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    • 4. 发明申请
    • ARTICLE HAVING WATER-REPELLENT SURFACE
    • US20090304996A1
    • 2009-12-10
    • US12483347
    • 2009-06-12
    • Noriko KISHIKAWATakashige Yoneda
    • Noriko KISHIKAWATakashige Yoneda
    • B32B3/00B05D1/36
    • C03C17/3411B32B5/16B32B15/16B32B2255/04B32B2255/20B32B2264/102B32B2264/105B32B2307/538B32B2307/73B32B2605/006C03C2217/42C03C2217/475C03C2217/76C03C2217/77C03C2218/11C03C2218/113C08K3/22C08K9/06C09D1/00C09D5/00C09D7/60C09D7/67C09D7/68Y10T428/24355
    • To provide an article having a water-repellent surface, which has excellent water repellency and abrasion resistance.An article having a water-repellent layer comprising the following inner layer and the following surface layer, on a surface of a substrate, and characterized in that the surface of the water-repellent layer has (a) a surface area ratio (S ratio) of from 1.01 to 1.40, (b) an average surface roughness (Ra) of from 3 to 80 nm, (c) a root-mean-square surface roughness (RMS) of from 3 to 90 nm, (d) an absolute value of the difference between the average surface roughness (Ra) and the root-mean-square surface roughness (RMS) of at most 20 nm and (e) a maximum peak-valley difference (P-V) of from 40 to 600 nm: Inner layer: A layer which is formed by sintering a mixture of metal oxide spherical fine particles (A) having a mean primary particle size of from 1 to 60 nm and metal oxide spherical fine particles (B) having a mean primary particle size of from 50 to 300 nm, provided that the difference in the mean primary particle size between the metal oxide spherical fine particles (A) and the metal oxide spherical fine particles (B) is at least 20 nm and the proportion of the metal oxide spherical fine particles (A) to the total of the metal oxide spherical fine particles (A) and the metal oxide spherical fine particles (B) is more than 30 mass % and at most 60 mass %, and which has a thickness of at most 5 times the mean primary particle size of the metal oxide spherical fine particles (B), Surface layer: A layer which comprises hydrophobized metal oxide fine particles (C) whose mean primary particle size is from 1 to 20 nm and a metal oxide binder, provided that the metal oxide binder is made of a binder material containing a metal compound (D) which becomes a metal oxide by a hydrolytic condensation reaction or thermal decomposition, and in which the hydrophobized metal oxide fine particles (C) adhere to the surface of the spherical fine particles present on the upper side of the inner layer.
    • 10. 发明授权
    • Surface-treated substrate and process for its production
    • 表面处理基材及其生产工艺
    • US5786096A
    • 1998-07-28
    • US746482
    • 1996-11-12
    • Takashige YonedaFumiaki GunjiTakeshi Morimoto
    • Takashige YonedaFumiaki GunjiTakeshi Morimoto
    • B05D1/18C03C17/34B05D3/02B32B9/04
    • B82Y30/00B05D1/185B82Y40/00C03C17/3405Y10T428/31612Y10T428/31663
    • A surface-treated substrate which is a substrate having at least two treated surface layers, wherein the first layer constituting the outermost layer among the treated surface layers is a layer formed by treatment with a surface treating agent containing compound B of the formula (B) as an essential component, and the second layer constituting an underlayer in contact with the outermost layer is a layer formed by treatment with a surface treating agent containing compound A of the formula (A) and Si(NCO).sub.4 as essential components: (R.sup.1).sub.a (R.sup.2).sub.b Si(Z).sub.4-a-b (A) (R.sup.3).sub.c (R.sup.4).sub.d Si(NCO).sub.4-c-d (B) wherein R.sup.1 is an organic group, R.sup.2 is a hydrogen atom or an organic group, a is 1, 2 or 3, b is 0, 1 or 2, provided that 1.ltoreq.a+b.ltoreq.3, and Z is an isocyanate group or a hydrolyzable group; and R.sup.3 is an organic group, R.sup.4 is a hydrogen atom or an organic group, c is 1, 2 or 3, and d is 0, 1 or 2, provided that 1.ltoreq.c+d.ltoreq.3.
    • 作为具有至少两个经处理的表面层的基板的表面处理基板,其中,处理表面层中构成最外层的第一层是通过用含有式(B)的化合物B的表面处理剂处理形成的层, 构成与最外层接触的底层的第二层是通过用含有式(A)的化合物A和Si(NCO)4作为必要成分的表面处理剂处理形成的层:(R1 )a(R2)bSi(Z)4-ab(A)(R3)c(R4)dSi(NCO)4-cd(B)其中R1是有机基团,R2是氢原子或有机基团, 是1,2或3,b是0,1或2,条件是1≤a+b≤3,Z是异氰酸酯基或可水解基团; R3为有机基团,R4为氢原子或有机基团,c为1,2或3,d为0,1或2,条件是1≤c+d≤3。