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1. 发明申请

WO2010024681A1 PICK- AND-PLACE MACHINE 审中-公开
标题翻译：皮革机械
公开(公告)号：WO2010024681A1
公开(公告)日：2010-03-04
申请号：PCT/NL2009/050523
申请日：2009-09-01
申请人： NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO , VERMEER, Adrianus Johannes Petrus Maria , VAN DER DONCK, Jacques Cor Johan , VAN DER ZON, Clemens Maria Bernardus , VAN ZWET, Erwin John , SNEL, Robert , DE JAGER, Pieter Willem Herman
发明人： VERMEER, Adrianus Johannes Petrus Maria , VAN DER DONCK, Jacques Cor Johan , VAN DER ZON, Clemens Maria Bernardus , VAN ZWET, Erwin John , SNEL, Robert , DE JAGER, Pieter Willem Herman
IPC分类号： H05K13/08 , H05K13/04 , H01L21/00
CPC分类号： H01L21/67144 , H05K13/08
摘要： A pick-and-place machine, comprising: a pick station; a place station; a pick/place head for transporting a die from the pick station along a transport path to the place station; wherein the machine further comprises a die-face processing means, comprising an inspection unit and/or a cleaning unit, operable to process a face of the die on the transport path.
摘要翻译：拾取机器，包括：拾取站; 一个地方站; 用于沿着运输路径将骰子从捡拾站运送到地点的捡拾/放置头; 其中所述机器还包括模具表面处理装置，其包括检查单元和/或清洁单元，其可操作以在所述传送路径上处理所述管芯的面。

2. 发明申请

WO2010024675A1 PICK-AND-PLACE MACHINE 审中-公开
标题翻译：选购机
公开(公告)号：WO2010024675A1
公开(公告)日：2010-03-04
申请号：PCT/NL2009/050516
申请日：2009-08-27
申请人： Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO , KNAAPEN, Raymond Jacobus Wilhelmus , VAN ZWET, Erwin John , VERMEER, Adrianus Johannes Petrus Maria , BROERS, Sander Christiaan , VAN DER ZON, Clemens Maria Bernardus , DE JAGER, Pieter Willem Herman
发明人： KNAAPEN, Raymond Jacobus Wilhelmus , VAN ZWET, Erwin John , VERMEER, Adrianus Johannes Petrus Maria , BROERS, Sander Christiaan , VAN DER ZON, Clemens Maria Bernardus , DE JAGER, Pieter Willem Herman
IPC分类号： H05K13/04
CPC分类号： H05K13/0452 , H05K13/0413
摘要： A pick-and-place machine, comprising a frame including a shaft; a turret comprising a plurality of pick/place heads, and an inertial balance wheel, both being mounted for rotation about the axis of the shaft; a first electromechanical device for rotating the turret during pick-and-place operation and comprising a magnetic field-generating part and an electrical current-carrying, one part being on the turret and one part being on the inertial balance wheel, wherein the machine is constructed such that torque developed by the first electromechanical device causes angular acceleration of the turret in one direction and angular acceleration of the inertial balance wheel in the opposite direction.
摘要翻译：一种拾放机，包括一个包括轴的框架; 包括多个拾取/放置头的转台和惯性摆轮，两个安装用于围绕轴的轴线旋转; 第一机电装置，用于在拾取和放置操作期间旋转转台，并且包括磁场产生部分和载流电，一部分在转台上，一部分在惯性平衡轮上，其中机器是构造成使得由第一机电装置展开的扭矩导致转台在一个方向上的角加速度和惯性摆轮在相反方向上的角加速度。

3. 发明申请

WO2011084058A1 SYSTEM AND METHOD FOR PICKING AND PLACEMENT OF CHIP DIES 审中-公开
标题翻译：芯片的拾取和放置系统和方法
公开(公告)号：WO2011084058A1
公开(公告)日：2011-07-14
申请号：PCT/NL2011/050010
申请日：2011-01-06
申请人： NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO , VAN ZWET, Erwin John , VAN DOOREN, Léon , VERMEER, Adrianus Johannes Petrus Maria , MODDEMEIJER, Kees
发明人： VAN ZWET, Erwin John , VAN DOOREN, Léon , VERMEER, Adrianus Johannes Petrus Maria , MODDEMEIJER, Kees
IPC分类号： B25J9/16 , G05B19/401 , H01L21/68 , H05K13/04
CPC分类号： B25J9/1697 , G05B19/401 , G05B2219/40609 , G05B2219/45029 , H01L21/681 , Y10T29/53087 , Y10T29/53091 , Y10T29/53174 , Y10T29/53178
摘要： According to an aspect of the invention, there is provided a chip die 2 manipulator apparatus arranged for picking and placing of a chip die 2 in a chip manufacturing process, wherein an imaging system 11 comprising an arc form convex spherical mirror 13 arranged at a second off-axis position B and centered relative to the centre position 5; a folding mirror 4 arranged in a light path between the convex spherical mirror 13 and the centre position 5 for folding the light path to a third off-axis position C; and an arc form concave spherical mirror 15 arranged at the third off-axis position C having a curvature to image from at least one of the centre position 5 and the component 2 on the image detection system 9. The imaging system 11 corrects for the angled image detection of the centre position 5.
摘要翻译：根据本发明的一个方面，提供了一种在芯片制造过程中设置用于拾取和放置芯片芯片2的芯片芯片2的机械手装置，其中，成像系统11包括设置在第二个处的弧形凸球面镜13 离轴位置B并相对于中心位置5居中; 折叠镜4，布置在凸球面镜13和中心位置5之间的光路中，用于将光路折叠到第三离轴位置C; 以及布置在第三离轴位置C处的弧形凹球面镜15，其具有从图像检测系统9上的中心位置5和部件2中的至少一个成像的曲率。成像系统11校正成角度图像检测中心位置5。

4. 发明申请

WO2011102718A1 CONTINUOUS PATTERNED LAYER DEPOSITION 审中-公开
标题翻译：连续图案沉积
公开(公告)号：WO2011102718A1
公开(公告)日：2011-08-25
申请号：PCT/NL2011/050112
申请日：2011-02-17
申请人： NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO , DE GRAAF, Ariël , VAN ZWET, Erwin John , POODT, Paulus Willibrordus George , VERMEER, Adrianus Johannes Petrus Maria
发明人： DE GRAAF, Ariël , VAN ZWET, Erwin John , POODT, Paulus Willibrordus George , VERMEER, Adrianus Johannes Petrus Maria
IPC分类号： C23C16/04 , C23C16/54 , C23C16/455
CPC分类号： C23C16/45551 , C23C16/04 , C23C16/545
摘要： A method of manufacturing a substrate with a patterned layer of deposited material, the patterned layer being deposited from a processing head, the method comprising - applying bearing gas from the processing head to keep the processing head hovering over the substrate on a gas bearing; - moving the substrate and the hovering processing head relative to each other; - applying a primer material for selective deposition of a deposition material to the substrate, the primer material being applied from a first area of a surface of the processing head that faces the substrate, and spatially patterning the primer on the substrate after or during application; - applying the deposition material to the substrate from a second area of the surface of the processing head that faces the substrate, the second area lying downstream of the first area in a direction of the movement of the substrate relative to the processing head.
摘要翻译：一种制造具有沉积材料的图案化层的衬底的方法，所述图案化层从处理头沉积，所述方法包括 - 从所述处理头施加轴承气体以将所述处理头保持在所述衬底上的气体轴承上; - 相对于彼此移动基板和悬停处理头; - 施加用于选择性沉积沉积材料的底漆材料，所述底漆材料从所述处理头的面向所述基材的表面的第一区域施加，并且在涂布之后或施加期间在所述基材上进行空间图案化; - 从所述处理头的面向所述衬底的表面的第二区域将所述沉积材料施加到所述衬底，所述第二区域在所述衬底相对于所述处理头的移动方向上位于所述第一区域的下游。

5. 发明申请

WO2008108653A1 METHOD AND SYSTEM FOR REMOVING UNDESIRED PLANT PARTS 审中-公开
标题翻译：用于去除不利植物部分的方法和系统
公开(公告)号：WO2008108653A1
公开(公告)日：2008-09-12
申请号：PCT/NL2008/050135
申请日：2008-03-07
申请人： NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO , ZEELEN, Ronald , VAN ZWET, Erwin John
发明人： ZEELEN, Ronald , VAN ZWET, Erwin John
IPC分类号： A01G1/06 , A01G5/00 , A01G7/00 , A01G7/06 , A01H4/00
CPC分类号： A01G3/00 , A01G7/06 , A01G2003/005 , A01G2005/005
摘要： Method and system for removing undesired plant parts (9). A first cap (7) and means (13) are provided for lowering that cap over the supposed plant parts location, pushing downwards any leafs (8) etc. Around the supposed plant parts location. Means (15) are provided for making at least one image of the supposed plant parts location from several sides through the cap. Processing means (3) process the image (s) of the supposed plant parts location and localize any plant part to be removed. Means (16) are provided for excising any plant part through the first cap under control of said processing means (3). A second cap (14) may be provided extending outside and arranged co-movable with the first cap (7). The means for making at least one image of the supposed plant parts location and the means for excising any plant part to be removed reside inside the gap between the first cap and the second cap.
摘要翻译：用于去除不期望的植物部件的方法和系统（9）。提供第一盖（7）和装置（13），用于将所述盖子降低到所述假定的植物部件位置上，向下推动任何叶片（8）等。围绕假定的植物部件位置。提供装置（15）用于通过盖从多个侧面制造假定的植物部分位置的至少一个图像。处理装置（3）处理假定的植物部分位置的图像，并定位待移除的任何植物部分。提供装置（16），用于在所述处理装置（3）的控制下通过第一盖板切除任何植物部分。第二盖（14）可以设置成向外延伸并与第一盖（7）共同移动。用于制造假定的植物部位位置的至少一个图像的装置和用于切除要移除的任何植物部分的装置驻留在第一帽和第二帽之间的间隙内。

6. 发明申请

WO2010032224A2 LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRAPHIC METHOD 审中-公开
标题翻译：光栅设备，可编程格式设备和光刻方法
公开(公告)号：WO2010032224A2
公开(公告)日：2010-03-25
申请号：PCT/IB2009/054135
申请日：2009-09-21
申请人： ASML NETHERLANDS B.V. , DE JAGER, Pieter Willem Herman , BANINE, Vadim Yevgenyevich , BENSCHOP, Jozef Petrus Henricus , GUI, Cheng-Qun , ONVLEE, Johannes , VAN ZWET, Erwin John
发明人： DE JAGER, Pieter Willem Herman , BANINE, Vadim Yevgenyevich , BENSCHOP, Jozef Petrus Henricus , GUI, Cheng-Qun , ONVLEE, Johannes , VAN ZWET, Erwin John
IPC分类号： G03F7/20
CPC分类号： G03F7/70183 , G03F7/70275 , G03F7/70291 , G03F7/70391 , G03F7/704
摘要： In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.
摘要翻译：在一个实施例中，公开了一种光刻设备，其包括调制器，其被配置为将基板的曝光区域暴露于根据期望图案调制的多个光束;以及投影系统，该投影系统配置成将经调制的光束投影到基板上。调制器可以相对于曝光区域可移动，和/或投影系统可以具有用于接收多个光束的透镜阵列，透镜阵列可相对于曝光区域移动。

7. 发明申请

WO2016159768A1 MULTI-BEAM LASER SYSTEM 审中-公开
标题翻译：多光束激光系统
公开(公告)号：WO2016159768A1
公开(公告)日：2016-10-06
申请号：PCT/NL2016/050222
申请日：2016-03-31
申请人： NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO
发明人： PETTAZZI, Federico , VAN ZWET, Erwin John , VAN BEIJNUM, Frerik
IPC分类号： H01S3/08 , H01S5/04 , H01S3/07 , H01S5/40
CPC分类号： H01S3/0602 , H01S3/0405 , H01S3/0604 , H01S3/0621 , H01S3/094053 , H01S3/094076 , H01S3/09415 , H01S3/1024 , H01S3/2383
摘要： A multi-beam laser cavity unit (10) comprises a laser crystal (13) and lens array (14) disposed in the laser cavity (LC). The lens array comprises an integral piece formed by a plurality of interconnected lenses. Each lens (14a) is configured to form a respective closed optical path (OPa) along the length (Z) of the laser cavity (LC) between the cavity mirrors (11,12) through the laser crystal (13) corresponding to a cavity mode for generating one (LBa) of the plurality of parallel laser beams (LB). The cavity unit (10) can be comprised in a laser system receiving pump light (PL) from a plurality of light sources. For example, the system can be used in a maskless patterning device.
摘要翻译：多光束激光腔单元（10）包括设置在激光腔（LC）中的激光晶体（13）和透镜阵列（14）。透镜阵列包括由多个互连透镜形成的整体片。每个透镜（14a）被配置成沿着激光腔（LC）的长度（Z），通过激光晶体（13）在空腔反射镜（11,12）之间形成相应的闭合光路（OPa）用于生成多个平行激光束（LB）中的一个（LBa）的模式。空腔单元（10）可以包括在从多个光源接收泵浦光（PL）的激光系统中。例如，该系统可以用在无掩模图案形成装置中。

8. 发明申请

WO2017105240A1 HIGH POWER ADAPTIVE MIRROR 审中-公开
标题翻译：高功率自适应镜子
公开(公告)号：WO2017105240A1
公开(公告)日：2017-06-22
申请号：PCT/NL2016/050883
申请日：2016-12-16
申请人： NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO
发明人： VAN ZWET, Erwin John , VAN DEN DOOL, Teunis Cornelis , NIEUWKOOP, Evert
IPC分类号： G02B26/06 , G02B26/08
CPC分类号： G02B26/0825 , G02B26/06 , G02B26/0841 , G02B26/0866
摘要： According to an aspect of the invention, there is provided a mirror structure for adaptive optics devices, characterized in that it comprises: an elastically deformable layer in response to an applied force, said deformable layer comprising a central portion reflective to said an incident light beam (F); a support substrate positioned spaced with respect to said deformable layer; a spacer element connected to said elastically deformable layer and support substrate and positioned there between, said spacer element being arranged so that the separation distance between said first and second inner surface is in the range between 2 and 100 micron; an inner chamber at least partially defined by said first and substrate and by said spacer element, said inner chamber containing a pressurized gas (G); an actuator system capable of causing a deformation of said central portion counteracting the pressure of said pressurized gas; wherein, in use, said central portion is deformed according to profiles such as to control said light beam. Advantages may include thermal robustness and improved dimensional scaling properties.
摘要翻译：根据本发明的一个方面，提供了一种用于自适应光学装置的反射镜结构，其特征在于其包括：响应于所施加的力的可弹性变形层，所述可变形层包括中央对所述入射光束（F）反射的部分; 相对于所述可变形层间隔设置的支撑基板; 连接到所述可弹性变形层和支撑衬底并定位在其间的间隔元件，所述间隔元件布置成使得所述第一和第二内表面之间的分隔距离在2和100微米之间的范围内; 至少部分地由所述第一和衬底以及所述隔离元件限定的内室，所述内室包含加压气体（G）; 致动器系统，所述致动器系统能够引起所述中心部分的变形抵消所述加压气体的压力; 其中在使用中，所述中央部分根据轮廓变形以控制所述光束。优势可能包括热稳定性和改进的尺寸缩放性能。

9. 发明申请

WO2017086787A1 METHOD OF DETERMINING AN OVERLAY ERROR, MANUFACTURING METHOD AND SYSTEM FOR MANUFACTURING OF A MULTILAYER SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE MANUFACTURED THEREBY 审中-公开
标题翻译：确定覆盖误差的方法，用于制造多层半导体器件的制造方法和系统以及由其制造的半导体器件
公开(公告)号：WO2017086787A1
公开(公告)日：2017-05-26
申请号：PCT/NL2016/050803
申请日：2016-11-17
申请人： NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO
发明人： KUIPER, Stefan , VAN ZWET, Erwin John , BÄUMER, Stefan Michael Bruno , SADEGHIAN MARNANI, Hamed
IPC分类号： H01L21/66 , G03F7/20
CPC分类号： H01L22/12 , G03F7/70633 , H01L22/20
摘要： Method of determining an overlay error, manufacturing method and system for manufacturing of a multilayer semiconductor device, and semiconductor device manufactured thereby. This document describes a method of determining an overlay error during manufacturing of a multilayer semiconductor device. Manufacturing of the semiconductor device comprises forming a stack of material layers comprising depositing of at least two subsequent patterned layers (26, 27) of semiconductor material, the patterned layers comprising a first patterned layer (26) having a first marker element (29) and a second patterned layer (27) having a second marker element (37). The determining of the overlay error comprises determining relative positions of the first and second marker element in relation to each other, such as to determine the overlay error between the first patterned layer and the second patterned layer. In addition an imaging step is performed on at least one of said first and second patterned layer, for determining relative positions of the respective first (29) or second (37) marker element and a pattern feature of a device pattern (30, 36) comprised by said respective first (26) and second (27) patterned layer.
摘要翻译：确定重叠误差的方法，用于制造多层半导体器件的制造方法和系统以及由此制造的半导体器件。该文件描述了在制造多层半导体器件期间确定重叠误差的方法。所述半导体器件的制造包括形成包括沉积至少两个半导体材料的后续图案化层（26,27）的材料层堆叠，所述图案化层包括具有第一标记元件（29）的第一图案化层（26）和具有第二标记元件（37）的第二图案化层（27）。确定重叠误差包括确定第一和第二标记元件相对于彼此的相对位置，例如以确定第一图案化层和第二图案化层之间的重叠误差。此外，在所述第一和第二图案化层中的至少一个上执行成像步骤，用于确定相应的第一（29）或第二（37）标记元件和器件图案（30,36）的图案特征的相对位置，由所述相应的第一图案层（26）和第二图案层（27）构成。

10. 发明申请

WO2019112423A1 SUBSURFACE INSPECTION METHOD AND SYSTEM 审中-公开
公开(公告)号：WO2019112423A1
公开(公告)日：2019-06-13
申请号：PCT/NL2018/050806
申请日：2018-12-03
申请人： NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO
发明人： KOEK, Wouter Dick , VAN ZWET, Erwin John
IPC分类号： G01N21/95 , G01N21/17 , G03F7/20 , G01B21/08 , G01S15/89 , G01N29/24 , G01B11/06 , G01B11/24 , G01N29/04 , G01N29/06
摘要： A subsurface inspection method and system (1) for detecting internal defects (2) and/or overlay/misalignment in a semiconductor wafer (4). A measurement laser beam (6) is split into a laser probe beam (8) and a reference laser beam (10). The laser probe beam is transmitted to a wafer surface (12). A laser excitation pulse (14) is transmitted impinging the wafer surface for causing an ultrasound wave propagating through the wafer and causing wafer surface movement when reflected back from an encountered subsurface feature. The laser probe beam and the reference laser beam are recombined in an optical interference detector (18) and the subsurface feature inside the wafer is detected by a deviation of a detected phase difference. The laser probe beam and the reference laser beam are guided through an optic (20) prior to arriving at the optical interference detector. The optic has a dispersive characteristic dimensioned to enlarge the phase difference between the reference beam and the wave length shifted probe beam.

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