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1. 发明授权

US07289219B2 Polarimetric scatterometry methods for critical dimension measurements of periodic structures 有权
标题翻译：周期性结构关键尺寸测量的极化散射法
公开(公告)号：US07289219B2
公开(公告)日：2007-10-30
申请号：US11105099
申请日：2005-04-13
申请人： Adam E. Norton , Abdurrahman Sezginer , Fred E. Stanke
发明人： Adam E. Norton , Abdurrahman Sezginer , Fred E. Stanke
IPC分类号： G01N21/55 , G01J4/00
CPC分类号： G01B11/02 , G01J3/02 , G01J3/0294 , G01N21/211 , G01N21/25 , G01N21/474 , G01N21/9501 , G01N21/956 , G01N2021/213
摘要： An optical measurement system for evaluating a sample has a motor-driven rotating mechanism coupled to an azimuthally rotatable measurement head, allowing the optics to rotate with respect to the sample. A polarimetric scatterometer, having optics directing a polarized illumination beam at non-normal incidence onto a periodic structure on a sample, can measure optical properties of the periodic structure. An E-O modulator in the illumination path can modulate the polarization. The head optics collect light reflected from the periodic structure and feed that light to a spectrometer for measurement. A beamsplitter in the collection path can ensure both S and P polarization from the sample are separately measured. The measurement head can be mounted for rotation of the plane of incidence to different azimuthal directions relative to the periodic structures. The instrument can be integrated within a wafer process tool in which wafers may be provided at arbitrary orientation.
摘要翻译：用于评估样品的光学测量系统具有耦合到方位角可旋转测量头的电动机旋转机构，允许光学器件相对于样品旋转。具有将非正常入射的偏振照明光束引导到样品上的周期性结构上的光学偏振散射仪可以测量周期性结构的光学性质。照明路径中的E-O调制器可以调制偏振。头部光学器件收集从周期性结构反射的光并将光馈送到光谱仪进行测量。收集路径中的分束器可以确保来自样品的S和P极化分别测量。测量头可以安装成相对于周期性结构使入射平面旋转到不同的方位角方向。仪器可以集成在晶片工艺工具中，其中可以以任意取向提供晶片。

2. 发明授权

US07042580B1 Apparatus for imaging metrology 有权
标题翻译：成像计量仪器
公开(公告)号：US07042580B1
公开(公告)日：2006-05-09
申请号：US09533613
申请日：2000-03-22
申请人： Fred E. Stanke , Clinton B. Carlisle , Hung Pham , Edric Tong , Douglas E. Ruth , James M. Cahill , Michael Weber , Elliot Burke
发明人： Fred E. Stanke , Clinton B. Carlisle , Hung Pham , Edric Tong , Douglas E. Ruth , James M. Cahill , Michael Weber , Elliot Burke
IPC分类号： G01B11/24
CPC分类号： G01B11/0625 , B24B37/042 , B24B49/12 , G01B11/30 , G01N21/55 , G01N21/8422 , G01N21/9501 , G01N2021/8825 , H01L21/67259
摘要： This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.
摘要翻译：本发明是一种用于成像测量的装置，其在特定实施例中可以与处理器站集成，使得计量站离开处理站而不是耦合到处理站。计量站设置有具有包含测量区域的第一视野的第一成像照相机。替代实施例包括具有第二视野的第二成像相机。优选实施例包括宽带紫外光源，但是其他实施例可以具有宽或窄光带宽的可见光或近红外光源。包括宽带宽源的实施例通常包括光谱仪或成像光谱仪。具体实施例可以包括弯曲的，反射光学的或由液体润湿的测量区域。在典型的实施例中，计量站和测量区域被配置为具有相对于彼此的4个移动自由度。

3. 发明授权

US06919958B2 Wafer metrology apparatus and method 失效
标题翻译：晶圆计量仪器及方法
公开(公告)号：US06919958B2
公开(公告)日：2005-07-19
申请号：US10397917
申请日：2003-03-26
申请人： Fred E. Stanke , Clinton B. Carlisle , Hung Van Pham , Edric Tong , Douglas E. Ruth , James M. Cahill, Jr. , Michael Weber-Grabau , Elliot Burke , Adam E. Norton
发明人： Fred E. Stanke , Clinton B. Carlisle , Hung Van Pham , Edric Tong , Douglas E. Ruth , James M. Cahill, Jr. , Michael Weber-Grabau , Elliot Burke , Adam E. Norton
IPC分类号： B24B49/12 , G01B11/06 , G01B11/30 , G01N21/21 , G01N21/95 , H01L21/66 , H01L21/67 , G01N21/88
CPC分类号： H01L21/67 , B24B49/12 , G01B11/0625 , G01B11/30 , G01N21/211 , H01L22/12
摘要： This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.
摘要翻译：本发明是一种用于成像测量的装置，其在特定实施例中可以与处理器站集成，使得计量站离开处理站而不是耦合到处理站。计量站设置有具有包含测量区域的第一视野的第一成像照相机。替代实施例包括具有第二视野的第二成像相机。优选实施例包括宽带紫外光源，但是其他实施例可以具有宽或窄光带宽的可见光或近红外光源。包括宽带宽源的实施例通常包括光谱仪或成像光谱仪。具体实施例可以包括弯曲的，反射光学的或由液体润湿的测量区域。在典型的实施例中，计量站和测量区域被配置为具有相对于彼此的4个移动自由度。

4. 发明授权

US06768967B2 Database interpolation method for optical measurement of diffractive microstructures 失效
$Database interpolation method for optical measurement of diffractive microstructures$
标题翻译：衍射微观结构的光学测量数据库插值方法
公开(公告)号：US06768967B2
公开(公告)日：2004-07-27
申请号：US09927177
申请日：2001-08-10
申请人： Kenneth C. Johnson , Fred E. Stanke
发明人： Kenneth C. Johnson , Fred E. Stanke
IPC分类号： G01B1106
CPC分类号： G02B5/18 , G01N21/4788 , G01N21/9501 , G01N21/956
摘要： A database interpolation method is used to rapidly calculate a predicted optical response characteristic of a diffractive microstructure as part of a real-time optical measurement process. The interpolated optical response is a continuous and (in a preferred embodiment) smooth function of measurement parameters, and it matches the theoretically-calculated optical response at the database-stored interpolation points.
摘要翻译：数据库插值方法用于快速计算衍射微结构的预测光学响应特性，作为实时光学测量过程的一部分。内插的光学响应是连续的（在优选实施例中）测量参数的平滑功能，并且它与在数据库存储的插值点处的理论计算的光学响应相匹配。

5. 发明授权

US06753961B1 Spectroscopic ellipsometer without rotating components 有权
标题翻译：光学椭偏仪无旋转元件
公开(公告)号：US06753961B1
公开(公告)日：2004-06-22
申请号：US09956356
申请日：2001-09-18
申请人： Adam E. Norton , Kenneth C. Johnson , Fred E. Stanke , Abdurrahman Sezginer
发明人： Adam E. Norton , Kenneth C. Johnson , Fred E. Stanke , Abdurrahman Sezginer
IPC分类号： G01J400
CPC分类号： G01J3/447 , G01J4/00 , G01N21/211 , G01N21/274 , G01N2021/213
摘要： A spectroscopic ellipsometer having a multiwavelength light source, spectrometer (or wavelength-scanning monochromator and photodetector), a polarizer and polarization analyzer, and one or more objectives in the illumination and collection light paths, further comprises a stationary polarization modulator that modulates the light polarization versus wavelength. Modulator can be an optically active crystal rotating the linear polarization plane by a different angle for each wavelength or a non-achromatic waveplate retarder that varies the relative phase delay of the polarization components periodically over wavelength. The measured spectrum can be used to characterize selected features or parameters of a sample, e.g. by comparison with one or more theoretical spectra.
摘要翻译：具有多波长光源，光谱仪（或波长扫描单色仪和光电检测器），偏振器和偏振分析器以及照明和采集光路中的一个或多个目标的光谱椭偏仪还包括调制光偏振的固定偏振调制器对波长。调制器可以是旋转线性偏振平面对于每个波长旋转不同角度的光学活性晶体，或者是在波长周期性地改变偏振分量的相对相位延迟的非消色差波片延迟器。测量的光谱可用于表征所选择的特征或样品的参数，例如。通过与一个或多个理论光谱进行比较。

6. 发明授权

US5274604A Method for spatially filtering signals representing formation and channel echoes in a borehole environment 失效
标题翻译：用于在井眼环境中空间滤波表示地层和声道回波的信号的方法
公开(公告)号：US5274604A
公开(公告)日：1993-12-28
申请号：US960524
申请日：1992-10-13
申请人： Ralph M. D'Angelo , Fred E. Stanke , Hung-Wen Chang , Kai Hsu
发明人： Ralph M. D'Angelo , Fred E. Stanke , Hung-Wen Chang , Kai Hsu
IPC分类号： G01V1/50 , G01V1/40
CPC分类号： G01V1/50
摘要： A method and apparatus for spatially filtering a signal set to enhance interface echoes representing a borehole configuration. The spatial filtering technique provides information regarding the various interfaces formed between materials in the borehole environment, as well as thicknesses of the various materials present in the borehole. Further, the presence of channels formed during the cementing procedure are detected.
摘要翻译：一种用于空间滤波信号集以增强表示井眼配置的接口回波的方法和装置。空间滤波技术提供了有关钻孔环境中材料之间形成的各种界面的信息以及钻孔中存在的各种材料的厚度。此外，检测在固井过程中形成的通道的存在。

7. 发明授权

US07471392B2 Polarimetric scatterometry methods for critical dimension measurements of periodic structures 有权
公开(公告)号：US07471392B2
公开(公告)日：2008-12-30
申请号：US11903238
申请日：2007-09-21
申请人： Adam E. Norton , Abdurrahman Sezginer , Fred E. Stanke
发明人： Adam E. Norton , Abdurrahman Sezginer , Fred E. Stanke
IPC分类号： G01J3/28
CPC分类号： G01B11/02 , G01J3/02 , G01J3/0294 , G01N21/211 , G01N21/25 , G01N21/474 , G01N21/9501 , G01N21/956 , G01N2021/213
摘要： An optical measurement system for evaluating a sample has a motor-driven rotating mechanism coupled to an azimuthally rotatable measurement head, allowing the optics to rotate with respect to the sample. A polarimetric scatterometer, having optics directing a polarized illumination beam at non-normal incidence onto a periodic structure on a sample, can measure optical properties of the periodic structure. An E-O modulator in the illumination path can modulate the polarization. The head optics collect light reflected from the periodic structure and feed that light to a spectrometer for measurement. A beamsplitter in the collection path can ensure both S and P polarization from the sample are separately measured. The measurement head can be mounted for rotation of the plane of incidence to different azimuthal directions relative to the periodic structures. The instrument can be integrated within a wafer process tool in which wafers may be provided at arbitrary orientation.

8. 发明授权

US06909507B2 Polarimetric scatterometry methods for critical dimension measurements of periodic structures 失效
标题翻译：周期性结构关键尺寸测量的极化散射法
公开(公告)号：US06909507B2
公开(公告)日：2005-06-21
申请号：US10857223
申请日：2004-05-28
申请人： Adam E. Norton , Abdurrahman Sezginer , Fred E. Stanke
发明人： Adam E. Norton , Abdurrahman Sezginer , Fred E. Stanke
IPC分类号： G01N21/21 , G01N21/25 , G01N21/47 , G01N21/956 , G01J4/00
CPC分类号： G01B11/02 , G01J3/02 , G01J3/0294 , G01N21/211 , G01N21/25 , G01N21/474 , G01N21/9501 , G01N21/956 , G01N2021/213
摘要： An optical measurement system for evaluating a sample has a motor-driven rotating mechanism coupled to an azimuthally rotatable measurement head, allowing the optics to rotate with respect to the sample. A polarimetric scatterometer, having optics directing a polarized illumination beam at non-normal incidence onto a periodic structure on a sample, can measure optical properties of the periodic structure. An E-O modulator in the illumination path can modulate the polarization. The head optics collect light reflected from the periodic structure and feed that light to a spectrometer for measurement. A beamsplitter in the collection path can ensure both S and P polarization from the sample are separately measured. The measurement head can be mounted for rotation of the plane of incidence to different azimuthal directions relative to the periodic structures. The instrument can be integrated within a wafer process tool in which wafers may be provided at arbitrary orientation.
摘要翻译：用于评估样品的光学测量系统具有耦合到方位角可旋转测量头的电动机旋转机构，允许光学器件相对于样品旋转。具有将非正常入射的偏振照明光束引导到样品上的周期性结构上的光学偏振散射仪可以测量周期性结构的光学性质。照明路径中的E-O调制器可以调制偏振。头部光学器件收集从周期性结构反射的光并将光馈送到光谱仪进行测量。收集路径中的分束器可以确保来自样品的S和P极化分别测量。测量头可以安装成相对于周期性结构使入射平面旋转到不同的方位角方向。仪器可以集成在晶片工艺工具中，其中晶片可以以任意取向提供。

9. 发明授权

US06870617B2 Accurate small-spot spectrometry systems and methods 有权
标题翻译：精确的小光谱分析系统和方法
公开(公告)号：US06870617B2
公开(公告)日：2005-03-22
申请号：US10796322
申请日：2004-03-09
申请人： Adam Norton , Abdurrahman Sezginer , Fred E. Stanke , Rodney Smedt
发明人： Adam Norton , Abdurrahman Sezginer , Fred E. Stanke , Rodney Smedt
IPC分类号： G01J3/08 , G01J3/42 , G01N21/55
CPC分类号： G01J3/02 , G01J3/0218 , G01J3/08 , G01J3/42 , G01N21/55
摘要： The invention is a method and apparatus for determining characteristics of a sample. The system and method provide for detecting a monitor beam reflected off a mirror, where the monitor beam corresponds to the intensity of light incident upon the sample. The system and method also provide for detecting a measurement beam, where the measurement beam has been reflected off the sample being characterized. Both the monitor beam and the measurement beam are transmitted through the same transmission path, and detected by the same detector. Thus, potential sources of variations between the monitor beam and the measurement beam which are not due to the characteristics of the sample are minimized. Reflectivity information for the sample can be determined by comparing data corresponding to the measurement beam relative to data corresponding the monitor beam.
摘要翻译：本发明是用于确定样品特性的方法和装置。该系统和方法提供用于检测从反射镜反射的监视光束，其中监视光束对应于入射在样本上的光的强度。该系统和方法还提供了用于检测测量光束，其中测量光束已经从被表征的样品反射出来。监测光束和测量光束都通过相同的传输路径传输，并由相同的检测器检测。因此，监测光束和测量光束之间不是由于样品特性引起的变化的潜在来源被最小化。可以通过将与测量光束相对应的数据相对于监视光束对应的数据进行比较来确定样本的反射率信息。

10. 发明授权

US06819426B2 Overlay alignment metrology using diffraction gratings 有权
$Overlay alignment metrology using diffraction gratings$
标题翻译：使用衍射光栅覆盖对准测量
公开(公告)号：US06819426B2
公开(公告)日：2004-11-16
申请号：US10074561
申请日：2002-02-12
申请人： Abdurrahman Sezginer , Kenneth C. Johnson , Fred E. Stanke
发明人： Abdurrahman Sezginer , Kenneth C. Johnson , Fred E. Stanke
IPC分类号： G01B1100
CPC分类号： G03F7/70633 , H01L22/34 , H01L2223/54453
摘要： Alignment accuracy between two or more patterned layers is measured using a metrology target comprising substantially overlapping diffraction gratings formed in a test area of the layers being tested. An optical instrument illuminates all or part of the target area and measures the optical response. The instrument can measure transmission, reflectance, and/or ellipsometric parameters as a function of wavelength, polar angle of incidence, azimuthal angle of incidence, and/or polarization of the illumination and detected light. Overlay error or offset between those layers containing the test gratings is determined by a processor programmed to calculate an optical response for a set of parameters that include overlay error, using a model that accounts for diffraction by the gratings and interaction of the gratings with each others' diffracted field. The model parameters might also take account of manufactured asymmetries. The calculation may involve interpolation of pre-computed entries from a database accessible to the processor. The calculated and measured responses are iteratively compared and the model parameters changed to minimize the difference.
摘要翻译：使用包括在被测试层的测试区域中形成的基本上重叠的衍射光栅的测量目标来测量两个或更多个图案化层之间的对准精度。光学仪器照亮目标区域的全部或部分，并测量光学响应。仪器可以测量作为波长，极角入射角，入射方位角和/或照明和检测光的偏振的函数的透射率，反射率和/或椭偏参数。包含测试光栅的那些层之间的叠加误差或偏移量被编程为使用考虑光栅衍射的模型和光栅与彼此的相互作用计算包括重叠误差的一组参数的光学响应的处理器来确定 '衍射场模型参数也可能考虑到制造的不对称性。该计算可以包括从处理器可访问的数据库插入预先计算的条目。迭代比较计算和测量的响应，改变模型参数以最小化差异。

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