a greater amount of output with wavelengths in the vacuum ultraviolet range than do quartz or fused silica cells. These cells also produce continuous spectral emission well into the infrared range, making them a broadband light source.
摘要翻译：一种用于真空紫外线等离子体光源的电池，该电池具有包含至少一种惰性气体的封闭蓝宝石管。除了电极（在一些实施例中），这种电池不具有金属外壳，金属对金属密封件或任何其它金属法兰或部件。以这种方式，电池被保持为相对小的尺寸，并且表现出比使用杂化金属/窗口电池设计容易实现的气体和电池的更均匀的加热。这些设计通常导致更高的等离子体温度（较亮的光源），更短的波长输出和更低的光学噪声，这是由于较热的等离子体区域和周围较冷的气体之间产生的较小的气体对流电流。这些电池在真空紫外线范围内提供比石英或熔融石英电池更大的输出量。这些电池还可以在红外范围内产生连续的光谱发射，使其成为宽带光源。

6. 发明申请

WO2008151083A1 FEEDFORWARD/FEEDBACK LITHO PROCESS CONTROL OF STRESS AND OVERLAY 审中-公开
标题翻译：反应/反馈LITHO过程控制应力和覆盖
公开(公告)号：WO2008151083A1
公开(公告)日：2008-12-11
申请号：PCT/US2008/065421
申请日：2008-05-30
申请人： KLA-TENCOR CORPORATION , ADEL, Michael , FIELDEN, John , WIDMANN, Amir , ROBINSON, John , CHOI, Dongsub
发明人： ADEL, Michael , FIELDEN, John , WIDMANN, Amir , ROBINSON, John , CHOI, Dongsub
IPC分类号： G06F19/00
CPC分类号： G03F7/70258 , G03F7/705 , G03F7/70525 , G03F7/70616 , G03F7/70783
摘要： A method and apparatus for process control in a lithographic process are described. Metrology may be performed on a substrate either before or after performing a lithographic patterning process on the substrate. One or more correctables to the lithographic patterning process may be generated based on the metrology. The lithographic patterning process performed on the substrate (or a subsequent substrate) may be adjusted with the correctables.
摘要翻译：描述了光刻工艺中的工艺控制的方法和装置。在基板上执行光刻图案化处理之前或之后，可以在基板上进行计量。可以基于计量产生光刻图案化过程的一个或多个可修改的内容。可以用可校正的方法来调整在衬底（或随后的衬底）上执行的光刻图案化工艺。

7. 发明申请

WO2004076963A2 APPARATUS AND METHOD FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY 审中-公开
标题翻译：用于使用散射检测来检测重叠错误的装置和方法
公开(公告)号：WO2004076963A2
公开(公告)日：2004-09-10
申请号：PCT/US2004/005419
申请日：2004-02-23
申请人： KLA-TENCOR TECHNOLOGIES CORPORATION , MIEHER, Walter, D. , LEVY, Ady , GOLOVANEVSKY, Boris , FRIEDMANN, Michael , SMITH, Ian , ADEL, Michael , FABRIKANT, Anatoly , BEVIS, Christopher, F. , FIELDEN, John , BAREKET, Noah , GROSS, Ken , ZALICKI, Piotr , WACK, Dan , DECECCO, Paola , DZIURA, Thaddeus, G. , GHINOVKER, Mark
发明人： MIEHER, Walter, D. , LEVY, Ady , GOLOVANEVSKY, Boris , FRIEDMANN, Michael , SMITH, Ian , ADEL, Michael , FABRIKANT, Anatoly , BEVIS, Christopher, F. , FIELDEN, John , BAREKET, Noah , GROSS, Ken , ZALICKI, Piotr , WACK, Dan , DECECCO, Paola , DZIURA, Thaddeus, G. , GHINOVKER, Mark
IPC分类号： G01B
CPC分类号： G03F9/7088 , G01N21/956 , G01N2021/213 , G03F7/70625 , G03F7/70633 , G03F7/70683 , G03F9/7049 , G03F9/7084
摘要： Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an optical system is employed to thereby measure an optical signal from each of the periodic targets. There are predefined offsets between the first and second structures. An overlay error is determined between the first and second structures by analyzing the measured optical signals from the periodic targets using a scatterometry overlay technique based on the predefined offsets. The optical system comprises any one or more of the following apparatus: an imaging reflectometer, an imaging spectroscopic reflectometer, a polarized spectroscopic imaging reflectometer, a scanning reflectometer system, a system with two or more reflectometers capable of parallel data acquisition, a system with two or more spectroscopic reflectometers capable of parallel data acquisition, a system with two or more polarized spectroscopic reflectometers capable of parallel data acquisition, a system with two or more polarized spectroscopic reflectometers capable of serial data acquisition without moving the wafer stage or moving any optical elements or the reflectometer stage, imaging spectrometers, imaging system with wavelength filter, imaging system with long-pass wavelength filter, imaging system with short-pass wavelength filter, imaging system without wavelength filter, interferometric imaging system, imaging ellipsometer, a spectroscopic ellipsometer, a laser ellipsometer having a photoelastic modulator, an imaging spectroscopic ellipsometer, a scanning ellipsometer system, a system with two or more ellipsometers capable of parallel data acquisition, a system with two or more ellipsometers capable of serial data acquisition without moving the wafer stage or moving any optical elements or the ellipsometer stage, a Michelson interferometer, and a Mach-Zehnder interferometer, a Sagnac interferometer, a scanning angle of incidence system, a scanning azimuth angle system, a +/- first order differential reflectometer, a +/- first order differential polarized reflectometer.
摘要翻译：公开了一种确定多层样本的两层之间的覆盖误差的方法。对于每个具有由第一层形成的第一结构和由第二层样品形成的第二结构的多个周期性目标，采用光学系统，从而测量来自每个周期性目标的光信号。在第一和第二结构之间有预定义的偏移。通过使用基于预定偏移的散射测量覆盖技术来分析来自周期性目标的所测量的光信号，在第一和第二结构之间确定覆盖误差。光学系统包括以下装置中的任何一个或多个：成像反射计，成像光谱反射计，偏振光谱成像反射计，扫描反射计系统，具有两个或更多个能够并行数据采集的反射计的系统，具有两个具有能够并行数据采集的两个或更多个偏振分光反射计的系统，具有两个或更多个偏振光谱反射计的系统，其能够进行串行数据采集而不移动晶片台或移动任何光学元件或反射计阶段，成像光谱仪，波长滤波器成像系统，长波长滤波器成像系统，短波长滤波器成像系统，无波长滤波器成像系统，干涉成像系统，成像椭偏仪，光谱椭偏仪，激光椭偏仪具有光弹性调制器，成像光谱椭偏仪，扫描椭偏仪系统，具有能够并行数据采集的两个或更多个椭偏仪的系统，具有两个或更多个椭圆计的系统，能够进行串行数据采集而不移动晶片台或移动任何光学元件或椭圆偏振台，迈克尔逊干涉仪和马赫 - 策德尔干涉仪，Sagnac干涉仪，入射系统的扫描角度，扫描方位角系统，+/-一阶微分反射计，+/-一阶差分偏振反射计。

8. 发明申请

WO2010104799A2 SYSTEMS AND METHODS FOR DETERMINING ONE OR MORE CHARACTERISTICS OF A SPECIMEN USING RADIATION IN THE TERAHERTZ RANGE 审中-公开
标题翻译：用于确定在TERAHERTZ范围内使用辐射的样本的一个或多个特征的系统和方法
公开(公告)号：WO2010104799A2
公开(公告)日：2010-09-16
申请号：PCT/US2010/026557
申请日：2010-03-08
申请人： KLA-TENCOR CORPORATION , LEVY, Ady , NGAI, Samuel , BEVIS, Christopher F. , CONCINA, Stefano , FIELDEN, John , MIEHER, Walter , MUELLER, Dieter , RICHARDSON, Neil , WACK, Dan , WAGNER, Larry
发明人： LEVY, Ady , NGAI, Samuel , BEVIS, Christopher F. , CONCINA, Stefano , FIELDEN, John , MIEHER, Walter , MUELLER, Dieter , RICHARDSON, Neil , WACK, Dan , WAGNER, Larry
IPC分类号： H01L21/66
CPC分类号： G01N21/9505 , G01N21/3581 , H01L22/12
摘要： Systems and methods for determining one or more characteristics of a specimen using radiation in the terahertz range are provided. One system includes an illumination subsystem configured to illuminate the specimen with radiation. The system also includes a detection subsystem configured to detect radiation propagating from the specimen in response to illumination of the specimen and to generate output responsive to the detected radiation. The detected radiation includes radiation in the terahertz range. In addition, the system includes a processor configured to determine the one or more characteristics of the specimen using the output.
摘要翻译：提供了使用太赫兹范围内的辐射来确定样本的一个或多个特征的系统和方法。一个系统包括被配置为用辐射照射样本的照明子系统。该系统还包括检测子系统，该检测子系统被配置为响应于样本的照射来检测从样本传播的辐射，并响应于检测到的辐射产生输出。检测到的辐射包括太赫兹范围内的辐射。另外，该系统包括配置成使用该输出来确定样本的一个或多个特性的处理器。

9. 发明申请

WO2013043831A2 PROCESS AWARE METROLOGY 审中-公开
标题翻译：过程技巧
公开(公告)号：WO2013043831A2
公开(公告)日：2013-03-28
申请号：PCT/US2012/056272
申请日：2012-09-20
申请人： KLA-TENCOR CORPORATION , LIU, Xuefeng , CHUANG, Yung-Ho Alex , FIELDEN, John , TSAI, Bin-Ming Benjamin , ZHANG, Jingjing
发明人： LIU, Xuefeng , CHUANG, Yung-Ho Alex , FIELDEN, John , TSAI, Bin-Ming Benjamin , ZHANG, Jingjing
IPC分类号： H01L21/66
CPC分类号： G06F17/5018 , G03F7/70625 , G06F17/10 , G06F17/5081 , G06F19/00 , G06F2217/12 , G06F2217/14 , G06F2217/16 , H01L22/12 , H01L22/20
摘要： Systems and methods for process aware metrology are provided.
摘要翻译：提供了流程感知度量的系统和方法。

10. 发明申请

WO2010011560A3 IMPROVED METROLOGY THROUGH USE OF FEED FORWARD FEED SIDEWAYS AND MEASUREMENT CELL RE-USE 审中-公开
公开(公告)号：WO2010011560A3
公开(公告)日：2010-01-28
申请号：PCT/US2009/050834
申请日：2009-07-16
申请人： KLA-TENCOR CORPORATION , ADEL, Michael, E. , POSLAVSKY, Leonid , FIELDEN, John , MADSEN, Jonathan, Michael , PETERS, Robert
发明人： ADEL, Michael, E. , POSLAVSKY, Leonid , FIELDEN, John , MADSEN, Jonathan, Michael , PETERS, Robert
IPC分类号： H01L21/66
摘要： Metrology may be implemented during semiconductor device fabrication by a) modeling a first measurement on a first test cell formed in a layer of a partially fabricated device; b) performing a second measurement on a second test cell in the layer; c) feeding information from the second measurement into the modeling of the first measurement; and after a lithography pattern has been formed on the layer including the first and second test cells, d) modeling a third and a fourth measurement on the first and second test cells respectively using information from a) and b) respectively.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式