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1. 发明授权

KR100989988B1 Fancy pen case having function of holding pen 无效
标题翻译：具有保持笔功能的风扇笔箱
公开(公告)号：KR100989988B1
公开(公告)日：2010-10-26
申请号：KR20100018822
申请日：2010-03-03
申请人： PARK JEONG GYU , KANG CHANG HO
发明人： KANG CHANG HO , PARK JEONG GYU
IPC分类号： B43K31/00 , A45C11/34
CPC分类号： A45C11/34 , B43K23/001 , B43K31/00
摘要： PURPOSE: A holder of a pen with fancy writing instrument case is provided to store the pens conveniently in the case and can use the pen without opening the lid and can be used as a holder of the pen, thereby it is very convenient for using. CONSTITUTION: A holder of a pen with fancy writing instrument case includes a pen casing body, a pen supporter(220), a holder(240), and a spring(230). The pen casing body forms a spatial part(212) which is connected to the entrance to accept the pens(P). The pen casing body has a guide rail(213) for guiding the pens in inner side by constant interval. The pen casing body forms a slide groove(214) on both side of the entrance. The pen supporter is installed behind the pen casing body and supports the end part of the pens and has an insertion grooves(221) which end part of the pen is inserted. The holder is combined to a slide hole and hinge-coupled to be rotatable at the entrance of the pen casing body. The spring is installed to side of the pen cashing body and elastically supports the holder.
摘要翻译：目的：提供具有花式书写工具箱的笔的笔夹，方便地将笔存放在外壳中，并且可以使用笔而不打开盖子，并且可以用作笔的保持器，从而非常方便使用。构成：具有花式书写工具箱的笔的支架包括笔式外壳主体，笔支撑件（220），保持器（240）和弹簧（230）。笔筒体形成空间部分（212），其连接到入口以接受笔（P）。笔筒体具有用于以恒定间隔在内侧引导笔的导轨（213）。笔筒体在入口的两侧形成滑动槽（214）。笔支撑件安装在笔壳体后面，并支撑笔的端部，并且具有插入笔的端部的插入槽（221）。保持器组合到滑动孔并且铰链联接以在笔壳体的入口处可旋转。弹簧被安装在笔体的侧面并弹性地支撑支架。

2. 发明申请

WO2010131878A3 SUBSTRATE PROCESSING SYSTEM 审中-公开
标题翻译：基板加工系统
公开(公告)号：WO2010131878A3
公开(公告)日：2011-02-24
申请号：PCT/KR2010002952
申请日：2010-05-10
申请人： SNU PRECISION CO LTD , BAE KYUNG BIN , YOON HYUNG SEOK , KANG CHANG HO , HAN KYUNG ROK , NAMGOONG SUNG TAE , LEE TAE SUNG
发明人： BAE KYUNG BIN , YOON HYUNG SEOK , KANG CHANG HO , HAN KYUNG ROK , NAMGOONG SUNG TAE , LEE TAE SUNG
IPC分类号： H01L51/56 , H05B33/10
CPC分类号： H05B33/10 , B05B15/045 , B05D1/02 , B05D3/067
摘要： The present invention relates to a substrate processing system, and more particularly, to a substrate processing system comprising antifouling means for preventing the interior of a chamber from being fouled by the diffusion of organic compounds during a process of coating a substrate with said organic compounds. The substrate processing system according to the present invention comprises a coating module and a hardening module. The coating module includes a spray unit and a pump. The spray unit sprays organic compounds on the substrate in the chamber, and has a cooling plate which is spaced apart from the substrate and which has a cooling path formed therein for circulating a coolant in order to prevent the diffusion of the dripping organic compounds which are not coated on the substrate. The pump has a cooling trap arranged in a lower portion outside the chamber, said pump being connected to the spray unit through a pump connection pipe having a branched or curved portion formed in the direction intersecting the direction in which the pump connection pipe extends lengthwise. The hardening module irradiates ultraviolet rays by means of an ultraviolet lamp onto the substrate coated with the organic compounds, and has a heating coil for heating a transmissive window interposed between the substrate and the ultraviolet lamp.
摘要翻译：本发明涉及一种基板处理系统，更具体地说，涉及一种基板处理系统，该基板处理系统包括防污装置，该防污装置用于在用所述有机化合物涂覆基板的过程中防止室内部被有机化合物扩散而被污染。根据本发明的基板处理系统包括涂覆模块和硬化模块。涂层模块包括喷雾单元和泵。喷雾单元将有机化合物喷射在室中的基材上，并且具有与基板间隔开的冷却板，并且其中形成有用于循环冷却剂的冷却路径，以防止滴落的有机化合物的扩散未涂覆在基材上。泵具有布置在室外部下部的冷却捕集器，所述泵通过泵连接管连接到喷射单元，该泵连接管具有在与泵连接管纵向延伸的方向相交的方向上形成的分支或弯曲部分。硬化模块通过紫外线灯将紫外线照射到涂有有机化合物的基材上，并具有用于加热插入在基板和紫外线灯之间的透射窗的加热线圈。

3. 发明申请

WO2009142427A3 ORGANIC LIGHT EMITTING DEVICE AND MANUFACTURING METHOD THEREOF 审中-公开
标题翻译：有机发光装置及其制造方法
公开(公告)号：WO2009142427A3
公开(公告)日：2010-02-18
申请号：PCT/KR2009002634
申请日：2009-05-19
申请人： SNU PRECISION CO LTD , KANG CHANG HO , NAMGOONG SUNG TAE , LEE TAE SUNG
发明人： KANG CHANG HO , NAMGOONG SUNG TAE , LEE TAE SUNG
IPC分类号： H01L51/50
CPC分类号： H01L51/525 , H01L51/5246
摘要： A method for manufacturing an organic light emitting device according to the present invention includes the steps of: forming a plurality of spacers and an organic light emitting layer on a substrate, such that the spacers are spaced apart from each other; introducing the substrate with the spacers and the organic light emitting layer into a vacuum-state chamber; filling a filler to coat the organic light emitting layer and hardening the resultant structure; applying a sealant to the space where the filler is not applied, from among the spaces formed between the spacers by the spacing of the spacers; disposing encapsulating portions onto the spacers, the sealant and the filler; encapsulating the chamber by hardening the sealant; and slowly venting the encapsulated vacuum-state chamber to remove air gaps formed between upper surfaces of the spacers, the sealant and the filler and the encapsulating portions. As described above, the present invention performs a first encapsulation by using the filler which is filled to coat the organic light emitting layer containing a protective layer, and performs a second encapsulation on the region of the substrate with no organic light emitting layer by using the sealant, thereby suppressing moisture and oxygen from entering the organic light emitting layer and thus improving the lifespan of the device.
摘要翻译：根据本发明的制造有机发光器件的方法包括以下步骤：在衬底上形成多个间隔物和有机发光层，使得间隔物彼此间隔开; 将具有间隔物和有机发光层的基板引入真空状态室; 填充填料以涂覆有机发光层并硬化所得结构; 通过间隔物的间隔从形成在间隔物之间的空间之间施加密封剂到填充物未被施加的空间; 将封装部分设置在间隔件上，密封剂和填料上; 通过硬化密封剂来封装腔室; 并缓慢地排出封装的真空状态室以去除间隔件，密封剂和填料的上表面之间形成的空气间隙和封装部分。如上所述，本发明通过使用被填充以涂覆含有保护层的有机发光层的填料来进行第一封装，并且通过使用无机发光层在基板的区域上进行第二封装从而抑制水分和氧气进入有机发光层，从而提高装置的使用寿命。

4. 发明申请

WO2010128811A3 THIN FILM DEPOSITION APPARATUS AND THIN FILM DEPOSITION SYSTEM COMPRISING SAME 审中-公开
标题翻译：薄膜沉积装置和薄膜沉积系统
公开(公告)号：WO2010128811A3
公开(公告)日：2011-03-17
申请号：PCT/KR2010002887
申请日：2010-05-06
申请人： SNU PRECISION CO LTD , BAE KYUNG BIN , YOON HYUNG SEOK , KANG CHANG HO
发明人： BAE KYUNG BIN , YOON HYUNG SEOK , KANG CHANG HO
IPC分类号： C23C14/56 , C23C14/24
CPC分类号： C23C14/568 , C23C14/042 , C23C14/50 , C23C14/541
摘要： The present invention provides a thin film deposition apparatus comprising: a transfer chamber for transferring substrates; and a first process chamber and a second process chamber coupled to both sides of the transfer chamber, respectively, wherein each of the first process chamber and the second process chamber includes: a first substrate holder and a second substrate holder spaced apart from each other; and a spray unit interposed between the first substrate holder and the second substrate holder to consecutively supply deposition materials in the direction of the first and second substrate holders. The present invention also provides a thin film deposition system comprising the apparatus. The thus-configured apparatus of the present invention has multiple process chambers which perform the same process and which are connected to both sides of the transfer chamber, respectively, thus performing a thin film process simultaneously on multiple substrates and improving processing speed.
摘要翻译：本发明提供一种薄膜沉积设备，包括：用于传送基板的传送室; 以及分别耦合到所述传送室的两侧的第一处理室和第二处理室，其中所述第一处理室和所述第二处理室中的每一个包括：彼此间隔开的第一衬底保持器和第二衬底保持器; 以及插入在所述第一基板保持件和所述第二基板保持件之间的喷射单元，以连续地在所述第一和第二基板保持器的方向上供应沉积材料。本发明还提供一种包括该装置的薄膜沉积系统。本发明的这样构成的装置具有多个处理室，它们分别进行相同的处理并连接到传送室的两侧，从而在多个基板上同时执行薄膜处理并提高处理速度。

5. 发明申请

WO2010126254A3 SOURCE SUPPLYING UNIT, THIN FILM DEPOSITING APPARATUS, AND METHOD FOR DEPOSITING THIN FILM 审中-公开
标题翻译：源提供单元，薄膜沉积装置和沉积薄膜的方法
公开(公告)号：WO2010126254A3
公开(公告)日：2011-01-20
申请号：PCT/KR2010002543
申请日：2010-04-23
申请人： SNU PRECISION CO LTD , KANG CHANG HO , NAMGOONG SUNG TAE , RHO JUN SEO , CHO WHANG SIN , YOON HYUNG SEOK , BAE KYUNG BIN
发明人： KANG CHANG HO , NAMGOONG SUNG TAE , RHO JUN SEO , CHO WHANG SIN , YOON HYUNG SEOK , BAE KYUNG BIN
IPC分类号： H01L21/205 , H01L21/02
CPC分类号： C23C14/246 , H01L21/67115
摘要： Provided are a source supplying unit, a thin film depositing apparatus including the source supplying unit, and a method for depositing a thin film. The source supplying unit includes a liquefaction part configured to liquefy a source material, an evaporation part communicating with the liquefaction part to evaporate the liquefied source material, and an injector communicating with the evaporation part to inject the evaporated source material. The liquefaction part includes a pot having a cylinder shape to store the source material, a piston part inserted to a side of the pot to discharge the source material, and a liquefaction heating part configured to heat the pot to liquefy the source material. After a solid source material is liquefied, a necessary portion is evaporated from the source material and supplied, thus achieving large capacity in source material and minimizing the amount of heat consumed for evaporating and supplying the source material.
摘要翻译：提供源供给单元，包括源供给单元的薄膜沉积设备和用于沉积薄膜的方法。源供给单元包括：液化部，其构成为液化源材料，与液化部连通以蒸发液化源材料的蒸发部;以及与蒸发部连通以喷射蒸发的原料的喷射器。液化部分包括一个具有圆筒形状以储存源材料的罐，一个插入锅的一侧以排放源材料的活塞部分，以及液化加热部分，其构造成加热该罐以使该源材料液化。在固体源材料液化后，从源材料中蒸发必要的部分并供应，从而实现源材料的大容量并最小化用于蒸发和供应源材料的消耗热量。

6. 发明申请

WO2010082755A3 EVAPORATION APPARATUS, THIN FILM DEPOSITING APPARATUS AND METHOD FOR FEEDING SOURCE MATERIAL OF THE SAME 审中-公开
标题翻译：蒸发装置，薄膜沉积装置和用于输送相同来源材料的方法
公开(公告)号：WO2010082755A3
公开(公告)日：2010-10-14
申请号：PCT/KR2010000203
申请日：2010-01-13
申请人： SNU PRECISION CO LTD , YOON HYUNG SEOK , SON SUNG KWAN , KANG CHANG HO , KWON HYUN GOO
发明人： YOON HYUNG SEOK , SON SUNG KWAN , KANG CHANG HO , KWON HYUN GOO
IPC分类号： H01L21/203
CPC分类号： C23C14/044 , C23C14/24 , C23C14/246
摘要： Provided are an evaporation apparatus and a thin film depositing apparatus, and a source material filling method thereof. The thin film depositing apparatus includes a chamber having an inner space, a substrate transferring member to fix a substrate and move the substrate within the inner space, and a plurality of evaporation members to supply a deposition source material to the substrate, wherein each of the evaporation members is disposed to allow its central extension line to form an acute angle with a surface of the substrate that moves. Therefore, it is possible to form a thin film on the substrate by supplying the vaporized source material to the substrate in a sloped direction with respect to the substrate through the use of the plurality of evaporation members, and to fill the source material by selectively control only an evaporation member where the source material is exhausted without shutting down the whole apparatus.
摘要翻译：本发明提供一种蒸镀装置及薄膜蒸镀装置及其原料填充方法。薄膜沉积装置包括具有内部空间的腔室，用于固定基板并在内部空间内移动基板的基板传递构件，以及用于向基板供应沉积源材料的多个蒸发构件，其中，每个设置蒸发构件以允许其中心延伸线与移动的基底的表面形成锐角。因此，可以通过使用多个蒸发部件将蒸发的源材料相对于基板以倾斜方向供应到基板，并且通过选择性地控制填充源材料来在基板上形成薄膜只有在没有关闭整个设备的情况下排放源材料的蒸发部件。

7. 发明申请

WO2010114274A3 APPARATUS FOR DEPOSITING FILM AND METHOD FOR DEPOSITING FILM AND SYSTEM FOR DEPOSITING FILM 审中-公开
标题翻译：用于沉积膜的装置和沉积膜的方法和用于沉积膜的方法
公开(公告)号：WO2010114274A3
公开(公告)日：2010-12-23
申请号：PCT/KR2010001919
申请日：2010-03-30
申请人： SNU PRECISION CO LTD , BAE KYUNG BIN , YOON HYUNG SEOK , KANG CHANG HO , KWON HYUN GOO
发明人： BAE KYUNG BIN , YOON HYUNG SEOK , KANG CHANG HO , KWON HYUN GOO
IPC分类号： C23C14/24 , C23C14/12 , H05B33/10
CPC分类号： C23C14/568 , H01L21/67173 , H01L51/56
摘要： Provided are an apparatus for depositing a film, including: a chamber configured to provide a reaction space; first and second substrate holders spaced apart from each other and installed in the chamber; and a deposition source which is installed between the first and second substrate holders and configured to sequentially supply a deposition raw materials in directions of the first and second substrate holders, a method for depositing a film suitable for the apparatus, and a system for depositing a film including the apparatus. According to the present disclosure, since sequential film processes can be performed with respect to two or more process lines provided in each of the process chambers through the single deposition source provided in each of the process chambers, fabrication costs can be saved and at the same time productivity can be enhanced.
摘要翻译：提供一种用于沉积膜的设备，包括：被配置为提供反应空间的室; 第一和第二衬底保持器彼此间隔开并安装在腔室中; 以及沉积源，其安装在所述第一和第二基板保持器之间并且被配置为在所述第一和第二基板保持器的方向上顺序地供应沉积原料，沉积适合于所述装置的膜的方法，以及用于沉积电影包括装置。根据本公开，由于可以通过设置在每个处理室中的单个沉积源相对于在每个处理室中提供的两个或更多个处理线执行顺序膜处理，因此可以节省制造成本可以提高时间生产率。

8. 发明申请

WO2010056057A3 DEPOSITION MATERIAL SUPPLY APPARATUS AND SUBSTRATE TREATMENT APPARATUS HAVING THE SAME 审中-公开
标题翻译：沉积物料供应装置及其基材处理装置
公开(公告)号：WO2010056057A3
公开(公告)日：2010-07-08
申请号：PCT/KR2009006671
申请日：2009-11-13
申请人： SNU PRECISION CO LTD , YOON HYUNG SEOK , CHOI SANG HWA , SON SUNG KWAN , KANG CHANG HO , KWON HYUN GOO , NAMGOONG SUNG TAE , HAN KYUNG ROK
发明人： YOON HYUNG SEOK , CHOI SANG HWA , SON SUNG KWAN , KANG CHANG HO , KWON HYUN GOO , NAMGOONG SUNG TAE , HAN KYUNG ROK
IPC分类号： C23C14/24 , H05B33/10
CPC分类号： C23C14/243 , C23C14/12 , C23C14/544
摘要： Provided are a deposition material supplying device and a substrate processing apparatus including the deposition material supplying device, which store a large amount of organic material without deteriorating the organic material and vaporize a desired amount of the organic material to a substrate. The deposition material supplying device includes: a pot in which a storage space filled with raw material communicates with a vaporization space where the raw material is vaporized; a transporting unit configured to continuously or periodically transport the raw material filling the storage space to the vaporization space; a heating unit disposed on an outside of the vaporization space of the pot to supply heat vaporizing the raw material; and a cooling unit disposed on an outside of the storage space to prevent the raw material stored in the storage space from being thermally deteriorated.
摘要翻译：提供了一种沉积材料供给装置和包括沉积材料供给装置的基板处理装置，其存储大量的有机材料而不使有机材料恶化并将所需量的有机材料蒸发到基板。沉积材料供给装置包括：容纳有原料的储存空间与原料蒸发的蒸发空间连通的罐; 传送单元，被配置为将填充所述存储空间的原料连续地或周期地运送到所述蒸发空间; 加热单元，设置在所述锅的蒸发空间的外侧，以供应蒸发所述原料的热量; 以及设置在所述存储空间的外侧的冷却单元，以防止存储在所述存储空间中的原料热劣化。

9. 发明申请

WO2010027178A2 DEPOSITION APPARATUS AND DEPOSITION METHOD USING THE SAME 审中-公开
标题翻译：沉积装置和使用该沉积方法的沉积方法
公开(公告)号：WO2010027178A2
公开(公告)日：2010-03-11
申请号：PCT/KR2009004906
申请日：2009-09-01
申请人： SNU PRECISION CO LTD , KANG CHANG HO , KWON HYUN GOO , NAMGOONG SUNG TAE , SON SUNG KWAN
发明人： KANG CHANG HO , KWON HYUN GOO , NAMGOONG SUNG TAE , SON SUNG KWAN
IPC分类号： H01L21/203
CPC分类号： C23C14/547 , C23C14/042 , C23C14/12 , C23C14/568
摘要： A transmission chamber connected to the processing chamber, a substrate seating part located in the processing chamber to seat a substrate, a deposition source facing the substrate seating part and storing a source material, and a thickness measuring part installed in the transmission chamber to directly measure a practical thickness of a deposition layer formed on the substrate. It is possible to directly measure and monitor the practical thickness of the deposition layer using the deposition apparatus employing the thickness measuring part. Thus, a thickness of the deposition layer can be exactly controlled by monitoring the practical thickness of the deposition layer in real time and correcting the deposition control thickness used to control the practical thickness of the deposition layer, so that the reliability and the yield rate of a device fabricated on the substrate can be improved.
摘要翻译：连接到处理室的传输室，位于处理室中的基板安置部分，用于安置基板，面向基板安置部分并存储源材料的沉积源，以及安装在传送室中的厚度测量部分，以直接测量形成在基板上的沉积层的实际厚度。可以使用采用厚度测量部件的沉积设备直接测量和监测沉积层的实际厚度。因此，可以通过实时监控沉积层的实际厚度和校正用于控制沉积层的实际厚度的沉积控制厚度来精确地控制沉积层的厚度，从而可靠性和屈服率可以改善在基板上制造的器件。

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