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1. 发明申请

US20110019169A1 PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置的投影目标
公开(公告)号：US20110019169A1
公开(公告)日：2011-01-27
申请号：US12896128
申请日：2010-10-01
申请人： Olaf Conradi , Boris Bittner , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati
发明人： Olaf Conradi , Boris Bittner , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati
IPC分类号： G03B27/52
CPC分类号： G02B27/0068 , G02B3/14 , G03F7/70266 , G03F7/70825
摘要： A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
摘要翻译：微光刻投影曝光装置的投影物镜包括用于减小旋转非对称图像误差的操纵器。操纵器又包含透镜，光学元件和形成在透镜和光学元件之间的间隙，其可以填充液体。此外还提供至少一个致动器作用于透镜，这可以产生透镜的旋转非对称变形。

2. 发明授权

US07830611B2 Projection objective of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的投影目标
公开(公告)号：US07830611B2
公开(公告)日：2010-11-09
申请号：US11971328
申请日：2008-01-09
申请人： Olaf Conradi , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati , Boris Bittner
发明人： Olaf Conradi , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati , Boris Bittner
IPC分类号： G02B1/06 , G02B3/02 , G02B27/02
CPC分类号： G02B27/0068 , G02B3/14 , G03F7/70266 , G03F7/70825
摘要： A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
摘要翻译：微光刻投影曝光装置的投影物镜包括用于减小旋转非对称图像误差的操纵器。操纵器又包含透镜，光学元件和形成在透镜和光学元件之间的间隙，其可以填充液体。此外还提供至少一个致动器作用于透镜，这可以产生透镜的旋转非对称变形。

3. 发明授权

US07990622B2 Projection objective of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的投影目标
公开(公告)号：US07990622B2
公开(公告)日：2011-08-02
申请号：US12896128
申请日：2010-10-01
申请人： Olaf Conradi , Boris Bittner , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati
发明人： Olaf Conradi , Boris Bittner , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati
IPC分类号： G02B1/06 , G02B3/12 , G02B27/02
CPC分类号： G02B27/0068 , G02B3/14 , G03F7/70266 , G03F7/70825
摘要： A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
摘要翻译：微光刻投影曝光装置的投影物镜包括用于减小旋转非对称图像误差的操纵器。操纵器又包含透镜，光学元件和形成在透镜和光学元件之间的间隙，其可以填充液体。此外还提供至少一个致动器作用于透镜，这可以产生透镜的旋转非对称变形。

4. 发明申请

US20080239503A1 PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置的投影目标
公开(公告)号：US20080239503A1
公开(公告)日：2008-10-02
申请号：US11971328
申请日：2008-01-09
申请人： Olaf Conradi , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati , Boris Bittner
发明人： Olaf Conradi , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati , Boris Bittner
IPC分类号： G02B3/12 , G03B27/52
CPC分类号： G02B27/0068 , G02B3/14 , G03F7/70266 , G03F7/70825
摘要： A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
摘要翻译：微光刻投影曝光装置的投影物镜包括用于减小旋转非对称图像误差的操纵器。操纵器又包含透镜，光学元件和形成在透镜和光学元件之间的间隙，其可以填充液体。此外还提供至少一个致动器作用于透镜，这可以产生透镜的旋转非对称变形。

5. 发明授权

US08319944B2 Projection lens system of a microlithographic projection exposure installation 有权
标题翻译：投影透镜系统的微光刻投影曝光装置
公开(公告)号：US08319944B2
公开(公告)日：2012-11-27
申请号：US12825001
申请日：2010-06-28
申请人： Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Baerbel Schwaer , Olaf Rogalsky , Ari Kazi
发明人： Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Baerbel Schwaer , Olaf Rogalsky , Ari Kazi
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/70891
摘要： A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.
摘要翻译：微光刻投影曝光装置包括将物体成像到平面上并具有弯曲表面的透镜的投影物镜。在投影物镜中，存在液体或固体介质，其直接邻接可用于成像物体的区域上的曲面。投影曝光装置还具有可调节的操纵器，用于降低在投影操作期间由介质的加热引起的图像场曲率。

6. 发明申请

US20100231883A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置
公开(公告)号：US20100231883A1
公开(公告)日：2010-09-16
申请号：US12727482
申请日：2010-03-19
申请人： Aurelian Dodoc , Sascha Bleidistel , Olaf Conradi , Arif Kazi
发明人： Aurelian Dodoc , Sascha Bleidistel , Olaf Conradi , Arif Kazi
IPC分类号： G03B27/54
CPC分类号： G03F7/70891 , G03F7/70308
摘要： A microlithographic projection exposure apparatus includes a primary illumination system producing projection light, a projection objective and a correction optical system. The correction optical system includes a secondary illumination system, which produces an intensity distribution of correction light in a reference surface, and a correction element which includes a heating material and is arranged in a plane that is at least substantially optically conjugate to the reference surface such that the correction light and the projection light pass through at least one lens contained in the projection objective before they impinge on the correction element. All lenses through which both the correction light and the projection light pass are made of a lens material which has a lower coefficient of absorption for the correction light than the heating material contained in the correction element.
摘要翻译：微光刻投影曝光装置包括产生投影光的一次照明系统，投射物镜和校正光学系统。校正光学系统包括二次照明系统，其产生参考表面中的校正光的强度分布;以及校正元件，其包括加热材料，并且被布置在与参考表面至少基本上光学共轭的平面中，校正光和投射光在撞击在校正元件上之前通过包含在投影物镜中的至少一个透镜。校正光和投影光通过的所有透镜由透镜材料制成，该透镜材料与校正元件中包含的加热材料相比具有较低的校正光吸收系数。

7. 发明授权

US09366977B2 Semiconductor microlithography projection exposure apparatus 有权
标题翻译：半导体微光刻投影曝光装置
公开(公告)号：US09366977B2
公开(公告)日：2016-06-14
申请号：US13289560
申请日：2011-11-04
申请人： Sascha Bleidistel , Olaf Conradi , Arif Kazi
发明人： Sascha Bleidistel , Olaf Conradi , Arif Kazi
IPC分类号： G03B27/42 , G03F7/20 , G02B7/00 , G02B27/00
CPC分类号： G03F7/70891 , G02B7/008 , G02B27/0068 , G03F7/70308
摘要： The disclosure relates to an optical correction arrangement including at least one optical element and at least one irradiation mechanism for the targeted local irradiation of the optical element with electromagnetic heating radiation for the targeted local heating of the optical element. The optical correction arrangement also includes a mechanism for dissipating the thermal energy introduced into the optical element by the at least one irradiation mechanism. The disclosure furthermore relates to a projection exposure apparatus for semiconductor lithography including an optical correction arrangement according to the disclosure.
摘要翻译：本公开涉及一种光学校正装置，其包括至少一个光学元件和至少一个照射机构，用于利用用于光学元件的目标局部加热的电磁加热辐射来对光学元件进行目标局部照射。光学校正装置还包括用于通过至少一个照射机构耗散引入光学元件的热能的机构。本发明还涉及一种包括根据本公开的光学校正装置的用于半导体光刻的投影曝光装置。

8. 发明授权

US08773638B2 Microlithographic projection exposure apparatus with correction optical system that heats projection objective element 有权
标题翻译：具有校正光学系统的微光刻投影曝光装置，其加热投影物镜元件
公开(公告)号：US08773638B2
公开(公告)日：2014-07-08
申请号：US12727482
申请日：2010-03-19
申请人： Aurelian Dodoc , Sascha Bleidistel , Olaf Conradi , Arif Kazi
发明人： Aurelian Dodoc , Sascha Bleidistel , Olaf Conradi , Arif Kazi
IPC分类号： G03B27/54
CPC分类号： G03F7/70891 , G03F7/70308
摘要： A microlithographic projection exposure apparatus includes a primary illumination system producing projection light, a projection objective and a correction optical system. The correction optical system includes a secondary illumination system, which produces an intensity distribution of correction light in a reference surface, and a correction element which includes a heating material and is arranged in a plane that is at least substantially optically conjugate to the reference surface such that the correction light and the projection light pass through at least one lens contained in the projection objective before they impinge on the correction element. All lenses through which both the correction light and the projection light pass are made of a lens material which has a lower coefficient of absorption for the correction light than the heating material contained in the correction element.
摘要翻译：微光刻投影曝光装置包括产生投影光的一次照明系统，投射物镜和校正光学系统。校正光学系统包括二次照明系统，其产生参考表面中的校正光的强度分布;以及校正元件，其包括加热材料，并且被布置在与参考表面至少基本上光学共轭的平面中，校正光和投射光在撞击在校正元件上之前通过包含在投影物镜中的至少一个透镜。校正光和投影光通过的所有透镜由透镜材料制成，该透镜材料与校正元件中包含的加热材料相比具有较低的校正光吸收系数。

9. 发明申请

US20120069310A1 SEMICONDUCTOR MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS 有权
公开(公告)号：US20120069310A1
公开(公告)日：2012-03-22
申请号：US13289560
申请日：2011-11-04
申请人： Sascha Bleidistel , Olaf Conradi , Arif Kazi
发明人： Sascha Bleidistel , Olaf Conradi , Arif Kazi
IPC分类号： G03B27/52
CPC分类号： G03F7/70891 , G02B7/008 , G02B27/0068 , G03F7/70308
摘要： The disclosure relates to an optical correction arrangement including at least one optical element and at least one irradiation mechanism for the targeted local irradiation of the optical element with electromagnetic heating radiation for the targeted local heating of the optical element. The optical correction arrangement also includes a mechanism for dissipating the thermal energy introduced into the optical element by the at least one irradiation mechanism. The disclosure furthermore relates to a projection exposure apparatus for semiconductor lithography including an optical correction arrangement according to the disclosure.
摘要翻译：本公开涉及一种光学校正装置，其包括至少一个光学元件和至少一个照射机构，用于利用用于光学元件的目标局部加热的电磁加热辐射来对光学元件进行目标局部照射。光学校正装置还包括用于通过至少一个照射机构耗散引入光学元件的热能的机构。本发明还涉及一种包括根据本公开的光学校正装置的用于半导体光刻的投影曝光装置。

10. 发明申请

US20100128367A1 PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHY APPARATUS AND METHOD 审中-公开
标题翻译：一种微电脑设备和方法的投影目标
公开(公告)号：US20100128367A1
公开(公告)日：2010-05-27
申请号：US12403526
申请日：2009-03-13
申请人： Mariella Beckenbach , Klaus Rief , Andreas Bertele , Benjamin Sigel , Sascha Bleidistel , Wolfgang Hummel , Andreas Frommeyer , Toralf Gruner , Jochen Schwaer , Baerbel Schwaer , Thomas Schletterer , Artur Hoegele , Armin Schoeppach
发明人： Mariella Beckenbach , Klaus Rief , Andreas Bertele , Benjamin Sigel , Sascha Bleidistel , Wolfgang Hummel , Andreas Frommeyer , Toralf Gruner , Jochen Schwaer , Baerbel Schwaer , Thomas Schletterer , Artur Hoegele , Armin Schoeppach
IPC分类号： G02B7/02
CPC分类号： G03F7/70825 , G02B7/023 , G02B13/14 , G02B27/0068 , G03F7/70058 , G03F7/70266
摘要： A projection objective for a microlithography apparatus with improved imaging properties is provided. A manipulator for a projection objective is provided. A microlithography apparatus including a projection objective of this type and/or a manipulator of this type is provided. A method for improving the imaging properties of a projection objective is provided.
摘要翻译：提供了具有改善的成像特性的微光刻设备的投影物镜。提供了一种用于投影物镜的操纵器。提供包括这种类型的投影物镜和/或这种类型的操纵器的微光刻设备。提供了一种用于改善投影物镜的成像特性的方法。

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