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    • 1. 发明授权
    • Displacement-measuring optical device with orifice
    • 带孔的位移测量光学装置
    • US07518737B2
    • 2009-04-14
    • US11405053
    • 2006-04-17
    • Neal Allen HallFahrettin Levent Degertekin
    • Neal Allen HallFahrettin Levent Degertekin
    • G01B9/02G01B11/02
    • G01B11/026G01B9/02051G01B2290/30G01D5/266H04R23/008
    • Micron-scale displacement measurement devices having enhanced performance characteristics are disclosed. One embodiment of a micron-scale displacement measurement device includes a phase-sensitive reflective diffraction grating for reflecting a first portion of an incident light and transmitting a second portion of the incident light such that the second portion of the incident light is diffracted. The device can further include a mechanical structure having a first region and a second region, the mechanical structure positioned a distance d above the diffraction grating and forming a wall of a cavity, the second portion of the incident light is reflected off of the first region of the structure such that an interference pattern is formed by the reflected first portion and the reflected second portion of the incident light. The device can further include an orifice formed in the cavity to provide for the passage of air between the inside and outside of the cavity.
    • 公开了具有增强的性能特性的微米尺度位移测量装置。 微米尺度位移测量装置的一个实施例包括用于反射入射光的第一部分并透射入射光的第二部分的相敏反射衍射光栅,使得入射光的第二部分被衍射。 该装置还可以包括具有第一区域和第二区域的机械结构,机械结构定位在衍射光栅上方的距离d并形成空腔的壁,入射光的第二部分被反射离开第一区域 的结构,使得由入射光的反射的第一部分和反射的第二部分形成干涉图案。 该装置还可以包括形成在空腔中的孔口,以在空腔的内部和外部之间提供空气的通过。
    • 2. 发明授权
    • Highly-sensitive displacement-measuring optical device
    • 高灵敏度位移测量光学器件
    • US07440117B2
    • 2008-10-21
    • US11405051
    • 2006-04-17
    • Fahrettin Levent DegertekinNeal Allen HallWook Lee
    • Fahrettin Levent DegertekinNeal Allen HallWook Lee
    • G01B11/02G01B9/02
    • G01B11/02G01D5/266
    • Micron-scale displacement measurement devices having enhanced performance characteristics are disclosed. One embodiment of a micron-scale displacement measurement device includes a phase-sensitive reflective diffraction grating for reflecting a first portion of an incident light and transmitting a second portion of the incident light such that the second portion of the incident light is diffracted. The device further includes a mechanical structure having a first region and a second region, the mechanical structure positioned a distance d above the diffraction grating, the second portion of the incident light is reflected off of the first region of the structure such that an interference pattern is formed by the reflected first portion and the reflected second portion of the incident light. The device can further include an electrode extending toward, but spaced a distance away from, the second region of the mechanical structure.
    • 公开了具有增强的性能特性的微米尺度位移测量装置。 微米尺度位移测量装置的一个实施例包括用于反射入射光的第一部分并透射入射光的第二部分的相敏反射衍射光栅,使得入射光的第二部分被衍射。 该装置还包括具有第一区域和第二区域的机械结构,机械结构定位在衍射光栅上方的距离d处,入射光的第二部分被反射离开结构的第一区域,使得干涉图案 由反射的第一部分和入射光的反射的第二部分形成。 该装置还可以包括延伸到机械结构的第二区域的距离但间隔开距离的电极。
    • 4. 发明授权
    • Highly-sensitive displacement-measuring optical device
    • 高灵敏度位移测量光学器件
    • US07116430B2
    • 2006-10-03
    • US10704932
    • 2003-11-10
    • Fahrettin Levent DegertekinNeal Allen HallWook Lee
    • Fahrettin Levent DegertekinNeal Allen HallWook Lee
    • G01B11/02G01B9/02
    • G01B11/026G01B9/02023G01B2290/30
    • The present invention relates to micron-scale displacement measurement devices. A first embodiment is a device that includes a substrate and a rigid structure suspended above the substrate to form a backside cavity. Formed in the rigid structure is a reflective diffraction grating positioned to reflect a first portion of an incident light and transmit a second portion of the incident light such that the second portion of the incident light is diffracted. The device also includes a membrane positioned a distance d above the reflective diffraction grating and at least a first photo-detector for receiving interference patterns produced from the first portion of the incident light reflected from the diffraction grating and the second portion of the incident light reflected from the membrane.
    • 本发明涉及微米级位移测量装置。 第一实施例是一种装置,其包括基板和悬挂在基板上方的刚性结构以形成背侧空腔。 形成在刚性结构中的反射衍射光栅被定位成反射入射光的第一部分并透射入射光的第二部分,使得入射光的第二部分被衍射。 该装置还包括位于反射衍射光栅上方距离d处的膜和至少第一光电检测器,用于接收从衍射光栅反射的入射光的第一部分产生的干涉图案,并将入射光的第二部分反射 从膜。
    • 5. 发明授权
    • Overlay measurement methods with firat based probe microscope
    • 覆盖测量方法与基于探针显微镜
    • US07461543B2
    • 2008-12-09
    • US11548531
    • 2006-10-11
    • Fahrettin Levent Degertekin
    • Fahrettin Levent Degertekin
    • G01B5/28
    • G01Q70/02G01Q20/04G01Q60/38
    • A method, system and unit for determining alignment in a layered device such as a semiconductor device includes providing a first layer having detectable surface and subsurface material properties and positioning a patterned photoresist layer over the first layer, patterned photoresist layer having detectable surface and subsurface material properties. The layers are imaged with a FIRAT probe to detect the material properties, and the detectable material properties are compared for mapping an alignment of the compared detectable material properties. The first layer may be a substrate or have a previously processed layer formed thereon. A surface topography may be included over the substrate and an etchable layer formed over the substrate or first layer. The FIRAT probe may be a single tip probe or a dual tip probe.
    • 用于确定诸如半导体器件的分层器件中的对准的方法,系统和单元包括提供具有可检测表面和次表面材料性质的第一层,并将图案化光致抗蚀剂层定位在第一层之上,具有可检测表面和表面下材料的图案化光致抗蚀剂层 属性。 这些层用FIRAT探针成像以检测材料性质,并且比较可检测的材料性质以绘制比较的可检测材料性质的对准。 第一层可以是衬底或者在其上形成预先处理的层。 表面形貌可以包括在衬底上,并且可蚀刻层形成在衬底或第一层上。 FIRAT探针可以是单个尖端探针或双尖端探针。
    • 8. 发明授权
    • Cantilevers with integrated actuators for probe microscopy
    • 具有集成执行器的悬臂用于探针显微镜
    • US07797757B2
    • 2010-09-14
    • US11838547
    • 2007-08-14
    • Fahrettin Levent Degertekin
    • Fahrettin Levent Degertekin
    • G01Q20/04
    • G01Q20/04G01Q10/045G01Q60/38
    • An atomic force microscopy sensor includes a substrate, a cantilever beam and an electrostatic actuator. The cantilever beam has a proximal end and an opposite distal end. The proximal end is in a fixed relationship with the substrate and the cantilever beam is configured so that the distal end is in a moveable relationship with respect to the substrate. The electrostatic actuator includes a first electrode that is coupled to the cantilever beam adjacent to the proximal end and a spaced apart second electrode that is in a fixed relationship with the substrate. When an electrical potential is applied between the first electrode and the second electrode, the first electrode is drawn to the second electrode, thereby causing the distal end of the cantilever beam to move.
    • 原子力显微镜传感器包括基底,悬臂梁和静电致动器。 悬臂梁具有近端和相对的远端。 近端与衬底处于固定关系,并且悬臂梁被配置为使得远端相对于衬底处于可移动的关系。 静电致动器包括耦合到邻近近端的悬臂梁的第一电极和与衬底成固定关系的间隔开的第二电极。 当在第一电极和第二电极之间施加电势时,第一电极被拉到第二电极,从而使悬臂梁的远端移动。