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1. 发明申请

WO0217030B1 METHODS AND APPARATUS FOR OBTAINING DATA FOR PROCESS OPERATION, OPTIMIZATION, MONITORING, AND CONTROL 审中-公开
标题翻译：用于获取过程操作，优化，监控和控制的数据的方法和设备
公开(公告)号：WO0217030B1
公开(公告)日：2003-03-27
申请号：PCT/US0126315
申请日：2001-08-22
申请人： ONWAFER TECHNOLOGIES INC , FREED MASON L , MUNDT RANDALL S , SPANOS COSTAS J
发明人： FREED MASON L , MUNDT RANDALL S , SPANOS COSTAS J
IPC分类号： H01L21/3065 , G05B19/418 , G05B23/02
CPC分类号： G05B19/41865 , G05B2219/32019 , G05B2219/45031 , Y02P90/02 , Y02P90/20
摘要： Data are collected for deriving response models and information required for developing and maintaining processes and process tools. Methods and apparatus for collecting the data include a sensor apparatus (100) capable of collecting data with less perturbation and fewer disruptions than is usually possible using standard methods. The sensor apparatus is capable of being loaded into a process tool. From within the process tool, one embodiment of the sensor apparatus is capable of measuring data, processing data, storing data, and transmitting data. The sensor apparatus has capabilities for near real time data collection and communication.
摘要翻译：收集数据以得出响应模型和开发和维护过程和过程工具所需的信息。用于收集数据的方法和装置包括能够采用标准方法通常可能采集的扰动少且中断少的传感器装置（100）。传感器装置能够被加载到处理工具中。从处理工具中，传感器装置的一个实施例能够测量数据，处理数据，存储数据和发送数据。传感器装置具有接近实时数据收集和通信的能力。

2. 发明申请

WO0217030A3 METHODS AND APPARATUS FOR OBTAINING DATA FOR PROCESS OPERATION, OPTIMIZATION, MONITORING, AND CONTROL 审中-公开
标题翻译：获取过程操作，优化，监测和控制数据的方法和设备
公开(公告)号：WO0217030A3
公开(公告)日：2003-01-09
申请号：PCT/US0126315
申请日：2001-08-22
申请人： ONWAFER TECHNOLOGIES INC , FREED MASON L , MUNDT RANDALL S , SPANOS COSTAS J
发明人： FREED MASON L , MUNDT RANDALL S , SPANOS COSTAS J
IPC分类号： H01L21/3065 , G05B19/418 , G05B23/02
CPC分类号： G05B19/41865 , G05B2219/32019 , G05B2219/45031 , Y02P90/02 , Y02P90/20
摘要： Data are collected for deriving response models and information required for developing and maintaining processes and process tools. Methods and apparatus for collecting the data include a sensor apparatus (100) capable of collecting data with less perturbation and fewer disruptions than is usually possible using standard methods. The sensor apparatus is capable of being loaded into a process tool. From within the process tool, one embodiment of the sensor apparatus is capable of measuring data, processing data, storing data, and transmitting data. The sensor apparatus has capabilities for near real time data collection and communication.
摘要翻译：收集数据用于推导开发和维护过程和过程工具所需的响应模型和信息。用于收集数据的方法和设备包括传感器设备（100），其能够以比通常使用标准方法可能的更少的扰动和更少的中断收集数据。传感器装置能够被装载到处理工具中。从处理工具内部，传感器设备的一个实施例能够测量数据，处理数据，存储数据和传输数据。传感器设备具有近实时数据收集和通信的能力。

3. 发明专利

JP2005202933A Method and apparatus for controlling sensor device 有权
标题翻译：用于控制传感器装置的方法和装置
公开(公告)号：JP2005202933A
公开(公告)日：2005-07-28
申请号：JP2004344135
申请日：2004-11-29
申请人： Onwafer Technologies Inc , オンウェハーテクノロジーズインコーポレーテッドOnwafer Technologies, Inc
发明人： FREED MASON L , SPANOS COSTAS J , MUNDT RANDALL S
IPC分类号： G08C19/00 , G08C17/00 , H01L21/673 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To solve the problem that a method is required for performing operation and maintenance not manually but automatically in a manufacture environment for a sensor device such as a semiconductor wafer. SOLUTION: An apparatus, a method, a system and a computer program for maintaining and/or processing the sensor device are provided. A maintenance unit includes a communication device for communicating with the sensor device, and a device for charging a power source of the sensor device. The sensor device comprises a secondary coil and a charger connected thereto, and receives power supply from the maintenance unit in unison with a primary coil on the maintenance unit side. The sensor device and the maintenance unit perform wireless communication with each other using a coil. The maintenance unit operates and maintains the sensor device, communicates with an external information source, and comprises a sensor device detector and a storage device for storing data, calibration coefficients and commands. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了解决在用于诸如半导体晶片的传感器装置的制造环境中不是手动地但是自动地执行操作和维护所需的方法的问题。提供了一种用于维护和/或处理传感器装置的装置，方法，系统和计算机程序。维护单元包括用于与传感器装置进行通信的通信装置和用于对传感器装置的电源进行充电的装置。传感器装置包括次级线圈和连接到其上的充电器，并且从维护单元接收与维护单元侧的初级线圈一致的电源。传感器装置和维护单元使用线圈进行彼此的无线通信。维护单元操作和维护传感器设备，与外部信息源通信，并且包括用于存储数据，校准系数和命令的传感器设备检测器和存储设备。版权所有（C）2005，JPO＆NCIPI

4. 发明专利

AU8665901A Methods and apparatus for obtaining data for process operation, optimization, monitoring, and control 未知
公开(公告)号：AU8665901A
公开(公告)日：2002-03-04
申请号：AU8665901
申请日：2001-08-22
申请人： ONWAFER TECHNOLOGIES INC
发明人： FREED MASON L , MUNDT RANDALL S , SPANOS COSTAS J
IPC分类号： H01L21/3065 , G05B19/418 , G05B23/02
摘要： Data are collected for deriving response models and information required for developing and maintaining processes and process tools. Methods and apparatus for collecting the data include a sensor apparatus capable of collecting data with less perturbation and fewer disruptions than is usually possible using standard methods. The sensor apparatus is capable of being loaded into a process tool. From within the process tool, the sensor apparatus is capable of measuring data, processing data, storing data, and transmitting data. The sensor apparatus has capabilities for near real time data collection and communication.

5. 发明申请

WO2007041280A3 METHODS OF AND APPARATUSES FOR MEASURING ELECTRICAL PARAMETERS OF A PLASMA PROCESS 审中-公开
标题翻译：用于测量等离子体工艺电气参数的方法和装置
公开(公告)号：WO2007041280A3
公开(公告)日：2007-09-20
申请号：PCT/US2006038029
申请日：2006-09-29
申请人： ONWAFER TECHNOLOGIES INC
发明人： MUNDT RANDY , MACDONALD PAUL D , BEERS ANDREW , FREED MASON L , SPANOS COSTAS J
IPC分类号： B23K9/10
CPC分类号： G01N27/60 , G01K7/25 , G01N33/0004 , G01R15/24 , G01R29/12 , H01L21/67248 , H01L21/67253 , H01L2924/0002 , H01L2924/00
摘要： A sensor apparatus (100) for measuring a plasma process parameter for processing a workpiece. The sensor apparatus (100) includes base (115), an information processor (130) supported on or in the base (115), and at least one sensor (120) supported on or in the bas (115). The at least one sensor (120) includes at least one sensing element (120A) configured for measuring an electrical property of a plasma and at least one transducer (120B) coupled to the at least one sensing element (120A). The transducer (120B) is configured s as to receive a signal from the sensing element (120A) and converting the signal into a second signal for input to the information processor (130).
摘要翻译：一种用于测量用于处理工件的等离子体工艺参数的传感器装置（100）。传感器装置（100）包括基座（115），支撑在基座（115）上或基座（115）中的信息处理器（130）以及支撑在基座（115）上或基座（115）中的至少一个传感器（120）。所述至少一个传感器（120）包括被配置用于测量等离子体的电特性的至少一个感测元件（120A）和耦合到所述至少一个感测元件（120A）的至少一个换能器（120B）。换能器（120B）被配置为接收来自感测元件（120A）的信号，并将该信号转换成第二信号以输入信息处理器（130）。

6. 发明申请

WO2006010128A2 METHODS OF AND APPARATUSES FOR MAINTENANCE, DIAGNOSIS, AND OPTIMIZATION OF PROCESSES 审中-公开
标题翻译：维护，诊断和过程优化的方法和装置
公开(公告)号：WO2006010128A2
公开(公告)日：2006-01-26
申请号：PCT/US2005024580
申请日：2005-07-11
申请人： ONWAFER TECHNOLOGIES INC
发明人： MACDONALD PAUL D , KRUGER MICHIEL , WELCH MICHAEL , FREED MASON L , SPANOS COSTAS J
CPC分类号： G05B23/0235 , G05B13/04 , G05B13/045
摘要： One aspect of the present invention is a method of monitoring processes, optimizing processes, and diagnosing problems in the performance of a process tool for processing a workpiece. Another aspect of the present invention is a system configured for monitoring processes, optimizing processes, and diagnosing problems in the performance of a process tool for processing a workpiece. One embodiment of the present invention includes a software program that can be implemented in a computer for optimizing the performance of a process tool for processing a workpiece.
摘要翻译：本发明的一个方面是监视处理工艺，优化处理以及诊断用于处理工件的处理工具的执行中的问题的方法。本发明的另一方面是被配置为用于监视处理，优化处理和诊断用于处理工件的处理工具的执行中的问题的系统。本发明的一个实施例包括可以在计算机中实现的用于优化用于处理工件的处理工具的性能的软件程序。

7. 发明申请

WO2006010108B1 METHODS AND APPARATUS FOR LOW DISTORTION PARAMETER MEASUREMENTS 审中-公开
标题翻译：低失真参数测量的方法和装置
公开(公告)号：WO2006010108B1
公开(公告)日：2007-05-31
申请号：PCT/US2005024505
申请日：2005-07-08
申请人： ONWAFER TECHNOLOGIES INC
发明人： HUNT DEAN , POOLLA KAMESHWAR , SPANOS COSTAS J , WELCH MICHAEL , FREED MASON L
IPC分类号： G01K7/00
CPC分类号： G01K1/18 , H05K1/147 , H05K1/148
摘要： This invention seeks to provide methods and apparatus that can improve the accuracy of measured parameter data used for processing workpieces. One aspect of the present invention includes methods of measuring process conditions with low distortion of the measurements caused by the measuring apparatus. The measurements include data for applications such as data for monitoring, controlling, and optimizing processes and process tools. Another aspect of the present invention includes apparatus for measuring substantially correct data for applications such as generating data for monitoring, controlling, and optimizing processes and process tools.
摘要翻译：本发明寻求提供可以提高用于处理工件的测量参数数据的精度的方法和装置。本发明的一个方面包括测量由测量装置引起的测量的低变形的工艺条件的方法。这些测量包括应用程序的数据，例如用于监视，控制和优化流程和流程工具的数据。本发明的另一方面包括用于测量用于诸如生成用于监控，控制和优化过程和处理工具的数据的应用的基本正确的数据的装置。

8. 发明申请

WO2006010108A3 METHODS AND APPARATUS FOR LOW DISTORTION PARAMETER MEASUREMENTS 审中-公开
标题翻译：用于低变形参数测量的方法和设备
公开(公告)号：WO2006010108A3
公开(公告)日：2007-03-22
申请号：PCT/US2005024505
申请日：2005-07-08
申请人： ONWAFER TECHNOLOGIES INC
发明人： HUNT DEAN , POOLLA KAMESHWAR , SPANOS COSTAS J , WELCH MICHAEL , FREED MASON L
IPC分类号： G01K7/00
CPC分类号： G01K1/18 , H05K1/147 , H05K1/148
摘要： This invention seeks to provide methods and apparatus that can improve the accuracy of measured parameter data used for processing workpieces. One aspect of the present invention includes methods of measuring process conditions with low distortion of the measurements caused by the measuring apparatus. The measurements include data for applications such as data for monitoring, controlling, and optimizing processes and process tools. Another aspect of the present invention includes apparatus for measuring substantially correct data for applications such as generating data for monitoring, controlling, and optimizing processes and process tools.
摘要翻译：本发明试图提供可以提高用于处理工件的测量参数数据的准确度的方法和设备。本发明的一个方面包括测量过程条件的方法，其中测量设备引起的测量失真较小。测量包括应用程序的数据，如用于监视，控制和优化流程和流程工具的数据。本发明的另一方面包括用于测量用于诸如生成用于监视，控制和优化过程和处理工具的数据的应用的基本上正确的数据的设备。

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