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    • 4. 发明申请
    • OPTOELECTRONIC MODULE
    • 光电模块
    • WO2009140947A3
    • 2010-02-25
    • PCT/DE2009000679
    • 2009-05-13
    • OSRAM OPTO SEMICONDUCTORS GMBHEISSLER DIETERHERRMANN SIEGFRIED
    • EISSLER DIETERHERRMANN SIEGFRIED
    • H01L27/15
    • H01S5/0261H01L25/167H01L27/32H01L2924/0002H01S5/36H01S5/4025H01L2924/00
    • An optoelectronic module (1) comprises a supporting substrate layer (10) encompassing several circuits (200) that have been previously structured into or onto the supporting substrate layer (10) on the wafer level in front-end processes. Light emitting diodes (100), the emission characteristics, brightness, and color of which are controlled by the circuits (200) integrated into/onto the supporting substrate layer (10), are arranged on the supporting substrate layer (10). By interconnecting several optoelectronic modules (1, 2, 3), module arrangements are created which have an extremely high degree of packing density and excellent properties in respect of color fidelity and dimmability. The individual optoelectronic modules of such a module arrangement can be adjusted to each other or to the surroundings in an autonomous or coupled manner.
    • 一种光电模块(1)包括与各种电路(200),其已在或在前端工艺在晶片级平面载体基板层(10)上被预结构化的载体基板层(10)。 在载体基材层(10)是发光二极管(100),布置成控制所述支撑基板层(10)的电路(200)上的集成在/的辐射图案,亮度和颜色。 通过互连多个光电模块(1,2,3)中创建模块组件最高密度与色彩保真度和调光方面具有极好的性能。 这样的模块化布置的各个光电子模块可以是自主或耦合,坐标,或对周围环境。
    • 9. 发明专利
    • DE102008047579A1
    • 2010-04-15
    • DE102008047579
    • 2008-09-17
    • OSRAM OPTO SEMICONDUCTORS GMBH
    • HERRMANN SIEGFRIEDEISSLER DIETER
    • H01S5/02H01L25/075
    • A luminous means includes a first group of semiconductor chips and a second group of semiconductor chips, each group includes at least one semiconductor chip, wherein the first and second groups of semiconductor chips are arranged laterally alongside one another at least in part with respect to a main emission direction of the luminous means, and a third group of semiconductor chips which includes at least one semiconductor chip and is disposed downstream of the first and the second group with respect to the main emission direction, wherein each group of semiconductor chips emits electromagnetic radiation in wavelength ranges that differ from one another in pairs, radiation emitted by the third group of semiconductor chips has the shortest-wave wavelength range, radiation emitted by the first and second group of semiconductor chips at least partly passes into the at least one semiconductor chip of the third group, and mixed radiation is emitted by an emission area of the luminous means.
    • 10. 发明专利
    • Machining surfaces of substrates, which have first and second surface, comprises treating first surface of the substrate with etching medium, so that part of the first surface is removed, and applying leveling material on the first surface
    • DE102008046854A1
    • 2010-03-18
    • DE102008046854
    • 2008-09-12
    • OSRAM OPTO SEMICONDUCTORS GMBH
    • EISSLER DIETERFISCHER HELMUT
    • C30B33/10C30B33/00H01L21/306H01L33/00
    • The process comprises providing a M mX n-substrate (1) with first and second surfaces, where M is aluminum and/or gallium, X is oxygen and/or nitrogen and m and n are numbers of 1-3, treating the first surface of the substrate with an etching medium, so that a part of the first surface of the substrate is removed, applying a leveling material on the first surface of the substrate, where the leveling material possesses chemical or mechanical ablation rate that corresponds to the substrate, and then chemically or mechanically treating the modified first surface. The process comprises providing a M mX n-substrate (1) with first and second surfaces, where M is aluminum and/or gallium, X is oxygen and/or nitrogen and m and n are numbers of 1-3, treating the first surface of the substrate with an etching medium, so that a part of the first surface of the substrate is removed, applying a leveling material on the first surface of the substrate, where the leveling material possesses chemical or mechanical ablation rate that corresponds to the substrate, and then chemically or mechanically treating the modified first surface, so that the leveling material is completely removed and simultaneously the part of the first surface of the substrate is removed. The surface areas of the first surface are removed and have a defective crystal structure. The etching medium acts on the substrate at 200[deg] C. The effect of the etching medium is ended such that the etching medium is separated from the substrate and/or is diluted by a solvent and/or a mixture of the etching medium and substrate is cooled. The second surface of the substrate is partially provided with a protective layer and/or a part of the first surface is provided with the protective layer. The protective layer lies in the form of parallel strips. The first surface is provided with a sacrificial layer, which is removed in the treated step, where the sacrificial layer is obtained by changing the crystal structure of the surface of the substrate. Independent claims are included for: (1) M mX n-substrate for defect-free semiconductor device; (2) a semiconductor device; (3) a method for producing a semiconductor device; and (4) a radiation-emitting device such as LED.