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    • 3. 发明申请
    • ENVIRONMENTAL SYSTEM INCLUDING VACCUM SCAVANGE FOR AN IMMERSION LITHOGRAPHY APPARATUS
    • 环境系统,包括用于浸没式光刻设备的真空SCAVANGE
    • WO2004090634A2
    • 2004-10-21
    • PCT/IB2004/002704
    • 2004-03-29
    • NIKON CORPORATIONHAZELTON, Andrew, J.SOGARD, Michael
    • HAZELTON, Andrew, J.SOGARD, Michael
    • G03F
    • G03F7/70875G03F7/2041G03F7/70341G03F7/70775G03F7/70816G03F7/70866G03F7/709
    • An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254) and an immersion fluid system (252). The fluid barrier (254) is positioned near the device (30). The immersion fluid system (252) delivers an immersion fluid (248) that fills the gap (246). The immersion fluid system (252) collects the immersion fluid (248) that is directly between the fluid barrier (254) and the device (30). The fluid barrier (254) can include a scavenge inlet (286) that is positioned near the device (30), and the immersion fluid system (252) can include a low pressure source (392A) that is in fluid communication with the scavenge inlet (286). The fluid barrier (254) confines any vapor (249) of the immersion fluid (248) and prevents it from perturbing a measurement system (22). Additionally, the environmental system (26) can include a bearing fluid source (290B) that directs a bearing fluid (290C) between the fluid barrier (254) and the device (30) to support the fluid barrier (254) relative to the device (30).
    • 用于控制光学组件(16)和装置(30)之间的间隙(246)中的环境的环境系统(26)包括流体屏障(254)和浸没流体系统(252)。 流体屏障(254)位于装置(30)附近。 浸没流体系统(252)输送填充间隙(246)的浸没流体(248)。 浸没流体系统(252)收集直接在流体屏障(254)和装置(30)之间的浸没流体(248)。 流体屏障(254)可以包括位于装置(30)附近的扫气入口(286),并且浸没流体系统(252)可包括低压源(392A),该低压源与扫气入口 (286)。 流体屏障(254)限制浸没流体(248)的任何蒸气(249)并防止其扰动测量系统(22)。 另外,环境系统(26)可以包括轴承流体源(290B),该轴承流体源引导在流体屏障(254)和装置(30)之间的轴承流体(290C)相对于装置支撑流体屏障(254) (30)。
    • 5. 发明申请
    • WAFER TABLE FOR IMMERSION LITHOGRAPHY
    • 抛光平台的波形表
    • WO2005010611A2
    • 2005-02-03
    • PCT/US2004/017452
    • 2004-06-02
    • NIKON CORPORATIONHAZELTON, Andrew, J.TAKAIWA, Hiroaki
    • HAZELTON, Andrew, J.TAKAIWA, Hiroaki
    • G03F
    • G03F7/70975G03F7/70341G03F7/707G03F7/70716Y10T29/49826
    • Methods and apparatus for allowing a liquid to be substantially contained between a lens and a wafer table assembly of an immersion lithography system are disclosed. According to one aspect of the present invention, an exposure apparatus includes a lens and a wafer table assembly. The wafer table assembly has a top surface, and is arranged to support a wafer to be moved with respect to the lens as well as at least one component. The top surface of the wafer and the top surface of the component are each at substantially a same height as the top surface of the wafer table assembly. An overall top surface of the wafer table assembly which includes the top surface of the wafer, the top surface of the wafer table assembly, and the top surface of the at least one component is substantially planar.
    • 公开了用于允许液体基本上包含在浸没式光刻系统的透镜和晶片台组件之间的方法和装置。 根据本发明的一个方面,曝光装置包括透镜和晶片台组件。 晶片台组件具有顶表面,并且被布置成支撑晶片相对于透镜以及至少一个部件移动。 晶片的顶表面和部件的顶表面各自与晶片台组件的顶表面基本相同的高度。 包括晶片的顶表面,晶片台组件的顶表面和至少一个部件的顶表面的晶片台组件的整个顶表面基本上是平面的。
    • 9. 发明申请
    • CLEANUP METHOD FOR OPTICS IN IMMERSION LITHOGRAPHY
    • CLEANUP方法在透视图中的光学
    • WO2004093130A2
    • 2004-10-28
    • PCT/US2004/010309
    • 2004-04-02
    • NIKON CORPORATIONHAZELTON, Andrew, J.KAWAI, HidemiWATSON, Douglas, C.NOVAK, W., Thomas
    • HAZELTON, Andrew, J.KAWAI, HidemiWATSON, Douglas, C.NOVAK, W., Thomas
    • H01L
    • G03F7/70341B08B3/04B08B3/12G03F7/70891G03F7/70916G03F7/70925
    • An immersion lithography apparatus has a reticle stage arranged to retain a reticle, a working stage arranged to retain a workpiece, and an optical system including an illumination source and an optical element opposite the workpiece for having an image pattern of the reticle projected by radiation from the illumination source. A gap is defined between the optical element and the workpiece, and a fluid-supplying device serves to supply an immersion liquid into this gap such that the supplied immersion liquid contacts both the optical element and the workpiece during an immersion lithography process. A cleaning device is incorporated for removing absorbed liquid from the optical element during a cleanup process. The cleaning device may make use of a cleaning liquid having affinity to the absorbed liquid, heat, a vacuum condition, ultrasonic vibrations or cavitating bubbles for the removal of the absorbed liquid. The cleaning liquid may be supplied through the same fluid-applying device provided with a switching device such as a valve.
    • 浸没式光刻设备具有分隔板台,其布置成保持掩模版,布置成保持工件的工作台,以及包括照明源和与工件相对的光学元件的光学系统,用于具有通过辐射投射的掩模版的图像图案 照明源。 在光学元件和工件之间限定间隙,并且流体供应装置用于将浸没液体供应到该间隙中,使得所提供的浸没液体在浸没式光刻工艺期间与光学元件和工件接触。 一种清洁装置,用于在净化过程中从光学元件中去除吸收的液体。 清洁装置可以利用对吸收的液体具有亲和性的清洁液体,热,真空条件,超声波振动或气泡以去除吸收的液体。 可以通过设置有诸如阀门的开关装置的相同的流体施加装置来供应清洁液体。