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1. 发明授权

US07368734B2 Ion beam measuring method and ion implanting apparatus 有权
标题翻译：离子束测量方法和离子注入装置
公开(公告)号：US07368734B2
公开(公告)日：2008-05-06
申请号：US10574281
申请日：2004-12-28
申请人： Sei Umisedo , Nariaki Hamamoto
发明人： Sei Umisedo , Nariaki Hamamoto
IPC分类号： H01J3/10
CPC分类号： H01J37/3171 , H01J37/244 , H01J2237/24405 , H01J2237/2446 , H01J2237/24507 , H01J2237/31703 , H01L21/26586
摘要： A beam current density distribution in y direction of an ion beam 4 at a position of a forestage beam restricting shutter 32 is measured by measuring a change in a beam current of the ion beam 4 incident on a forestage multipoint Faraday 24 by passing an outer side of a side 34 of the shutter 32 while driving the forestage beam restricting shutter 32 in y direction by a forestage shutter driving apparatus 36. Further, a beam current density distribution in y direction of the ion beam 4 at a position of a poststage beam restricting shutter 42 is measured by measuring a change in the beam current of the ion beam 4 incident on a poststage multipoints Faraday 28 by passing an outer side of a side 44 of the shutter 42 while driving the poststage beam restricting shutter 42 in y direction by a poststage shutter driving apparatus 46. Further, at least one of an angle deviation, a diverging angle and abeam side in y direction of the ion beam 4 is measured by using a result of the measurement.
摘要翻译：通过测量入射在森林多点法拉第24上的离子束4的射束电流的变化，测量离子束4在森林束限制闸门32的位置处的y方向上的束流密度分布，通过使外侧同时通过森林快门驱动装置36在y方向上驱动森林光束限制快门32，同时快门32的侧面34。此外，通过测量入射在后级多点法拉第28上的离子束4的射束电流的变化来测量离子束4在后级束限制闸门42的位置的y方向上的束流密度分布，同时通过后级快门驱动装置46驱动后级束限制快门42在y方向上的快门42的侧面44的外侧。此外，通过使用测量结果测量离子束4的y方向上的角度偏差，发散角度和光焦度中的至少一个。

2. 发明申请

US20070023674A1 Ion beam measuring method and ion implanting apparatus 有权
标题翻译：离子束测量方法和离子注入装置
公开(公告)号：US20070023674A1
公开(公告)日：2007-02-01
申请号：US10574281
申请日：2004-12-28
申请人： Sei Umisedo , Nariaki Hamamoto
发明人： Sei Umisedo , Nariaki Hamamoto
IPC分类号： G01K1/08
CPC分类号： H01J37/3171 , H01J37/244 , H01J2237/24405 , H01J2237/2446 , H01J2237/24507 , H01J2237/31703 , H01L21/26586
摘要： A beam current density distribution in y direction of an ion beam 4 at a position of a forestage beam restricting shutter 32 is measured by measuring a change in a beam current of the ion beam 4 incident on a forestage multipoint Faraday 24 by passing an outer side of a side 34 of the shutter 32 while driving the forestage beam restricting shutter 32 in y direction by a forestage shutter driving apparatus 36. Further, a beam current density distribution in y direction of the ion beam 4 at a position of a poststage beam restricting shutter 42 is measured by measuring a change in the beam current of the ion beam 4 incident on a poststage multipoints Faraday 28 by passing an outer side of a side 44 of the shutter 42 while driving the poststage beam restricting shutter 42 in y direction by a poststage shutter driving apparatus 46. Further, at least one of an angle deviation, a diverging angle and abeam side in y direction of the ion beam 4 is measured by using a result of the measurement.
摘要翻译：通过测量入射在森林多点法拉第24上的离子束4的射束电流的变化，测量离子束4在森林束限制闸门32的位置处的y方向上的束流密度分布，通过使外侧同时通过森林快门驱动装置36在y方向上驱动森林光束限制快门32，同时快门32的侧面34。此外，通过测量入射在后级多点法拉第28上的离子束4的射束电流的变化来测量离子束4在后级束限制闸门42的位置的y方向上的束流密度分布，同时通过后级快门驱动装置46驱动后级束限制快门42在y方向上的快门42的侧面44的外侧。此外，通过使用测量结果测量离子束4的y方向上的角度偏差，发散角度和光焦度中的至少一个。

3. 发明申请

US20060284104A1 Ion source 失效
标题翻译：离子源
公开(公告)号：US20060284104A1
公开(公告)日：2006-12-21
申请号：US11434891
申请日：2006-05-17
申请人： Hideki Fujita , Sei Umisedo , Nariaki Hamamoto
发明人： Hideki Fujita , Sei Umisedo , Nariaki Hamamoto
IPC分类号： H01J27/00
CPC分类号： H01J27/14 , H01J27/08
摘要： A cathode holder of a tubular shape is inserted into an opening for a cathode of a plasma generating chamber with a tip of the cathode holder positioned outward from an inner wall surface of the plasma generating chamber. The cathode is held in the cathode holder so that a front surface of the cathode will be positioned outward from the inner wall surface. In the cathode holder is provided a tubular first heat shield surrounding the cathode with a space provided between the first heat shield and the cathode, the tip of the first heat shield positioned outward from the inner wall surface. At a rear side of the cathode is provided a filament. The gap between the cathode holder and the plasma generating chamber is filled with an electrical insulating material.
摘要翻译：将管状的阴极保持器插入到等离子体发生室的阴极的开口中，其中阴极保持器的尖端位于等离子体产生室的内壁表面的外侧。阴极保持在阴极保持器中，使得阴极的前表面将从内壁表面向外定位。在阴极保持器中设置有围绕阴极的管状第一隔热罩，其具有设置在第一隔热罩和阴极之间的空间，第一隔热罩的顶端从内壁表面向外定位。在阴极的后侧设有细丝。阴极保持器和等离子体发生室之间的间隙填充有电绝缘材料。

4. 发明申请

US20090261248A1 ION BEAM APPARATUS AND METHOD EMPLOYING MAGNETIC SCANNING 有权
标题翻译：离子束设备和采用磁性扫描的方法
公开(公告)号：US20090261248A1
公开(公告)日：2009-10-22
申请号：US12301557
申请日：2007-06-13
申请人： Hilton F. Glavish , Thomas N. Horsky , Dale C. Jacobson , Sami K. Hahto , Masao Naito , Nobuo Nagai , Nariaki Hamamoto
发明人： Hilton F. Glavish , Thomas N. Horsky , Dale C. Jacobson , Sami K. Hahto , Masao Naito , Nobuo Nagai , Nariaki Hamamoto
IPC分类号： H01J49/00 , A61N5/00
CPC分类号： H01J37/3171 , H01J37/05 , H01J37/09 , H01J2237/0044 , H01J2237/0455 , H01J2237/047 , H01J2237/0492 , H01J2237/057 , H01J2237/14 , H01J2237/30477 , H01J2237/31703 , H01L21/26513
摘要： A multipurpose ion implanter beam line configuration comprising a mass analyzer magnet followed by a magnetic scanner and magnetic collimator combination that introduce bends to the beam path, the beam line constructed for enabling implantation of common monatomic dopant ion species cluster ions, the beam line configuration having a mass analyzer magnet defining a pole gap of substantial width between ferromagnetic poles of the magnet and a mass selection aperture, the analyzer magnet sized to accept an ion beam from a slot-form ion source extraction aperture of at least about 80 mm height and at least about 7 mm width, and to produce dispersion at the mass selection aperture in a plane corresponding to the width of the beam, the mass selection aperture capable of being set to a mass-selection width sized to select a beam of the cluster ions of the same dopant species but incrementally differing molecular weights, the mass selection aperture also capable of being set to a substantially narrower mass-selection width and the analyzer magnet having a resolution at the mass selection aperture sufficient to enable selection of a beam of monatomic dopant ions of substantially a single atomic or molecular weight, the magnetic scanner and magnetic collimator being constructed to successively bend the ion beam in the same sense, which is in the opposite sense to that of the bend introduced by the analyzer magnet of the beam line.
摘要翻译：一种多用途离子注入机束线配置，包括质量分析器磁体，随后是磁扫描器和磁准直器组合，其将弯曲引入到光束路径，所述束线被构造用于使得能够注入常见的单原子掺杂离子种类簇离子，所述束线配置具有质量分析器磁体限定磁体的铁磁极之间的相当宽度的磁极间隙和质量选择孔，分析器磁体的尺寸设计成接受来自至少约80mm高度的槽形离子源提取孔的离子束，并且在至少约7mm的宽度，并且在对应于梁的宽度的平面中的质量选择孔处产生分散体，质量选择孔能够被设定为质量选择宽度，该质量选择宽度的尺寸被选择为选择聚集离子的束相同的掺杂物种类但递增不同的分子量，质量选择孔径也能够基本上被设定较窄的质量选择宽度和具有质量选择孔径的分辨率的分析器磁体足以能够选择基本上单一原子或分子量的单原子掺杂离子束，磁扫描器和磁准直器被构造为连续弯曲离子在相同意义上的光束，其与由光束线的分析器磁体引入的弯曲的方向相反。

5. 发明授权

US07365339B2 Ion source 失效
标题翻译：离子源
公开(公告)号：US07365339B2
公开(公告)日：2008-04-29
申请号：US11434891
申请日：2006-05-17
申请人： Hideki Fujita , Sei Umisedo , Nariaki Hamamoto
发明人： Hideki Fujita , Sei Umisedo , Nariaki Hamamoto
IPC分类号： H01J49/10 , H01J49/16 , H01J37/08 , H01J27/02
CPC分类号： H01J27/14 , H01J27/08
摘要： A cathode holder of a tubular shape is inserted into an opening for a cathode of a plasma generating chamber with a tip of the cathode holder positioned outward from an inner wall surface of the plasma generating chamber. The cathode is held in the cathode holder so that a front surface of the cathode will be positioned outward from the inner wall surface. In the cathode holder is provided a tubular first heat shield surrounding the cathode with a space provided between the first heat shield and the cathode, the tip of the first heat shield positioned outward from the inner wall surface. At a rear side of the cathode is provided a filament. The gap between the cathode holder and the plasma generating chamber is filled with an electrical insulating material.
摘要翻译：将管状的阴极保持器插入到等离子体发生室的阴极的开口中，其中阴极保持器的尖端位于等离子体产生室的内壁表面的外侧。阴极保持在阴极保持器中，使得阴极的前表面将从内壁表面向外定位。在阴极保持器中设置有围绕阴极的管状第一隔热罩，其具有设置在第一隔热罩和阴极之间的空间，第一隔热罩的顶端从内壁表面向外定位。在阴极的后侧设有细丝。阴极保持器和等离子体发生室之间的间隙填充有电绝缘材料。

6. 发明授权

US06548381B2 Ion beam irradiation apparatus and method of igniting a plasma for the same 有权
公开(公告)号：US06548381B2
公开(公告)日：2003-04-15
申请号：US10131085
申请日：2002-04-25
申请人： Nariaki Hamamoto
发明人： Nariaki Hamamoto
IPC分类号： H01L21425
CPC分类号： H01J37/317 , H01J2237/0041 , H01L21/2236
摘要： When a plasma is ignited in a plasma generator, an ion beam is made to run in the plasma generator, and in this state, a positive voltage with respective to ground is applied to a plasma production chamber from a DC power source. Secondary electrons are generated when the ion beam collides with a plasma generating gas which flows out of the plasma production chamber into a path of the ion beam. The secondary electrons are led into the plasma production chamber by the positive voltage, and within the plasma production chamber, a plasma ignition is triggered using the secondary electrons led into the plasma production chamber and a radio frequency.

7. 发明授权

US08436326B2 Ion beam apparatus and method employing magnetic scanning 失效
标题翻译：离子束装置和采用磁扫描的方法
公开(公告)号：US08436326B2
公开(公告)日：2013-05-07
申请号：US12948298
申请日：2010-11-17
申请人： Hilton F. Glavish , Thomas N. Horsky , Dale C. Jacobson , Sami K. Hahto , Masao Naito , Nobuo Nagai , Nariaki Hamamoto
发明人： Hilton F. Glavish , Thomas N. Horsky , Dale C. Jacobson , Sami K. Hahto , Masao Naito , Nobuo Nagai , Nariaki Hamamoto
IPC分类号： H01J37/317 , H01J37/28 , H01L21/265
CPC分类号： H01J37/3171 , H01J37/05 , H01J37/09 , H01J2237/0044 , H01J2237/0455 , H01J2237/047 , H01J2237/0492 , H01J2237/057 , H01J2237/14 , H01J2237/30477 , H01J2237/31703 , H01L21/26513
摘要： A multipurpose ion implanter beam line configuration comprising a mass analyzer magnet followed by a magnetic scanner and magnetic collimator combination that introduce bends to the beam path, the beam line constructed for enabling implantation of common monatomic dopant ion species cluster ions, the beam line configuration having a mass analyzer magnet defining a pole gap of substantial width between ferromagnetic poles of the magnet and a mass selection aperture, the analyzer magnet sized to accept an ion beam from a slot-form ion source extraction aperture of at least about 80 mm height and at least about 7 mm width, and to produce dispersion at the mass selection aperture in a plane corresponding to the width of the beam, the mass selection aperture capable of being set to a mass-selection width sized to select a beam of the cluster ions of the same dopant species but incrementally differing molecular weights, the mass selection aperture also capable of being set to a substantially narrower mass-selection width and the analyzer magnet having a resolution at the selection aperture sufficient to enable selection of a beam of monatomic dopant ions of substantially a single atomic or molecular weight, the magnetic scanner and magnetic collimator being constructed to successively bend the ion beam in the same sense, which is in the opposite sense to that of the bend introduced by the analyzer magnet of the beam line.
摘要翻译：一种多用途离子注入机束线配置，包括质量分析器磁体，随后是磁扫描器和磁准直器组合，其将弯曲引入到光束路径，所述束线被构造用于使得能够注入常见的单原子掺杂离子种类簇离子，所述束线配置具有质量分析器磁体限定磁体的铁磁极之间的相当宽度的磁极间隙和质量选择孔，分析器磁体的尺寸设计成接受来自至少约80mm高度的槽形离子源提取孔的离子束，并且在至少约7mm的宽度，并且在对应于梁的宽度的平面中的质量选择孔处产生分散体，质量选择孔能够被设定为质量选择宽度，该质量选择宽度的尺寸被选择为选择聚集离子的束相同的掺杂物种类但递增不同的分子量，质量选择孔径也能够基本上被设定较窄的质量选择宽度和具有质量选择孔径的分辨率的分析器磁体足以能够选择基本上单个原子或分子量的单原子掺杂离子束，磁扫描器和磁准直器被构造为连续弯曲离子在相同意义上的光束，其与由光束线的分析器磁体引入的弯曲的方向相反。

8. 发明申请

US20110089321A1 ION BEAM APPARATUS AND METHOD EMPLOYING MAGNETIC SCANNING 失效
标题翻译：离子束设备和采用磁性扫描的方法
公开(公告)号：US20110089321A1
公开(公告)日：2011-04-21
申请号：US12948298
申请日：2010-11-17
申请人： Hilton F. Glavish , Thomas N. Horsky , Dale C. Jacobson , Sami K. Hahto , Masao Naito , Nobuo Nagai , Nariaki Hamamoto
发明人： Hilton F. Glavish , Thomas N. Horsky , Dale C. Jacobson , Sami K. Hahto , Masao Naito , Nobuo Nagai , Nariaki Hamamoto
IPC分类号： H01J49/00 , H01L21/265 , H01J37/317
CPC分类号： H01J37/3171 , H01J37/05 , H01J37/09 , H01J2237/0044 , H01J2237/0455 , H01J2237/047 , H01J2237/0492 , H01J2237/057 , H01J2237/14 , H01J2237/30477 , H01J2237/31703 , H01L21/26513
摘要： A multipurpose ion implanter beam line configuration comprising a mass analyzer magnet followed by a magnetic scanner and magnetic collimator combination that introduce bends to the beam path, the beam line constructed for enabling implantation of common monatomic dopant ion species cluster ions, the beam line configuration having a mass analyzer magnet defining a pole gap of substantial width between ferromagnetic poles of the magnet and a mass selection aperture, the analyzer magnet sized to accept an ion beam from a slot-form ion source extraction aperture of at least about 80 mm height and at least about 7 mm width, and to produce dispersion at the mass selection aperture in a plane corresponding to the width of the beam, the mass selection aperture capable of being set to a mass-selection width sized to select a beam of the cluster ions of the same dopant species but incrementally differing molecular weights, the mass selection aperture also capable of being set to a substantially narrower mass-selection width and the analyzer magnet having a resolution at the selection aperture sufficient to enable selection of a beam of monatomic dopant ions of substantially a single atomic or molecular weight, the magnetic scanner and magnetic collimator being constructed to successively bend the ion beam in the same sense, which is in the opposite sense to that of the bend introduced by the analyzer magnet of the beam line.
摘要翻译：一种多用途离子注入机束线配置，包括质量分析器磁体，随后是磁扫描器和磁准直器组合，其将弯曲引入到光束路径，所述束线被构造用于使得能够注入常见的单原子掺杂离子种类簇离子，所述束线配置具有质量分析器磁体限定磁体的铁磁极之间的相当宽度的磁极间隙和质量选择孔，分析器磁体的尺寸设计成接受来自至少约80mm高度的槽形离子源提取孔的离子束，并且在至少约7mm的宽度，并且在对应于梁的宽度的平面中的质量选择孔处产生分散体，质量选择孔能够被设定为质量选择宽度，该质量选择宽度的尺寸被选择为选择聚集离子的束相同的掺杂物种类但递增不同的分子量，质量选择孔径也能够基本上被设定较窄的质量选择宽度和具有质量选择孔径的分辨率的分析器磁体足以能够选择基本上单个原子或分子量的单原子掺杂离子束，磁扫描器和磁准直器被构造为连续弯曲离子在相同意义上的光束，其与由光束线的分析器磁体引入的弯曲的方向相反。

9. 发明授权

US06495840B2 Ion-implanting method and ion-implanting apparatus 失效
标题翻译：离子注入法和离子注入装置
公开(公告)号：US06495840B2
公开(公告)日：2002-12-17
申请号：US09748241
申请日：2000-12-27
申请人： Nariaki Hamamoto , Takao Matsumoto
发明人： Nariaki Hamamoto , Takao Matsumoto
IPC分类号： G21K510
CPC分类号： H01J37/3171 , H01J37/1472
摘要： The ion-implanting apparatus includes an implanting control device 26a having the functions of sweeping an ion beam by a sweeping magnet 12 and scanning a target by a scan mechanism. The implanting control device 26a has the functions of changing a sweep frequency of the ion beam to be swept by said sweeping magnet according to at least one of the species and energy of the ion beam and changing the minimum number of times of scanning of the target to be scanned by said scan mechanism according to the changing of the sweep frequency.
摘要翻译：离子注入装置包括具有通过扫掠磁体12扫掠离子束并通过扫描机构扫描靶的功能的注入控制装置26a。植入控制装置26a具有根据离子束的种类和能量中的至少一种来改变由所述扫掠磁体扫掠的离子束的扫描频率的功能，并且改变目标的扫描的最小次数根据扫描频率的变化由扫描机构进行扫描。

10. 发明授权

US07851773B2 Ion beam apparatus and method employing magnetic scanning 有权
标题翻译：离子束装置和采用磁扫描的方法
公开(公告)号：US07851773B2
公开(公告)日：2010-12-14
申请号：US12301557
申请日：2007-06-13
申请人： Hilton F. Glavish , Thomas N. Horsky , Dale C. Jacobson , Sami K. Hahto , Masao Naito , Nobuo Nagai , Nariaki Hamamoto
发明人： Hilton F. Glavish , Thomas N. Horsky , Dale C. Jacobson , Sami K. Hahto , Masao Naito , Nobuo Nagai , Nariaki Hamamoto
IPC分类号： H01J37/317 , H01J37/28 , H01L21/265
CPC分类号： H01J37/3171 , H01J37/05 , H01J37/09 , H01J2237/0044 , H01J2237/0455 , H01J2237/047 , H01J2237/0492 , H01J2237/057 , H01J2237/14 , H01J2237/30477 , H01J2237/31703 , H01L21/26513
摘要： A multipurpose ion implanter beam line configuration comprising a mass analyzer magnet followed by a magnetic scanner and magnetic collimator combination that introduce bends to the beam path, the beam line constructed for enabling implantation of common monatomic dopant ion species cluster ions, the beam line configuration having a mass analyzer magnet defining a pole gap of substantial width between ferromagnetic poles of the magnet and a mass selection aperture, the analyzer magnet sized to accept an ion beam from a slot-form ion source extraction aperture of at least about 80 mm height and at least about 7 mm width, and to produce dispersion at the mass selection aperture in a plane corresponding to the width of the beam, the mass selection aperture capable of being set to a mass-selection width sized to select a beam of the cluster ions of the same dopant species but incrementally differing molecular weights, the mass selection aperture also capable of being set to a substantially narrower mass-selection width and the analyzer magnet having a resolution at the mass selection aperture sufficient to enable selection of a beam of monatomic dopant ions of substantially a single atomic or molecular weight, the magnetic scanner and magnetic collimator being constructed to successively bend the ion beam in the same sense, which is in the opposite sense to that of the bend introduced by the analyzer magnet of the beam line.
摘要翻译：一种多用途离子注入机束线配置，包括质量分析器磁体，随后是磁扫描器和磁准直器组合，其将弯曲引入到光束路径，所述束线被构造用于使得能够注入常见的单原子掺杂离子种类簇离子，所述束线配置具有质量分析器磁体限定磁体的铁磁极之间的相当宽度的磁极间隙和质量选择孔，分析器磁体的尺寸设计成接受来自至少约80mm高度的槽形离子源提取孔的离子束，并且在至少约7mm的宽度，并且在对应于梁的宽度的平面中的质量选择孔处产生分散体，质量选择孔能够被设定为质量选择宽度，该质量选择宽度的尺寸被选择为选择聚集离子的束相同的掺杂物种类但递增不同的分子量，质量选择孔径也能够基本上被设定较窄的质量选择宽度和具有质量选择孔径的分辨率的分析器磁体足以能够选择基本上单个原子或分子量的单原子掺杂离子束，磁扫描器和磁准直器被构造为连续弯曲离子在相同意义上的光束，其与由光束线的分析器磁体引入的弯曲的方向相反。

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