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    • 1. 发明专利
    • Method of manufacturing silicon carbide porous body
    • 制造碳化硅多孔体的方法
    • JP2005162538A
    • 2005-06-23
    • JP2003404084
    • 2003-12-03
    • Noritake Co Ltd株式会社ノリタケカンパニーリミテド
    • BARAGOPARU N NAIRYAMADA SEIJIYOSHINO YASUSHI
    • C04B35/565C04B35/626C04B38/00
    • PROBLEM TO BE SOLVED: To provide a method of manufacturing a high strength and high purity silicon carbide porous body at a relatively low temperature of ≤2,000°C. SOLUTION: Silicon carbide powder having 1μm average particle diameter is formed tubular at 150 MPa pressure based on a cold isotropic pressure process (CIP). The resultant formed body is heated at 1,000°C in the air (a 1st firing process) to be partially oxidized. The temperature rising and cooling rate is 5°C/min. The holding time at a maximum heating temperature is 3 hr. Next, liquid sintering (a 2nd firing process) is carried out at 1,400°C under a nitrogen atmosphere. The temperature rising and cooling rate is 5°C/min and the holding time at the maximum sintering is 3hr. The resultant silicon carbide porous body has 223 nm average fine pore diameter, 43.2% porosity and contains about 6.3 mass% oxygen. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供在≤2,000℃的较低温度下制造高强度和高纯度碳化硅多孔体的方法。 解决方案:基于冷各向同性压力工艺(CIP),在150MPa压力下形成具有1μm平均粒径的碳化硅粉末管状。 将所得成形体在空气中(1000℃)加热以进行部分氧化。 升温速度为5℃/ min。 最高加热温度下的保持时间为3小时。 接着,在氮气氛下,在1400℃下进行液体烧结(第二烧成工序)。 升温和冷却速度为5℃/ min,最大烧结保持时间为3小时。 所得碳化硅多孔体的平均细孔直径为223nm,孔隙率为43.2%,氧含量为约6.3质量%。 版权所有(C)2005,JPO&NCIPI
    • 3. 发明专利
    • Hydrogen separating material and its manufacturing method
    • 氢分离材料及其制造方法
    • JP2005319383A
    • 2005-11-17
    • JP2004138799
    • 2004-05-07
    • Noritake Co Ltd株式会社ノリタケカンパニーリミテド
    • YOSHINO YASUSHIBARAGOPARU N NAIR
    • B01D71/82B01D71/02C04B41/85
    • PROBLEM TO BE SOLVED: To provide a hydrogen separating material with an enhancement in hydrogen separating capacity at a high temperature, that is, hydrogen permselectivity and/or hydrogen permeation speed, and its manufacturing method.
      SOLUTION: The hydrogen separating material is equipped with a porous body (preferably comprising a baked ceramic material) having a hydrogen separating layer (preferably an average pore size is 0.3-0.5 nm and thickness is 5-200 nm), of which the pore size has a size capable of permeating hydrogen selectively, provided at least to a part thereof, and keeps the hydrogen separating layer modified with a silazane compound. The manufacturing method of the hydrogen separating material includes a process for preparing the porous body and a process for modifying (preferably impregnating) the hydrogen separating layer (preferably after surface homogenizing treatment, for example, plasma treatment) with the silazane compound (preferably especially hexamethylsilazane with a molecular weight of 200 or below).
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 解决的问题:提供一种在高温下氢分选能力和/或氢渗透速度提高氢分离能力的氢分离材料及其制造方法。 解决方案:氢气分离材料配备有具有氢分离层(优选平均孔径为0.3-0.5nm,厚度为5-200nm)的多孔体(优选包括焙烧陶瓷材料),其中 选择性地使孔径具有能够选择性地渗透氢的尺寸,至少提供一部分,并且保持用硅氮烷化合物改性的氢分离层。 氢分离材料的制造方法包括制备多孔体的方法和用硅氮烷化合物(优选特别是六甲基硅氮烷)(优选浸渍)氢分离层(优选在表面均化处理,例如等离子体处理之后) 分子量为200以下)。 版权所有(C)2006,JPO&NCIPI
    • 6. 发明专利
    • Method for producing hydrogen, and membrane reactor used therefor
    • 生产氢的方法及其使用的膜反应器
    • JP2005281024A
    • 2005-10-13
    • JP2004094489
    • 2004-03-29
    • Noritake Co Ltd株式会社ノリタケカンパニーリミテド
    • BARAGOPARU N NAIRSUZUKI TAKEHIROITO NAOJIOMORI TAKAOTSURU TOSHIAKI
    • C01B3/38
    • PROBLEM TO BE SOLVED: To provide a method for producing hydrogen with high reaction efficiency and to provide a membrane reactor capable of carrying out the method.
      SOLUTION: The method for producing hydrogen includes a step of supplying source gas containing a source material for hydrogen reformation and H
      2 O to the hydrogen generating side separated by a hydrogen separation membrane in a membrane type reactor which essentially comprises a reformation catalyst and a ceramic porous material having the hydrogen separation membrane, and a step of supplying sweep gas substantially comprising H
      2 O to the hydrogen permeating and recovering side separated by the hydrogen separation membrane. The sweep gas is supplied to the reactor while the H
      2 O partial pressure in the sweep gas is controlled to maintain the relation of 0.3 2 O partial pressure in the hydrogen generating side and P2 is the H
      2 O partial pressure in the hydrogen permeating and recovering side.
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 待解决的问题:提供一种生产具有高反应效率的氢的方法,并提供能够实施该方法的膜反应器。 解决方案:氢气的制造方法包括将由氢气分离膜分离的氢气发生侧的源气体供给到氢气重整用的源气体和H SB 2 O的步骤, 反应器,其基本上包括重整催化剂和具有氢分离膜的陶瓷多孔材料,以及向由氢分离膜分离的氢透过和回收侧供给基本上包含H 2 S 2 O的吹扫气体的步骤 。 将吹扫气体供给到反应器中,同时控制吹扫气体中的H SB 2 O分压,以保持0.3 2 O分压和P2是氢渗透和回收侧的H SB 2 O分压。 版权所有(C)2006,JPO&NCIPI
    • 10. 发明专利
    • Inorganic porous body and method for manufacturing the same
    • 无机多孔体及其制造方法
    • JP2006008435A
    • 2006-01-12
    • JP2004185809
    • 2004-06-24
    • Noritake Co Ltd株式会社ノリタケカンパニーリミテド
    • BARAGOPARU N NAIR
    • C04B41/85B01D67/00B01J20/30C23C14/28C23C30/00
    • PROBLEM TO BE SOLVED: To provide an inorganic porous body having an inorganic porous film through which molecules or particles contained in a fluidity to be treated is efficiently permeated and a method for manufacturing the porous body.
      SOLUTION: The inorganic porous body is provided with the inorganic porous film having a plurality of pores oriented almost in the film thickness direction on the surface of the porous base material. The average pore diameter is preferably 2-200 nm. The method of obtaining the porous body includes a process for preparing a target containing an inorganic material and the porous base material and a process for forming the porous film by arranging the target and the porous base material under 1-200 Pa atmospheric pressure, irradiating the target with pulse laser having 5-500 Hz frequency to produce the vapor of the inorganic material, and depositing the vapor on the surface of the porous base material. The porous film forming process is preferably carried out under a fixed temperature condition in which the base material temperature is set to ≤1,000°C. The number of irradiation times with the pulse laser is preferably ≤200,000 times.
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供一种具有无机多孔膜的无机多孔体,通过该无机多孔膜有效地渗透待处理的流动性中所含的分子或颗粒,以及制造多孔体的方法。 解决方案:无机多孔体设置有多孔基材的表面上具有多个在膜厚度方向取向的多孔的无机多孔膜。 平均孔径优选为2〜200nm。 获得多孔体的方法包括制备包含无机材料的靶和多孔基材的方法,以及通过将靶和多孔基材设置在1-200Pa大气压下形成多孔膜的方法,照射 目标是具有5-500Hz频率的脉冲激光,以产生无机材料的蒸气,并将蒸气沉积在多孔基材的表面上。 多孔膜形成方法优选在将基材温度设定为≤1000℃的固定温度条件下进行。 脉冲激光器的照射次数优选为≤200,000次。 版权所有(C)2006,JPO&NCIPI