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1. 发明授权

US06346425B1 Vapor-phase processing method capable of eliminating particle formation 有权
标题翻译：能够消除颗粒形成的气相加工方法
公开(公告)号：US06346425B1
公开(公告)日：2002-02-12
申请号：US09651186
申请日：2000-08-30
申请人： Natsuko Ito , Tsuyoshi Moriya , Fumihiko Uesugi , Shuji Moriya , Masaru Aomori , Yoshinori Kato , Mitsuhiro Tachibana
发明人： Natsuko Ito , Tsuyoshi Moriya , Fumihiko Uesugi , Shuji Moriya , Masaru Aomori , Yoshinori Kato , Mitsuhiro Tachibana
IPC分类号： H01L2100
CPC分类号： H01L22/26 , C23C16/4401 , C23C16/52 , G01N21/47 , H01L21/28556
摘要： A method for processing a substrate includes the steps of determining an allowable margin of process condition such that a substrate is processed without forming particles, selecting a process condition of a substrate for a production process such that the process condition falls in the allowable margin in the production process, and carrying out a processing of the substrate in the production process at the selected process condition, wherein the step of determining the allowable margin includes the steps of introducing an optical beam to an atmosphere in which the substrate is processed in the step of determining the allowable margin, and detecting scattering of the optical beam.
摘要翻译：一种处理衬底的方法包括以下步骤：确定工艺条件的允许余量，使得在不形成颗粒的情况下处理衬底，选择用于生产工艺的衬底的工艺条件，使得工艺条件落在在所选择的处理条件下在生产过程中进行基板的处理，其中确定允许余量的步骤包括以下步骤：将光束引入到其中处理基板的气氛中的步骤确定容许余量，并检测光束的散射。

2. 发明授权

US06737666B1 Apparatus and method for detecting an end point of a cleaning process 有权
标题翻译：用于检测清洁过程的终点的装置和方法
公开(公告)号：US06737666B1
公开(公告)日：2004-05-18
申请号：US09721703
申请日：2000-11-27
申请人： Natsuko Ito , Tsuyoshi Moriya , Fumihiko Uesugi , Yoshinori Kato , Masaru Aomori , Shuji Moriya , Mitsuhiro Tachibana
发明人： Natsuko Ito , Tsuyoshi Moriya , Fumihiko Uesugi , Yoshinori Kato , Masaru Aomori , Shuji Moriya , Mitsuhiro Tachibana
IPC分类号： G01N2149
CPC分类号： H01J37/32935 , C23C16/4405 , C23C16/52 , G01N21/49 , H01J37/32963 , Y10S438/905
摘要： A cleaning end point detecting apparatus detects an end point of a cleaning process in which contamination attached to an inner wall of a reaction chamber is removed by introducing a cleaning gas into the chamber to produce a cluster cloud and detached particles. An irradiating unit irradiates a laser beam onto the cluster cloud and the detached particles within the reaction chamber to produce a scattered laser beam. A monitoring unit monitors the scattered laser beam as a two-dimensional image information. A judging unit judges the end point of the cleaning process on the basis of the two-dimensional image information. Preferably, the judging unit judges, as the end point of the cleaning process, a time instant when neither the detached particles nor the cluster cloud are detected on the basis of the two-dimensional image information.
摘要翻译：清洗终点检测装置检测清洁过程的终点，其中通过将清洁气体引入室中来除去附着在反应室内壁上的污染物，以产生簇云和分离的颗粒。照射单元将激光束照射到聚簇云和反应室内的分离的颗粒以产生散射的激光束。监视单元将散射的激光束监视为二维图像信息。判断单元基于二维图像信息判断清洁处理的结束点。优选地，判断单元基于二维图像信息来判断清除处理的结束点是否没有检测到分离的颗粒和簇云的时刻。

3. 发明授权

US06835352B2 Spotting pin 失效
标题翻译：点针
公开(公告)号：US06835352B2
公开(公告)日：2004-12-28
申请号：US10434214
申请日：2003-05-09
申请人： Seiichiro Ito , Mitsuhiro Tachibana
发明人： Seiichiro Ito , Mitsuhiro Tachibana
IPC分类号： B01L302
CPC分类号： B01L3/0244 , B01L3/0248 , B01L3/0262 , B01L2200/0605 , B01L2400/025 , B01L2400/0406 , Y10T436/2575
摘要： A spotting pin 10 capable of spotting equal amounts of a solution in a sequential manner comprises a first member 11 having a solution holding portion 13 formed at the tip thereof for holding a predetermined amount of solution, and a second member 12 having a solution supply portion 14 for holding the solution by a capillary action, the second member adapted to slide along the first member. As the solution supply portion 14 is brought into contact with the solution holding portion 13, the solution enters the solution holding portion 13 from the solution supply portion 14 by a capillary action. As the solution supply portion 14 and the solution holding portion 13 are separated from each other, a predetermined amount of the solution can be carried in the solution holding portion 13. Then, as the solution holding portion 13 is brought into contact with a water-absorbing support 21, a spot 22 of a predetermined amount of the solution can be formed thereon.
摘要翻译：能够顺序地分配等量溶液的点针10包括：第一构件11，其具有形成在其顶端处的用于保持预定量溶液的溶液保持部分13;以及第二构件12，其具有溶液供应部分 14，用于通过毛细作用保持溶液，第二构件适于沿着第一构件滑动。当溶液供应部分14与溶液保持部分13接触时，溶液通过毛细作用从溶液供应部分14进入溶液保留部分13。当溶液供应部分14和溶液保持部分13彼此分离时，可以在溶液保留部分13中承载预定量的溶液。然后，当溶液保持部分13与水溶液保持部分13接触时，吸收支撑件21，可以在其上形成预定量的溶液的点22。

4. 发明授权

US06787349B1 Biochip reader and labeling reagent 失效
标题翻译：生物芯片阅读器和贴标试剂
公开(公告)号：US06787349B1
公开(公告)日：2004-09-07
申请号：US09889747
申请日：2001-07-19
申请人： Kenji Yamamoto , Mitsuhiro Tachibana , Katsuya Mizuno
发明人： Kenji Yamamoto , Mitsuhiro Tachibana , Katsuya Mizuno
IPC分类号： C12M100
CPC分类号： G01N33/543 , B01J2219/00536 , Y10T436/13
摘要： The present invention provides a high-sensitive, inexpensive biochip reader for reading a biochip as compared to a fluorescence method. The biochip reader is provided with an X-Y stage (3) for mounting a biochip (6) and scanning the biochip (6) in a two-dimensional manner, a controller (4) for the X-Y stage, a magnetic sensor (1) for reading the magnetic field strength, an ohmmeter (2), and a computer (5) for signal processing. As a result, a high-performance, inexpensive biochip reader can be provided without using an expensive laser or an expensive optical system, by employing a magnetic sensor and a disk driving mechanism generally used in a hard disk drive and the like.
摘要翻译：与荧光方法相比，本发明提供了一种用于读取生物芯片的高灵敏度，便宜的生物芯片读取器。生物芯片读取器设置有用于安装生物芯片（6）并以二维方式扫描生物芯片（6）的XY台（3），用于XY台的控制器（4），用于读取磁场强度，欧姆表（2）和用于信号处理的计算机（5）。结果，通过采用通常用于硬盘驱动器等中的磁传感器和盘驱动机构，可以提供高性能，廉价的生物芯片读取器，而不需要使用昂贵的激光器或昂贵的光学系统。

5. 发明授权

US06767748B2 Spotting pin, spotting device and method for spotting biomolecules 失效
标题翻译：点针，点样装置和生物分子检测方法
公开(公告)号：US06767748B2
公开(公告)日：2004-07-27
申请号：US10429825
申请日：2003-05-06
申请人： Naoki Yokokawa , Mitsuhiro Tachibana , Hiroshi Kishida
发明人： Naoki Yokokawa , Mitsuhiro Tachibana , Hiroshi Kishida
IPC分类号： G01N128
CPC分类号： B01L3/0244 , B01J19/0046 , B01J2219/00387 , B01J2219/00585 , B01J2219/00596 , B01J2219/00605 , B01J2219/0061 , B01J2219/00612 , B01J2219/00659 , B01J2219/00689 , B01J2219/00698 , B01J2219/00722 , B01J2219/00725 , C40B40/06 , C40B40/10 , C40B60/14 , G01N35/10 , G01N2035/1037 , Y10T436/2575
摘要： The present invention enables the accurate management of the total number of spotting counts for each spotting pin. An IC chip is installed on the spotting pin to allow the IC chip to accumulate spotting-count information, and during each spotting time the information is loaded up and displayed.
摘要翻译：本发明能够精确地管理每个点针的总点数计数。 IC芯片安装在点焊针上，允许IC芯片累积点样数信息，并在每个发光时间内加载和显示信息。

6. 发明授权

US06646271B2 Method and apparatus for reading fluorescence 失效
标题翻译：读取荧光的方法和装置
公开(公告)号：US06646271B2
公开(公告)日：2003-11-11
申请号：US09998527
申请日：2001-11-28
申请人： Naoki Yokokawa , Mitsuhiro Tachibana
发明人： Naoki Yokokawa , Mitsuhiro Tachibana
IPC分类号： G01N2164
CPC分类号： G01N21/6408 , G01N21/6458
摘要： The present invention aims at minimizing the influence of residual fluorescence emitted from adjacent spots, upon reading time-resolved fluorescence. The path of laser beam scan is set to be intermittent such that residual fluorescence from adjacent spots gives no effect. In other words, the spots are read in a skipping manner.
摘要翻译：本发明的目的是在读取时间分辨荧光的同时最小化从相邻光点发射的残留荧光的影响。激光束扫描的路径被设置为间歇的，使得来自相邻斑点的残留荧光不起作用。换句话说，以跳过的方式读取斑点。

7. 发明授权

US6036782A Shower head 有权
标题翻译：淋浴头
公开(公告)号：US6036782A
公开(公告)日：2000-03-14
申请号：US166577
申请日：1998-10-06
申请人： Sumi Tanaka , Sakae Nakatsuka , Mitsuhiro Tachibana
发明人： Sumi Tanaka , Sakae Nakatsuka , Mitsuhiro Tachibana
IPC分类号： H01L21/285 , C23C16/44 , C23C16/455 , H01L21/205 , H01L21/3065 , H01L21/31 , H01L21/687 , C23C16/00
CPC分类号： C23C16/45565 , C23C16/455 , H01L21/687
摘要： A showerhead for use in a process chamber for performing a predetermined process on an object, designed to apply a prescribed gas in the process chamber. The showerhead comprises a main body, a cover, and a support. The main body has a an internal space into which the gas to be supplied into the process chamber is introduced and an opening which opens to the process chamber. The cover closes the opening of the main body and has a plurality of gas-applying holes for applying the gas from the main body. The support supports the cover to the main body and provides a predetermined clearance between the cover and the main body.
摘要翻译：一种在处理室中使用的用于对物体进行预定处理的喷头，其被设计成在处理室中施加规定的气体。喷头包括主体，盖和支撑件。主体具有内部空间，供给到处理室中的气体被引入到该内部空间中，并且开口通向处理室。盖封闭主体的开口，并具有多个用于从主体施加气体的气体施加孔。支撑件支撑主体的盖，并且在盖和主体之间提供预定的间隙。

8. 发明授权

US5303671A System for continuously washing and film-forming a semiconductor wafer 失效
标题翻译：用于连续洗涤和成膜半导体晶片的系统
公开(公告)号：US5303671A
公开(公告)日：1994-04-19
申请号：US014150
申请日：1993-02-05
申请人： Hiroshi Kondo , Mitsuhiro Tachibana
发明人： Hiroshi Kondo , Mitsuhiro Tachibana
IPC分类号： C23C16/02 , C23C16/54 , H01L21/00 , H01L21/677 , C23C16/00
CPC分类号： H01L21/67757 , C23C16/0227 , C23C16/54 , H01L21/67051 , H01L21/67115 , H01L21/67201 , H01L21/67207 , Y10S414/137 , Y10S414/139
摘要： A system for cleaning and film-forming a semiconductor wafer continuously comprises a washing section for removing native oxide from the surface of the wafer while applying hydrofluoric acid to the silicon wafer, a load lock chamber located adjacent to the washing section and filled with the atmosphere of non-oxidizing gas, a film-forming section communicated with and shielded from the load lock chamber by a gate valve to form film on that face of the wafer which is to be processed, a first transfer robot for transferring the wafer between the washing section and the load lock chamber, and a second transfer robot for transferring the wafer between the load lock chamber and the film-forming section. Film is formed on the wafer in the film-forming section after the native oxide is removed from the wafer.
摘要翻译：用于连续地清洁和成膜半导体晶片的系统包括：洗涤部分，用于从硅晶片的表面除去天然氧化物，同时向硅晶片施加氢氟酸;位于邻近洗涤部分并充满大气的负载锁定室的非氧化性气体，通过栅极阀与负载锁定室连通并与其隔离的成膜部，以在被处理晶片的面上形成膜，第一传送机器人，用于在洗涤之间传送晶片以及用于在所述负载锁定室和所述成膜部之间传送所述晶片的第二传送机器人。在从晶片上去除自然氧化物之后，在成膜部分的晶片上形成膜。

9. 发明授权

US07063871B2 CVD process capable of reducing incubation time 失效
标题翻译： CVD工艺能够减少孵化时间
公开(公告)号：US07063871B2
公开(公告)日：2006-06-20
申请号：US10617819
申请日：2003-07-14
申请人： Hideaki Yamasaki , Tatsuo Hatano , Tsukasa Matsuda , Taro Ikeda , Kazuhito Nakamura , Koumei Matsuzawa , Yumiko Kawano , Mitsuhiro Tachibana
发明人： Hideaki Yamasaki , Tatsuo Hatano , Tsukasa Matsuda , Taro Ikeda , Kazuhito Nakamura , Koumei Matsuzawa , Yumiko Kawano , Mitsuhiro Tachibana
IPC分类号： C23C16/16
CPC分类号： C23C16/16
摘要： A metal CVD process includes a step (A) of introducing a gaseous source material containing a metal carbonyl compound into a process space adjacent to a surface of a substrate to be processed in such a manner that the metal carbonyl compound has a first partial pressure, and a step (B) of depositing a metal film on the surface of the substrate by introducing a gaseous source material containing the metal carbonyl compound into the process space in such a mater that the metal carbonyl compound has a second, smaller partial pressure. The step (A) is conducted such that there is caused no substantial deposition of the metal film on the substrate.
摘要翻译：金属CVD法包括将含有羰基金属化合物的气态源材料以与金属羰基化合物具有第一分压的方式相连接的待处理基板的表面的工艺空间引入的工序（A）以及在金属羰基化合物具有第二较小分压的情况下，通过将含有羰基金属化合物的气态源材料引入到工艺空间中，在基板的表面上沉积金属膜的工序（B）。进行步骤（A），使得金属膜不会在基板上实质上沉积。

10. 发明授权

US06913996B2 Method of forming metal wiring and semiconductor manufacturing apparatus for forming metal wiring 有权
标题翻译：形成金属布线的方法和用于形成金属布线的半导体制造装置
公开(公告)号：US06913996B2
公开(公告)日：2005-07-05
申请号：US10181273
申请日：2001-11-13
申请人： Hideaki Yamasaki , Mitsuhiro Tachibana , Kazuya Okubo , Kenji Suzuki , Yumiko Kawano
发明人： Hideaki Yamasaki , Mitsuhiro Tachibana , Kazuya Okubo , Kenji Suzuki , Yumiko Kawano
IPC分类号： C23C16/30 , H01L21/28 , H01L21/285 , H01L21/3205 , H01L21/768 , H01L23/52 , H01L21/4763 , H01L21/44
CPC分类号： H01L21/76843 , H01L21/28556 , H01L21/28562 , H01L21/76876 , H01L21/76877
摘要： A metal film forming method, includes the steps of (a) (s13, s15) supplying a plural kinds of ingredient gases to a base barrier film (3) in sequence, wherein at least one of the gases includes a metal, and (b) (s14, s16) vacuum-exhausting the ingredient gases of the step (a) or substituting the ingredient gases of the step (a) by an other kind of gas after the ingredient gases of the step (a) are supplied respectively, thereby an extremely thin film (5) of the metal is formed on the base barrier film (3).
摘要翻译：金属膜形成方法包括以下步骤：（a）（s 13，s 15），其顺序地将多种成分气体供应到基底阻挡膜（3），其中至少一种气体包括金属，以及（b）（s 14，s 16）对步骤（a）的成分气体进行真空排气，或者在步骤（a）的成分气体为原料气体之后，用另一种气体代替步骤（a）的成分气体从而在基底阻挡膜（3）上形成极薄的金属薄膜（5）。

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