专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07591601B2 Coater/developer, coating/developing method, and storage medium 失效
标题翻译：涂布机/显影剂，涂布/显影方法和存储介质
公开(公告)号：US07591601B2
公开(公告)日：2009-09-22
申请号：US12107496
申请日：2008-04-22
申请人： Nobuaki Matsuoka , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
发明人： Nobuaki Matsuoka , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
IPC分类号： G03D5/00 , G03B27/32 , G03F7/00
CPC分类号： G03B27/32 , G03F7/162 , G03F7/3021
摘要： A coater/developer is disclosed that includes a heating module having a pair of rotary bodies configured to rotate about respective horizontal axles, the rotary bodies being spaced apart from each other in a direction along the conveyance path of a substrate so that the rotational axles thereof are parallel to each other; a conveyance path member engaged with and extended between the rotary bodies so as to move along an orbit, the conveyance path member forming a part of the conveyance path of the substrate placed on the conveyance path member; a first transfer part provided at the upstream end of the conveyance path; a second transfer part provided at the downstream end of the conveyance path; and a heating part provided between the upstream end and the downstream end of the conveyance path and configured to heat the substrate.
摘要翻译：公开了一种涂布机/显影剂，其包括具有一对旋转体的加热模块，所述一对旋转体构造成围绕各自的水平轴旋转，所述旋转体在沿着基板的传送路径的方向上彼此间隔开，使得其旋转轴彼此平行; 输送路径构件，其与所述旋转体接合并在所述旋转体之间延伸以沿着轨道移动，所述输送路径构件形成放置在所述输送路径构件上的所述基板的输送路径的一部分; 设置在所述输送路径的上游端的第一转印部; 设置在所述输送路径的下游端的第二输送部; 以及加热部，其设置在所述输送路径的上游端和下游端之间，并且构造成加热所述基板。

2. 发明授权

US07997813B2 Coating and developing system with a direct carrying device in a processing block, coating and developing method and storage medium 有权
标题翻译：涂装和显影系统，具有处理块中的直接承载装置，涂层和显影方法和存储介质
公开(公告)号：US07997813B2
公开(公告)日：2011-08-16
申请号：US12057846
申请日：2008-03-28
申请人： Nobuaki Matsuoka , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
发明人： Nobuaki Matsuoka , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
IPC分类号： G03D5/04
CPC分类号： H01L21/67745 , H01L21/67178
摘要： A coating and developing system includes processing blocks of the same construction each built by stacking up a plurality of unit blocks including a film forming unit block and a developing unit block in layers. The processing blocks are arranged longitudinally between a carrier block and an interface block. The number of processing blocks like the processing blocks arranged between the carrier block and the interface block is adjusted to adjust the throughput of the coating and developing system. Thus, a coating and developing system capable of achieving a desired throughput can be easily designed and manufactured.
摘要翻译：涂覆和显影系统包括具有相同结构的处理块，每个处理块通过堆叠多个单元块而构建，所述单元块包括成膜单元块和显影单元块。处理块被纵向地布置在载体块和接口块之间。调整布置在承载块和接口块之间的处理块的处理块的数量，以调整涂覆和显影系统的生产量。因此，可以容易地设计和制造能够实现期望生产量的涂布和显影系统。

3. 发明授权

US07789577B2 Coating and developing system, coating and developing method and storage medium 有权
标题翻译：涂层和显影系统，涂层和显影方法和存储介质
公开(公告)号：US07789577B2
公开(公告)日：2010-09-07
申请号：US12103884
申请日：2008-04-16
申请人： Nobuaki Matsuoka , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
发明人： Nobuaki Matsuoka , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
IPC分类号： G03D5/00 , G03F1/00 , B05D3/12 , B05D3/00
CPC分类号： H01L21/67178 , H01L21/67028 , H01L21/6715 , H01L21/67173 , H01L21/67709 , H01L21/6776
摘要： A coating and developing system that includes two rotating members having parallel horizontal axes of rotation and disposed longitudinally opposite to each other, a carrying passage forming mechanism extended between the rotating members to form a carrying passage, and capable of moving along an orbital path to carry a wafer supported thereon, a sending-in transfer unit disposed at the upstream end of the carrying passage, a sending-out transfer unit disposed at the downstream end of the carrying passage, a developer pouring nozzle for pouring a developer onto the wafer, a cleaning nozzle for pouring a cleaning liquid onto the wafer, and a gas nozzle for blowing a gas against the wafer. The developer pouring nozzle, the cleaning nozzle, and the gas nozzle are arranged in a direction in which the wafer is carried along the carrying passage between the upstream and the downstream end of the carrying passage.
摘要翻译：一种涂覆和显影系统，包括具有平行的水平旋转轴线和彼此纵向相对设置的两个旋转构件，在所述旋转构件之间延伸的承载通道形成机构，以形成承载通道，并且能够沿着轨道路径移动以携带设置在所述输送通道的上游端的送出传送单元，设置在所述输送通道的下游端的送出传送单元，将显影剂倾倒在所述晶片上的显影剂倾倒用喷嘴，用于将清洗液注入到晶片上的清洗喷嘴和用于将气体吹向晶片的气体喷嘴。显影剂倾倒喷嘴，清洁喷嘴和气体喷嘴沿着沿着运送通道的上游和下游端之间的输送通道携带的方向布置。

4. 发明授权

US07871211B2 Coating and developing system, coating and developing method and storage medium 有权
标题翻译：涂层和显影系统，涂层和显影方法和存储介质
公开(公告)号：US07871211B2
公开(公告)日：2011-01-18
申请号：US12058252
申请日：2008-03-28
申请人： Nobuaki Matsuoka , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
发明人： Nobuaki Matsuoka , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
IPC分类号： G03D5/00 , G03B27/52 , B05C11/02 , G03F1/00
CPC分类号： H01L21/67178 , H01L21/67745
摘要： A coating and developing system has a first processing block, a second processing block, and a transfer block interposed between the first and the second processing block. A first direct carrying means carries substrates from a carrier block to the transfer block. The transfer block distributes the substrates to respective film forming unit blocks of the first and the second processing block. Substrates on which films have been formed by the first and the second processing block are collected temporarily in the transfer block. A second direct carrying means carries the substrate collected in the transfer block from the transfer block to an interface block. Use of the first and the second processing block can improve the throughput of the coating and developing system. Since a carrying route from the carrier block to the first processing block, and a carrying route from the carrier block to the second processing block are the same, a carrying program is easy to create.
摘要翻译：涂覆和显影系统具有第一处理块，第二处理块和介于第一和第二处理块之间的传输块。第一直接承载装置将衬底从承载块运送到转移块。传送块将基板分配到第一和第二处理块的各个成膜单元块。由第一处理块和第二处理块形成了膜的基板被临时收集在转印块中。第二直接传送装置将从传送块收集的基板传送到接口块。使用第一和第二处理块可以提高涂层和显影系统的生产量。由于从承载块到第一处理块的承载路由和从承载块到第二处理块的承载路由相同，所以携带程序容易创建。

5. 发明授权

US07955011B2 Coating and developing apparatus, substrate processing method, and storage medium 有权
标题翻译：涂布显影装置，基板处理方法和存储介质
公开(公告)号：US07955011B2
公开(公告)日：2011-06-07
申请号：US11733441
申请日：2007-04-10
申请人： Nobuaki Matsuoka , Yasushi Hayashida , Shinichi Hayashi
发明人： Nobuaki Matsuoka , Yasushi Hayashida , Shinichi Hayashi
IPC分类号： G03D5/04
CPC分类号： H01L21/67745 , H01L21/67178
摘要： A coating and developing apparatus is provided which requires a smaller occupation space even when it incorporates a substrate inspection unit, while eliminating a disadvantageous layout. A coating film forming part B3 including a plurality of process units and transfer mechanisms A3 and A4, and a developing part B1 including a plurality of process units 31 and a transfer mechanism A1 are vertically arranged in a process block S2. There are disposed in the process block S2 on a side of a carrier block S1, a plurality of vertically arranged transfer units TRS for transferring a substrate W between the same and transfer mechanisms for the respective parts, and a vertically movable transfer mechanism D1 for the transfer unit for transferring a substrate between these transfer units. At least one of the coating film forming part and the developing part includes a substrate inspection unit 43 for inspecting a substrate transferred by the transfer mechanism for the corresponding part.
摘要翻译：提供了一种涂覆和显影装置，即使当其包含基板检查单元时也需要较小的占用空间，同时消除不利的布局。包括多个处理单元和转印机构A3和A4的涂膜形成部分B3和包括多个处理单元31和转印机构A1的显影部分B1垂直地布置在处理块S2中。在载体块S1的一侧设置有处理块S2，多个垂直设置的传送单元TRS，用于将基板W传送到相应部件的传送机构和用于各部件的传送机构之间，转印单元，用于在这些转印单元之间转印衬底。涂膜形成部和显影部中的至少一个包括用于检查由相应部分的转印机构转印的基板的基板检查单元43。

6. 发明授权

US07245348B2 Coating and developing system and coating and developing method with antireflection film and an auxiliary block for inspection and cleaning 有权
标题翻译：涂层和显影系统以及具有防反射膜和辅助块的检测和清洁的涂层和显影方法
公开(公告)号：US07245348B2
公开(公告)日：2007-07-17
申请号：US11117566
申请日：2005-04-29
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： G03B27/52
CPC分类号： H01L21/67184 , H01L21/6715 , H01L21/67178 , H01L21/6719
摘要： A coating and developing system includes an auxiliary block, a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with either a case where antireflection films are formed or a case where no antireflection film is formed. Film forming unit blocks, namely, a TCT layer, a COT layer and a BCT layer, and developing unit blocks, namely, DEV layers, are stacked up in layers in a processing block S2. The TCT layer, the COT layer and the BCT layer are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a carrying program.
摘要翻译：涂覆显影系统包括辅助块，抗蚀剂膜形成单元块和层叠的抗反射膜形成单元块，以形成抗蚀剂膜和抗蚀剂膜下面的抗反射膜，以及抗反射膜，覆盖抗蚀剂膜空间。涂覆和显影系统可以应对形成防反射膜的情况或不形成抗反射膜的情况。成膜单位块，即TCT层，COT层和BCT层，以及显影单元块，即DEV层，在处理块S2中层叠。在形成防反射膜的情况下选择性地使用TCT层，COT层和BCT层以及未形成任何抗反射膜的情况。涂层和显影系统由携带程序控制。

7. 发明申请

US20070056514A1 Coating and developing apparatus 有权
标题翻译：涂装显影装置
公开(公告)号：US20070056514A1
公开(公告)日：2007-03-15
申请号：US11342616
申请日：2006-01-31
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： C23C16/00
CPC分类号： H01L21/67184 , H01L21/67173 , H01L21/67178 , H01L21/67207 , H01L21/67745
摘要： Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application.
摘要翻译：提供一种由多个单元块组成的涂层显影装置。第一单位块堆叠和第二单位块堆叠被布置在相对于前后方向的不同位置。用于显影的单元块，每个包括多个处理单元，包括执行曝光之后的显影处理的显影单元和在处理单元之间传送基板的转印装置布置在最下层。用于应用或涂布的单元块包括多个处理单元，包括在曝光之前进行施加处理的涂布单元和在处理单元之间传送基板的转印装置，布置在用于显影的单位块上方。用于应用的单元块被布置在第一和第二单元块堆叠中。根据防反射膜和抗蚀剂膜之间的层叠位置关系确定晶片通过的应用单元块。暴露的晶片仅通过单元块进行开发，而不经过用于应用的单元块中的任何一个。

8. 发明申请

US20060201615A1 Coating and developing system 有权
标题翻译：涂装和开发系统
公开(公告)号：US20060201615A1
公开(公告)日：2006-09-14
申请号：US11156571
申请日：2005-06-21
申请人： Nobuaki Matsuoka , Shinichi Hayashi , Yasushi Hayashida
发明人： Nobuaki Matsuoka , Shinichi Hayashi , Yasushi Hayashida
IPC分类号： B32B37/00
CPC分类号： H01L21/67178 , H01L21/67745
摘要： A coating and developing system is constructed so as to enable the maintenance of an exposure system combined therewith at desired time. The coating and developing system carries a substrate delivered to a carrier handling block to a processing block to form a film on the substrate by a coating block included in the processing block, carries the substrate through an interface block to the exposure system, processes the substrate having the exposed film by a developing process by a developing block included in the processing block and returns the thus processed substrate to the carrier handling block. A direct carrying means is superposed on the coating block and the developing block to carry a substrate having a surface coated with a film from the carrier handling block directly to the interface block. A test substrate can be carried to the exposure system to inspect the condition of the exposure system even in a state where the coating block and the developing block are under maintenance work.
摘要翻译：构造涂层和显影系统，以便能够在期望的时间维持与其组合的曝光系统。涂覆和显影系统将传送到载体处理块的基底运送到处理块，以通过包含在处理块中的涂层在基板上形成膜，将基板通过界面块运送到曝光系统，处理基板通过由处理块中包含的显影块通过显影处理使曝光的胶片具有曝光的胶片，并将这样处理的基材返回到载体处理块。直接承载装置重叠在涂层块和显影块上，以将载体处理块上具有涂覆有表面的表面的基底直接运送至界面块。即使在涂布块和显影块处于维护工作的状态下，也可以将测试基板运送到曝光系统以检查曝光系统的状况。

9. 发明申请

US20060162858A1 Coating and developing system and coating and developing method 有权
公开(公告)号：US20060162858A1
公开(公告)日：2006-07-27
申请号：US11336990
申请日：2006-01-23
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： B32B37/00
CPC分类号： H01L21/6715 , H01L21/00 , H01L21/67178 , H01L21/67184 , H01L21/6719
摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.

10. 发明申请

US20060165409A1 Coating and developing system and coating and developing method 有权
标题翻译：涂层开发系统及涂层开发方法
公开(公告)号：US20060165409A1
公开(公告)日：2006-07-27
申请号：US11335635
申请日：2006-01-20
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： G03D5/00
CPC分类号： H01L21/67184 , H01L21/00 , H01L21/6715 , H01L21/67178 , H01L21/6719
摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.
摘要翻译：涂覆显影系统包括：抗蚀剂膜形成单元块和层叠的抗反射膜形成单元块，以形成抗蚀剂膜和抗反射膜下面的抗反射膜以及在小空间中覆盖抗蚀剂膜的抗反射膜。涂层显影系统能够应对形成防反射膜的情况和没有形成任何抗反射膜的情况，并且需要简单的软件。成膜单位块，即TCT层B 3，COT层B 4和BCT层B 5以及显影单元块，即DEV层B 1和B 2，层叠在处理块S 在形成防反射膜的情况下选择性地使用TCT层B 3，COT层B 4和BCT层B 5以及未形成任何抗反射膜的情况。涂层和显影系统由简单的携带程序和简单的软件控制。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式