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    • 6. 发明专利
    • Method of manufacturing silicon carbide porous body
    • 制造碳化硅多孔体的方法
    • JP2005162538A
    • 2005-06-23
    • JP2003404084
    • 2003-12-03
    • Noritake Co Ltd株式会社ノリタケカンパニーリミテド
    • BARAGOPARU N NAIRYAMADA SEIJIYOSHINO YASUSHI
    • C04B35/565C04B35/626C04B38/00
    • PROBLEM TO BE SOLVED: To provide a method of manufacturing a high strength and high purity silicon carbide porous body at a relatively low temperature of ≤2,000°C. SOLUTION: Silicon carbide powder having 1μm average particle diameter is formed tubular at 150 MPa pressure based on a cold isotropic pressure process (CIP). The resultant formed body is heated at 1,000°C in the air (a 1st firing process) to be partially oxidized. The temperature rising and cooling rate is 5°C/min. The holding time at a maximum heating temperature is 3 hr. Next, liquid sintering (a 2nd firing process) is carried out at 1,400°C under a nitrogen atmosphere. The temperature rising and cooling rate is 5°C/min and the holding time at the maximum sintering is 3hr. The resultant silicon carbide porous body has 223 nm average fine pore diameter, 43.2% porosity and contains about 6.3 mass% oxygen. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供在≤2,000℃的较低温度下制造高强度和高纯度碳化硅多孔体的方法。 解决方案:基于冷各向同性压力工艺(CIP),在150MPa压力下形成具有1μm平均粒径的碳化硅粉末管状。 将所得成形体在空气中(1000℃)加热以进行部分氧化。 升温速度为5℃/ min。 最高加热温度下的保持时间为3小时。 接着,在氮气氛下,在1400℃下进行液体烧结(第二烧成工序)。 升温和冷却速度为5℃/ min,最大烧结保持时间为3小时。 所得碳化硅多孔体的平均细孔直径为223nm,孔隙率为43.2%,氧含量为约6.3质量%。 版权所有(C)2005,JPO&NCIPI
    • 8. 发明专利
    • Hydrogen separating material and its manufacturing method
    • 氢分离材料及其制造方法
    • JP2005319383A
    • 2005-11-17
    • JP2004138799
    • 2004-05-07
    • Noritake Co Ltd株式会社ノリタケカンパニーリミテド
    • YOSHINO YASUSHIBARAGOPARU N NAIR
    • B01D71/82B01D71/02C04B41/85
    • PROBLEM TO BE SOLVED: To provide a hydrogen separating material with an enhancement in hydrogen separating capacity at a high temperature, that is, hydrogen permselectivity and/or hydrogen permeation speed, and its manufacturing method.
      SOLUTION: The hydrogen separating material is equipped with a porous body (preferably comprising a baked ceramic material) having a hydrogen separating layer (preferably an average pore size is 0.3-0.5 nm and thickness is 5-200 nm), of which the pore size has a size capable of permeating hydrogen selectively, provided at least to a part thereof, and keeps the hydrogen separating layer modified with a silazane compound. The manufacturing method of the hydrogen separating material includes a process for preparing the porous body and a process for modifying (preferably impregnating) the hydrogen separating layer (preferably after surface homogenizing treatment, for example, plasma treatment) with the silazane compound (preferably especially hexamethylsilazane with a molecular weight of 200 or below).
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 解决的问题:提供一种在高温下氢分选能力和/或氢渗透速度提高氢分离能力的氢分离材料及其制造方法。 解决方案:氢气分离材料配备有具有氢分离层(优选平均孔径为0.3-0.5nm,厚度为5-200nm)的多孔体(优选包括焙烧陶瓷材料),其中 选择性地使孔径具有能够选择性地渗透氢的尺寸,至少提供一部分,并且保持用硅氮烷化合物改性的氢分离层。 氢分离材料的制造方法包括制备多孔体的方法和用硅氮烷化合物(优选特别是六甲基硅氮烷)(优选浸渍)氢分离层(优选在表面均化处理,例如等离子体处理之后) 分子量为200以下)。 版权所有(C)2006,JPO&NCIPI