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1. 发明授权

US5684642A Optical transmission system and light radiating method 失效
标题翻译：光传输系统和光辐射方法
公开(公告)号：US5684642A
公开(公告)日：1997-11-04
申请号：US331367
申请日：1994-10-27
申请人： Nobuyuki Zumoto , Teruo Miyamoto , Toshinori Yagi , Masaaki Tanaka
发明人： Nobuyuki Zumoto , Teruo Miyamoto , Toshinori Yagi , Masaaki Tanaka
IPC分类号： B23K26/04 , B23K26/06 , B23K26/073 , B23K26/08 , G02B6/26 , G02B6/42 , G02B26/08 , G03F7/20 , G02B9/00
CPC分类号： B23K26/0608 , B23K26/032 , B23K26/06 , B23K26/0604 , B23K26/064 , B23K26/0643 , B23K26/0648 , B23K26/0652 , B23K26/066 , B23K26/0665 , G02B26/0816 , G02B26/0875 , G02B6/262 , G02B6/4206 , G02B6/4296 , G03F7/2006
摘要： An optical transmission system permitting any desired machining to be done by radiating to an object to be irradiated a laser beam having an optimum intensity distribution in the direction of its optical axis or in a plane perpendicular to the optical axis, comprising a laser oscillator 1, an optical fiber 3 for propagating the laser beam emitted from the laser oscillator 1 by a predetermined distance, a condenser lens 2 for converging the laser beam from the laser oscillator 1 into the optical fiber 3, a first lens 6 for forming images with aberration from the laser beam emerging from the optical fiber 3, a mask 7 disposed in a position having a predetermined light intensity distribution out of the positions of the images formed by the first lens 6, and a second lens 4 for forming the image passing through the mask 7 onto an object 5 to be irradiated.
摘要翻译：一种光传输系统，其允许通过向被照射的物体照射具有在其光轴方向上的最佳强度分布或垂直于光轴的平面中的激光束来进行所需的加工，包括激光振荡器1，用于将从激光振荡器1发射的激光束传播预定距离的光纤3，用于将来自激光振荡器1的激光束会聚到光纤3中的聚光透镜2，用于形成具有像差的图像的第一透镜6 从光纤3出射的激光束，设置在由第一透镜6形成的图像的位置之外具有预定的光强度分布的位置的掩模7和用于形成通过掩模的图像的第二透镜4 7到待照射的物体5上。

2. 发明授权

US5355194A Optical processing apparatus 失效
标题翻译：光学加工设备
公开(公告)号：US5355194A
公开(公告)日：1994-10-11
申请号：US888782
申请日：1992-05-27
申请人： Nobuyuki Zumoto , Toshinori Yagi , Yasuhito Myoi , Teruo Miyamoto , Masaaki Tanaka , Masao Izumo
发明人： Nobuyuki Zumoto , Toshinori Yagi , Yasuhito Myoi , Teruo Miyamoto , Masaaki Tanaka , Masao Izumo
IPC分类号： B23K26/00 , B23K26/06 , B23K26/38 , G03F1/00 , G03F1/68 , G03F7/20 , H01S3/101 , H05K3/00 , G02B17/00
CPC分类号： G03F7/2008 , B23K26/066 , H05K3/0017
摘要： An optical processing apparatus utilizing multiple reflections of a light beam between a mask and a reflector has improved uniformity in the distribution of the light beam over a surface of the mask. In one form, the reflector is disposed in a face-to-face relation with respect to the mask with an angle of inclination relative thereto. In another form, the reflector has a flat or curved taper surface for decreasing an angle of reflection of the light beam at the mask surface at an initial stage, and a flat surface disposed in parallel with the mask surface. In a further form, the reflector is curved in a direction of transmission of the light beam. In a yet further form, an angle of incidence of the light beam is properly adjusted such that a portion of the light beam, which is first reflected from the mask and escapes outwardly from the reflector, is minimized.
摘要翻译：在掩模和反射器之间利用光束的多次反射的光学处理装置改善了光束在掩模表面上的分布的均匀性。在一种形式中，反射器相对于掩模以相对于掩模的倾斜角度的面对面关系设置。在另一种形式中，反射器具有平坦或弯曲的锥形表面，用于在初始阶段减小光掩模在掩模表面处的反射角度，以及与掩模表面平行设置的平坦表面。在另一形式中，反射器在光束的透射方向上弯曲。在另一种形式中，光束的入射角被适当调节，使得首先从掩模反射并从反射器向外逸出的光束的一部分被最小化。

3. 发明授权

US5223693A Optical machining apparatus 失效
标题翻译：光学加工设备
公开(公告)号：US5223693A
公开(公告)日：1993-06-29
申请号：US659691
申请日：1991-02-25
申请人： Nobuyuki Zumoto , Toshinori Yagi , Yasuhito Myoi , Yoshie Uchiyama , Masaaki Tanaka , Teruo Miyamoto , Masao Izumo
发明人： Nobuyuki Zumoto , Toshinori Yagi , Yasuhito Myoi , Yoshie Uchiyama , Masaaki Tanaka , Teruo Miyamoto , Masao Izumo
IPC分类号： B23K26/06 , G03F1/00 , G03F7/20 , H05K3/00
CPC分类号： G03F7/70283 , B23K26/066 , G03F7/2006 , G03F7/70058 , G03F7/70075 , G03F7/702 , H05K3/0017
摘要： An optical machining apparatus for irradiating light from a light source onto a source to be machined to form a grooves in the surface. The apparatus uses a mask disposed in the path of light from the light source. The mask includes reflective parts for reflecting the light from the light source. The reflective parts are on a first surface of the mask. The mask also includes a reflection member for returning the light reflected at the reflective parts of the mask toward the mask.
摘要翻译：一种用于将来自光源的光照射到要加工的源上以在表面中形成凹槽的光学加工设备。该设备使用设置在来自光源的光的路径中的掩模。掩模包括用于反射来自光源的光的反射部分。反射部分位于掩模的第一表面上。掩模还包括用于将在掩模的反射部分反射的光返回到掩模的反射构件。

4. 发明授权

US5310986A Laser machining apparatus 失效
标题翻译：激光加工设备
公开(公告)号：US5310986A
公开(公告)日：1994-05-10
申请号：US52897
申请日：1993-04-26
申请人： Nobuyuki Zumoto , Toshinori Yagi , Masao Izumo , Masaaki Tanaka
发明人： Nobuyuki Zumoto , Toshinori Yagi , Masao Izumo , Masaaki Tanaka
IPC分类号： B23K26/06 , H01L21/00 , H05K3/00 , B23K26/00
CPC分类号： H05K3/0026 , B23K26/066 , H01L21/67092 , H05K2203/056
摘要： A laser machining apparatus comprises a mask, a reflecting mirror and an imaging optical system. The laser light reflected by the mask and also by the reflecting mirror passes through the mask and images on the work for machining the work. The laser machining apparatus comprises means for causing said mask to move in parallel with said work for machining the work. This laser machining apparatus is able to machine a work having a large surface using small apertured mask. Another type of laser machining apparatus comprises a mask and a platform and an imaging optical system. The mask and the work are puts in the same plane of the platform and driven so that the image of the mask is mapped on the work via the imaging optical system. The laser machining apparatus is able to machine a large area at low price and high accuracy.
摘要翻译：激光加工装置包括掩模，反射镜和成像光学系统。由掩模和反射镜反射的激光通过掩模和工件上的图像进行加工。激光加工设备包括用于使所述面罩与所述工件并行移动以便加工工件的装置。该激光加工装置能够使用小孔径掩模加工具有大表面的工件。另一种类型的激光加工设备包括掩模和平台以及成像光学系统。掩模和工作放在平台的同一平面上并被驱动，使得掩模的图像经由成像光学系统映射到工件上。激光加工设备能够以低价格和高精度加工大面积。

5. 发明授权

US5811754A Optical processing method and apparatus for carrying out the same 失效
公开(公告)号：US5811754A
公开(公告)日：1998-09-22
申请号：US444871
申请日：1995-05-19
申请人： Hajime Nakatani , Atsushi Sugitatsu , Masao Izumo , Tadao Minagawa , Yasushi Minamitani , Yoshifumi Matsushita , Toshinori Yagi , Nobuyuki Zumoto
发明人： Hajime Nakatani , Atsushi Sugitatsu , Masao Izumo , Tadao Minagawa , Yasushi Minamitani , Yoshifumi Matsushita , Toshinori Yagi , Nobuyuki Zumoto
IPC分类号： H05K3/00 , H05K3/46 , B23K26/02
CPC分类号： B23K26/046 , B23K26/04 , B23K26/043 , B23K26/048 , B23K26/066 , H05K3/0026 , H05K2203/056
摘要： An optical processing apparatus for processing optically a workpiece (7) by using a light beam (B). The apparatus is capable of automatically adjusting a imaging magnification to a predetermined value and at the same time maintaining constant a imaging magnification regardless of exchange of masks (3; 100) and workpieces (7) and for ensuring an extended use life of a mask with satisfactory mask function. The apparatus includes a light source system (1) for generating a light beam (B) for illuminating a mask (3; 100) having a predetermined pattern, a imaging lens (5) for copying a pattern image of the mask (3; 100) onto a workpiece (7), a mask moving mechanism (4) for moving the mask in a direction perpendicular to an optical axis (L) of the imaging lens (5), a workpiece moving mechanism for moving the workpiece in a direction perpendicular to the optical axis (L) of the imaging lens (5), a imaging magnification changing mechanism for changing inter-mask/lens/workpiece distance between the mask, the imaging lens and the workpiece, and a central control unit (9) which is comprised of an actual imaging magnification arithmetic module (91) for determining an actual imaging magnification value (M') in terms of a ratio between the copied pattern image and a predetermined pattern, a magnification decision module (92) for making decision whether or not a difference between the actual imaging magnification value and a desired imaging magnification value is smaller than a permissible value, an optical-axis displacement control module (93) responsive to indication that the difference exceeds a permissible value (.delta.) to thereby arithmetically determine on the basis of the actual and desired imaging magnification values the inter-mask/lens/workpiece distance at which the actual imaging magnification value (M') becomes equal to the desired imaging magnification value (M) for controlling thereby the imaging magnification changing mechanism so that the inter-mask/lens/workpiece distance coincides with the arithmetically determined distance, and a displacement control module for controlling the mask moving mechanism and the workpiece moving mechanism.

6. 发明授权

US5785824A Method of and apparatus for producing ozone 失效
标题翻译：产生臭氧的方法和设备
公开(公告)号：US5785824A
公开(公告)日：1998-07-28
申请号：US712845
申请日：1996-09-12
申请人： Jiro Kitayama , Toshinori Yagi , Masaaki Tanaka , Norikazu Tabata
发明人： Jiro Kitayama , Toshinori Yagi , Masaaki Tanaka , Norikazu Tabata
IPC分类号： B01F3/02 , B01F5/04 , B01F13/10 , B01J19/08 , B01J19/26 , C01B13/10 , C01B13/11
CPC分类号： B01J19/088 , B01F13/1013 , B01F13/1016 , B01F3/02 , B01F5/0413 , B01F5/0453 , B01J19/26 , C01B13/10 , C01B13/11 , B01J2219/00105 , B01J2219/00126 , B01J2219/00132 , B01J2219/00162 , B01J2219/00164
摘要： An ozone producing apparatus including: an oxygen atom producing portion (6) for dissociating a supplied oxygen gas at a low pressure not more than atmospheric pressure so as to produce a first gas containing oxygen atoms; an ozone producing portion (a throat 3 and a diffuser 4) for mixing the first gas containing oxygen atoms supplied from the oxygen atom producing portion with a second gas containing oxygen, and allowing the first and second gases to react with each other for producing ozone; and a low pressure feeding (2, 9) means for reducing a pressure in the oxygen atom producing portion (6) at a specified low value not more than atmospheric pressure, and feeding the first gas to the ozone producing portion in a pressure reduction state.
摘要翻译：一种臭氧产生装置，包括：氧原子产生部分（6），用于在低于大气压的低压下解离所提供的氧气，以产生含有氧原子的第一气体; 臭氧产生部分（喉部3和扩散器4），用于将从氧原子产生部分供应的含氧原子的第一气体与含有氧的第二气体混合，并使第一和第二气体彼此反应以产生臭氧 ; 和低压供给装置（2,9），用于以不大于大气压的规定的低值将所述氧原子产生部分（6）的压力降低，以及将所述第一气体以减压状态供给到所述臭氧产生部分。

7. 发明授权

US07896392B2 Airbag deployment controller and passenger protection device including the same 有权
标题翻译：安全气囊部署控制器和乘客保护装置包括相同
公开(公告)号：US07896392B2
公开(公告)日：2011-03-01
申请号：US12318103
申请日：2008-12-22
申请人： Tohru Oowada , Mineyuki Ooishi , Ryuichi Asada , Tetsuya Ozawa , Toshinori Yagi
发明人： Tohru Oowada , Mineyuki Ooishi , Ryuichi Asada , Tetsuya Ozawa , Toshinori Yagi
IPC分类号： B60R21/16
CPC分类号： B60R21/0132 , B60R21/0136 , B60R2021/01027 , B60R2021/0117 , B60R2021/01184 , B60R2021/01322
摘要： An airbag deployment controller and a passenger protection device including the same are provided to prevent erroneous (false) operation of an airbag due to noises and quickly deploy the airbag. The passenger protection device determines whether or not to drive an airbag unit, upon determining a detected value of a front acceleration sensor as being over a first collision threshold. Then, when determining to drive the airbag unit, the passenger protection device determines whether or not a detected value of a central acceleration sensor exceeds a second collision threshold. With the detected value being over the second threshold, it generates a driving signal and outputs it to the airbag unit in a final deployment control process. Thereby, the airbag unit operates an inflator to drive an airbag.
摘要翻译：提供一种安全气囊展开控制器和包括该气囊展开控制装置的乘客保护装置，以防止由于噪音而导致的气囊的错误（错误）操作并且迅速展开气囊。当确定前加速度传感器的检测值超过第一碰撞阈值时，乘客保护装置确定是否驱动安全气囊单元。然后，当确定驾驶安全气囊单元时，乘客保护装置确定中央加速度传感器的检测值是否超过第二碰撞阈值。在检测值超过第二阈值的情况下，它产生一个驱动信号，并在最终部署控制过程中将其输出到安全气囊单元。由此，气囊单元操作充气机来驱动气囊。

8. 发明申请

US20090167005A1 Airbag deployment controller and passenger protection device including the same 有权
标题翻译：安全气囊部署控制器和乘客保护装置包括相同
公开(公告)号：US20090167005A1
公开(公告)日：2009-07-02
申请号：US12318103
申请日：2008-12-22
申请人： Tohru Oowada , Mineyuki Ooishi , Ryuichi Asada , Tetsuya Ozawa , Toshinori Yagi
发明人： Tohru Oowada , Mineyuki Ooishi , Ryuichi Asada , Tetsuya Ozawa , Toshinori Yagi
IPC分类号： B60R21/16
CPC分类号： B60R21/0132 , B60R21/0136 , B60R2021/01027 , B60R2021/0117 , B60R2021/01184 , B60R2021/01322
摘要： An airbag deployment controller and a passenger protection device including the same are provided to prevent erroneous operation of an airbag due to noises and quickly deploy the airbag. The passenger protection device determines whether or not to drive an airbag unit, upon determining a detected value of a front acceleration sensor as being over a first collision threshold. Then, when determining to drive the airbag unit, the passenger protection device determines whether or not a detected value of a central acceleration sensor exceeds a second collision threshold. With the detected value being over the second threshold, it generates a driving signal and outputs it to the airbag unit in a final deployment control process. Thereby, the airbag unit operates an inflator to drive an airbag.
摘要翻译：提供一种安全气囊展开控制器和包括该气囊展开控制器的乘客保护装置，以防止气囊由于噪音而错误地操作，并迅速展开气囊。当确定前加速度传感器的检测值超过第一碰撞阈值时，乘客保护装置确定是否驱动安全气囊单元。然后，当确定驾驶安全气囊单元时，乘客保护装置确定中央加速度传感器的检测值是否超过第二碰撞阈值。在检测值超过第二阈值的情况下，它产生一个驱动信号，并在最终部署控制过程中将其输出到安全气囊单元。由此，气囊单元操作充气机来驱动气囊。

9. 发明授权

US07478699B2 Vehicle passenger detecting device 失效
标题翻译：车辆检测装置
公开(公告)号：US07478699B2
公开(公告)日：2009-01-20
申请号：US11347365
申请日：2006-02-06
申请人： Masatoshi Kobayashi , Takahiro Kawakami , Toshinori Yagi
发明人： Masatoshi Kobayashi , Takahiro Kawakami , Toshinori Yagi
IPC分类号： B60R21/015
CPC分类号： B60R21/01516
摘要： A vehicle passenger detecting device includes a judging circuit (6), which judges whether a passenger seated on a seat (1) is a child or not based on a load acting on each of areas of a seat portion (1a) of the seat for a vehicle, and the judging circuit (6), with a fastened sate of a seat belt (5a), judges whether or not a total load acting on the entire area of the seat portion is within a predetermined range, and when the total load is within the predetermined range, if a front outer load acting on a front outer area is a first threshold or more and the ratio of the front outer load to a front inner load acting on a front inner area is a second threshold or more, or the ratio of both outer loads acting on both of outer areas to both inner loads acting on both of inner areas is a third threshold or more, the judging circuit judges (6) that a seated passenger is a child.
摘要翻译：车辆乘客检测装置包括判断电路（6），其判断坐在座椅（1）上的乘客是否基于作用在座椅的座位部分（1a）的每个区域上的负载，用于车辆和具有安全带（5a）的紧固状态的判断电路（6）判断作用在座椅部分的整个区域上的总负载是否在预定范围内，并且当总负载如果作用在前外侧区域上的前外侧负载为第一阈值以上，前外侧负载与作为前侧内侧区域的前方内侧负载的比例为第二阈值以上，则作用于两个外部区域的两个外部载荷与作用在两个内部区域上的两个内部负载的两个外部载荷的比率是第三阈值以上，判断电路判断（6）坐着的乘客是小孩。

10. 发明授权

US5661744A Excimer laser beam irradiation apparatus for optically processing workpiece 失效
标题翻译：用于光学处理工件的准分子激光束照射装置
公开(公告)号：US5661744A
公开(公告)日：1997-08-26
申请号：US512710
申请日：1995-08-08
申请人： Kazuyuki Murakami , Hajime Nakatani , Atsushi Sugitatsu , Tadao Minagawa , Toshinori Yagi , Keiko Ito
发明人： Kazuyuki Murakami , Hajime Nakatani , Atsushi Sugitatsu , Tadao Minagawa , Toshinori Yagi , Keiko Ito
IPC分类号： B23K26/38 , H05K3/00 , H05K3/46 , H01S3/22 , H01S3/223
CPC分类号： B23K26/083 , B23K26/066
摘要： An excimer laser beam irradiation apparatus capable of processing a workpiece optimally with an excimer irradiation beam even when intensity distribution of the excimer laser beam undergone multiple reflections is non-uniform. A patterning mask has light-transmissive portions for allowing the excimer laser beam to pass through and a reflecting layer for reflecting it. A high reflectivity mirror disposed in opposition to the reflecting layer reflects the excimer laser beam reflected from the reflecting layer toward the patterning mask. An imaging lens images a pattern of the excimer laser beam transmitted through the patterning mask onto a workpiece for irradiation thereof. A workpiece moving mechanism and a mask moving mechanism move the workpiece and the mask moving mechanism, respectively. A control unit controls the workpiece moving mechanism and the mask moving mechanism such that the patterning mask and the workpiece are displaced along a same axis synchronously with each other in a scan moving direction which coincides with a direction in which the excimer laser beam shifts positionally while being reflected between the patterning mask and the reflecting means, for thereby allowing the workpiece to be scanned with the excimer laser beam. The workpiece can be processed uniformly and stably in accordance with a pattern of the patterning mask with high accuracy and reliability.
摘要翻译：即使准分子激光束的强度分布发生多次反射也能够用准分子照射光束最佳地处理工件的准分子激光束照射装置是不均匀的。图形掩模具有用于允许准分子激光束通过的透光部分和用于反射它的反射层。与反射层相对设置的高反射率反射镜将从反射层反射的准分子激光束朝向图案掩模反射。成像透镜将通过图案化掩模透射的准分子激光束的图案成像到工件上以进行照射。工件移动机构和掩模移动机构分别移动工件和掩模移动机构。控制单元控制工件移动机构和掩模移动机构，使得图案掩模和工件沿着与准分子激光束在位置上移动的方向一致的扫描移动方向沿同一轴线同步地移位，同时在图案掩模和反射装置之间被反射，从而允许用准分子激光束扫描工件。可以以高精度和可靠性根据图案化掩模的图案均匀且稳定地加工工件。

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