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1. 发明授权

US5310986A Laser machining apparatus 失效
标题翻译：激光加工设备
公开(公告)号：US5310986A
公开(公告)日：1994-05-10
申请号：US52897
申请日：1993-04-26
申请人： Nobuyuki Zumoto , Toshinori Yagi , Masao Izumo , Masaaki Tanaka
发明人： Nobuyuki Zumoto , Toshinori Yagi , Masao Izumo , Masaaki Tanaka
IPC分类号： B23K26/06 , H01L21/00 , H05K3/00 , B23K26/00
CPC分类号： H05K3/0026 , B23K26/066 , H01L21/67092 , H05K2203/056
摘要： A laser machining apparatus comprises a mask, a reflecting mirror and an imaging optical system. The laser light reflected by the mask and also by the reflecting mirror passes through the mask and images on the work for machining the work. The laser machining apparatus comprises means for causing said mask to move in parallel with said work for machining the work. This laser machining apparatus is able to machine a work having a large surface using small apertured mask. Another type of laser machining apparatus comprises a mask and a platform and an imaging optical system. The mask and the work are puts in the same plane of the platform and driven so that the image of the mask is mapped on the work via the imaging optical system. The laser machining apparatus is able to machine a large area at low price and high accuracy.
摘要翻译：激光加工装置包括掩模，反射镜和成像光学系统。由掩模和反射镜反射的激光通过掩模和工件上的图像进行加工。激光加工设备包括用于使所述面罩与所述工件并行移动以便加工工件的装置。该激光加工装置能够使用小孔径掩模加工具有大表面的工件。另一种类型的激光加工设备包括掩模和平台以及成像光学系统。掩模和工作放在平台的同一平面上并被驱动，使得掩模的图像经由成像光学系统映射到工件上。激光加工设备能够以低价格和高精度加工大面积。

2. 发明授权

US5355194A Optical processing apparatus 失效
标题翻译：光学加工设备
公开(公告)号：US5355194A
公开(公告)日：1994-10-11
申请号：US888782
申请日：1992-05-27
申请人： Nobuyuki Zumoto , Toshinori Yagi , Yasuhito Myoi , Teruo Miyamoto , Masaaki Tanaka , Masao Izumo
发明人： Nobuyuki Zumoto , Toshinori Yagi , Yasuhito Myoi , Teruo Miyamoto , Masaaki Tanaka , Masao Izumo
IPC分类号： B23K26/00 , B23K26/06 , B23K26/38 , G03F1/00 , G03F1/68 , G03F7/20 , H01S3/101 , H05K3/00 , G02B17/00
CPC分类号： G03F7/2008 , B23K26/066 , H05K3/0017
摘要： An optical processing apparatus utilizing multiple reflections of a light beam between a mask and a reflector has improved uniformity in the distribution of the light beam over a surface of the mask. In one form, the reflector is disposed in a face-to-face relation with respect to the mask with an angle of inclination relative thereto. In another form, the reflector has a flat or curved taper surface for decreasing an angle of reflection of the light beam at the mask surface at an initial stage, and a flat surface disposed in parallel with the mask surface. In a further form, the reflector is curved in a direction of transmission of the light beam. In a yet further form, an angle of incidence of the light beam is properly adjusted such that a portion of the light beam, which is first reflected from the mask and escapes outwardly from the reflector, is minimized.
摘要翻译：在掩模和反射器之间利用光束的多次反射的光学处理装置改善了光束在掩模表面上的分布的均匀性。在一种形式中，反射器相对于掩模以相对于掩模的倾斜角度的面对面关系设置。在另一种形式中，反射器具有平坦或弯曲的锥形表面，用于在初始阶段减小光掩模在掩模表面处的反射角度，以及与掩模表面平行设置的平坦表面。在另一形式中，反射器在光束的透射方向上弯曲。在另一种形式中，光束的入射角被适当调节，使得首先从掩模反射并从反射器向外逸出的光束的一部分被最小化。

3. 发明授权

US5223693A Optical machining apparatus 失效
标题翻译：光学加工设备
公开(公告)号：US5223693A
公开(公告)日：1993-06-29
申请号：US659691
申请日：1991-02-25
申请人： Nobuyuki Zumoto , Toshinori Yagi , Yasuhito Myoi , Yoshie Uchiyama , Masaaki Tanaka , Teruo Miyamoto , Masao Izumo
发明人： Nobuyuki Zumoto , Toshinori Yagi , Yasuhito Myoi , Yoshie Uchiyama , Masaaki Tanaka , Teruo Miyamoto , Masao Izumo
IPC分类号： B23K26/06 , G03F1/00 , G03F7/20 , H05K3/00
CPC分类号： G03F7/70283 , B23K26/066 , G03F7/2006 , G03F7/70058 , G03F7/70075 , G03F7/702 , H05K3/0017
摘要： An optical machining apparatus for irradiating light from a light source onto a source to be machined to form a grooves in the surface. The apparatus uses a mask disposed in the path of light from the light source. The mask includes reflective parts for reflecting the light from the light source. The reflective parts are on a first surface of the mask. The mask also includes a reflection member for returning the light reflected at the reflective parts of the mask toward the mask.
摘要翻译：一种用于将来自光源的光照射到要加工的源上以在表面中形成凹槽的光学加工设备。该设备使用设置在来自光源的光的路径中的掩模。掩模包括用于反射来自光源的光的反射部分。反射部分位于掩模的第一表面上。掩模还包括用于将在掩模的反射部分反射的光返回到掩模的反射构件。

4. 发明授权

US5811754A Optical processing method and apparatus for carrying out the same 失效
公开(公告)号：US5811754A
公开(公告)日：1998-09-22
申请号：US444871
申请日：1995-05-19
申请人： Hajime Nakatani , Atsushi Sugitatsu , Masao Izumo , Tadao Minagawa , Yasushi Minamitani , Yoshifumi Matsushita , Toshinori Yagi , Nobuyuki Zumoto
发明人： Hajime Nakatani , Atsushi Sugitatsu , Masao Izumo , Tadao Minagawa , Yasushi Minamitani , Yoshifumi Matsushita , Toshinori Yagi , Nobuyuki Zumoto
IPC分类号： H05K3/00 , H05K3/46 , B23K26/02
CPC分类号： B23K26/046 , B23K26/04 , B23K26/043 , B23K26/048 , B23K26/066 , H05K3/0026 , H05K2203/056
摘要： An optical processing apparatus for processing optically a workpiece (7) by using a light beam (B). The apparatus is capable of automatically adjusting a imaging magnification to a predetermined value and at the same time maintaining constant a imaging magnification regardless of exchange of masks (3; 100) and workpieces (7) and for ensuring an extended use life of a mask with satisfactory mask function. The apparatus includes a light source system (1) for generating a light beam (B) for illuminating a mask (3; 100) having a predetermined pattern, a imaging lens (5) for copying a pattern image of the mask (3; 100) onto a workpiece (7), a mask moving mechanism (4) for moving the mask in a direction perpendicular to an optical axis (L) of the imaging lens (5), a workpiece moving mechanism for moving the workpiece in a direction perpendicular to the optical axis (L) of the imaging lens (5), a imaging magnification changing mechanism for changing inter-mask/lens/workpiece distance between the mask, the imaging lens and the workpiece, and a central control unit (9) which is comprised of an actual imaging magnification arithmetic module (91) for determining an actual imaging magnification value (M') in terms of a ratio between the copied pattern image and a predetermined pattern, a magnification decision module (92) for making decision whether or not a difference between the actual imaging magnification value and a desired imaging magnification value is smaller than a permissible value, an optical-axis displacement control module (93) responsive to indication that the difference exceeds a permissible value (.delta.) to thereby arithmetically determine on the basis of the actual and desired imaging magnification values the inter-mask/lens/workpiece distance at which the actual imaging magnification value (M') becomes equal to the desired imaging magnification value (M) for controlling thereby the imaging magnification changing mechanism so that the inter-mask/lens/workpiece distance coincides with the arithmetically determined distance, and a displacement control module for controlling the mask moving mechanism and the workpiece moving mechanism.

5. 发明申请

US20100272932A1 DECORATIVE COMPONENT 审中-公开
标题翻译：装饰组件
公开(公告)号：US20100272932A1
公开(公告)日：2010-10-28
申请号：US12747301
申请日：2008-03-07
申请人： Masao Izumo , Masaru Imaizumi , Mizuki Ogawa , Hiroshi Onishi
发明人： Masao Izumo , Masaru Imaizumi , Mizuki Ogawa , Hiroshi Onishi
IPC分类号： B32B1/02 , B32B5/00 , B32B3/26
CPC分类号： C23C28/00 , C23C28/04 , C23C30/00 , H01Q1/526 , Y10T428/13 , Y10T428/24999 , Y10T428/265
摘要： In a conventional decorative component, a conductive material is formed on the entire surface of an insulation part so that the decoration part looks in metallic color. However, an electric current flows through the inside of the conductive material, and hence electromagnetic waves applied to the decoration part suffers a loss. This poses a problem that sufficient antenna characteristics cannot be obtained. On the member surface, a semiconductor layer or a semi-metal layer with a film thickness of 5 nm or more, and a mean transmittance of 65% or less and a mean reflectance of 20% or more at 400 nm to 800 nm is formed. This can implement a decorative component exhibiting a sufficient metallic luster without blocking the electromagnetic waves.
摘要翻译：在传统的装饰部件中，在绝缘部件的整个表面上形成导电材料，使得装饰部件看起来呈金属色。然而，电流流过导电材料的内部，因此施加到装饰部件的电磁波遭受损失。这导致不能获得足够的天线特性的问题。在构件表面上，形成膜厚度为5nm以上，半导体层或半金属层，其厚度为500nm以上，平均透射率为65％以下，平均反射率为20％以上。。这可以实现具有足够的金属光泽而不阻挡电磁波的装饰组分。

6. 发明授权

US5128020A Gas detector 失效
标题翻译：气体探测器
公开(公告)号：US5128020A
公开(公告)日：1992-07-07
申请号：US664429
申请日：1991-03-04
申请人： Shiro Yamauchi , Masao Izumo , Shoji Tada
发明人： Shiro Yamauchi , Masao Izumo , Shoji Tada
IPC分类号： G01N27/406 , G01N27/416 , H01H33/56
CPC分类号： H01H33/56 , H01H2033/567
摘要： A gas detector for detecting the decomposed SF.sub.6 gas produced by discharge in gas-insulated equipment. The gas detector operates as a cell generating voltage in proportion to the amount of the decomposed SF.sub.6 gas wherein the voltage is generated between the detection electrode including Ag, reacting upon contact by the decomposed gas and the opposing electrode including Ag also, both electrodes sandwiching the ionic conductive solid electrolyte layer including Ag ion therebetween.
摘要翻译：一种气体检测器，用于检测在气体绝缘设备中通过放电产生的分解的SF6气体。气体检测器作为电池发生电压，与分解的SF 6气体的量成比例，其中在包括Ag的检测电极之间产生电压，在与分解气体接触的反应和包括Ag的相对电极之间产生电压，两个电极夹着其间包含Ag离子的离子导电性固体电解质层。

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