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    • 1. 发明授权
    • Molding composition having a matt surface
    • 具有无光泽表面的成型组合物
    • US5475053A
    • 1995-12-12
    • US259165
    • 1994-06-13
    • Norbert NiessnerFriedrich SeitzWolfgang FischerNorbert GuentherbergKarl RuppmichRainer MoorsRobert Weiss
    • Norbert NiessnerFriedrich SeitzWolfgang FischerNorbert GuentherbergKarl RuppmichRainer MoorsRobert Weiss
    • C08L51/00C08L51/04C08L51/06C08L55/02C08L101/00
    • C08L101/00C08L51/04C08L55/02C08L2555/40
    • A molding composition based on an impact-modified thermoplastic A selected from ABS, ASA, impact-resistant polystyrene (HIPS) impact resistant polymethyl methacrylate, impact resistant PVC, polycarbonate, polyester carbonate, polyester, polyamide, polyphenylene ether, polyether ketone, polyether sulfone, polysulfone, polyoxyalkylene, polyarylene sulfide and also mixtures thereof containing a matting agent B composed of 30 to 80% by weight of an elastomeric grafting base B1 of 75 to 99.8% by weight of an alkyl acrylate having 1 to 8 carbon atoms in the alkyl radical (B11), 0.1 to 5% by weight of a polyfunctional, crosslinking monomer (B12) and 0.1 to 20% by weight of a monomer containing one or more acidic groups, or 49.9 to 99.9% by weight of one or more dienes (B111), up to 50% by weight of a further ethylenically unsaturated monomer (B112) and 0.1 to 20% by weight of a monomer containing one or more acidic groups (B113), and 20 to 70% by weight of a graft sheath B2 composed of 40 to 99.9% by weight of an aromatic vinyl monomer (B21), up to 49.9% by weight of a polar, copolymerizable, ethylenically unsaturated monomer (B22) and 0.1 to 20% by weight of a monomer containing one or more basic groups (B23), and also a molding composition whose constituents B13 and B113 and B23 are interchanged.
    • 基于抗冲击改性热塑性塑料A的成型组合物,其选自ABS,ASA,耐冲击聚苯乙烯(HIPS)耐冲击聚甲基丙烯酸甲酯,耐冲击PVC,聚碳酸酯,聚酯碳酸酯,聚酯,聚酰胺,聚苯醚,聚醚酮,聚醚砜 ,聚砜,聚氧化烯,聚芳硫醚以及它们的混合物,其含有消光剂B,其由30至80重量%的弹性体接枝基料B1为75至99.8重量%的烷基中具有1至8个碳原子的丙烯酸烷基酯 (B11),0.1〜5重量%的多官能交联单体(B12)和0.1〜20重量%的含有一个或多个酸性基团的单体,或49.9-99.9重量%的一种或多种二烯( B111),至多50重量%的另外的烯属不饱和单体(B112)和0.1〜20重量%的含有一个或多个酸性基团(B113)的单体和20〜70重量%的接枝鞘B2 由40组成 99.9重量%的芳族乙烯基单体(B21),最多49.9重量%的极性,可共聚的烯属不饱和单体(B22)和0.1-20重量%的含有一个或多个碱性基团(B23)的单体, ,以及其组分B13和B113和B23互换的成型组合物。
    • 9. 发明授权
    • Device for the simultaneous double-side grinding of a workpiece in wafer form
    • 用于以晶圆形式同时双面研磨工件的装置
    • US06997779B2
    • 2006-02-14
    • US11070297
    • 2005-03-02
    • Joachim JungeRobert Weiss
    • Joachim JungeRobert Weiss
    • B24B7/00
    • B24B37/08B24B41/061B24B49/08H01L21/02013
    • A device for the simultaneous double-side grinding of workpiece wafers has two collinear grinding wheels and two hydropads oppositely positioned for hydrostatic bearing of the workpiece, each having at least one hydrostatic bearing and at least one dynamic pressure tube for measuring the spacing between the workpiece and the hydrdopads. The surfaces of the hydropads which face the workpiece are of nonplanar configuration, contoured in such a manner that the spacing between the surface and the workpiece adopts a minimum value near the edge of the hydropads proximate the grinding wheels, this spacing increasing at increasing distance from the grinding wheels. In a further embodiment, at least one bore, through which liquid and abraded material can be discharged from the vicinity of the dynamic pressure tube, is proximate each dynamic pressure tube.
    • 用于同时双面研磨工件晶片的装置具有两个共线研磨轮和两个相对定位用于工件的静压轴承的水平面,每个具有至少一个静压轴承和用于测量工件之间的间隔的至少一个动压力管 和氢键。 面向工件的水力平台的表面是非平面构造,其轮廓是这样的,使得表面和工件之间的间距在靠近研磨轮的靠近水槽的边缘处采取最小值, 磨轮。 在另一实施例中,液体和磨损材料可以从动压管附近排出的至少一个孔靠近每个动压管。
    • 10. 发明申请
    • Device for the simultaneous double-side grinding of a workpiece in wafer form
    • 用于以晶圆形式同时双面研磨工件的装置
    • US20050202757A1
    • 2005-09-15
    • US11070297
    • 2005-03-02
    • Joachim JungeRobert Weiss
    • Joachim JungeRobert Weiss
    • B24B7/17B24B41/00B24B41/047B24B49/00H01L21/304
    • B24B37/08B24B41/061B24B49/08H01L21/02013
    • A device for the simultaneous double-side grinding of workpiece wafers has two collinear grinding wheels and two hydropads oppositely positioned for hydrostatic bearing of the workpiece, each having at least one hydrostatic bearing and at least one dynamic pressure tube for measuring the spacing between the workpiece and the hydrdopads. The surfaces of the hydropads which face the workpiece are of nonplanar configuration, contoured in such a manner that the spacing between the surface and the workpiece adopts a minimum value near the edge of the hydropads proximate the grinding wheels, this spacing increasing at increasing distance from the grinding wheels. In a further embodiment, at least one bore, through which liquid and abraded material can be discharged from the vicinity of the dynamic pressure tube, is proximate each dynamic pressure tube.
    • 用于同时双面研磨工件晶片的装置具有两个共线研磨轮和两个相对定位用于工件的静压轴承的水平面,每个具有至少一个静压轴承和用于测量工件之间的间隔的至少一个动压力管 和氢键。 面向工件的水力平台的表面是非平面构造,其轮廓是这样的,使得表面和工件之间的间距在靠近研磨轮的靠近水槽的边缘处采取最小值, 磨轮。 在另一实施例中,液体和磨损材料可以从动压管附近排出的至少一个孔靠近每个动压管。