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1. 发明授权

US10768341B2 Optical material, optical element and method for manufacturing same 有权
公开(公告)号：US10768341B2
公开(公告)日：2020-09-08
申请号：US16001235
申请日：2018-06-06
申请人： NIKON CORPORATION
发明人： Soichi Owa , Shunji Watanabe , Junji Suzuki , Kazuhiro Kido , Hidemitsu Toba
IPC分类号： B32B3/10 , G02B1/00 , B82Y20/00 , G02B1/14 , G03F7/20 , G03F7/32
摘要： An optical member to be arranged in an optical path of a light, includes an optical medium made of an insulator or a semiconductor; a first element provided at a first position in the optical medium and made of a first electric conductor having a width approximately same as or smaller than a wavelength of the light, the first position being a position in the optical path; and a second element provided at a second position, in the optical medium, different from the first position, and made of a second electric conductor having a width approximately same as or smaller than the wavelength of the light, the second position being a position in the optical path.

2. 发明授权

US10261421B2 Controller for optical device, exposure method and apparatus, and method for manufacturing device 有权
公开(公告)号：US10261421B2
公开(公告)日：2019-04-16
申请号：US15920834
申请日：2018-03-14
申请人： NIKON CORPORATION
发明人： Soichi Owa
IPC分类号： G03F7/20
摘要： An exposure method for exposing a mask pattern, which includes plural types of patterns, with a high throughput and optimal illumination conditions for each type of pattern. The method includes guiding light from a first spatial light modulator illuminated with pulse lights of illumination light to a second spatial light modulator and exposing a wafer with light from the second spatial light modulator, accompanied by: controlling a conversion state of the second spatial light modulator including a plurality of second mirror elements; and controlling a conversion state of the first spatial light modulator including a plurality of first mirror elements to control intensity distribution of the illumination light on a predetermined plane between the first spatial light modulator and the second spatial light modulator.

3. 发明申请

US20160223914A1 SPATIAL LIGHT MODULATOR, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE 有权
公开(公告)号：US20160223914A1
公开(公告)日：2016-08-04
申请号：US15011145
申请日：2016-01-29
申请人： Nikon Corporation
发明人： Soichi Owa , Yoji Watanabe , Tomoharu Fujiwara
IPC分类号： G03F7/20 , G02B26/06
CPC分类号： G03F7/70191 , G02B5/09 , G02B7/1821 , G02B26/06 , G02B26/0833 , G02B27/425 , G03F7/70291
摘要： A spatial light modulator has a plurality of mirror elements each of which is controllable into a first state in which the mirror element reflects incident light with a change in a phase thereof by a first phase and a second state in which the mirror element reflects the incident light with a change in the phase thereof by a second phase 180° different from the first phase; and a boundary portion arranged between the mirror elements, which changes the phase of the incident light by a third phase substantially (90°+k·180°) (where k is an integer) different from the first phase. In projecting a pattern with the use of the spatial light modulator, an error caused in the pattern can be reduced even if the light quantity of light passing a gap region between the optical elements in the spatial light modulator is large.

4. 发明授权

US09019467B2 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US09019467B2
公开(公告)日：2015-04-28
申请号：US13753969
申请日：2013-01-30
申请人： Nikon Corporation
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58 , G03F7/20 , G03B27/54 , G03B27/60
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

5. 发明授权

US11119411B2 Drive method for spatial light modulator, method for generating pattern for exposure, and exposure method and apparatus 有权
公开(公告)号：US11119411B2
公开(公告)日：2021-09-14
申请号：US14331689
申请日：2014-07-15
申请人： Nikon Corporation
发明人： Soichi Owa , Yoji Watanabe
IPC分类号： G03F7/20 , G02F1/29
摘要： In a drive method for a spatial light modulator, out of a first boundary region and a second boundary region arranged adjacently in a Y-direction and extending in an X-direction, mirror elements arranged at a first pitch not resolved by a projection optical system, in the X-direction in the first boundary region are set in the phase 0, and the other mirror elements therein are set in the phase π; mirror elements arranged at a second pitch not resolved by the projection optical system, in the X-direction in the second boundary region are set in the phase π, and the other mirror elements therein are set in the phase 0.

6. 发明授权

US09551942B2 Controller for optical device, exposure method and apparatus, and method for manufacturing device 有权
标题翻译：用于光学装置的控制器，曝光方法和装置以及制造装置的方法
公开(公告)号：US09551942B2
公开(公告)日：2017-01-24
申请号：US14991667
申请日：2016-01-08
申请人： NIKON CORPORATION
发明人： Soichi Owa
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/20 , G03F7/70091 , G03F7/70108 , G03F7/70116 , G03F7/70141 , G03F7/702 , G03F7/70291
摘要： An exposure method for exposing a mask pattern, which includes plural types of patterns, with a high throughput and optimal illumination conditions for each type of pattern. The method includes guiding light from a first spatial light modulator illuminated with pulse lights of illumination light to a second spatial light modulator and exposing a wafer with light from the second spatial light modulator, accompanied by: controlling a conversion state of the second spatial light modulator including a plurality of second mirror elements; and controlling a conversion state of the first spatial light modulator including a plurality of first mirror elements to control intensity distribution of the illumination light on a predetermined plane between the first spatial light modulator and the second spatial light modulator.
摘要翻译：一种曝光方法，用于以每种类型图案的高通量和最佳照明条件曝光包括多种图案的掩模图案。该方法包括将来自照明光的脉冲光照射的第一空间光调制器的光引导到第二空间光调制器，并且用来自第二空间光调制器的光曝光晶片，伴随着：控制第二空间光调制器包括多个第二镜元件; 以及控制包括多个第一反射镜元件的第一空间光调制器的转换状态，以控制照明光在第一空间光调制器和第二空间光调制器之间的预定平面上的强度分布。

7. 发明授权

US09316921B2 Exposure apparatus, exposure method, and method for producing device 有权
公开(公告)号：US09316921B2
公开(公告)日：2016-04-19
申请号：US14070021
申请日：2013-11-01
申请人： NIKON CORPORATION
发明人： Naoyuki Kobayashi , Soichi Owa , Shigeru Hirukawa , Yasuhiro Omura
IPC分类号： G03B27/42 , G03B27/52 , G03F7/20
CPC分类号： G03F7/70875 , G03F7/2041 , G03F7/70341 , G03F7/7075 , G03F7/70891
摘要： An exposure apparatus exposes a substrate by irradiating exposure light on the substrate through liquid. The exposure apparatus has a substrate holder for holding the substrate, a substrate stage capable of moving the substrate held by the substrate holder, and a temperature adjusting system for adjusting the temperature of the substrate holder. The temperature of the substrate is controlled so that there is no difference in temperature between the substrate and the liquid, thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid.

8. 发明授权

US09268235B2 Controller for optical device, exposure method and apparatus, and method for manufacturing device 有权
标题翻译：用于光学装置的控制器，曝光方法和装置以及制造装置的方法
公开(公告)号：US09268235B2
公开(公告)日：2016-02-23
申请号：US14320075
申请日：2014-06-30
申请人： NIKON CORPORATION
发明人： Soichi Owa
IPC分类号： G03C5/04 , G03F7/20
CPC分类号： G03F7/70191 , G03F7/20 , G03F7/70091 , G03F7/70108 , G03F7/70116 , G03F7/70141 , G03F7/702 , G03F7/70291
摘要： An exposure method for exposing a mask pattern, which includes plural types of patterns, with a high throughput and optimal illumination conditions for each type of pattern. The method includes guiding light from a first spatial light modulator illuminated with pulse lights of illumination light to a second spatial light modulator and exposing a wafer with light from the second spatial light modulator, accompanied by: controlling a conversion state of the second spatial light modulator including a plurality of second mirror elements; and controlling a conversion state of the first spatial light modulator including a plurality of first mirror elements to control intensity distribution of the illumination light on a predetermined plane between the first spatial light modulator and the second spatial light modulator.
摘要翻译：一种曝光方法，用于以每种类型图案的高通量和最佳照明条件曝光包括多种图案的掩模图案。该方法包括将来自照明光的脉冲光照射的第一空间光调制器的光引导到第二空间光调制器，并且用来自第二空间光调制器的光曝光晶片，伴随着：控制第二空间光调制器包括多个第二镜元件; 以及控制包括多个第一反射镜元件的第一空间光调制器的转换状态，以控制照明光在第一空间光调制器和第二空间光调制器之间的预定平面上的强度分布。

9. 发明授权

US09235139B2 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US09235139B2
公开(公告)日：2016-01-12
申请号：US13754112
申请日：2013-01-30
申请人： NIKON CORPORATION
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/52 , G03B27/42 , G03B27/32 , G03B27/58 , G03F7/20 , G03B27/54 , G03B27/60
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

10. 发明授权

US10761431B2 Spatial light modulator, method of driving same, and exposure method and apparatus 有权
公开(公告)号：US10761431B2
公开(公告)日：2020-09-01
申请号：US16410693
申请日：2019-05-13
申请人： NIKON CORPORATION
发明人： Yoji Watanabe , Soichi Owa , Tomoharu Fujiwara
IPC分类号： G03F7/20 , G02B26/08 , G02B26/06
摘要： A mirror array device, and related exposure apparatus and manufacturing method, for driving a spatial light modulator that includes: setting, in an array of mirror elements, mirror elements in a first state for turning incident light into reflected light with the same phase as that of the incident light or with a phase different by a first phase from that of the incident light and mirror elements in a second state for turning incident light into reflected light with a phase different approximately 180° from the first phase to an arrangement with a first phase distribution; and setting, in the array of mirror elements, the first mirror elements and the second mirror elements to an arrangement with a second phase distribution which is an inversion of the first phase distribution.

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