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    • 1. 发明授权
    • Damping support structure
    • 阻尼支撑结构
    • US5042784A
    • 1991-08-27
    • US376982
    • 1989-07-07
    • Nobuyoshi MuraiYoshinori TakahashiKazuyoshi KatayamaMasashi YasudaAtsuhiko Mori
    • Nobuyoshi MuraiYoshinori TakahashiKazuyoshi KatayamaMasashi YasudaAtsuhiko Mori
    • F16F15/027H01L21/00H05K13/00
    • H01L21/67011F16F15/0275H05K13/0061
    • A damping support structure for preventing vibrations of an apparatus table supporting an apparatus for manufacturing ultra-high precision devices such as semiconductors and printed circuit boards. The apparatus table is supported in suspension by support members, with its apparatus mounting surface disposed at a low level. The support members are supported by stationary members through vertically extendible and contractible first air springs. Horizontally extendible and contractible second air springs are disposed between the stationary members and the apparatus table. The first and second air springs serve to mitigate vertical and horizontal vibrations of the apparatus table, respectively. At the same time, in response to vibrations of the apparatus table detected by vibration sensors, air supply from air supply devices to inside spaces of the first and second air springs is controlled to apply controlling forces to the apparatus table through the first and second air springs for displacing the apparatus table relative to the stationary members and maintaining the apparatus table in an absolutely stationary state.
    • 一种用于防止支撑用于制造诸如半导体和印刷电路板的超高精度器件的装置的装置台的振动的阻尼支撑结构。 装置台由支撑构件悬挂支撑,其装置安装表面设置在较低水平。 支撑构件通过垂直延伸和收缩的第一空气弹簧由固定构件支撑。 水平伸缩和收缩的第二空气弹簧设置在固定构件和装置台之间。 第一和第二空气弹簧分别用于减轻装置台的垂直和水平振动。 同时,响应由振动传感器检测到的装置台的振动,控制从空气供应装置到第一和第二空气弹簧的内部空间的供气,以通过第一和第二空气向装置台施加控制力 用于使装置台相对于固定构件移动并将装置台保持在绝对静止状态的弹簧。
    • 6. 发明授权
    • Pyrazolothiazole compound
    • 吡唑并噻唑化合物
    • US08530504B2
    • 2013-09-10
    • US12900026
    • 2010-10-07
    • Kogyoku ShinTaro TerauchiYoshinori TakahashiMinako HashizumeKunitoshi TakedaKodo ShikataAkira Inomata
    • Kogyoku ShinTaro TerauchiYoshinori TakahashiMinako HashizumeKunitoshi TakedaKodo ShikataAkira Inomata
    • A61K31/429A61P25/24
    • C07D513/04
    • A compound represented by the formula (I) or pharmacologically acceptable salt thereof exhibits an excellent CRF receptor antagonism wherein X is a nitrogen atom or CH; R1 is -A11-A12; A11 is a single bond or a C1-6 alkylene group; A12 is a hydrogen atom, a C1-6 alkyl group or a C3-6 cycloalkyl group, etc.; R2 is -A21-A22; A21 is a single bond or a C1-6 alkylene group; A22 is a hydrogen atom, a C1-6 alkyl group, a C3-6 cycloalkyl group, a non-aromatic heterocyclic group, or a heteroaryl group, etc.; R3 is a C1-6 alkyl group, a C3-6 cycloalkyl group, a C1-6 alkoxy group, a C3-6 cycloalkoxy C1-6 alkyl group, di-C1-6 alkyl amino group, a halogen atom, a cyano group, a formyl group, or a carboxyl group, etc; R4 is a hydrogen atom or a C1-6 alkoxy group; R5 is a halogen atom, a C1-6 alkyl group, or a C1-6 alkoxy group; R6 is a hydrogen atom, a C1-6 alkyl group, a C1-6 alkoxy group, a C1-6 alkylthio group, or a C1-6 alkyl sulfinyl group etc.; and R7 is a C1-6 alkyl group, a C1-6 alkoxy group, or a C1-6 alkylthio group.
    • 由式(I)表示的化合物或其药理学上可接受的盐表现出优异的CRF受体拮抗作用,其中X为氮原子或CH; R1为-A11-A12; A11是单键或C1-6亚烷基; A12是氢原子,C1-6烷基或C3-6环烷基等; R2为-A21-A22; A21是单键或C1-6亚烷基; A22为氢原子,C1-6烷基,C3-6环烷基,非芳族杂环基或杂芳基等; R3是C1-6烷基,C3-6环烷基,C1-6烷氧基,C3-6环烷氧基C1-6烷基,二C1-6烷基氨基,卤素原子,氰基 ,甲酰基或羧基等; R4是氢原子或C1-6烷氧基; R5是卤素原子,C1-6烷基或C1-6烷氧基; R6是氢原子,C1-6烷基,C1-6烷氧基,C1-6烷硫基或C1-6烷基亚磺酰基等; 且R 7为C 1-6烷基,C 1-6烷氧基或C 1-6烷硫基。