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1. 发明专利

JP2001051724A FLOW RATE ABNORMALITY DETECTING METHOD OF PRESSURE TYPE FLOW PATE CONTROLLER 失效
公开(公告)号：JP2001051724A
公开(公告)日：2001-02-23
申请号：JP22602399
申请日：1999-08-10
申请人： OMI TADAHIRO , IIDA SEIICHI , TOKYO ELECTRON LTD , FUJIKIN KK
发明人： OMI TADAHIRO , IIDA SEIICHI , KAGATSUME SATORU , HIROSE JUN , FUKAZAWA KAZUO , KOIZUMI HIROSHI , NAGAOKA HIDEKI , UNO TOMIO , NISHINO KOJI , IKEDA SHINICHI , DOI RYOSUKE , IDETA EIJI
IPC分类号： G01F1/36 , F16K37/00 , G05B23/02 , G05D7/06
摘要： PROBLEM TO BE SOLVED: To give notice of flow rate abnormality due to the clogging of an orifice with simple constitution by measuring the amplitude of varying pressure of upstream-side pressure in response to the opening and closing of a control valve and giving notice of the clogging of the orifice when the pressure amplitude becomes smaller than a limit amplitude. SOLUTION: The amplitude of the varying pressure of the upstream-side pressure is measured in response to the opening and closing of the control valve and when the pressure amplitude becomes smaller than the limit amplitude, notice of the clogging of the orifice is given. When a clogging detection start signal is inputted from an external circuit 44, a CPU outputs a signal to check circuit 31, which outputs a set flow rate QS(t)=QSO+ΔQS composed of a stationary set flow rate QSO and a signal ΔQS for examination. This signal controls a driving part 8 through an amplifier circuit 33 to open and close the control valve CV. Namely, the examining circuit 31 while holding an orifice passing flow rate at the stationary flow rate QSO checks the clogging of the orifice with the signal ΔQS for examination.

2. 发明专利

JP2000322130A METHOD FOR VARIABLE FLUID FLOW RATE CONTROL BY FLOW FACTOR AND ITS DEVICE 失效
公开(公告)号：JP2000322130A
公开(公告)日：2000-11-24
申请号：JP12910999
申请日：1999-05-10
申请人： FUJIKIN KK , OMI TADAHIRO , TOKYO ELECTRON LTD
发明人： OMI TADAHIRO , MORIMOTO AKIHIRO , UNO TOMIO , IKEDA SHINICHI , DOI RYOSUKE , NISHINO KOJI , IDETA EIJI , MATSUMOTO ATSUSHI , UENOYAMA TOYOMI , YAMAJI MICHIO , HIROSE TAKASHI , KAGATSUME SATORU , HIROSE JUN , FUKAZAWA KAZUO , KOIZUMI HIROSHI , NAGAOKA HIDEKI
IPC分类号： G01F1/42 , G05D7/06
摘要： PROBLEM TO BE SOLVED: To obtain the method for performing high-precision flow rate control over different kinds of gas by one flow rate controller by calculating a factor under specific conditions and calculating the flow rate of another gas kind when the gas kind is circulated through the same orifice under conditions of the same upstream pressure and the same upstream temperature on condition that the calculated flow rate of one gas kind is specific. SOLUTION: Flow factors FF is calculated by gas kinds from FF=(k/γs)(2/(κ+1))1/(κ-1)(κ/((κ+1)R))1/2 and on condition that the calculated flow rate of a gas kind A is QA, the flow rate QB of a gas kind B is calculated from QB=(FFB/FFA)QA when the gas kind B is circulated through the same orifice under the conditions of the same upstream side pressure and the same upstream temperature. Here, γs is the density of gas in a standard state, κ is the specific heat ratio of the gas, R is the gas constant, (k) is a proportion constant which does not depend upon the gas kind, FFA is the flow factor of the gas kind A, and FFB is the flow factor of the gas kind B.

3. 发明专利

JPH11117915A ORIFICE FOR PRESSURE TYPE FLOW CONTROL DEVICE AND MANUFACTURE THEREOF 失效
公开(公告)号：JPH11117915A
公开(公告)日：1999-04-27
申请号：JP23016097
申请日：1997-08-27
申请人： OMI TADAHIRO , TOKYO ELECTRON LTD , FUJIKIN KK
发明人： OMI TADAHIRO , KAGATSUME SATORU , SUGIYAMA KAZUHIKO , FUKADA OSAMU , OZAWA SUSUMU , SATO YOSHIHIRO , DOI RYOSUKE , UNO TOMIO , NISHINO KOJI , FUKUDA HIROYUKI , IKEDA SHINICHI , YAMAJI MICHIO
IPC分类号： B23P15/00 , B05B1/00 , B23P15/16 , F15D1/08
摘要： PROBLEM TO BE SOLVED: To attain pressure flow control of high accuracy by providing an inlet tapered part, a short throttle parallel part, a short tapered part and a parallel diameter-enlarged part continuously in this order. SOLUTION: An orifice for a pressure type flow control device is composed of an orifice A, an inlet tapered part 1, a throttle parallel part 2, a tapered diameter-enlarged part 3 and a parallel diameter-enlarged part 4. As a concrete example, it is confirmed that linearity between a flow rate and primary pressure P1 is ensured over a range of the flow characteristic P2 /P1 of the orifice (a parallel diameter-enlarged part inner diameter (ϕ2 =0.2 mm) A being P2 /P1 =0.633 (P1 =3.0 kgf/cm abs, P2 =1.89 kgf/cm abs), that is, in spite of a form of the orifice A based on machining of only deburring by an R-cutting tool, a drill and a center drill, the linear characteristic of any orifice A is held to a point of P2 /P1 =0.633 so as to attain flow control of high accuracy.

4. 发明专利

JPH11212653A FLUID SUPPLIER 失效
公开(公告)号：JPH11212653A
公开(公告)日：1999-08-06
申请号：JP996198
申请日：1998-01-21
申请人： FUJIKIN KK , OMI TADAHIRO , TOKYO ELECTRON LTD
发明人： OMI TADAHIRO , KAGATSUME SATORU , SUGIYAMA KAZUHIKO , IKEDA SHINICHI , NISHINO KOJI , KAWADA KOJI , MINAMI YUKIO , DOI RYOSUKE , YAMAJI MICHIO
IPC分类号： F16K31/06 , C01B5/00 , G05D7/06 , G05D11/13 , G05D21/00
摘要： PROBLEM TO BE SOLVED: To always enable high-accuracy fluid control while preventing the overshoot phenomenon of fluid to be transiently generated in the starting or switching of the fluid supply. SOLUTION: This device comprises a pressure controller C for controlling the flow rate of the fluid, fluid switching valve D for opening/closing a fluid passage on the secondary side and fluid supply controller for controlling operation of the pressure controller C and fluid switching valve D, and the pressure controller C is formed from an orifice 5, control valve 1 provided on the upstream side of the orifice 5, pressure detector 3 provided between the control valve 1 and the orifice 5, and arithmetic controller 6 for outputting the difference of flow rate signal Qc and flow rate command signal Qs, which are operated from detected pressure P1 of the pressure detector 3 as flow rate Qc=KP1 (K is constant), to a diving part 2 of the control valve 1 as a control signal Qy. Further the flow rate on the downstream side of the orifice 5 controlled by regulating the upstream side pressure P1 of the orifice 5 by opening/closing the control valve 1.

5. 发明专利

JPH1163265A PRESSURE TYPE FLOW CONTROL DEVICE 失效
公开(公告)号：JPH1163265A
公开(公告)日：1999-03-05
申请号：JP22036797
申请日：1997-08-15
申请人： OMI TADAHIRO , TOKYO ELECTRON LTD , FUJIKIN KK
发明人： OMI TADAHIRO , KAGATSUME SATORU , SUGIYAMA KAZUHIKO , DOI RYOSUKE , UNO TOMIO , NISHINO KOJI , FUKUDA HIROYUKI , IKEDA SHINICHI , YAMAJI MICHIO
IPC分类号： F16K17/22 , G05D7/06
摘要： PROBLEM TO BE SOLVED: To ensure highly accurate flow control over a wide flow range so as to improve the replacement of gas and reduce generation of dust by using a direct touch type metal diaphragm valve as a variable sectional area type orifice. SOLUTION: A direct touch type metal diaphragm valve is used for a pressure control valve 2. A control valve control signal Qy is output from a controller 7 to open-close control the valve 2. When the diameter of a variable orifice 5 is changed to change the range of controlled flow, the setting of orifice opening signal Qos is changed. Accordingly, an orifice control signal Qz is changed, and as a result, the operation stroke of an orifice drive part 6 changes to change the diameter of the orifice 5. Consequently, there is no sliding part so that generation of dust can be ignored substantially. Furthermore, there is no space in a fluid passage in which gas is taken to thereby improve the replacement of gas.

6. 发明专利

JP2000305630A PARALLEL BRANCHED FLUID FEEDING DEVICE 失效
公开(公告)号：JP2000305630A
公开(公告)日：2000-11-02
申请号：JP10868999
申请日：1999-04-16
申请人： OMI TADAHIRO , TOKYO ELECTRON LTD , FUJIKIN KK
发明人： OMI TADAHIRO , KAGATSUME SATORU , SUGIYAMA KAZUHIKO , MINAMI YUKIO , NISHINO KOJI , DOI RYOSUKE , KOMEHANA KATSUNORI , IKEDA SHINICHI , YAMAJI MICHIO
IPC分类号： G05D7/06
摘要： PROBLEM TO BE SOLVED: To stably hold the steady flow of another passage and to enable one regulator to control the steady flow of plural passages by setting a mass flow controller so as to have delay time from an operation start point to a command flow value when controlling the circulation of a fluid in a certain passage from a closed state to a circulating state. SOLUTION: On the assumption valves V1 and V2 are opened in a passage S1, gas is ordinarily fed and gas reaction is performed in a reaction chamber C, on this stage, closed valves V3 and V4 are opened and gas flows into a time delay type mass flow controller DMFC2. The valve part of the time delay type mass flow controller DMFC2 is completely closed at the beginning but when a valve detecting part detects the changes of the valves V3 and V4 from closing to opening, after short standstill time, a time delay part starts operating. This short standstill time is provided as time for setting the disturbance of gas stream caused by opening the valves V3 and V4.

7. 发明专利

JP2000137528A METHOD AND DEVICE FOR DETECTING ORIFICE CLOGGING IN PRESSURE-TYPE FLOW RATE CONTROLLER 失效
公开(公告)号：JP2000137528A
公开(公告)日：2000-05-16
申请号：JP21363399
申请日：1999-07-28
申请人： OMI TADAHIRO , TOKYO ELECTRON LTD , FUJIKIN KK
发明人： OMI TADAHIRO , IIDA SEIICHI , KAGATSUME SATORU , HIROSE JUN , UNO TOMIO , NISHINO KOJI , IKEDA SHINICHI , YAMAJI MICHIO , DOI RYOSUKE , IDETA EIJI , HIROSE TAKASHI , YOSHIKAWA KAZUHIRO , KOGAI MUTSUNORI
IPC分类号： G01F1/42 , G05D7/06 , G05D16/20
摘要： PROBLEM TO BE SOLVED: To judge clogging with simple operation without disassembling piping by comparing reference pressure attenuation data when an orifice is not clogged with pressure attenuation data at the time of an actual operation and judging the propriety of clogging according to whether or not they are dissociated for not less than a prescribed degree. SOLUTION: A setting flow rate is held to a high setting flow rate. The high setting flow rate is switched to a low setting flow rate and it is kept. Upper stream side pressure is measured and pressure attenuation data is obtained. Reference pressure attenuation data measured when an orifice is not clogged and pressure attenuation data obtained by measurement are compared with same conditions. When pressure attenuation data is dissociated from reference pressure attenuation data for not less than a prescribed degree, clogging is reported. The clogging detector is constituted of a central processing unit CPU, a memory device for data storage M, a communication part PT 42 with outside, the outer circuit 4 of a trigger circuit, an alarm circuit 46 at the time of clogging, a power source circuit SC 48 and the outer power source 50 of ±15 V, for example.

8. 发明专利

JP2001050835A FIXING STRUCTURE OF PRESSURE DETECTOR 失效
公开(公告)号：JP2001050835A
公开(公告)日：2001-02-23
申请号：JP22236799
申请日：1999-08-05
申请人： OMI TADAHIRO , FUJIKIN KK , TOKYO ELECTRON LTD
发明人： OMI TADAHIRO , HIROSE TAKASHI , IDETA EIJI , IKEDA SHINICHI , DOI RYOSUKE , NISHINO KOJI , YOSHIKAWA KAZUHIRO , KAGATSUME SATORU , HIROSE JUN , FUKAZAWA KAZUO , KOIZUMI HIROSHI , NAGAOKA HIDEKI
IPC分类号： G01L9/04 , G01L9/00 , G01L19/00 , G01L19/04 , G01L19/06 , G01L19/14
摘要： PROBLEM TO BE SOLVED: To obtain a structure for fixing a diaphragm type pressure detector to a conduit or an apparatus in which a diaphragm is prevented from being distorted with a stress applied to the pressure detector and the output characteristics or temperature characteristics are varied significantly after the pressure detector is built in. SOLUTION: A pressure detector comprising a combination of a diaphragm base 4 having a diaphragm 3 and a sensor base incorporating a sensor element actuated by displacement of the diaphragm 3 is inserted through a gasket into the insertion hole in a fixing metal body fixed to a conduit or an apparatus and the pressure detector is secured while being pressed hermetically by means of a retaining member inserted into the insertion hole from above. In such a fixing structure of pressure detector, the retaining member is abutted against the upper surface at the body part of the diaphragm base 4 and a gasket is abutted against the lower surface thereof. Shallow grooves 18a, 18b are made on the inside of the part where the retaining member abuts against the upper surface at the body part and a shallow groove is made on the inside of the part where the gasket abuts against the lower surface at the body part. Strain generated by pressing the retaining member is absorbed by both shallow grooves 18a, 18b.

9. 发明专利

JP2000066732A FLUID VARIABLE-TYPE FLOW RATE CONTROLLER 失效
公开(公告)号：JP2000066732A
公开(公告)日：2000-03-03
申请号：JP23665698
申请日：1998-08-24
申请人： OMI TADAHIRO , TOKYO ELECTRON LTD , FUJIKIN KK
发明人： OMI TADAHIRO , KAGATSUME SATORU , HIROSE JUN , NISHINO KOJI
IPC分类号： F16K7/14 , C01B5/00 , F15D1/04 , F16K31/06 , G05B11/36 , G05D7/06
摘要： PROBLEM TO BE SOLVED: To control a flow rate with high precision by means of the same orifice against various kinds of fluids and flow rate ranges and to vary the kinds and ranges by opening/closing a control valve so as to permit a control signal being a difference between a change-over arithmetic flow rate signal and a flow rate setting signal to be zero and controlling an orifice downstream side flow rate. SOLUTION: The orifice 8 is arranged so as to be freely convertible, the control valve 2 is arranged at its upstream side and pressure detecting equipment 6 is disposed between the control valve 2 and the orifice 8. A flow rate arithmetic circuit 14 calculates the flow rate from the detection pressure P1 of the pressure detecting equipment 6 as Qc=KP1 (K is a constant number), a flow rate setting circuit 16 outputs the flow rate setting signal Qe and a flow rate converting circuit 18 converts an arithmetic flow rate signal Qc into the change-over arithmetic flow rate signal Qf in order to change-over a full- scale flow rate. An arithmetic control circuit 20 outputs the difference between the signal Qf and the signal Qe to a driving part 4 as the control signal Qy, opens/closes the control valve 2 to permit the control signal Qy to be zero and controls the orifice downstream side flow rate.

10. 发明专利

JPH11345027A GAS SUPPLY EQUIPMENT PROVIDED WITH PRESSURE TYPE FLOW RATE CONTROLLER 失效
公开(公告)号：JPH11345027A
公开(公告)日：1999-12-14
申请号：JP15004998
申请日：1998-05-29
申请人： OMI TADAHIRO , TOKYO ELECTRON LTD , FUJIKIN KK
发明人： OMI TADAHIRO , KAGATSUME SATORU , IKEDA SHINICHI , NISHINO KOJI , YOSHIKAWA KAZUHIRO , IDETA EIJI , DOI RYOSUKE , YAMAJI MICHIO , UNO TOMIO
IPC分类号： F17D1/00 , G05D7/06 , G05D16/20
摘要： PROBLEM TO BE SOLVED: To miniaturize a gas supply equipment provided with a pressure type flow rate controller more, to lower a manufacture cost thereof, to prevent the occurrence of overshoot phenomenon of gas at the time of starting gas supply, to improve flow rate control accuracy and the reliability of the equipment, to reduce the dispersion of the quality of products such as semiconductors and to improve the manufacture efficiency of the products. SOLUTION: This gas supply equipment for controlling the flow rate of the gas in a state of keeping an upstream side pressure of an orifice 5 more than double or so of a downstream side pressure is constituted of a control valve 2 for receiving the gas from a gas supply source, an orifice corresponding valve 9 provided on the downstream side of the valve, a pressure detector 3 provided between the control valve and the orifice corresponding valve, the orifice provided on the downstream side of the valve mechanism part of the orifice corresponding valve and an arithmetic controller 6 for computing the flow rate from the detected pressure P1 of the pressure detector as Qc=KP1 (where K is a constant) and outputting the difference between a flow rate command signal Qs and a computed flow rate Qc to the drive part of the control valve as a control signal Qy.

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