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1. 发明申请

WO2004092833A2 ENVIRONMENTAL SYSTEM INCLUDING A TRANSPORT REGION FOR AN IMMERSION LITHOGRAPHY APPARATUS 审中-公开
标题翻译：环境系统，其中包括一个静态地图设备的运输区域
公开(公告)号：WO2004092833A2
公开(公告)日：2004-10-28
申请号：PCT/US2004/009994
申请日：2004-04-01
申请人： NIKON CORPORATION , NOVAK, Thomas, W. , HAZELTON, Andrew, J. , WATSON, Douglas, C.
发明人： NOVAK, Thomas, W. , HAZELTON, Andrew, J. , WATSON, Douglas, C.
IPC分类号： G03F
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254), an immersion fluid system (252), and a transport region (256). The fluid barrier (254) is positioned near the device (30) and maintains the transport region (256) near the gap (246). The immersion fluid system (252) delivers an immersion fluid (248) that fills the gap (246). The transport region (256) transports at least a portion of the immersion fluid (248) that is near the fluid barrier (254) and the device (30) away from the device (30). The immersion fluid system (252) can include a fluid removal system (282) that is in fluid communication with the transport region (256). The transport region (256) can be made of a porous material.
摘要翻译：用于控制光学组件（16）和装置（30）之间的间隙（246）中的环境的环境系统（26）包括流体屏障（254），浸没流体系统（252）和输送区域 256）。流体屏障（254）位于装置（30）附近，并将输送区域（256）保持在间隙（246）附近。浸没流体系统（252）输送填充间隙（246）的浸没流体（248）。输送区域（256）将流体屏障（254）和装置（30）附近的浸没流体（248）的至少一部分输送离开装置（30）。浸没流体系统（252）可以包括与输送区域（256）流体连通的流体移除系统（282）。运输区域（256）可由多孔材料制成。

2. 发明申请

WO2005010611A2 WAFER TABLE FOR IMMERSION LITHOGRAPHY 审中-公开
标题翻译：抛光平台的波形表
公开(公告)号：WO2005010611A2
公开(公告)日：2005-02-03
申请号：PCT/US2004/017452
申请日：2004-06-02
申请人： NIKON CORPORATION , HAZELTON, Andrew, J. , TAKAIWA, Hiroaki
发明人： HAZELTON, Andrew, J. , TAKAIWA, Hiroaki
IPC分类号： G03F
CPC分类号： G03F7/70975 , G03F7/70341 , G03F7/707 , G03F7/70716 , Y10T29/49826
摘要： Methods and apparatus for allowing a liquid to be substantially contained between a lens and a wafer table assembly of an immersion lithography system are disclosed. According to one aspect of the present invention, an exposure apparatus includes a lens and a wafer table assembly. The wafer table assembly has a top surface, and is arranged to support a wafer to be moved with respect to the lens as well as at least one component. The top surface of the wafer and the top surface of the component are each at substantially a same height as the top surface of the wafer table assembly. An overall top surface of the wafer table assembly which includes the top surface of the wafer, the top surface of the wafer table assembly, and the top surface of the at least one component is substantially planar.
摘要翻译：公开了用于允许液体基本上包含在浸没式光刻系统的透镜和晶片台组件之间的方法和装置。根据本发明的一个方面，曝光装置包括透镜和晶片台组件。晶片台组件具有顶表面，并且被布置成支撑晶片相对于透镜以及至少一个部件移动。晶片的顶表面和部件的顶表面各自与晶片台组件的顶表面基本相同的高度。包括晶片的顶表面，晶片台组件的顶表面和至少一个部件的顶表面的晶片台组件的整个顶表面基本上是平面的。

3. 发明申请

WO2004092830A2 LIQUID JET AND RECOVERY SYSTEM FOR IMMERSION LITHOGRAPHY 审中-公开
标题翻译：液体喷射和恢复系统
公开(公告)号：WO2004092830A2
公开(公告)日：2004-10-28
申请号：PCT/US2004/010071
申请日：2004-04-01
申请人： NIKON CORPORATION , NOVAK, W., Thomas , HAZELTON, Andrew, J. , WATSON, Douglas, C,
发明人： NOVAK, W., Thomas , HAZELTON, Andrew, J. , WATSON, Douglas, C,
IPC分类号： G03F
CPC分类号： G03F7/70341
摘要： A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected on a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and those on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.
摘要翻译：用于浸没式光刻设备的液体喷射和回收系统具有布置成使其开口位于曝光区域附近的喷嘴阵列，图像图案通过该曝光区域投射在诸如晶片的工件上。这些喷嘴各自适于选择性地用作用于将流体供应到曝光区域中的源喷嘴或用作从曝光区域回收流体的回收喷嘴。流体控制装置用于使得在曝光区域的所选一个或多个侧面上的喷嘴用作源喷嘴，并且在所选择的一个或多个剩余侧面上的喷嘴用作回收喷嘴，使得可以建立所需的流动模式浸没光刻的方便。

4. 发明申请

WO2004093159A3 IMMERSION LITHOGRAPHY FLUID CONTROL SYSTEM 审中-公开
公开(公告)号：WO2004093159A3
公开(公告)日：2004-10-28
申请号：PCT/US2004/009911
申请日：2004-03-29
申请人： NIKON CORPORATION , COON, Derek , HAZELTON, Andrew, J.
发明人： COON, Derek , HAZELTON, Andrew, J.
IPC分类号： G03B27/52
摘要： A fluid control system for immersion lithography is formed with an optical member (4) such as a lens, a workpiece (W) such as a semiconductor wafer with a surface disposed opposite to the optical member with a gap in between, a fluid-supplying device (21) for providing an immersion fluid (7) such as water to a specified exposure area (40) in the gap, and a fluid control device (25) that activates a force on the fluid so that the immersion fluid is retained in the exposure area and its vicinity at least while the immersion lithography operation is being carried out. A pressured gas may be caused to apply a hydrodynamic force on the fluid to keep it in its place.

5. 发明申请

WO2004090634A2 ENVIRONMENTAL SYSTEM INCLUDING VACCUM SCAVANGE FOR AN IMMERSION LITHOGRAPHY APPARATUS 审中-公开
标题翻译：环境系统，包括用于浸没式光刻设备的真空SCAVANGE
公开(公告)号：WO2004090634A2
公开(公告)日：2004-10-21
申请号：PCT/IB2004/002704
申请日：2004-03-29
申请人： NIKON CORPORATION , HAZELTON, Andrew, J. , SOGARD, Michael
发明人： HAZELTON, Andrew, J. , SOGARD, Michael
IPC分类号： G03F
CPC分类号： G03F7/70875 , G03F7/2041 , G03F7/70341 , G03F7/70775 , G03F7/70816 , G03F7/70866 , G03F7/709
摘要： An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254) and an immersion fluid system (252). The fluid barrier (254) is positioned near the device (30). The immersion fluid system (252) delivers an immersion fluid (248) that fills the gap (246). The immersion fluid system (252) collects the immersion fluid (248) that is directly between the fluid barrier (254) and the device (30). The fluid barrier (254) can include a scavenge inlet (286) that is positioned near the device (30), and the immersion fluid system (252) can include a low pressure source (392A) that is in fluid communication with the scavenge inlet (286). The fluid barrier (254) confines any vapor (249) of the immersion fluid (248) and prevents it from perturbing a measurement system (22). Additionally, the environmental system (26) can include a bearing fluid source (290B) that directs a bearing fluid (290C) between the fluid barrier (254) and the device (30) to support the fluid barrier (254) relative to the device (30).
摘要翻译：用于控制光学组件（16）和装置（30）之间的间隙（246）中的环境的环境系统（26）包括流体屏障（254）和浸没流体系统（252）。流体屏障（254）位于装置（30）附近。浸没流体系统（252）输送填充间隙（246）的浸没流体（248）。浸没流体系统（252）收集直接在流体屏障（254）和装置（30）之间的浸没流体（248）。流体屏障（254）可以包括位于装置（30）附近的扫气入口（286），并且浸没流体系统（252）可包括低压源（392A），该低压源与扫气入口（286）。流体屏障（254）限制浸没流体（248）的任何蒸气（249）并防止其扰动测量系统（22）。另外，环境系统（26）可以包括轴承流体源（290B），该轴承流体源引导在流体屏障（254）和装置（30）之间的轴承流体（290C）相对于装置支撑流体屏障（254）（30）。

6. 发明申请

WO2006052855A3 FINE STAGE Z SUPPORT APPARATUS 审中-公开
公开(公告)号：WO2006052855A3
公开(公告)日：2006-05-18
申请号：PCT/US2005/040229
申请日：2005-11-04
申请人： NIKON CORPORATION , BINNARD, Michael, B. , HAZELTON, Andrew, J. , WATSON, Douglas, C. , ARAI, Yoichi
发明人： BINNARD, Michael, B. , HAZELTON, Andrew, J. , WATSON, Douglas, C. , ARAI, Yoichi
IPC分类号： G03B27/42 , G03B27/58
摘要： An apparatus for supporting an object is disclosed. The apparatus includes an air bearing coupled to an air bellows. When used in a vacuum environment, the apparatus preferably includes an air bearing housing with vacuum to remove the pressurized fluid used in the air bearing.

7. 发明申请

WO2004109757A3 HEAT PIPE WITH TEMPERATURE CONTROL 审中-公开
公开(公告)号：WO2004109757A3
公开(公告)日：2004-12-16
申请号：PCT/US2004/016495
申请日：2004-05-26
申请人： NIKON CORPORATION , HAZELTON, Andrew, J.
发明人： HAZELTON, Andrew, J.
IPC分类号： F28F27/00
摘要： Methods and apparatus for controlling the boiling temperature of a fluid within a heat pipe (404) are disclosed. According to one aspect of the present invention, a method for controlling a temperature associated with a heat pipe that contains a fluid and has an evaporator end (606) includes measuring (640) the temperature associated with the heat pipe and determining when the temperature associated with the heat pipe is at a desired level. The method also includes changing a pressure (614) within the heat pipe when it is determined that the temperature associated with the heat pipe is not at a desired level. Changing the pressure within the heat pipe causes the temperature associated with the heat pipe to change.

8. 发明申请

WO2004093130A2 CLEANUP METHOD FOR OPTICS IN IMMERSION LITHOGRAPHY 审中-公开
标题翻译： CLEANUP方法在透视图中的光学
公开(公告)号：WO2004093130A2
公开(公告)日：2004-10-28
申请号：PCT/US2004/010309
申请日：2004-04-02
申请人： NIKON CORPORATION , HAZELTON, Andrew, J. , KAWAI, Hidemi , WATSON, Douglas, C. , NOVAK, W., Thomas
发明人： HAZELTON, Andrew, J. , KAWAI, Hidemi , WATSON, Douglas, C. , NOVAK, W., Thomas
IPC分类号： H01L
CPC分类号： G03F7/70341 , B08B3/04 , B08B3/12 , G03F7/70891 , G03F7/70916 , G03F7/70925
摘要： An immersion lithography apparatus has a reticle stage arranged to retain a reticle, a working stage arranged to retain a workpiece, and an optical system including an illumination source and an optical element opposite the workpiece for having an image pattern of the reticle projected by radiation from the illumination source. A gap is defined between the optical element and the workpiece, and a fluid-supplying device serves to supply an immersion liquid into this gap such that the supplied immersion liquid contacts both the optical element and the workpiece during an immersion lithography process. A cleaning device is incorporated for removing absorbed liquid from the optical element during a cleanup process. The cleaning device may make use of a cleaning liquid having affinity to the absorbed liquid, heat, a vacuum condition, ultrasonic vibrations or cavitating bubbles for the removal of the absorbed liquid. The cleaning liquid may be supplied through the same fluid-applying device provided with a switching device such as a valve.
摘要翻译：浸没式光刻设备具有分隔板台，其布置成保持掩模版，布置成保持工件的工作台，以及包括照明源和与工件相对的光学元件的光学系统，用于具有通过辐射投射的掩模版的图像图案照明源。在光学元件和工件之间限定间隙，并且流体供应装置用于将浸没液体供应到该间隙中，使得所提供的浸没液体在浸没式光刻工艺期间与光学元件和工件接触。一种清洁装置，用于在净化过程中从光学元件中去除吸收的液体。清洁装置可以利用对吸收的液体具有亲和性的清洁液体，热，真空条件，超声波振动或气泡以去除吸收的液体。可以通过设置有诸如阀门的开关装置的相同的流体施加装置来供应清洁液体。

9. 发明授权

EP1611485B1 Environmental system including vacuum scavenge for an immersion lithography apparatus 有权
公开(公告)号：EP1611485B1
公开(公告)日：2015-06-03
申请号：EP04758599.7
申请日：2004-03-29
申请人： NIKON CORPORATION
发明人： HAZELTON, Andrew, J. , SOGARD, Michael
IPC分类号： G03F7/20 , G03B27/32 , G03B27/42
CPC分类号： G03F7/70875 , G03F7/2041 , G03F7/70341 , G03F7/70775 , G03F7/70816 , G03F7/70866 , G03F7/709
摘要： An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254) and an immersion fluid system (252). The fluid barrier (254) is positioned near the device (30). The immersion fluid system (252) delivers an immersion fluid (248) that fills the gap (246). The immersion fluid system (252) collects the immersion fluid (248) that is directly between the fluid barrier (254) and the device (30). The fluid barrier (254) can include a scavenge inlet (286) that is positioned near the device (30), and the immersion fluid system (252) can include a low pressure source (392A) that is in fluid communication with the scavenge inlet (286). The fluid barrier (254) confines any vapor (249) of the immersion fluid (248) and prevents it from perturbing a measurement system (22). Additionally, the environmental system (26) can include a bearing fluid source (290B) that directs a bearing fluid (290C) between the fluid barrier (254) and the device (30) to support the fluid barrier (254) relative to the device (30).

10. 发明公开

EP1064713A2 EXPOSURE DEVICE HAVING A PLANAR MOTOR 审中-公开
标题翻译：采用平面MOTOR曝光装置
公开(公告)号：EP1064713A2
公开(公告)日：2001-01-03
申请号：EP99933725.6
申请日：1999-07-07
申请人： NIKON CORPORATION , Hazelton, Andrew J.
发明人： HAZELTON, Andrew, J. , TANAKA, Keiichi , EATON, John, K.
IPC分类号： H02K41/00 , G03B27/42
CPC分类号： G03F7/70716 , G03F7/70758 , G03F7/70858 , H02K41/031 , H02K2201/18
摘要： Disclosed is a planar motor device capable of effectively restraining thermal influence on the environment. When an electric current is supplied to armature coils (38) opposed to the magnet of a movable member (51), the movable member (51) is driven along a movement surface (21a) by electromagnetic force. When the movable member (51) is continued to be driven in a certain direction, electric current is supplied to the armature coils (38) opposed to the magnet for each movement position of the movable member (51), whereby the armature coils (38) supplied with electric current generate heat. The armature coils (38) are accommodated in a vacuum chamber (41) in a base (21), and are arranged so as to be in contact with a stator yoke (43), with a predetermined gap being defined between them and a ceramic plate (36) forming the vacuum chamber (41). Thus, the heat transmission from the armature coils (38) to the movement surface (21a) side is effected substantially by radiation alone, so that it is possible to effectively restrain thermal influence on the environment.

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