会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明申请
    • METHOD OF ELECTRON BEAM DIFFRACTION ANALYSIS
    • 电子束衍射分析方法
    • WO2014125295A1
    • 2014-08-21
    • PCT/GB2014/050444
    • 2014-02-14
    • OXFORD INSTRUMENTS NANOTECHNOLOGY TOOLS LIMITED
    • PENMAN, CharlesSCHMIDT, Niels-HenrikTHOMSEN, Knud
    • G01N23/203
    • G01N23/203H01J37/261
    • A method is provided for analysing electron backscatter diffraction data generated from a sample material. An image data set representative of an image of electron backscatter diffraction bands is obtained from the sample material. A set of estimated first diffraction parameters is then generated, these defining individual electron backscatter diffraction bands in the image data set. A candidate phase is then selected together with a respective orientation for the material,based upon the generated set of estimated parameters thereby identifying diffraction bands in the image data set. Second diffraction parameters of the identified diffraction bands are simulated for the candidate phase according to the respective orientation. These second diffraction parameters are then adjusted for the identified simulated bands so as to fit the simulated bands to the bands in the image data. A fitted orientation for the candidate phase is then calculated together with a corresponding fitting parameter defining the quality of fit.
    • 提供了一种用于分析从样品材料产生的电子反向散射衍射数据的方法。 从样品材料获得代表电子反向散射衍射带的图像的图像数据集。 然后产生一组估计的第一衍射参数,这些定义了图像数据集中的各个电子反向散射衍射带。 然后基于生成的估计参数集合,选择候选相位与材料的相应取向,从而识别图像数据集中的衍射带。 根据相应的取向,针对候选相模拟识别的衍射带的第二衍射参数。 然后对于所识别的模拟频带调整这些第二衍射参数,以便将模拟频带拟合到图像数据中的频带。 然后与候选相位的拟合方向一起计算与定义拟合质量的相应拟合参数。