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1. 发明公开

EP3635751A1 METHOD AND SYSTEM FOR SURFACE MODIFICATION OF SUBSTRATE FOR ION BEAM TARGET 有权转让
公开(公告)号：EP3635751A1
公开(公告)日：2020-04-15
申请号：EP17912902.8
申请日：2017-06-05
申请人： Neutron Therapeutics Inc. , Park, William, H., Jr. , Lambert, Mark , Gillespie, Joseph , Smick, Noah , Sakase, Takao
发明人： PARK, William, H., JR. , LAMBERT, Mark , GILLESPIE, Joseph , SMICK, Noah , SAKASE, Takao
IPC分类号： G21K1/00 , G21K5/04 , A61N5/10

2. 发明申请

WO2018226205A1 METHOD AND SYSTEM FOR SURFACE MODIFICATION OF SUBSTRATE FOR ION BEAM TARGET 审中-公开
公开(公告)号：WO2018226205A1
公开(公告)日：2018-12-13
申请号：PCT/US2017/035962
申请日：2017-06-05
申请人： NEUTRON THERAPEUTICS, INC. , PARK, William, H., JR. , LAMBERT, Mark , GILLESPIE, Joseph , SMICK, Noah , SAKASE, Takao
发明人： PARK, William, H., JR. , LAMBERT, Mark , GILLESPIE, Joseph , SMICK, Noah , SAKASE, Takao
IPC分类号： G21K1/00 , G21K5/04 , A61N5/10
摘要： Design and making methods of a neutrons generating target are described. In some embodiments, a surface of a target substrate can be modified to form one or more surface features. In some embodiments, a neutron source layer can be disposed on the surface of the target substrate. In some embodiments, the neutron source layer and the target substrate can be heated to an elevated temperature to form a bond between the two. In some embodiments, the surface modification of the target substrate can reduce blistering and material exfoliation in the target. The target can be used in boron neutron capture therapy.

3. 发明申请

WO2013074523A1 ION IMPLANT APPARATUS AND A METHOD OF IMPLANTING IONS 审中-公开
标题翻译：离子植入装置和离子注入方法
公开(公告)号：WO2013074523A1
公开(公告)日：2013-05-23
申请号：PCT/US2012/064829
申请日：2012-11-13
申请人： GTAT, CORPORATION , SMICK, Theodore , RYDING, Geoffrey , GLAVISH, Hilton , SAKASE, Takao , PARK, William , EIDE, Paul , ARNOLD, Drew , HORNER, Ronald , GILLESPIE, Joseph
发明人： SMICK, Theodore , RYDING, Geoffrey , GLAVISH, Hilton , SAKASE, Takao , PARK, William , EIDE, Paul , ARNOLD, Drew , HORNER, Ronald , GILLESPIE, Joseph
IPC分类号： H01J37/317 , H01L21/265 , H01L31/18
CPC分类号： C23C14/48 , H01J37/1475 , H01J37/20 , H01J37/3171 , H01J2237/1523 , H01J2237/20214
摘要： Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H + , is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.
摘要翻译：使用鼓式扫描轮的离子注入装置保持总锥角小于60°的晶片。准直的扫描的离子束，例如H +，沿着与扫描轮的旋转轴线成至少45°的角度的最终光束路径被引导。在扫描或质量分析之前，从源中提取离子并沿线性加速路径加速至高注入能量（大于500keV）。质量分析器可以位于旋转轴附近，并且不需要的离子被引导到可以安装在扫描轮上的环形光焦点。

4. 发明申请

WO2009134345A2 GAS BEARING ELETROSTATIC CHUCK 审中-公开
标题翻译：气体轴承静电卡盘
公开(公告)号：WO2009134345A2
公开(公告)日：2009-11-05
申请号：PCT/US2009/002569
申请日：2009-04-23
申请人： AXCELIS TECHNOLOGIES, INC , LEE, W , LAFONTAINE, Marvin , PUROHIT, Ashwin , GILLESPIE, Joseph , BECKEL, Donovan , TAO, Teng, Chao , SLOCUM, Alexander , NAYFEH, Samir
发明人： LEE, W , LAFONTAINE, Marvin , PUROHIT, Ashwin , GILLESPIE, Joseph , BECKEL, Donovan , TAO, Teng, Chao , SLOCUM, Alexander , NAYFEH, Samir
IPC分类号： H02N13/00
CPC分类号： H01L21/6831
摘要： An electrostatic clamp is provided having a clamping plate, wherein the clamping plate has a central region and an annulus region. A plurality of gas supply orifices are defined in the central region of the clamping plate, wherein the plurality of gas supply orifices are in fluid communication with a pressurized gas supply, and wherein the pressurized gas supply is configured to provide a cushion of gas between the clamping surface and the workpiece in the central region of the clamping plate via the plurality of gas supply orifices. One or more gas return orifices defined in one or more of the central region and annulus region of the clamping plate, wherein the one or more gas return orifices are in fluid communication with a vacuum source, therein generally defining an exhaust path for the cushion of gas. A seal is disposed in the annulus region of the clamping plate, wherein the seal is configured to generally prevent a leakage of the cushion of gas from the central region to an environment external to the annulus region. One or more electrodes are further electrically connected to a first voltage potential to provide a first clamping force.
摘要翻译：提供一种具有夹板的静电夹具，其中夹板具有中心区域和环形区域。多个气体供应孔被限定在夹板的中心区域中，其中多个气体供应孔与加压气体供应源流体连通，并且其中加压气体供应源被配置为在夹紧表面和工件通过多个供气孔位于夹板的中心区域。一个或多个气体返回孔口限定在夹板的中心区域和环空区域的一个或多个中，其中所述一个或多个气体返回孔口与真空源流体连通，其中通常限定用于加油站。密封件设置在夹板的环形区域中，其中密封件构造成大致防止气体垫从中心区域泄漏到环形区域外部的环境。一个或多个电极进一步电连接到第一电压电位以提供第一夹紧力。

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