专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07515247B2 Illumination optical system, exposure apparatus, and exposure method with polarized state fluctuation correcting device 失效
标题翻译：照明光学系统，曝光装置和具有极化状态波动校正装置的曝光方法
公开(公告)号：US07515247B2
公开(公告)日：2009-04-07
申请号：US11979516
申请日：2007-11-05
申请人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
发明人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03B27/42 , G03F7/70091
摘要： An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
摘要翻译：一种照明光学系统，当安装在曝光系统中时，通过根据掩模的图案特性改变照明光的偏振状态，同时抑制光的强度损失，实现合适的照明条件。照明光学系统具有用于提供用于照射被照射的面的线偏振光的光源单元和用于将照明光的偏振状态从预定极化状态改变为非极化状态的偏振状态改变装置，反之亦然。偏光状态改变装置配置在光源单元与被照射面之间的光路中。可以从照明光路去除偏振状态改变装置，并且具有去偏振器，用于选择性地使入射的线偏振光去极化。

2. 发明申请

US20060055834A1 Illumination optical system, exposure apparatus, and exposure method 有权
标题翻译：照明光学系统，曝光装置和曝光方法
公开(公告)号：US20060055834A1
公开(公告)日：2006-03-16
申请号：US11140103
申请日：2005-05-31
申请人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
发明人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
IPC分类号： G02F1/1335
CPC分类号： G03F7/70566 , G03B27/42 , G03F7/70091
摘要： An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
摘要翻译：一种照明光学系统，当安装在曝光系统中时，通过根据掩模的图案特性改变照明光的偏振状态，同时抑制光的强度损失，实现合适的照明条件。照明光学系统具有用于提供用于照射被照射的面的线偏振光的光源单元和用于将照明光的偏振状态从预定极化状态改变为非极化状态的偏振状态改变装置，反之亦然。偏光状态改变装置配置在光源单元与被照射面之间的光路中。可以从照明光路去除偏振状态改变装置，并且具有去偏振器，用于选择性地使入射的线偏振光去极化。

3. 发明申请

US20080094602A1 Illumination optical system, exposure apparatus, and exposure method 失效
公开(公告)号：US20080094602A1
公开(公告)日：2008-04-24
申请号：US11979516
申请日：2007-11-05
申请人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
发明人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
IPC分类号： G03B27/72 , G03B27/42
CPC分类号： G03F7/70566 , G03B27/42 , G03F7/70091
摘要： An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.

4. 发明申请

US20080074632A1 Illumination optical system, exposure apparatus, and exposure method 失效
标题翻译：照明光学系统，曝光装置和曝光方法
公开(公告)号：US20080074632A1
公开(公告)日：2008-03-27
申请号：US11979517
申请日：2007-11-05
申请人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
发明人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03B27/42 , G03F7/70091
摘要： An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
摘要翻译：一种照明光学系统，当安装在曝光系统中时，通过根据掩模的图案特性改变照明光的偏振状态，同时抑制光的强度损失，实现合适的照明条件。照明光学系统具有用于提供用于照射被照射的面的线偏振光的光源单元和用于将照明光的偏振状态从预定极化状态改变为非极化状态的偏振状态改变装置，反之亦然。偏光状态改变装置配置在光源单元与被照射面之间的光路中。可以从照明光路去除偏振状态改变装置，并且具有去偏振器，用于选择性地使入射的线偏振光去极化。

5. 发明申请

US20100149511A1 Illumination optical system, exposure apparatus, and exposure method 审中-公开
标题翻译：照明光学系统，曝光装置和曝光方法
公开(公告)号：US20100149511A1
公开(公告)日：2010-06-17
申请号：US12656822
申请日：2010-02-17
申请人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
发明人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03B27/42 , G03F7/70091
摘要： An illumination optical system illuminates an irradiated surface with light supplied from a light source. The illumination optical system includes a diffractive optical element disposed in an optical path of linearly polarized light supplied from the light source. The diffractive optical element forms a multipole illumination field including a plurality of illumination fields. The illumination optical system also includes an optical integrator that forms a multipole light source including a plurality of planar light sources with light that has passed through the multipole illumination field. The illumination optical system also includes a polarization optical member disposed in an illumination optical path and that sets a polarization direction of light that has passed through the multipole light source to a predetermined polarization direction.
摘要翻译：照明光学系统用从光源提供的光照射被照射的表面。照明光学系统包括设置在从光源提供的线偏振光的光路中的衍射光学元件。衍射光学元件形成包括多个照明场的多极照明场。照明光学系统还包括光学积分器，其形成包括已经穿过多极照明场的光的多个平面光源的多极光源。照明光学系统还包括设置在照明光路中并将已经通过多极光源的光的偏振方向设定为预定偏振方向的偏振光学构件。

6. 发明申请

US20080239274A1 Illumination optical system, exposure apparatus, and exposure method 审中-公开
公开(公告)号：US20080239274A1
公开(公告)日：2008-10-02
申请号：US12155301
申请日：2008-06-02
申请人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
发明人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03B27/42 , G03F7/70091
摘要： An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.

7. 发明申请

US20100225895A1 Illumination optical system, exposure apparatus, and exposure method 审中-公开
标题翻译：照明光学系统，曝光装置和曝光方法
公开(公告)号：US20100225895A1
公开(公告)日：2010-09-09
申请号：US12801043
申请日：2010-05-18
申请人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
发明人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03B27/42 , G03F7/70091
摘要： An illumination optical system and method illuminates an irradiated surface based on linearly polarized light supplied from a light source. The illumination optical system includes a depolarizer which is selectively positioned between a first position in an optical path of the illumination optical system and a second position outside of the optical path, and has a crystal member whose thickness in a direction along an optical axis of the illumination optical system varies in a direction crossing the optical axis.
摘要翻译：照明光学系统和方法基于从光源提供的线性偏振光照射照射的表面。照明光学系统包括：偏光器，其被选择性地定位在照明光学系统的光路中的第一位置和光路外的第二位置之间，并且具有晶体构件，该晶体构件沿着沿着光学系统的光轴的方向的厚度照明光学系统在与光轴交叉的方向上变化。

8. 发明授权

US07515248B2 Illumination optical system, exposure apparatus, and exposure method with polarized state detection result and adjustment 失效
标题翻译：照明光学系统，曝光装置和曝光方法，具有极化状态检测结果和调整
公开(公告)号：US07515248B2
公开(公告)日：2009-04-07
申请号：US11979517
申请日：2007-11-05
申请人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
发明人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03B27/42 , G03F7/70091
摘要： An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
摘要翻译：一种照明光学系统，当安装在曝光系统中时，通过根据掩模的图案特性改变照明光的偏振状态，同时抑制光的强度损失，实现合适的照明条件。照明光学系统具有用于提供用于照射被照射的面的线偏振光的光源单元和用于将照明光的偏振状态从预定极化状态改变为非极化状态的偏振状态改变装置，反之亦然。偏光状态改变装置配置在光源单元与被照射面之间的光路中。可以从照明光路去除偏振状态改变装置，并且具有去偏振器，用于选择性地使入射的线偏振光去极化。

9. 发明授权

US07423731B2 Illumination optical system, exposure apparatus, and exposure method with polarized switching device 有权
标题翻译：照明光学系统，曝光装置和带极化开关装置的曝光方法
公开(公告)号：US07423731B2
公开(公告)日：2008-09-09
申请号：US11140103
申请日：2005-05-31
申请人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
发明人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03B27/42 , G03F7/70091
摘要： An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
摘要翻译：一种照明光学系统，当安装在曝光系统中时，通过根据掩模的图案特性改变照明光的偏振状态，同时抑制光的强度损失，实现合适的照明条件。照明光学系统具有用于提供用于照射被照射的面的线偏振光的光源单元和用于将照明光的偏振状态从预定极化状态改变为非极化状态的偏振状态改变装置，反之亦然。偏光状态改变装置配置在光源单元与被照射面之间的光路中。可以从照明光路去除偏振状态改变装置，并且具有去偏振器，用于选择性地使入射的线偏振光去极化。

10. 发明申请

US20060171138A1 Illuminating optical system, exposure system and exposure method 审中-公开
标题翻译：照明光学系统，曝光系统和曝光方法
公开(公告)号：US20060171138A1
公开(公告)日：2006-08-03
申请号：US10565412
申请日：2004-06-29
申请人： Kenichi Muramatsu , Norio Komine , Osamu Tanitsu , Hirohisa Tanaka
发明人： Kenichi Muramatsu , Norio Komine , Osamu Tanitsu , Hirohisa Tanaka
IPC分类号： G01D11/28
CPC分类号： G03F7/70566
摘要： An illuminating optical system capable of preventing a change in the polarized status of a linearly polarized light passing through a light transmitting member formed of a cubic-system crystal material such as fluorite. An illuminating optical system comprising a light source unit (1) for suppling a linearly polarized light to illuminate surfaces (M, W) to be illuminated with a light from the light source unit. The system is provided with a polarized status switching means (10, 20) disposed on a light path between the light source unit and the surfaces to be illuminated, for switching the polarized status of a light, that illuminates the surfaces to be illuminated, between a linearly polarized status and a non-linearly polarized status. The polarized status switching means has a phase member (10) for changing the polarization surface of an incident linearly polarized light as needed, and a depolarizer (20) for depolarizing an incident linearly polarized light as needed. A phase advancing axis direction in association with the double refraction variation of a light transmitting member formed of fluorite is so set as to almost agree with or cross almost perpendicularly to the field vibration direction of a linearly polarized light incident to a light transmitting member.
摘要翻译：一种照明光学系统，其能够防止通过由诸如萤石的立方晶系晶体材料形成的透光构件的线偏振光的偏振状态的变化。一种照明光学系统，包括用于提供线性偏振光以照射要被来自光源单元的光照射的表面（M，W）的光源单元（1）。该系统设置有偏光状态切换装置（10,20），该偏振状态切换装置设置在光源单元和被照射表面之间的光路上，用于将照亮被照射的表面的光的偏振状态线性极化状态和非线性极化状态。极化状态切换装置具有用于根据需要改变入射的线偏振光的偏振面的相位构件（10）和根据需要对入射的线偏振光进行去偏振的消偏振器（20）。与萤石形成的透光构件的双折射变化相关的相位推进轴方向设定为几乎与入射到透光构件的线偏振光的场振动方向一致或几乎垂直。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式