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1. 发明公开

EP1064713A2 EXPOSURE DEVICE HAVING A PLANAR MOTOR 审中-公开
标题翻译：采用平面MOTOR曝光装置
公开(公告)号：EP1064713A2
公开(公告)日：2001-01-03
申请号：EP99933725.6
申请日：1999-07-07
申请人： NIKON CORPORATION , Hazelton, Andrew J.
发明人： HAZELTON, Andrew, J. , TANAKA, Keiichi , EATON, John, K.
IPC分类号： H02K41/00 , G03B27/42
CPC分类号： G03F7/70716 , G03F7/70758 , G03F7/70858 , H02K41/031 , H02K2201/18
摘要： Disclosed is a planar motor device capable of effectively restraining thermal influence on the environment. When an electric current is supplied to armature coils (38) opposed to the magnet of a movable member (51), the movable member (51) is driven along a movement surface (21a) by electromagnetic force. When the movable member (51) is continued to be driven in a certain direction, electric current is supplied to the armature coils (38) opposed to the magnet for each movement position of the movable member (51), whereby the armature coils (38) supplied with electric current generate heat. The armature coils (38) are accommodated in a vacuum chamber (41) in a base (21), and are arranged so as to be in contact with a stator yoke (43), with a predetermined gap being defined between them and a ceramic plate (36) forming the vacuum chamber (41). Thus, the heat transmission from the armature coils (38) to the movement surface (21a) side is effected substantially by radiation alone, so that it is possible to effectively restrain thermal influence on the environment.

2. 发明申请

WO2008140027A1 MOVABLE BODY APPARATUS AND EXPOSURE APPARATUS 审中-公开
标题翻译：可移动身体装置和曝光装置
公开(公告)号：WO2008140027A1
公开(公告)日：2008-11-20
申请号：PCT/JP2008/058583
申请日：2008-04-25
申请人： NIKON CORPORATION , TANAKA, Keiichi , KAKIZAKI, Yukio
发明人： TANAKA, Keiichi , KAKIZAKI, Yukio
IPC分类号： G03F7/20
CPC分类号： G03F7/7085 , F16C29/025 , F16C32/0603 , G03F7/70808 , G03F7/70816 , G03F7/70841 , G03F7/70866
摘要： The upper end of a static gas bearing member (42) of a wafer side seal unit (40W) is connected to an edge section on the outgoing side of an exposure beam of a chamber (52) in an air tight state via bellows (72), and the lower end surface is in a state forming a predetermined clearance with a wafer (W) and a wafer holder (WH). By this arrangement, the inside of the chamber (52) is isolated from the outside. Accordingly, it becomes possible to maintain a vacuum environment in the periphery of the optical path of the exposure beam without arranging a vacuum chamber to house a wafer (W), a wafer holder (WH), and a wafer stage (WST), which allows the size of the entire exposure apparatus to be reduced, and also makes it easy to have access to the vicinity of the wafer stage (WST).
摘要翻译：晶片侧密封单元（40W）的静态气体轴承构件（42）的上端通过波纹管（72）连接到处于气密状态的室（52）的曝光束的出射侧的边缘部分），并且下端表面处于与晶片（W）和晶片保持器（WH）形成预定间隙的状态。通过这种布置，室（52）的内部与外部隔离。因此，可以在不设置真空室来容纳晶片（W），晶片保持架（WH）和晶片台（WST））的同时，保持曝光光束的光路周边的真空环境，其中允许整个曝光装置的尺寸减小，并且还使得容易接近晶片台（WST）附近。

3. 发明申请

WO2005047981A2 THERMOPHORETIC TECHNIQUES FOR PROTECTING RETICLES FROM CONTAMINANTS 审中-公开
标题翻译：用于保护污染物中的反应物的热化学技术
公开(公告)号：WO2005047981A2
公开(公告)日：2005-05-26
申请号：PCT/US2004/037542
申请日：2004-11-10
申请人： NIKON CORPORATION , ALTON, Phillips, H. , SOGARD, Michael, R. , WATSON, Douglas, C. , TANAKA, Keiichi
发明人： ALTON, Phillips, H. , SOGARD, Michael, R. , WATSON, Douglas, C. , TANAKA, Keiichi
IPC分类号： G03F7/20
CPC分类号： G03F7/70741 , G03B27/52 , G03F1/82 , G03F7/70875 , G03F7/70916
摘要： Thermophoresis within lithography systems for protecting reticles from contaminants (e.g., floating particles). Generally, thermophoretic protection is implemented by maintaining the reticle at a higher temperature than its surrounding environment. Thermophoretic protection can be maintained throughout a reticle's use in a lithography system. For example, a reticle can be thermophoretically protected while in storage, through various stages of transportation via a reticle handler (also referred to as an end-effector), to its period of use while attached to a reticle chuck.
摘要翻译：在光刻系统内进行热电泳以保护掩模版免受污染物（例如浮动颗粒）的影响。通常，通过将掩模版保持在比周围环境更高的温度下来实现热保护。在光刻系统中使用的掩模版可以保持热保护。例如，在通过分划板处理器（也称为末端执行器）的各种运输阶段到存储期间，在将光罩保持在其使用期间，同时附着在标线盘卡盘上的情况下，可以热掩膜保护。

4. 发明申请

WO2010001945A1 LIGHT SHIELDING UNIT, VARIABLE SLIT APPARATUS, AND EXPOSURE APPARATUS 审中-公开
标题翻译：轻型屏蔽单元，可变缝隙装置和曝光装置
公开(公告)号：WO2010001945A1
公开(公告)日：2010-01-07
申请号：PCT/JP2009/062079
申请日：2009-06-25
申请人： NIKON CORPORATION , TANAKA, Keiichi
发明人： TANAKA, Keiichi
IPC分类号： G03F7/20
CPC分类号： G03F7/70916 , G03F7/70066 , G03F7/70558 , G03F7/70808
摘要： A light shielding unit 38, which shields a part of an exposure light with a light shielding member 39a, includes a sensor 43 which detects displacement of the light shielding member 39a, a driving device 44 which drives the light shielding member 39a based on a detection result obtained by the sensor 43, a case 40 which accommodates the sensor 43 and the driving device 44, and a bellows mechanism 41 which gas-seals the case 40 with respect to the light shielding member. When the illumination area of the illumination light is defined, it is possible to mitigate the influence of the foreign matters and/or the heat generated from the driving mechanism.
摘要翻译：用遮光部件39a遮挡曝光用光的一部分遮光部38包括检测遮光部件39a的位移的传感器43，基于检测部驱动遮光部件39a的驱动装置44 由传感器43获得的结果，容纳传感器43和驱动装置44的壳体40，以及相对于遮光部件对壳体40进行气密封的波纹管机构41。当照明光的照明区域被限定时，可以减轻异物的影响和/或由驱动机构产生的热量。

5. 发明授权

EP2541587B1 SUBSTRATE SEPARATION DEVICE, LOAD LOCK DEVICE, SUBSTRATE ADHESION DEVICE AND SUBSTRATE SEPARATION METHOD 有权转让
公开(公告)号：EP2541587B1
公开(公告)日：2020-05-06
申请号：EP11747064.1
申请日：2011-02-25
申请人： Nikon Corporation
发明人： TANAKA, Keiichi , YOSHIHASHI, Masahiro
IPC分类号： H01L21/677 , H01L21/687 , H01L21/67

6. 发明公开

EP2068349A1 STAGE DEVICE AND EXPOSURE DEVICE 审中-公开
标题翻译： BÜHNENVORRICHTUNGUND BELICHTUNGSVORRICHTUNG
公开(公告)号：EP2068349A1
公开(公告)日：2009-06-10
申请号：EP07828420.5
申请日：2007-09-26
申请人： Nikon Corporation
发明人： TANAKA, Keiichi
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70858 , B82Y10/00 , B82Y40/00 , G03F7/70716 , G03F7/70766 , G03F7/70783 , G03F7/70808 , G03F7/70816 , G03F7/70841 , H01J37/3174
摘要： The present invention provides a stage apparatus wherein an object is disposed in an atmosphere with a gas pressure lower than atmospheric pressure, and the object can be driven with high accuracy. The stage apparatus that drives a reticle (15) comprises: a vacuum chamber (1), which forms a space (A) and has an opening (1a); an integrated coarse and fine motion table (13), which has an electrostatic chuck (14) that holds the object, that, when driven, moves the electrostatic chuck (14) inside the space (A); a counter mass (11), which is disposed so that it covers the opening (1a), that is capable of moving because of the reaction force produced when the integrated coarse and fine motion table (13) is driven; and a vacuum cover (30), which forms a space (B) that houses the counter mass (11); wherein the space (A) and the space (B) are set to prescribed gas pressures.
摘要翻译：本发明提供一种舞台装置，其中物体设置在气压低于大气压的气氛中，并且可以高精度地驱动物体。驱动掩模版（15）的平台装置包括：形成空间（A）并具有开口（1a）的真空室（1）; 具有保持物体的静电吸盘（14）的集成的粗细动平台（13），当被驱动时，静电吸盘（14）在空间（A）内移动。被布置成使其覆盖开口（1a）的反质量块（11），其由于在整体式粗细动平台（13）被驱动时产生的反作用力而能够移动; 和形成容纳所述反质量块（11）的空间（B）的真空罩（30）。其中所述空间（A）和所述空间（B）被设定为规定的气体压力。

7. 发明公开

EP2006884A9 MOBILE DEVICE, EXPOSURE DEVICE, EXPOSURE METHOD, MICRO-MOTION BODY, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： MOBILE的陈设，曝光装置，曝光方法MICRO身体运动及零部件生产工艺
公开(公告)号：EP2006884A9
公开(公告)日：2009-07-15
申请号：EP07715038.1
申请日：2007-02-28
申请人： Nikon Corporation
发明人： TANAKA, Keiichi
IPC分类号： H01L21/027 , H01L21/68
CPC分类号： G03F7/70858 , G03F7/70716 , G03F7/70758 , H01L21/67109
摘要： Power-transmitting, waste-heat frames (24A, 24B) can continually absorbs heat radiated from wafer stages (WST1, WST2), and therefore it becomes possible to suppress adverse influence on exposure accuracy due to the heat generated at the wafer stages (WST1, WST2). In this case, unlike the conventional method, it is not necessary to connect a conduit (tube) for supplying coolant to the wafer stages (WST1, WST2) from the outside, and accordingly declines in movement accuracy of the wafer stages (WST1, WST2) due to tension of such a conduit can be prevented. Also from this standpoint, the exposure accuracy can be maintained at high accuracy.

8. 发明公开

EP1105780A1 REACTION FORCE ISOLATION SYSTEM FOR A PLANAR MOTOR 审中-公开
标题翻译：反作用力隔离SYSTEM FOR A平面电动机
公开(公告)号：EP1105780A1
公开(公告)日：2001-06-13
申请号：EP99943701.5
申请日：1999-08-12
申请人： Nikon Corporation
发明人： HAZELTON, Andrew, J. , HAYASHI, Yutaka , TANAKA, Keiichi , ITO, Nobukazu
IPC分类号： G05B5/01 , G05B11/01 , B64C17/06
CPC分类号： G03F7/70358 , F16F15/02 , G03F7/70716 , G03F7/70758 , G03F7/70833 , G03F7/709
摘要： The present invention provides a structure for isolating the reaction forces generated by a planar motor. Specifically, the fixed portion of the reaction motor, which is subject to reaction forces, is structurally isolated from the rest of the system in which the planar motor is deployed. In accordance with one embodiment of the present invention, the fixed portion of the planar motor is separated from the rest of the system and coupled to ground. The rest of the system is isolated from ground by deploying vibration isolation means. Alternatively or in addition, the fixed portion of the planar motor may be structured to move (e.g., on bearings) in the presence of reaction forces, so as to absorb the reaction forces with its inertia. In a further embodiment of the present invention, the fixed portion of the planar motor and the article to be moved are supported by the same frame, with the fixed portion of the planar motor movable on bearings.

9. 发明公开

EP1063756A1 METHOD OF MANUFACTURING LINEAR MOTOR, LINEAR MOTOR, STAGE PROVIDED WITH THE LINEAR MOTOR, AND EXPOSURE SYSTEM 审中-公开
标题翻译：用于生产直线电机，直线电机运载系统这样的线性马达和曝光系统
公开(公告)号：EP1063756A1
公开(公告)日：2000-12-27
申请号：EP99939233.5
申请日：1999-03-09
申请人： Nikon Corporation
发明人： HAYASHI, Yutaka , TANAKA, Keiichi
IPC分类号： H02K41/02
CPC分类号： G03F7/70758 , H02K41/031 , Y10T29/49009
摘要： A coil frame 24 of an armature coil unit 23 constituting a linear motor R1 comprises a pair of holding portions 26 and 26 and a connection portion 27 that connects these holding portions 26 and 26 to each other, and grooves 28 that holds ends 25a of the respective flat coils 25 are formed at an interval corresponding to an array interval of permanent magnets.
摘要翻译：构成线性电动机的电枢线圈单元23的线圈框架24 R 1包括一对保持部分26和26以及连接部分27没有连接论文保持部26和26彼此，和槽28没有保存结束的25A respectivement平面线圈25是在FORMED间隔在永磁铁的排列间隔对应于。

10. 发明公开

EP2541587A1 SUBSTRATE SEPARATION DEVICE, LOAD LOCK DEVICE, SUBSTRATE ADHESION DEVICE AND SUBSTRATE SEPARATION METHOD 有权转让
标题翻译： SUBSTRATTRENNVORRICHTUNG，SCHLEUSENVORRICHTUNG，SUBSTRATBIGESTIGUNGSVORRICHTUNG UND SUBTRATRENNVERFAHREN
公开(公告)号：EP2541587A1
公开(公告)日：2013-01-02
申请号：EP11747064.1
申请日：2011-02-25
申请人： Nikon Corporation
发明人： TANAKA, Keiichi , YOSHIHASHI, Masahiro
IPC分类号： H01L21/02 , H01L21/683
CPC分类号： H01L21/67092 , H01L21/67748 , H01L21/68742 , Y10S156/932 , Y10S156/943 , Y10T156/11 , Y10T156/1132 , Y10T156/1168 , Y10T156/1179 , Y10T156/1189 , Y10T156/19 , Y10T156/1944 , Y10T156/1972 , Y10T156/1983
摘要： A substrate separating method includes: holding, in a predetermined position, a substrate sandwiched between a first holder and a second holder opposed to cach other; and relatively moving the first holder and the second holder while the substrate is held in the predetermined position. In holding the substrate, the substrate may be held in the predetermined position by effecting a pressurizing force or a suction force onto the substrate. Also in holding the substrate, the substrate may be held in contact with one of the first holder and the second holder.
摘要翻译：基板分离方法包括：在预定位置保持夹在与第一保持器和第二保持器相对的另一个之间的基板; 并且当基板保持在预定位置时相对移动第一保持器和第二保持器。在保持基板时，可以通过对基板施加加压力或吸力将基板保持在预定位置。同样在保持基板时，基板可以保持与第一保持器和第二保持器中的一个保持接触。

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