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1. 发明申请

WO2012177404A3 OPTICAL SYSTEM POLARIZER CALIBRATION 审中-公开
标题翻译：光学系统偏振器校准
公开(公告)号：WO2012177404A3
公开(公告)日：2013-05-10
申请号：PCT/US2012041258
申请日：2012-06-07
申请人： KLA TENCOR CORP , DE VEER JOHANNES D , POSLAVSKY LEONID , ZHUANG GUORONG V , KRISHNAN SHANKAR
发明人： DE VEER JOHANNES D , POSLAVSKY LEONID , ZHUANG GUORONG V , KRISHNAN SHANKAR
IPC分类号： G02B27/62 , G02B5/30
CPC分类号： G01N21/21 , G01J3/504 , G01N21/274
摘要： A method to calibrate a polarizer in polarized optical system at any angle of incidence, by decoupling the calibration from a polarization effect of the system, by providing a calibration apparatus that includes a substrate having a polarizer disposed on a surface thereof, with an indicator on the substrate for indicating a polarization orientation of the polarizer, loading the calibration apparatus in the polarized optical system with the indicator in a desired position, determining an initial angle between the polarization orientation and a reference of the polarized optical system, acquiring spectra using the polarized optical system at a plurality of known angles between the polarization orientation and the reference of the polarized optical system, using the spectra to plot a curve indicating an angle of the polarizer in the polarized optical system, and when the angle of the polarizer is outside of a desired range, adjusting the angle of the polarizer, and repeating the steps of acquiring the spectra, and plotting a curve indicating the angle of the polarizer.
摘要翻译：一种通过提供校准装置来校准偏振光学系统中任何入射角的偏振器的方法，通过提供校准装置，该校准装置包括具有设置在其表面上的偏振器的衬底，用于指示偏振器的偏振取向的衬底，将校准装置装载在具有指示器的期望位置的偏振光学系统中，确定极化取向和偏振光学系统的基准之间的初始角度，使用偏振光光学系统以偏振方向和偏振光学系统的基准之间的多个已知角度，使用光谱绘制指示偏振器在偏振光学系统中的角度的曲线，以及当偏振器的角度在期望的范围，调整偏振器的角度，并重复以下步骤获取光谱，并绘制一个指示偏振片角度的曲线。

2. 发明申请

WO2012177404A2 OPTICAL SYSTEM POLARIZER CALIBRATION 审中-公开
标题翻译：光学系统偏振器校准
公开(公告)号：WO2012177404A2
公开(公告)日：2012-12-27
申请号：PCT/US2012/041258
申请日：2012-06-07
申请人： KLA-TENCOR CORPORATION , DE VEER, Johannes D. , POSLAVSKY, Leonid , ZHUANG, Guorong V. , KRISHNAN, Shankar
发明人： DE VEER, Johannes D. , POSLAVSKY, Leonid , ZHUANG, Guorong V. , KRISHNAN, Shankar
IPC分类号： G02B27/62 , G02B5/30
CPC分类号： G01N21/21 , G01J3/504 , G01N21/274
摘要： A method to calibrate a polarizer in polarized optical system at any angle of incidence, by decoupling the calibration from a polarization effect of the system, by providing a calibration apparatus that includes a substrate having a polarizer disposed on a surface thereof, with an indicator on the substrate for indicating a polarization orientation of the polarizer, loading the calibration apparatus in the polarized optical system with the indicator in a desired position, determining an initial angle between the polarization orientation and a reference of the polarized optical system, acquiring spectra using the polarized optical system at a plurality of known angles between the polarization orientation and the reference of the polarized optical system, using the spectra to plot a curve indicating an angle of the polarizer in the polarized optical system, and when the angle of the polarizer is outside of a desired range, adjusting the angle of the polarizer, and repeating the steps of acquiring the spectra, and plotting a curve indicating the angle of the polarizer.
摘要翻译：一种通过提供校准装置来校准偏振光学系统中任何入射角的偏振器的方法，通过提供校准装置，该校准装置包括具有设置在其表面上的偏振器的衬底，用于指示偏振器的偏振取向的衬底，将校准装置装载在具有指示器的期望位置的偏振光学系统中，确定极化取向和偏振光学系统的基准之间的初始角度，使用偏振光光学系统以偏振方向和偏振光学系统的基准之间的多个已知角度，使用光谱绘制指示偏振器在偏振光学系统中的角度的曲线，以及当偏振器的角度在期望的范围，调整偏振器的角度，并重复以下步骤获取光谱，并绘制一个指示偏振片角度的曲线。

3. 发明申请

WO2013006637A1 MULTI-ANALYZER ANGLE SPECTROSCOPIC ELLIPSOMETRY 审中-公开
标题翻译：多分析仪角度分光光度计
公开(公告)号：WO2013006637A1
公开(公告)日：2013-01-10
申请号：PCT/US2012/045436
申请日：2012-07-03
申请人： KLA-TENCOR CORPORATION , KWAK, Hindong , DIXON, Ward , POSLAVSKY, Leonid , KAACK, Torsten
发明人： KWAK, Hindong , DIXON, Ward , POSLAVSKY, Leonid , KAACK, Torsten
IPC分类号： G01N21/21 , G01J4/00
CPC分类号： G01J4/00 , G01N21/211 , G01N2021/213
摘要： Ellipsometry systems and ellipsometry data collection methods with improved stabilities are disclosed. In accordance with the present disclosure, multiple predetermined, discrete analyzer angles are utilized to collect ellipsometry data for a single measurement, and data regression is performed based on the ellipsometry data collected at these predetermined, discrete analyzer angles. Utilizing multiple discrete analyzer angles for a single measurement improves the stability of the ellipsometry system.
摘要翻译：公开了具有改进的稳定性的椭偏仪系统和椭偏仪数据采集方法。根据本公开，使用多个预定的离散分析器角度来收集用于单个测量的椭圆测量数据，并且基于在这些预定的离散分析器角度收集的椭偏仪数据执行数据回归。使用多个离散分析仪角度进行单次测量可提高椭偏仪系统的稳定性。

4. 发明申请

WO2013003122A2 MEASUREMENT OF COMPOSITION FOR THIN FILMS 审中-公开
标题翻译：薄膜组成的测量
公开(公告)号：WO2013003122A2
公开(公告)日：2013-01-03
申请号：PCT/US2012/043157
申请日：2012-06-19
申请人： KLA-TENCOR CORPORATION , DI, Ming , KAACK, Torsten , ZHAO, Qiang , GAO, Xiang , POSLAVSKY, Leonid
发明人： DI, Ming , KAACK, Torsten , ZHAO, Qiang , GAO, Xiang , POSLAVSKY, Leonid
CPC分类号： G01N21/211 , G01N21/8422 , G01N2021/213
摘要： The present invention includes generating a three-dimensional design of experiment (DOE) for a plurality of semiconductor wafers, a first dimension of the DOE being a relative amount of a first component of the thin film, a second dimension of the DOE being a relative amount of a second component of the thin film, a third dimension of the DOE being a thickness of the thin film, acquiring a spectrum for each of the wafers, generating a set of optical dispersion data by extracting a real component (n) and an imaginary component (k) of the complex index of refraction for each of the acquired spectrum, identifying one or more systematic features of the set of optical dispersion data; and generating a multi-component Bruggeman effective medium approximation (BEMA) model utilizing the identified one or more systematic features of the set of optical dispersion data.
摘要翻译：本发明包括为多个半导体晶片产生实验的三维设计（DOE），DOE的第一维度是薄膜的第一组分的相对量，所述DOE的第二维度是所述薄膜的第二分量的相对量，所述DOE的第三维度是所述薄膜的厚度，获取每个晶片的光谱，通过提取识别所获取的光谱中的每一个的复折射率的实数分量（n）和虚分量（k），识别该组光学色散数据的一个或多个系统特征; 以及利用所述一组光学色散数据的所识别的一个或多个系统特征来生成多分量Bruggeman有效介质近似（BEMA）模型。

5. 发明申请

WO2010011560A3 IMPROVED METROLOGY THROUGH USE OF FEED FORWARD FEED SIDEWAYS AND MEASUREMENT CELL RE-USE 审中-公开
公开(公告)号：WO2010011560A3
公开(公告)日：2010-01-28
申请号：PCT/US2009/050834
申请日：2009-07-16
申请人： KLA-TENCOR CORPORATION , ADEL, Michael, E. , POSLAVSKY, Leonid , FIELDEN, John , MADSEN, Jonathan, Michael , PETERS, Robert
发明人： ADEL, Michael, E. , POSLAVSKY, Leonid , FIELDEN, John , MADSEN, Jonathan, Michael , PETERS, Robert
IPC分类号： H01L21/66
摘要： Metrology may be implemented during semiconductor device fabrication by a) modeling a first measurement on a first test cell formed in a layer of a partially fabricated device; b) performing a second measurement on a second test cell in the layer; c) feeding information from the second measurement into the modeling of the first measurement; and after a lithography pattern has been formed on the layer including the first and second test cells, d) modeling a third and a fourth measurement on the first and second test cells respectively using information from a) and b) respectively.

6. 发明申请

WO2013090816A1 TECHNIQUES FOR OPTIMIZED SCATTEROMETRY 审中-公开
标题翻译：优化分析的技术
公开(公告)号：WO2013090816A1
公开(公告)日：2013-06-20
申请号：PCT/US2012/069910
申请日：2012-12-14
申请人： TOKYO ELECTRON LIMITED , KLA-TENCOR CORPORATION , LLORETA, Jonathan , AOYAGI, Paul , CHU, Hanyou , CHARD, Jeffrey , JIANG, Peilin , SUSHCHIK, Mikhail , POSLAVSKY, Leonid , FLANNER, Phillip D.
发明人： LLORETA, Jonathan , AOYAGI, Paul , CHU, Hanyou , CHARD, Jeffrey , JIANG, Peilin , SUSHCHIK, Mikhail , POSLAVSKY, Leonid , FLANNER, Phillip D.
IPC分类号： G01N21/47 , G06T7/00
CPC分类号： G01B11/00 , G01B11/24 , G01B11/30 , G01B2210/56 , G03F7/70625 , G06F7/00 , G06F17/16 , G06F17/40 , G06F19/00 , H01L22/12
摘要： Provided are optimized scatterometry techniques for evaluating a diffracting structure. In one embodiment, a method includes computing a finite-difference derivative of a field matrix with respect to first parameters (including a geometric parameter of the diffracting structure), computing an analytic derivative of the Jones matrix with respect to the field matrix, computing a derivative of the Jones matrix with respect to the first parameters, and computing a finite-difference derivative of the Jones matrix with respect to second parameters (including a non-geometric parameter). In one embodiment, a method includes generating a transfer matrix having Taylor Series approximations for elements, and decomposing the field matrix into two or more smaller matrices based on symmetry between the incident light and the diffracting structure.
摘要翻译：提供了用于评估衍射结构的优化散射测量技术。在一个实施例中，一种方法包括相对于第一参数（包括衍射结构的几何参数）计算场矩阵的有限差分导数，计算相对于场矩阵的Jones矩阵的分析导数，计算相对于第一参数的Jones矩阵的导数，以及相对于第二参数（包括非几何参数）计算Jones矩阵的有限差分导数。在一个实施例中，一种方法包括生成对于元素具有泰勒级数逼近的传递矩阵，并且基于入射光和衍射结构之间的对称性将场矩阵分解为两个或更多个较小的矩阵。

7. 发明申请

WO2013003122A3 MEASUREMENT OF COMPOSITION FOR THIN FILMS 审中-公开
标题翻译：薄膜组合物的测定
公开(公告)号：WO2013003122A3
公开(公告)日：2013-06-06
申请号：PCT/US2012043157
申请日：2012-06-19
申请人： KLA TENCOR CORP , DI MING , KAACK TORSTEN , ZHAO QIANG , GAO XIANG , POSLAVSKY LEONID
发明人： DI MING , KAACK TORSTEN , ZHAO QIANG , GAO XIANG , POSLAVSKY LEONID
IPC分类号： H01L21/66 , H01L21/205
CPC分类号： G01N21/211 , G01N21/8422 , G01N2021/213
摘要： The present invention includes generating a three-dimensional design of experiment (DOE) for a plurality of semiconductor wafers, a first dimension of the DOE being a relative amount of a first component of the thin film, a second dimension of the DOE being a relative amount of a second component of the thin film, a third dimension of the DOE being a thickness of the thin film, acquiring a spectrum for each of the wafers, generating a set of optical dispersion data by extracting a real component (n) and an imaginary component (k) of the complex index of refraction for each of the acquired spectrum, identifying one or more systematic features of the set of optical dispersion data; and generating a multi-component Bruggeman effective medium approximation (BEMA) model utilizing the identified one or more systematic features of the set of optical dispersion data.
摘要翻译：本发明包括生成多个半导体晶片的实验（DOE）的三维设计，DOE的第一维度是薄膜的第一分量的相对量，DOE的第二维度是相对的量的第二分量，DOE的第三维度是薄膜的厚度，获取每个晶片的光谱，通过提取实数分量（n）和生成一组光散射数据，生成一组光散射数据用于识别所述光学色散数据集合中的一个或多个系统特征的每个所获取的光谱的复折射率的虚分量（k）; 以及使用所述一组或多个光学色散数据的一个或多个系统特征来生成多分量Bruggeman有效中等近似（BEMA）模型。

8. 发明申请

WO2012048156A3 METHOD OF DETERMINING AN ASYMMETRIC PROPERTY OF A STRUCTURE 审中-公开
公开(公告)号：WO2012048156A3
公开(公告)日：2012-04-12
申请号：PCT/US2011/055163
申请日：2011-10-06
申请人： TOKYO ELECTRON LIMITED , KLA-TENCOR CORPORATION , SHIH, Meng-Fu , KIM, In-Kyo , ZHANG, Xiafang , POSLAVSKY, Leonid
发明人： SHIH, Meng-Fu , KIM, In-Kyo , ZHANG, Xiafang , POSLAVSKY, Leonid
IPC分类号： G01B11/24 , G01N21/47
摘要： Methods of determining asymmetric properties of structures are described. A method includes measuring, for a grating structure, a first signal and a second, different, signal obtained by optical scatterometry. A difference between the first signal and the second signal is then determined. An asymmetric structural parameter of the grating structure is determined based on a calculation using the first signal, the second signal, and the difference.

9. 发明申请

WO2012150993A3 ACCURATE AND FAST NEURAL NETWORK TRAINING FOR LIBRARY-BASED CRITICAL DIMENSION (CD) METROLOGY 审中-公开
标题翻译：基于图书馆临界尺度（CD）的精确和快速的神经网络训练
公开(公告)号：WO2012150993A3
公开(公告)日：2013-02-28
申请号：PCT/US2012026927
申请日：2012-02-28
申请人： TOKYO ELECTRON LTD , KLA TENCOR CORP , JIN WEN , YUONG VI , BAO JUNWEI , LEE LIE-QUAN , POSLAVSKY LEONID
发明人： JIN WEN , YUONG VI , BAO JUNWEI , LEE LIE-QUAN , POSLAVSKY LEONID
IPC分类号： G06F19/00 , G01N21/00 , G06N3/02
CPC分类号： G06N3/08 , G06N3/0454
摘要： Approaches for accurate neural network training for library-based critical dimension (CD) metrology are described. Approaches for fast neural network training for library-based CD metrology are also described.
摘要翻译：描述了基于图书馆的关键维度（CD）计量学的准确神经网络训练的方法。还介绍了基于图书馆的CD测量的快速神经网络训练方法。

10. 发明申请

WO2012150993A2 ACCURATE AND FAST NEURAL NETWORK TRAINING FOR LIBRARY-BASED CRITICAL DIMENSION (CD) METROLOGY 审中-公开
标题翻译：基于图书馆临界尺度（CD）的精确和快速的神经网络训练
公开(公告)号：WO2012150993A2
公开(公告)日：2012-11-08
申请号：PCT/US2012/026927
申请日：2012-02-28
申请人： TOKYO ELECTRON LIMITED , KLA-TENCOR CORPORATION , JIN, Wen , YUONG, Vi , BAO, Junwei , LEE, Lie-Quan , POSLAVSKY, Leonid
发明人： JIN, Wen , YUONG, Vi , BAO, Junwei , LEE, Lie-Quan , POSLAVSKY, Leonid
IPC分类号： G06F19/00 , G06N3/02 , G01N21/00
CPC分类号： G06N3/08 , G06N3/0454
摘要： Approaches for accurate neural network training for library-based critical dimension (CD) metrology are described. Approaches for fast neural network training for library-based CD metrology are also described.
摘要翻译：描述了基于图书馆的关键维度（CD）计量学的准确神经网络训练的方法。还介绍了基于图书馆的CD测量的快速神经网络训练方法。

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