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1. 发明授权

US09941217B2 Mark, method for forming same, and exposure apparatus 有权
公开(公告)号：US09941217B2
公开(公告)日：2018-04-10
申请号：US14590376
申请日：2015-01-06
申请人： NIKON CORPORATION
发明人： Yuji Shiba , Tomoharu Fujiwara , Nobutaka Magome
IPC分类号： H01L23/544 , H01L21/308 , G03F9/00 , H01L21/762 , B82Y40/00
CPC分类号： H01L23/544 , B82Y40/00 , G03F9/708 , H01L21/3086 , H01L21/76224 , H01L2223/5442 , H01L2223/54426 , H01L2223/5446 , H01L2924/0002 , H01L2924/00
摘要： A mark forming method includes: forming recessed portion on a mark formation area of a substrate; coating the recessed portion with a polymer layer containing a block copolymer; allowing the polymer layer in the recessed portion to form a self-assembled area; selectively removing a portion of the self-assembled area; and forming a positioning mark by using the self-assembled area from which the portion thereof has been removed.

2. 发明授权

US09268237B2 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US09268237B2
公开(公告)日：2016-02-23
申请号：US13754112
申请日：2013-01-30
申请人： NIKON CORPORATION
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/52 , G03B27/42 , G03B27/32 , G03B27/58 , G03F7/20 , G03B27/54 , G03B27/60
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

3. 发明授权

US10236259B2 Mark, method for forming same, and exposure apparatus 有权
公开(公告)号：US10236259B2
公开(公告)日：2019-03-19
申请号：US15914193
申请日：2018-03-07
申请人： NIKON CORPORATION
发明人： Yuji Shiba , Tomoharu Fujiwara , Nobutaka Magome
IPC分类号： H01L23/544 , H01L21/308 , G03F9/00 , H01L21/762 , B82Y40/00
摘要： A mark forming method includes: forming recessed portion on a mark formation area of a substrate; coating the recessed portion with a polymer layer containing a block copolymer, allowing the polymer layer in the recessed portion to form a self-assembled area; selectively removing a portion of the self-assembled area; and forming a positioning mark by using the self-assembled area from which the portion thereof has been removed.

4. 发明授权

US09760026B2 Exposure apparatus, method for producing device, and method for controlling exposure apparatus 有权
公开(公告)号：US09760026B2
公开(公告)日：2017-09-12
申请号：US15332509
申请日：2016-10-24
申请人： NIKON CORPORATION
发明人： Nobutaka Magome , Naoyuki Kobayashi
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70525 , G03F7/70725 , G03F7/70858 , G03F7/709
摘要： A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a liquid collection outlet, a separator fluidically connected to the liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the liquid collection outlet, from the other, a first flow-meter which measures an amount of the liquid collected via the liquid collection outlet, and a second flow-meter which measures an amount of liquid to be supplied via the liquid supply inlet.

5. 发明授权

US08749757B2 Exposure apparatus, method for producing device, and method for controlling exposure apparatus 有权
标题翻译：曝光装置，制造装置的方法以及曝光装置的控制方法
公开(公告)号：US08749757B2
公开(公告)日：2014-06-10
申请号：US13751509
申请日：2013-01-28
申请人： Nikon Corporation
发明人： Nobutaka Magome , Naoyuki Kobayashi , Yasuyuki Sakakibara , Hiroaki Takaiwa , Hisatsune Kadota
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70525 , G03F7/70725 , G03F7/70858 , G03F7/709
摘要： A liquid immersion exposure apparatus includes a movable member having a substrate holder and a surface disposed adjacent to the substrate holder, the surface capable of positioning under a projection optical system. A liquid immersion system has a supply path and a recovery path. The liquid immersion system supplies the liquid to a space between the projection optical system and the surface via the supply path and recovers the supplied liquid of a liquid immersion area formed under the projection optical system via the recovery path. A controller stops a supply of the liquid to the space under the projection optical system by the liquid immersion system on receipt of a signal indicating the occurrence of an abnormality. The abnormality causes a possibility of leakage due to at least a part of the supplied liquid not being recovered via the recovery path and outflowing from the liquid immersion area.
摘要翻译：液浸曝光装置包括具有基板保持器和邻近基板保持件设置的表面的可移动元件，该表面能够在投影光学系统下定位。液浸系统具有供给路径和恢复路径。液浸系统通过供给路径将液体供给到投影光学系统与表面之间的空间，并通过回收路径回收在投影光学系统下形成的液浸区域的供给液体。控制器在接收到指示发生异常的信号时，通过液浸系统停止向投影光学系统下的空间供应液体。由于至少一部分供给液体不能通过回收路径回收并从液浸区域流出，所以异常导致泄漏的可能性。

6. 发明授权

US09846371B2 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US09846371B2
公开(公告)日：2017-12-19
申请号：US14696898
申请日：2015-04-27
申请人： NIKON CORPORATION
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/58 , G03B27/52 , G03F7/20
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

7. 发明授权

US09494871B2 Exposure apparatus, method for producing device, and method for controlling exposure apparatus 有权
标题翻译：曝光装置，制造装置的方法以及曝光装置的控制方法
公开(公告)号：US09494871B2
公开(公告)日：2016-11-15
申请号：US14264711
申请日：2014-04-29
申请人： NIKON CORPORATION
发明人： Nobutaka Magome , Naoyuki Kobayashi
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70525 , G03F7/70725 , G03F7/70858 , G03F7/709
摘要： A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a liquid collection outlet, a separator fluidically connected to the liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the liquid collection outlet from the other, and a flow-meter configured to measure an amount of the liquid collected via the liquid collection outlet.
摘要翻译：液浸曝光装置包括投影系统，液体供应入口，液体收集出口，与液体收集出口流体连接的分离器，分离液体和气体中的一个的分离器，其经由液体收集出口从以及流量计，被配置为测量通过液体收集出口收集的液体的量。

8. 发明授权

US10185232B2 Exposure apparatus, method for producing device, and method for controlling exposure apparatus 有权
公开(公告)号：US10185232B2
公开(公告)日：2019-01-22
申请号：US15689321
申请日：2017-08-29
申请人： NIKON CORPORATION
发明人： Nobutaka Magome , Naoyuki Kobayashi
IPC分类号： G03B27/52 , G03F7/20
摘要： A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a first liquid collection outlet, and a separator fluidically connected to the first liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the first liquid collection outlet, from the other. A stage which holds a substrate has a second liquid collection outlet that collects a portion of the liquid supplied from the liquid supply inlet which comes from a gap between an upper surface of the substrate and an upper surface of the stage.

9. 发明授权

US09019467B2 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US09019467B2
公开(公告)日：2015-04-28
申请号：US13753969
申请日：2013-01-30
申请人： Nikon Corporation
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58 , G03F7/20 , G03B27/54 , G03B27/60
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

10. 发明申请

US20190338174A1 FLUID SYNTHESIS SYSTEM 审中-公开
公开(公告)号：US20190338174A1
公开(公告)日：2019-11-07
申请号：US16518201
申请日：2019-07-22
申请人： Nikon Corporation
发明人： Takashi Nagata , Ting-Chien Teng , Nobutaka Magome , Bausan Yuan
IPC分类号： C09K3/14 , B01D37/00 , B01D21/02 , B01F3/12
摘要： Fluid synthesis system and corresponding method for synthesis of slurry containing abrasive particles. The system and method are configured to substantially segregate the abrasive particles passing through the filter, used at the filtering step of the process, from the sticky components that clog such filter prior to the filtering step of the synthesis process to achieve a sustaining filtration of the slurry as a result of which the filter remains substantially unclogged for the whole predetermined duration of the filtering process.

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