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    • 10. 发明申请
    • PHOTONIC STRUCTURE
    • 光电结构
    • US20110006284A1
    • 2011-01-13
    • US12501844
    • 2009-07-13
    • Hans S. ChoDavid A. FattalTheodore I. Kamins
    • Hans S. ChoDavid A. FattalTheodore I. Kamins
    • H01L29/06H01L21/306
    • G02B6/1225B82Y20/00G02B1/005G02B6/136
    • A photonic structure includes a plurality of annealed, substantially smooth-surfaced ellipsoids arranged in a matrix. Additionally, a method of producing a photonic structure is provided. The method includes providing a semiconductor material, providing an etch mask comprising a two-dimensional hole array, and disposing the etch mask on at least one surface of the semiconductor material. The semiconductor material is then etched through the hole array of the etch mask to produce holes in the semiconductor material and thereafter applying a passivation layer to surfaces of the holes. Additionally, the method includes repeating the etching and passivation-layer application to produce a photonic crystal structure that contains ellipsoids within the semiconductor material and annealing the photonic crystal structure to smooth the surfaces of the ellipsoids.
    • 光子结构包括排列成矩阵的多个退火的基本上平滑的表面的椭圆体。 另外,提供了一种制造光子结构的方法。 该方法包括提供半导体材料,提供包括二维孔阵列的蚀刻掩模,并将蚀刻掩模设置在半导体材料的至少一个表面上。 然后通过蚀刻掩模的孔阵列蚀刻半导体材料,以在半导体材料中产生孔,然后将钝化层施加到孔的表面。 此外,该方法包括重复蚀刻和钝化层应用以产生在半导体材料内包含椭圆体的光子晶体结构,并退火光子晶体结构以平滑椭圆体的表面。