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1. 发明授权

US5639388A Polishing endpoint detection method 失效
标题翻译：抛光端点检测方法
公开(公告)号：US5639388A
公开(公告)日：1997-06-17
申请号：US588241
申请日：1996-01-18
申请人： Norio Kimura , Fumihiko Sakata , Tamami Takahashi
发明人： Norio Kimura , Fumihiko Sakata , Tamami Takahashi
IPC分类号： B24B37/013 , B24B37/07 , B24B49/16 , H01L21/66
CPC分类号： B24B37/013 , B24B49/16
摘要： An endpoint detection in a polishing process of a polishing object which has a first layer and a second layer, formed under the first layer, is performed by holding the polishing object on a top ring and pressing a surface of the first layer of the polishing object onto a polishing cloth mounted on a rotating turntable so as to remove the first layer, oscillating the top ring in contact with the turntable, periodically measuring a torque on the rotating turntable when the top ring is positioned at a specific radial location defined by a radius from a rotational center of the turntable, and determining the endpoint based on a change in the torque generated when the first layer is removed and the second layer comes into contact with the polishing cloth.
摘要翻译：通过将抛光对象保持在顶环上并按压抛光对象的第一层的表面来进行在第一层下方形成有第一层和第二层的抛光对象的抛光工序中的端点检测到安装在旋转转台上的抛光布上，以便去除第一层，使顶环与转台相接触，使顶环周期性地测量旋转转台上的转矩，当顶环位于由半径限定的特定径向位置时并且基于当去除第一层并且第二层与抛光布接触时产生的扭矩的变化来确定端点。

2. 发明授权

US5830041A Method and apparatus for determining endpoint during a polishing process 失效
标题翻译：用于在抛光过程中确定端点的方法和装置
公开(公告)号：US5830041A
公开(公告)日：1998-11-03
申请号：US743361
申请日：1996-11-04
申请人： Tamami Takahashi , Fumihiko Sakata , Norio Kimura , Masako Kodera , Atsushi Shigeta
发明人： Tamami Takahashi , Fumihiko Sakata , Norio Kimura , Masako Kodera , Atsushi Shigeta
IPC分类号： B24B37/013 , B24B37/04 , B24B49/16 , B24B7/22
CPC分类号： B24B37/013 , B24B49/16
摘要： A method and apparatus for determining a planar end point on a workpiece such as a semiconductor wafer in a polishing process for polishing the workpiece to a flat mirror finish. The workpiece having an uneven surface is held by a top ring and pressed against a polishing platen. The workpiece is moved relative to the polishing platen to polish the workpiece, and a change in a frictional force between the workpiece and the polishing platen is detected. A reference time when the workpiece having an uneven surface is polished to a flat surface is determined based on the change of the frictional force between the workpiece and the polishing platen. The time when a certain period of polishing time from the reference time elapses is determined as an endpoint on the workpiece.
摘要翻译：一种用于在用于将工件抛光到平面镜面抛光的抛光工艺中确定诸如半导体晶片的工件上的平面终点的方法和装置。具有不平坦表面的工件由顶环保持并压靠在研磨台板上。工件相对于研磨台板移动以抛光工件，并且检测到工件和抛光台板之间的摩擦力的变化。基于工件和研磨台板之间的摩擦力的变化，确定具有不平坦表面的工件被抛光到平坦表面的参考时间。从参考时间经过一定时间的抛光时间经过的时间被确定为工件上的端点。

3. 发明申请

US20110165825A1 POLISHING APPARATUS 有权
标题翻译：抛光装置
公开(公告)号：US20110165825A1
公开(公告)日：2011-07-07
申请号：US12673294
申请日：2008-07-23
申请人： Norio Kimura , Kenya Ito , Tamami Takahashi , Masaya Seki
发明人： Norio Kimura , Kenya Ito , Tamami Takahashi , Masaya Seki
IPC分类号： B24B9/00
CPC分类号： B24B9/065
摘要： A polishing apparatus according to the present invention is a polishing apparatus for polishing a periphery (a bevel portion, a notch portion, an edge-cut portion) of a substrate (W) by bringing a polishing tool (41) into sliding contact with the periphery of the substrate. The polishing apparatus includes a substrate holder (20) configured to hold the substrate (W); and a polishing head (42) configured to polish the periphery of the substrate (W) held by the substrate holder (20) using the polishing tool (41). The polishing head (42) includes a press pad (50) for pressing the polishing tool (41) against the periphery of the substrate (W), and a linear motor (90) configured to reciprocate the press pad (50).
摘要翻译：根据本发明的研磨装置是通过使研磨工具（41）与所述基板（W）滑动接触来研磨基板（W）的周边（斜面部，切口部，边缘切断部）的研磨装置衬底周边。抛光装置包括：基板保持架（20），其构造成保持基板（W）; 以及抛光头（42），其被配置为使用所述抛光工具（41）抛光由所述基板保持器（20）保持的所述基板（W）的周边。抛光头（42）包括用于将抛光工具（41）压靠在基板（W）的周边上的压垫（50）和构造成使压垫（50）往复运动的直线电动机（90）。

4. 发明授权

US08393935B2 Polishing apparatus 有权
标题翻译：抛光设备
公开(公告)号：US08393935B2
公开(公告)日：2013-03-12
申请号：US12673294
申请日：2008-07-23
申请人： Norio Kimura , Kenya Ito , Tamami Takahashi , Masaya Seki
发明人： Norio Kimura , Kenya Ito , Tamami Takahashi , Masaya Seki
IPC分类号： B24B9/00 , B24B21/00
CPC分类号： B24B9/065
摘要： A polishing apparatus polishes a periphery (a bevel portion, a notch portion, an edge-cut portion) of a substrate by bringing a polishing tool into sliding contact with the periphery of the substrate. The polishing apparatus includes a substrate holder configured to hold the substrate, and a polishing head configured to polish the periphery of the substrate held by the substrate holder using the polishing tool. The polishing head includes a press pad for pressing the polishing tool against the periphery of the substrate, and a linear motor configured to reciprocate the press pad.
摘要翻译：抛光装置通过使抛光工具与基板的周边滑动接触来抛光基板的周边（斜面部分，切口部分，边缘切割部分）。抛光装置包括：被配置为保持基板的基板保持器，以及抛光头，其被构造成使用抛光工具抛光由基板保持器保持的基板的周边。抛光头包括用于将抛光工具压靠在基板的周边上的压垫，以及配置成使压垫往复运动的线性电动机。

5. 发明授权

US08895960B2 Electrode covering material, electrode structure and semiconductor device 有权
标题翻译：电极覆盖材料，电极结构和半导体器件
公开(公告)号：US08895960B2
公开(公告)日：2014-11-25
申请号：US12515585
申请日：2007-11-21
申请人： Masaki Murata , Nobuhide Yoneya , Norio Kimura
发明人： Masaki Murata , Nobuhide Yoneya , Norio Kimura
IPC分类号： H01L29/08 , H01L51/00 , H01L51/10 , H01L51/05
CPC分类号： H01L51/0095 , H01L51/0035 , H01L51/0083 , H01L51/0541 , H01L51/0545 , H01L51/105 , Y10T428/31533 , Y10T428/31681 , Y10T428/31692
摘要： A semiconductor device is provided and includes a field effect transistor having a gate electrode, a gate insulating layer, a channel forming region composed of an organic semiconductor material layer and a source/drain electrode made of a metal. A portion of the source/drain electrode in contact with the organic semiconductor material layer comprising the channel forming region is covered with an electrode coating material. Because the electrode coating material is composed of organic molecules having a functional group which can be bound to a metal ion and a functional group that binds to the source/drain electrode composed of the metal, low contact resistance and high mobility can be achieved.
摘要翻译：提供一种半导体器件，并且包括具有栅电极，栅极绝缘层，由有机半导体材料层构成的沟道形成区域和由金属制成的源极/漏极电极的场效应晶体管。与包含沟道形成区域的有机半导体材料层接触的源极/漏极电极的一部分被电极涂覆材料覆盖。由于电极涂层材料由具有与金属离子结合的官能团的有机分子和与由金属构成的源/漏电极结合的官能团构成，所以可以实现低接触电阻和高迁移率。

6. 发明授权

US08657135B2 Artificial nipple and nursing container using same 有权
标题翻译：人造乳头和使用相同的护理容器
公开(公告)号：US08657135B2
公开(公告)日：2014-02-25
申请号：US13505155
申请日：2010-10-29
申请人： Daisuke Yamashita , Norio Kimura , Masakazu Yoshida , Mitsuo Tashiro
发明人： Daisuke Yamashita , Norio Kimura , Masakazu Yoshida , Mitsuo Tashiro
IPC分类号： A61J9/04 , A61J11/02
CPC分类号： A61J9/04 , A61J11/02 , A61J11/04
摘要： An artificial nipple can include a nipple tip section that can sufficiently reach the sucking fossa and can be appropriately squashed The artificial nipple can have a base section that widens to match an attachment object, an areola section formed contiguously to the base section and that extends while narrowing gradually, and a nipple section that extends from the areola section and that narrows more than the areola section. A flange section can be provided in the base section with a predetermined thickness. A check valve can be formed with a valve body so as to be entirely accommodated within the thickness dimension of the flange, and provided in the base section.
摘要翻译：人造乳头可以包括可以充分到达吸吮窝并能够适当地挤压的乳头末端部分。人造乳头可以具有加宽以匹配附着对象的基部部分，与基部部分连续形成并且延伸的乳晕部分逐渐变细，以及从乳晕部分延伸并且比乳晕部分更窄的乳头部分。凸缘部分可以以预定厚度设置在基部部分中。止回阀可以形成有阀体，以便完全容纳在凸缘的厚度尺寸内，并设置在基部中。

7. 发明授权

US08614839B2 Image reader, auto document feeder, and image forming apparatus capable of generating shading data 有权
标题翻译：图像读取器，自动文件馈送器和能够生成阴影数据的图像形成装置
公开(公告)号：US08614839B2
公开(公告)日：2013-12-24
申请号：US12458875
申请日：2009-07-27
申请人： Motoya Sano , Takashi Fujii , Hiroshi Kubo , Shinya Kitaoka , Takeshi Akai , Atsushi Kanaya , Shingo Matsushita , Norio Kimura , Kenichiro Morita
发明人： Motoya Sano , Takashi Fujii , Hiroshi Kubo , Shinya Kitaoka , Takeshi Akai , Atsushi Kanaya , Shingo Matsushita , Norio Kimura , Kenichiro Morita
IPC分类号： H04N1/04 , H04N1/40
CPC分类号： H04N1/1215 , H04N1/00588 , H04N1/00602 , H04N1/0061 , H04N1/0062 , H04N1/00652 , H04N1/00689 , H04N1/00694 , H04N1/00705 , H04N1/0071 , H04N1/00713 , H04N1/00732 , H04N1/00734 , H04N1/00745 , H04N1/0075 , H04N1/00755 , H04N1/00774 , H04N1/00782 , H04N1/125 , H04N1/193 , H04N1/2032 , H04N2201/0098
摘要： In an image reader, a reading member fixedly mounted in the image reader reads an image on a sheet conveyed into the image reader. A guide is disposed opposite the reading member to support the sheet with respect to the reading member. A guide moving member moves the guide with respect to the reading member in a main scanning direction in which the reading member reads the image on the sheet. A guide rotating member rotates the guide in a sub-scanning direction perpendicular to the main scanning direction. A controller controls the reading member to scan different positions on the guide moved by the guide moving member and rotated by the guide rotating member to generate shading data.
摘要翻译：在图像读取器中，固定地安装在图像读取器中的读取部件读取传送到图像读取器中的片材上的图像。引导件布置成与读取构件相对，以相对于读取构件支撑片材。引导移动构件在读取构件读取片材上的图像的主扫描方向上相对于读取构件移动引导件。导向旋转构件沿垂直于主扫描方向的副扫描方向旋转引导件。控制器控制读取构件扫描由引导移动构件移动并由引导旋转构件旋转的引导件上的不同位置，以产生阴影数据。

8. 发明授权

US08038140B2 Document feeding device, image forming apparatus including same, and control method for the document feeding device 有权
标题翻译：文件馈送装置，包括它的图像形成装置以及文件馈送装置的控制方法
公开(公告)号：US08038140B2
公开(公告)日：2011-10-18
申请号：US12659152
申请日：2010-02-26
申请人： Norio Kimura , Hideki Tobinaga , Akira Hirose , Shinya Kitaoka , Motoya Sano , Atsushi Kanaya , Michitaka Suzuki
发明人： Norio Kimura , Hideki Tobinaga , Akira Hirose , Shinya Kitaoka , Motoya Sano , Atsushi Kanaya , Michitaka Suzuki
IPC分类号： B65H5/00
CPC分类号： B65H7/18 , B65H3/0607 , B65H3/0684 , B65H2404/6111 , B65H2405/3321 , B65H2511/11 , B65H2511/514 , B65H2513/10 , B65H2513/412 , B65H2513/50 , B65H2513/514 , B65H2701/1313 , B65H2801/39 , B65H2220/01 , B65H2220/02 , B65H2220/11 , B65H2220/03
摘要： A document feeding device includes a carrying unit capable of carrying documents, a drawing device drawing and supplying the documents, a drawing device drive source driving the drawing device, a separation unit including a separation device to separate the documents one by one, a separation device drive source driving the separation device, a conveying device conveying the documents, a reading unit including a reading device to read information of the documents, a discharge device discharging the documents, a first document detector provided between a document set position and the separation unit to detect the documents, and a second document detector provided downstream of the separation unit and near a separation position to detect the documents. The first and second document detectors detect the trailing end of each of the documents to control the operation of the drawing device on the basis of the result of the detection.
摘要翻译：文件馈送装置包括能够携带文件的携带单元，绘图和提供文件的绘图装置，驱动绘图装置的绘图装置驱动源，包括分离装置的分离单元，用于逐个分离文件;分离装置驱动分离装置的驱动源，传送文件的传送装置，读取单元，包括读取文件信息的读取装置，放出文件的放电装置，设置在原稿设置位置和分离单元之间的第一文件检测器，检测文档，以及第二文档检测器，其设置在分离单元的下游并且靠近分离位置以检测文档。第一和第二文档检测器检测每个文档的后端，以根据检测结果控制绘图装置的操作。

9. 发明申请

US20110155905A1 SPECIMEN OBSERVATION METHOD AND DEVICE, AND INSPECTION METHOD AND DEVICE USING THE METHOD AND DEVICE 有权
标题翻译：标本观察方法和装置，以及使用方法和装置的检查方法和装置
公开(公告)号：US20110155905A1
公开(公告)日：2011-06-30
申请号：US12937145
申请日：2009-04-10
申请人： Masahiro Hatakeyama , Takeshi Murakami , Yoshihiko Naito , Kenji Terao , Norio Kimura , Kenji Watanabe
发明人： Masahiro Hatakeyama , Takeshi Murakami , Yoshihiko Naito , Kenji Terao , Norio Kimura , Kenji Watanabe
IPC分类号： G01N23/225 , G01N23/00
CPC分类号： H01J37/28 , H01J37/22 , H01J37/244 , H01J37/29 , H01J2237/24475 , H01J2237/24585 , H01J2237/24592 , H01J2237/2805 , H01J2237/2806 , H01J2237/2817 , H01L22/12
摘要： A technique capable of improving the ability to observe a specimen using an electron beam in an energy region which has not been conventionally given attention is provided. This specimen observation method comprises: irradiating the specimen with an electron beam; detecting electrons to be observed which have been generated and have obtained information on the specimen by the electron beam irradiation; and generating an image of the specimen from the detected electrons to be observed. The electron beam irradiation comprises irradiating the specimen with the electron beam with a landing energy set in a transition region between a secondary emission electron region in which secondary emission electrons are detected and a mirror electron region in which mirror electrons are detected, thereby causing the secondary emission electrons and the mirror electrons to be mixed as the electrons to be observed. The detection of the electrons to be observed comprises performing the detection in a state where the secondary emission electrons and the mirror electrons are mixed. Observation and inspection can be quickly carried out for a fine foreign material and pattern of 100 nm or less.
摘要翻译：提供了一种技术，其能够提高在未经常被注意的能量区域中使用电子束观察样本的能力。该样本观察方法包括：用电子束照射样本; 检测已经产生的待观察的电子，并通过电子束照射获得关于样品的信息; 以及从所检测的电子产生待观察的样本的图像。电子束照射包括用电子束照射样本，其中在其中检测到二次发射电子的二次发射电子区域和其中检测到反射镜电子的镜电子区域之间的过渡区域中设置的着陆能量，从而使次级发射电子和镜电子作为待观察的电子进行混合。要观察的电子的检测包括在二次发射电子和镜电子混合的状态下进行检测。对于100nm以下的细小异物和图案，可以快速进行观察和检查。

10. 发明授权

US07904123B2 Shield case and MEMS microphone having it 有权
标题翻译：屏蔽盒和MEMS麦克风
公开(公告)号：US07904123B2
公开(公告)日：2011-03-08
申请号：US12160663
申请日：2007-09-13
申请人： Katsuhiro Makihata , Norio Kimura
发明人： Katsuhiro Makihata , Norio Kimura
IPC分类号： H04M1/00 , H04R9/08
CPC分类号： H04R19/005 , B81B7/0077 , B81B2201/0257 , H01L23/552 , H01L2224/48091 , H01L2224/48227 , H01L2924/01004 , H01L2924/01078 , H01L2924/1461 , H01L2924/16152 , H01L2924/16315 , H01L2924/19041 , H01L2924/3025 , H04R19/016 , H04R31/00 , H04R2499/11 , H01L2924/00014 , H01L2924/00
摘要： To provide a shield case and an MEMS microphone having the shield case which can secure on a top plate the minimum distance for adhering with a gasket in a view point of airtightness.The shield case according to the invention is a shield case for shielding an MEMS chip mounted on a board from the outside, which includes a top plate and a plurality of side plates and the thickness of each of the plurality of side plates is larger than that of the top plate. According to this configuration, the area of the top plate can be made larger as compared with a conventional shield case having a uniform thickness. Thus, the area for adhering the gasket to the top plate can be secured without changing the position, size and range etc. of the chucking area from those of the conventional shield case.
摘要翻译：为了提供一种屏蔽壳和具有屏蔽壳的MEMS麦克风，该屏蔽壳可以在气密的视点中固定在顶板上具有用垫片粘附的最小距离。根据本发明的屏蔽盒是用于屏蔽从外部安装在板上的MEMS芯片的屏蔽盒，其包括顶板和多个侧板，并且多个侧板中的每一个的厚度大于的顶板。根据这种构造，与具有均匀厚度的常规屏蔽壳相比，可以使顶板的面积更大。因此，可以在不改变卡盘区域的位置，尺寸和范围等与常规屏蔽壳体的位置，尺寸和范围等的情况下确保将垫圈粘附到顶板的区域。

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