专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2012105832A8 APPARATUS FOR ATOMIC LAYER DEPOSITION 审中-公开
公开(公告)号：WO2012105832A8
公开(公告)日：2012-08-09
申请号：PCT/NL2012/050050
申请日：2012-01-30
申请人： NEDERLANDSE ORGANISATIE VOOR TOEGEPAST- NATUURWETENSCHAPPELIJK ONDERZOEK TNO , VERMEER, Adrianus Johannes Petrus Maria
发明人： VERMEER, Adrianus Johannes Petrus Maria
IPC分类号： C23C16/44 , C23C16/458 , C23C16/54 , C23C16/455 , B08B5/02
摘要： Apparatus for atomic layer deposition on a surface of a sheeted substrate, comprising: an injector head comprising a deposition space provided with a precursor supply and a precursor drain; said supply and drain arranged for providing a precursor gas flow from the precursor supply via the deposition space to the precursor drain; the deposition space in use being bounded by the injector head and the substrate surface; a gas bearing comprising a bearing gas injector, arranged for injecting a bearing gas between the injector head and the substrate surface, the bearing gas thus forming a gas-bearing; a conveying system providing relative movement of the substrate and the injector head along a plane of the substrate to form a conveying plane along which the substrate is conveyed. A support part arranged opposite the injector head, the support part constructed to provide a gas bearing pressure arrangement that balances the injector head gas-bearing in the conveying plane, so that the substrate is held supportless by said gas bearing pressure arrangement in between the injector head and the support part.

2. 发明申请

WO2011105908A1 APPARATUS AND METHOD FOR REACTIVE ION ETCHING 审中-公开
标题翻译：用于反应离子蚀刻的装置和方法
公开(公告)号：WO2011105908A1
公开(公告)日：2011-09-01
申请号：PCT/NL2011/050138
申请日：2011-02-25
申请人： NEDERLANDSE ORGANISATIE VOOR TOEGEPAST- NATUURWETENSCHAPPELIJK ONDERZOEK TNO , ROOZEBOOM, Freddy , LANKHORST, Adriaan Marinus , POODT, Paulus Willibrordus George , KOSTER, Norbertus Benedictus , WINANDS, Gerardus Johan Jozef , VERMEER, Adrianus Johannes Petrus Maria
发明人： ROOZEBOOM, Freddy , LANKHORST, Adriaan Marinus , POODT, Paulus Willibrordus George , KOSTER, Norbertus Benedictus , WINANDS, Gerardus Johan Jozef , VERMEER, Adrianus Johannes Petrus Maria
IPC分类号： H01L21/00 , H01L21/3065 , C23C16/455 , H01J37/32
CPC分类号： H01L21/3065 , C23C16/0245 , C23C16/45525 , H01J37/32366 , H01J37/3244 , H01J37/32449 , H01J37/32623 , H01J37/32706 , H01J2237/3341 , H01L21/30655 , H01L21/67028
摘要： The invention relates to an apparatus (1) for reactive ion etching of a substrate (5), comprising: a plasma etch zone (2) including an etch gas supply (40) and arranged with a plasma generating structure (22) for igniting a plasma (4) and comprising an electrode structure arranged to accelerate the etch plasma toward a substrate portion to have ions impinge on the surface of the substrate (5); a passivation zone (3) including a cavity (8) provided with a passivation gas supply (41); said supply (41) arranged for providing a passivation gas flow from the supply to the cavity (8); the cavity (8) in use being bounded by the injector head (1) and the substrate surface; and a gas purge structure (7) comprising a gas exhaust (6) arranged between said etch zone (2) and passivation zone (3); the gas purge structure (7) thus forming a spatial division of the etch (2) and passivation (3) zones.
摘要翻译：本发明涉及一种用于衬底（5）的反应离子蚀刻的设备（1），包括：等离子体蚀刻区（2），其包括蚀刻气体供应（40）并且布置有等离子体产生结构（22），用于点燃等离子体（4）并且包括电极结构，其布置成将蚀刻等离子体加速到衬底部分以使离子撞击在衬底（5）的表面上; 包括设置有钝化气体供应源（41）的空腔（8）的钝化区（3）; 所述供应装置（41）布置成提供从所述供应源到所述空腔（8）的钝化气体流; 所述腔（8）在使用中由所述注射器头（1）和所述基底表面限定; 和气体吹扫结构（7），其包括布置在所述蚀刻区（2）和钝化区（3）之间的排气（6）。气体吹扫结构（7）因此形成蚀刻（2）和钝化（3）区域的空间划分。

3. 发明申请

WO2011105898A1 METHOD AND DEVICE FOR LAYER DEPOSITION 审中-公开
标题翻译：用于层沉积的方法和装置
公开(公告)号：WO2011105898A1
公开(公告)日：2011-09-01
申请号：PCT/NL2011/050128
申请日：2011-02-23
申请人： NEDERLANDSE ORGANISATIE VOOR TOEGEPAST- NATUURWETENSCHAPPELIJK ONDERZOEK TNO , VISION DYNAMICS HOLDING B.V. , VERMEER, Adrianus Johannes Petrus Maria , DE HAAN, Hugo Anton Marie
发明人： VERMEER, Adrianus Johannes Petrus Maria , DE HAAN, Hugo Anton Marie
IPC分类号： C23C16/02 , C23C16/04 , C23C16/54 , C23C16/455 , H01J37/32
CPC分类号： C23C16/047 , C23C16/0245 , C23C16/45536 , C23C16/45544 , C23C16/45551 , C23C16/545 , H01J37/32366 , H01J37/32403 , H01J37/32449 , H01J37/32568 , H01J37/32623 , H01J2237/3321
摘要： Method for depositing a layer on a surface of a substrate. The method comprises injecting a precursor gas from a precursor supply into a deposition cavity for contacting the substrate surface, draining part of the injected precursor gas from the deposition cavity, and positioning the deposition cavity and the substrate relative to each other along a plane of the substrate surface. The method further comprising providing a first electrode and a second electrode, positioning the first electrode and the substrate relative to each other, and generating a plasma discharge near the substrate for contacting the substrate by generating a high-voltage difference between the first electrode and the second electrode. The method comprises generating the plasma discharge selectively, for patterning the surface by means of the plasma. A portion of the substrate contacted by the precursor gas selectively overlaps with a portion of the substrate contacted by the plasma.
摘要翻译：在基板的表面上沉积层的方法。该方法包括将前体气体从前体供应物注入到沉积腔中，用于接触衬底表面，从沉积腔排出注入的前体气体的一部分，并将沉积腔和衬底相对于彼此沿着基材表面。该方法还包括提供第一电极和第二电极，将第一电极和衬底相对于彼此定位，以及通过在第一电极和第二电极之间产生高压差而在衬底附近产生等离子体放电以接触衬底，第二电极。该方法包括选择性地产生等离子体放电，用于通过等离子体对表面进行图案化。与前体气体接触的衬底的一部分选择性地与与等离子体接触的衬底的一部分重叠。

4. 发明申请

WO2011084058A1 SYSTEM AND METHOD FOR PICKING AND PLACEMENT OF CHIP DIES 审中-公开
标题翻译：芯片的拾取和放置系统和方法
公开(公告)号：WO2011084058A1
公开(公告)日：2011-07-14
申请号：PCT/NL2011/050010
申请日：2011-01-06
申请人： NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO , VAN ZWET, Erwin John , VAN DOOREN, Léon , VERMEER, Adrianus Johannes Petrus Maria , MODDEMEIJER, Kees
发明人： VAN ZWET, Erwin John , VAN DOOREN, Léon , VERMEER, Adrianus Johannes Petrus Maria , MODDEMEIJER, Kees
IPC分类号： B25J9/16 , G05B19/401 , H01L21/68 , H05K13/04
CPC分类号： B25J9/1697 , G05B19/401 , G05B2219/40609 , G05B2219/45029 , H01L21/681 , Y10T29/53087 , Y10T29/53091 , Y10T29/53174 , Y10T29/53178
摘要： According to an aspect of the invention, there is provided a chip die 2 manipulator apparatus arranged for picking and placing of a chip die 2 in a chip manufacturing process, wherein an imaging system 11 comprising an arc form convex spherical mirror 13 arranged at a second off-axis position B and centered relative to the centre position 5; a folding mirror 4 arranged in a light path between the convex spherical mirror 13 and the centre position 5 for folding the light path to a third off-axis position C; and an arc form concave spherical mirror 15 arranged at the third off-axis position C having a curvature to image from at least one of the centre position 5 and the component 2 on the image detection system 9. The imaging system 11 corrects for the angled image detection of the centre position 5.
摘要翻译：根据本发明的一个方面，提供了一种在芯片制造过程中设置用于拾取和放置芯片芯片2的芯片芯片2的机械手装置，其中，成像系统11包括设置在第二个处的弧形凸球面镜13 离轴位置B并相对于中心位置5居中; 折叠镜4，布置在凸球面镜13和中心位置5之间的光路中，用于将光路折叠到第三离轴位置C; 以及布置在第三离轴位置C处的弧形凹球面镜15，其具有从图像检测系统9上的中心位置5和部件2中的至少一个成像的曲率。成像系统11校正成角度图像检测中心位置5。

5. 发明申请

WO2011014070A1 APPARATUS AND METHOD FOR ATOMIC LAYER DEPOSITION 审中-公开
标题翻译：用于原子层沉积的装置和方法
公开(公告)号：WO2011014070A1
公开(公告)日：2011-02-03
申请号：PCT/NL2010/050491
申请日：2010-07-30
申请人： NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO , VERMEER, Adrianus Johannes Petrus Maria , JANSSEN, Gabi P.
发明人： VERMEER, Adrianus Johannes Petrus Maria , JANSSEN, Gabi P.
IPC分类号： C23C16/455 , C23C16/458 , C23C16/54
CPC分类号： C23C16/45551 , C23C16/45595 , C23C16/4583 , C23C16/50 , C23C16/54 , C23C16/56 , F16C29/025 , F16C32/0622
摘要： Apparatus for atomic layer deposition on a surface of a sheeted substrate, comprising: an injector head comprising a deposition space provided with a precursor supply and a precursor drain; said supply and drain arranged for providing a precursor gas flow from the precursor supply via the deposition space to the precursor drain; the deposition space in use being bounded by the injector head and the substrate surface; a gas bearing comprising a bearing gas injector, arranged for injecting a bearing gas between the injector head and the substrate surface, the bearing gas thus forming a gas-bearing; a conveying system providing relative movement of the substrate and the injector head along a plane of the substrate to form a conveying plane along which the substrate is conveyed. A support part arranged opposite the injector head, the support part constructed to provide a gas bearing pressure arrangement that balances the injector head gas-bearing in the conveying plane, so that the substrate is held supportless by said gas bearing pressure arrangement in between the injector head and the support part.
摘要翻译：用于原子层沉积在片状基底的表面上的装置，包括：注射器头，其包括设置有前体供体和前体排出物的沉积空间; 所述供应和排出设置成用于从所述前体供应源经由所述沉积空间向所述前体排放提供前体气体流; 使用中的沉积空间被注射器头和衬底表面限定; 包括轴承气体注入器的气体轴承，其被布置用于在所述喷射头和所述基板表面之间注入轴承气体，所述轴承气体因此形成气体轴承; 输送系统，其提供所述基底和所述注射器头沿着所述基底的平面的相对运动，以形成所述基底沿着所述输送平面传送的输送平面。支撑部分，布置成与注射器头相对，支撑部分被构造成提供气体支承压力装置，其平衡输送平面中的喷射器头部气体轴承，使得基板由支撑压力排列保持在喷射器之间头部和支撑部分。

6. 发明申请

WO2010024675A1 PICK-AND-PLACE MACHINE 审中-公开
标题翻译：选购机
公开(公告)号：WO2010024675A1
公开(公告)日：2010-03-04
申请号：PCT/NL2009/050516
申请日：2009-08-27
申请人： Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO , KNAAPEN, Raymond Jacobus Wilhelmus , VAN ZWET, Erwin John , VERMEER, Adrianus Johannes Petrus Maria , BROERS, Sander Christiaan , VAN DER ZON, Clemens Maria Bernardus , DE JAGER, Pieter Willem Herman
发明人： KNAAPEN, Raymond Jacobus Wilhelmus , VAN ZWET, Erwin John , VERMEER, Adrianus Johannes Petrus Maria , BROERS, Sander Christiaan , VAN DER ZON, Clemens Maria Bernardus , DE JAGER, Pieter Willem Herman
IPC分类号： H05K13/04
CPC分类号： H05K13/0452 , H05K13/0413
摘要： A pick-and-place machine, comprising a frame including a shaft; a turret comprising a plurality of pick/place heads, and an inertial balance wheel, both being mounted for rotation about the axis of the shaft; a first electromechanical device for rotating the turret during pick-and-place operation and comprising a magnetic field-generating part and an electrical current-carrying, one part being on the turret and one part being on the inertial balance wheel, wherein the machine is constructed such that torque developed by the first electromechanical device causes angular acceleration of the turret in one direction and angular acceleration of the inertial balance wheel in the opposite direction.
摘要翻译：一种拾放机，包括一个包括轴的框架; 包括多个拾取/放置头的转台和惯性摆轮，两个安装用于围绕轴的轴线旋转; 第一机电装置，用于在拾取和放置操作期间旋转转台，并且包括磁场产生部分和载流电，一部分在转台上，一部分在惯性平衡轮上，其中机器是构造成使得由第一机电装置展开的扭矩导致转台在一个方向上的角加速度和惯性摆轮在相反方向上的角加速度。

7. 发明申请

WO2011099858A1 METHOD AND APPARATUS FOR DEPOSITING ATOMIC LAYERS ON A SUBSTRATE 审中-公开
标题翻译：在基材上沉积原子层的方法和装置
公开(公告)号：WO2011099858A1
公开(公告)日：2011-08-18
申请号：PCT/NL2011/050100
申请日：2011-02-11
申请人： NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO , VERMEER, Adrianus Johannes Petrus Maria , ROOZEBOOM, Freddy , VAN DEELEN, Joop
发明人： VERMEER, Adrianus Johannes Petrus Maria , ROOZEBOOM, Freddy , VAN DEELEN, Joop
IPC分类号： C23C16/54 , C23C16/455 , C23C16/458
CPC分类号： C23C16/45544 , C23C16/45551 , C23C16/45563 , C23C16/45589 , C23C16/458 , C23C16/52 , C23C16/545 , H01L21/67784
摘要： Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the deposition head along the substrate which in its turn is moved along the rotating drum.
摘要翻译：在基板上沉积原子层的方法。该方法包括从可以是可旋转滚筒的一部分的沉积头的前体气体供应源供应前体气体。前体气体从前体气体供应源朝向基底提供。该方法还包括通过沿着衬底旋转沉积头来移动前体气体源，衬底又沿旋转鼓移动。

8. 发明申请

WO2010074566A1 METHOD AND APPARATUS FOR LAYERWISE PRODUCTION OF A 3D OBJECT 审中-公开
标题翻译：用于三维对象的层生产的方法和装置
公开(公告)号：WO2010074566A1
公开(公告)日：2010-07-01
申请号：PCT/NL2009/050783
申请日：2009-12-18
申请人： NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO , VERMEER, Adrianus Johannes Petrus Maria , MAALDERINK, Herman Hendrikus , JAMAR, Jacobus Hubertus Theodoor , RIJFERS, Andries , VAES, Mark Herman Else
发明人： VERMEER, Adrianus Johannes Petrus Maria , MAALDERINK, Herman Hendrikus , JAMAR, Jacobus Hubertus Theodoor , RIJFERS, Andries , VAES, Mark Herman Else
IPC分类号： B29C67/00
CPC分类号： B29C67/007 , B29C64/129
摘要： A system and method for layerwise production of a tangible object (5), the system comprising: a construction shape (6) to form a liquid layer to be brought in contact with the tangible object; solidifying means (9) for solidifying a predetermined area of a layer (10) of the liquid (3), so as to obtain a solid layer (14) of the tangible object (5), the solid layer thus having a predetermined shape; separating means (18; 19'; 19") for separating said solid layer from said construction shape; moving means (18) for moving, relative to one another, the construction shape (6) to a predetermined position relative to the tangible object (5), for carrying out a successive such method cycle for solidifying a predetermined area of a successive such liquid layer; the system is arranged to provide a limited volume of liquid adhered to the construction shape to form a liquid layer of limited height that does not contact the tangible object; wherein said moving of said construction shape and said solidifying of said predetermined area are carried out to take place simultaneously.
摘要翻译：一种用于分层生产有形物体（5）的系统和方法，所述系统包括：构造形状（6），以形成与有形物体接触的液体层; 固化装置（9），用于固化液体（3）的层（10）的预定区域，以便获得有形物体（5）的固体层（14），所述固体层具有预定形状; 用于将所述固体层与所述结构形状分离的分离装置（18; 19'; 19“）;用于相对于彼此将所述结构形状（6）相对于所述有形物体（6）移动到预定位置的移动装置（18） 5），用于执行连续的这种方法循环，用于固化连续的这种液体层的预定区域;该系统被布置成提供附着到结构形状的有限体积的液体，以形成不具有有限高度的液体层接触有形物体;其中执行所述构造形状的移动和所述预定区域的所述固化同时进行。

9. 发明申请

WO2010024681A1 PICK- AND-PLACE MACHINE 审中-公开
标题翻译：皮革机械
公开(公告)号：WO2010024681A1
公开(公告)日：2010-03-04
申请号：PCT/NL2009/050523
申请日：2009-09-01
申请人： NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO , VERMEER, Adrianus Johannes Petrus Maria , VAN DER DONCK, Jacques Cor Johan , VAN DER ZON, Clemens Maria Bernardus , VAN ZWET, Erwin John , SNEL, Robert , DE JAGER, Pieter Willem Herman
发明人： VERMEER, Adrianus Johannes Petrus Maria , VAN DER DONCK, Jacques Cor Johan , VAN DER ZON, Clemens Maria Bernardus , VAN ZWET, Erwin John , SNEL, Robert , DE JAGER, Pieter Willem Herman
IPC分类号： H05K13/08 , H05K13/04 , H01L21/00
CPC分类号： H01L21/67144 , H05K13/08
摘要： A pick-and-place machine, comprising: a pick station; a place station; a pick/place head for transporting a die from the pick station along a transport path to the place station; wherein the machine further comprises a die-face processing means, comprising an inspection unit and/or a cleaning unit, operable to process a face of the die on the transport path.
摘要翻译：拾取机器，包括：拾取站; 一个地方站; 用于沿着运输路径将骰子从捡拾站运送到地点的捡拾/放置头; 其中所述机器还包括模具表面处理装置，其包括检查单元和/或清洁单元，其可操作以在所述传送路径上处理所述管芯的面。

10. 发明申请

WO2010024671A1 APPARATUS AND METHOD FOR ATOMIC LAYER DEPOSITION 审中-公开
标题翻译：用于原子层沉积的装置和方法
公开(公告)号：WO2010024671A1
公开(公告)日：2010-03-04
申请号：PCT/NL2009/050511
申请日：2009-08-25
申请人： NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO , MAAS, Diederik Jan , VAN SOMEREN, Bob , LEXMOND, Axel Sebastiaan , SPEE, Carolus Ida Maria Antonius , DUISTERWINKEL, Antonie Ellert , VERMEER, Adrianus Johannes Petrus Maria
发明人： MAAS, Diederik Jan , VAN SOMEREN, Bob , LEXMOND, Axel Sebastiaan , SPEE, Carolus Ida Maria Antonius , DUISTERWINKEL, Antonie Ellert , VERMEER, Adrianus Johannes Petrus Maria
IPC分类号： C23C16/455
CPC分类号： C23C16/45551
摘要： Apparatus (2) for atomic layer deposition on a surface (4) of a substrate (6). The apparatus (2) includes a precursor injector head (10), the precursor injector head (10) comprising a precursor supply (12) and a deposition space (14) that in use is bounded by the precursor injector head (10) and the substrate surface (4). The precursor injector head (10) is arranged for injecting a precursor gas from the precursor supply (12) into the deposition space (14) for contacting the substrate surface (4). The apparatus (2) is arranged for relative motion between the deposition space (14) and the substrate (6) in a plane of the substrate surface (4). The apparatus (2) is provided with a confining structure (26) arranged for confining the injected precursor gas to the deposition space (14) adjacent to the substrate surface (4).
摘要翻译：用于原子层沉积在衬底（6）的表面（4）上的装置（2）。装置（2）包括前体注入头（10），前体注入头（10）包括前体供应源（12）和沉积空间（14），其在使用中由前体注入头（10）和基板表面（4）。前体注入头（10）被布置用于将前体气体从前体供应源（12）注入到用于接触基底表面（4）的沉积空间（14）中。设备（2）布置成用于在基板表面（4）的平面中的沉积空间（14）和基板（6）之间的相对运动。设备（2）设置有限制结构（26），其被布置用于将注入的前体气体限制在与衬底表面（4）相邻的沉积空间（14）上。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式