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1. 发明授权

US07365339B2 Ion source 失效
标题翻译：离子源
公开(公告)号：US07365339B2
公开(公告)日：2008-04-29
申请号：US11434891
申请日：2006-05-17
申请人： Hideki Fujita , Sei Umisedo , Nariaki Hamamoto
发明人： Hideki Fujita , Sei Umisedo , Nariaki Hamamoto
IPC分类号： H01J49/10 , H01J49/16 , H01J37/08 , H01J27/02
CPC分类号： H01J27/14 , H01J27/08
摘要： A cathode holder of a tubular shape is inserted into an opening for a cathode of a plasma generating chamber with a tip of the cathode holder positioned outward from an inner wall surface of the plasma generating chamber. The cathode is held in the cathode holder so that a front surface of the cathode will be positioned outward from the inner wall surface. In the cathode holder is provided a tubular first heat shield surrounding the cathode with a space provided between the first heat shield and the cathode, the tip of the first heat shield positioned outward from the inner wall surface. At a rear side of the cathode is provided a filament. The gap between the cathode holder and the plasma generating chamber is filled with an electrical insulating material.
摘要翻译：将管状的阴极保持器插入到等离子体发生室的阴极的开口中，其中阴极保持器的尖端位于等离子体产生室的内壁表面的外侧。阴极保持在阴极保持器中，使得阴极的前表面将从内壁表面向外定位。在阴极保持器中设置有围绕阴极的管状第一隔热罩，其具有设置在第一隔热罩和阴极之间的空间，第一隔热罩的顶端从内壁表面向外定位。在阴极的后侧设有细丝。阴极保持器和等离子体发生室之间的间隙填充有电绝缘材料。

2. 发明授权

US07368734B2 Ion beam measuring method and ion implanting apparatus 有权
标题翻译：离子束测量方法和离子注入装置
公开(公告)号：US07368734B2
公开(公告)日：2008-05-06
申请号：US10574281
申请日：2004-12-28
申请人： Sei Umisedo , Nariaki Hamamoto
发明人： Sei Umisedo , Nariaki Hamamoto
IPC分类号： H01J3/10
CPC分类号： H01J37/3171 , H01J37/244 , H01J2237/24405 , H01J2237/2446 , H01J2237/24507 , H01J2237/31703 , H01L21/26586
摘要： A beam current density distribution in y direction of an ion beam 4 at a position of a forestage beam restricting shutter 32 is measured by measuring a change in a beam current of the ion beam 4 incident on a forestage multipoint Faraday 24 by passing an outer side of a side 34 of the shutter 32 while driving the forestage beam restricting shutter 32 in y direction by a forestage shutter driving apparatus 36. Further, a beam current density distribution in y direction of the ion beam 4 at a position of a poststage beam restricting shutter 42 is measured by measuring a change in the beam current of the ion beam 4 incident on a poststage multipoints Faraday 28 by passing an outer side of a side 44 of the shutter 42 while driving the poststage beam restricting shutter 42 in y direction by a poststage shutter driving apparatus 46. Further, at least one of an angle deviation, a diverging angle and abeam side in y direction of the ion beam 4 is measured by using a result of the measurement.
摘要翻译：通过测量入射在森林多点法拉第24上的离子束4的射束电流的变化，测量离子束4在森林束限制闸门32的位置处的y方向上的束流密度分布，通过使外侧同时通过森林快门驱动装置36在y方向上驱动森林光束限制快门32，同时快门32的侧面34。此外，通过测量入射在后级多点法拉第28上的离子束4的射束电流的变化来测量离子束4在后级束限制闸门42的位置的y方向上的束流密度分布，同时通过后级快门驱动装置46驱动后级束限制快门42在y方向上的快门42的侧面44的外侧。此外，通过使用测量结果测量离子束4的y方向上的角度偏差，发散角度和光焦度中的至少一个。

3. 发明申请

US20070023674A1 Ion beam measuring method and ion implanting apparatus 有权
标题翻译：离子束测量方法和离子注入装置
公开(公告)号：US20070023674A1
公开(公告)日：2007-02-01
申请号：US10574281
申请日：2004-12-28
申请人： Sei Umisedo , Nariaki Hamamoto
发明人： Sei Umisedo , Nariaki Hamamoto
IPC分类号： G01K1/08
CPC分类号： H01J37/3171 , H01J37/244 , H01J2237/24405 , H01J2237/2446 , H01J2237/24507 , H01J2237/31703 , H01L21/26586
摘要： A beam current density distribution in y direction of an ion beam 4 at a position of a forestage beam restricting shutter 32 is measured by measuring a change in a beam current of the ion beam 4 incident on a forestage multipoint Faraday 24 by passing an outer side of a side 34 of the shutter 32 while driving the forestage beam restricting shutter 32 in y direction by a forestage shutter driving apparatus 36. Further, a beam current density distribution in y direction of the ion beam 4 at a position of a poststage beam restricting shutter 42 is measured by measuring a change in the beam current of the ion beam 4 incident on a poststage multipoints Faraday 28 by passing an outer side of a side 44 of the shutter 42 while driving the poststage beam restricting shutter 42 in y direction by a poststage shutter driving apparatus 46. Further, at least one of an angle deviation, a diverging angle and abeam side in y direction of the ion beam 4 is measured by using a result of the measurement.
摘要翻译：通过测量入射在森林多点法拉第24上的离子束4的射束电流的变化，测量离子束4在森林束限制闸门32的位置处的y方向上的束流密度分布，通过使外侧同时通过森林快门驱动装置36在y方向上驱动森林光束限制快门32，同时快门32的侧面34。此外，通过测量入射在后级多点法拉第28上的离子束4的射束电流的变化来测量离子束4在后级束限制闸门42的位置的y方向上的束流密度分布，同时通过后级快门驱动装置46驱动后级束限制快门42在y方向上的快门42的侧面44的外侧。此外，通过使用测量结果测量离子束4的y方向上的角度偏差，发散角度和光焦度中的至少一个。

4. 发明申请

US20060284104A1 Ion source 失效
标题翻译：离子源
公开(公告)号：US20060284104A1
公开(公告)日：2006-12-21
申请号：US11434891
申请日：2006-05-17
申请人： Hideki Fujita , Sei Umisedo , Nariaki Hamamoto
发明人： Hideki Fujita , Sei Umisedo , Nariaki Hamamoto
IPC分类号： H01J27/00
CPC分类号： H01J27/14 , H01J27/08
摘要： A cathode holder of a tubular shape is inserted into an opening for a cathode of a plasma generating chamber with a tip of the cathode holder positioned outward from an inner wall surface of the plasma generating chamber. The cathode is held in the cathode holder so that a front surface of the cathode will be positioned outward from the inner wall surface. In the cathode holder is provided a tubular first heat shield surrounding the cathode with a space provided between the first heat shield and the cathode, the tip of the first heat shield positioned outward from the inner wall surface. At a rear side of the cathode is provided a filament. The gap between the cathode holder and the plasma generating chamber is filled with an electrical insulating material.
摘要翻译：将管状的阴极保持器插入到等离子体发生室的阴极的开口中，其中阴极保持器的尖端位于等离子体产生室的内壁表面的外侧。阴极保持在阴极保持器中，使得阴极的前表面将从内壁表面向外定位。在阴极保持器中设置有围绕阴极的管状第一隔热罩，其具有设置在第一隔热罩和阴极之间的空间，第一隔热罩的顶端从内壁表面向外定位。在阴极的后侧设有细丝。阴极保持器和等离子体发生室之间的间隙填充有电绝缘材料。

5. 发明授权

US07750313B2 Ion source 失效
标题翻译：离子源
公开(公告)号：US07750313B2
公开(公告)日：2010-07-06
申请号：US12076979
申请日：2008-03-26
申请人： Hideki Fujita , Sei Umisedo , Nariaki Hamamoto
发明人： Hideki Fujita , Sei Umisedo , Nariaki Hamamoto
IPC分类号： H01J49/10 , H01J49/16 , H01J37/08 , H01J27/02
CPC分类号： H01J27/08 , H01J27/14
摘要： A cathode holder of a tubular shape is inserted into an opening for a cathode of a plasma generating chamber, the cathode holder positioned such that a surface thereof opposes or surrounds a side surface of a cathode. The cathode is held in the cathode holder so that a front surface of the cathode will be positioned on the same plane as, outward from, or inward from the inner wall surface. In the cathode holder is provided a tubular first heat shield surrounding the cathode with a space provided between the first heat shield and the cathode, a surface of the first heat shield positioned to oppose or surround the side surface of the cathode. At a rear end of the cathode is provided a filament. The gap between the cathode holder and the plasma generating chamber is filled with an electrical insulating material.
摘要翻译：将管状阴极保持器插入到等离子体产生室的阴极的开口中，阴极保持器定位成使得其表面与阴极的侧表面相对或包围。阴极保持在阴极保持器中，使得阴极的前表面将位于与内壁表面相同的平面上，从内壁表面向外或向内定位。阴极保持器设置有围绕阴极的管状第一热屏蔽件，其具有设置在第一隔热罩和阴极之间的空间，第一热屏蔽的表面被定位成与阴极的侧表面相对或围绕。在阴极的后端设有细丝。阴极保持器和等离子体发生室之间的间隙填充有电绝缘材料。

6. 发明授权

US07655929B2 Ion beam measuring method and ion implanting apparatus 有权
标题翻译：离子束测量方法和离子注入装置
公开(公告)号：US07655929B2
公开(公告)日：2010-02-02
申请号：US11583830
申请日：2006-10-20
申请人： Sei Umisedo , Nariaki Hamamoto , Tadashi Ikejiri , Kohei Tanaka
发明人： Sei Umisedo , Nariaki Hamamoto , Tadashi Ikejiri , Kohei Tanaka
IPC分类号： G21K5/10 , H01J37/08
CPC分类号： H01J37/3171 , H01J37/244 , H01J37/304 , H01J2237/24405 , H01J2237/24507 , H01J2237/24535 , H01J2237/24564 , H01J2237/24578 , H01J2237/3045 , H01J2237/30483 , H01J2237/31703
摘要： A change of a beam current of an ion beam which passes an outside of the side of a forestage beam restricting shutter, and which is incident on a forestage multipoints Faraday is measured while the forestage beam restricting shutter is driven in a y direction by a forestage shutter driving apparatus in order to obtain a beam current density distribution in the y direction of the ion beam at a position of the forestage beam restricting shutter. A change of a beam current of the ion beam which passes an outside of the side of a poststage beam restricting shutter, and which is incident on a poststage multipoints Faraday is measured while the poststage beam restricting shutter is driven in the y direction by a poststage shutter driving apparatus in order to obtain a beam current density distribution in the y direction of the ion beam at a position of the poststage beam restricting shutter. By using these results, an angle deviation, a diverging angle, and/or a beam size in the y direction of the ion beam can be obtained.
摘要翻译：测量通过森林梁限制快门侧的外侧并入射在森林多点法拉第的离子束的射束电流的变化，同时森林光束限制快门通过森林遮挡板在ay方向上驱动驱动装置，以便在森林光束限制快门的位置处获得离子束的y方向上的束电流密度分布。在后级光束限制快门通过后台沿y方向驱动时，测量通过舞台前限制快门侧的外侧并且入射到后台多点法拉第的离子束的束电流的变化快门驱动装置，以便在后级束限制快门的位置处获得离子束的y方向上的束电流密度分布。通过使用这些结果，可以获得离子束的y方向上的角度偏差，发散角度和/或光束尺寸。

7. 发明申请

US20080277593A1 Ion source 失效
标题翻译：离子源
公开(公告)号：US20080277593A1
公开(公告)日：2008-11-13
申请号：US12076979
申请日：2008-03-26
申请人： Hideki Fujita , Sei Umisedo , Nariaki Hamamoto
发明人： Hideki Fujita , Sei Umisedo , Nariaki Hamamoto
IPC分类号： H01J27/00
CPC分类号： H01J27/08 , H01J27/14
摘要： A cathode holder of a tubular shape is inserted into an opening for a cathode of a plasma generating chamber, the cathode holder positioned such that a surface thereof opposes or surrounds a side surface of a cathode. The cathode is held in the cathode holder so that a front surface of the cathode will be positioned on the same plane as, outward from, or inward from the inner wall surface. In the cathode holder is provided a tubular first heat shield surrounding the cathode with a space provided between the first heat shield and the cathode, a surface of the first heat shield positioned to oppose or surround the side surface of the cathode. At a rear end of the cathode is provided a filament. The gap between the cathode holder and the plasma generating chamber is filled with an electrical insulating material.
摘要翻译：将管状阴极保持器插入到等离子体产生室的阴极的开口中，阴极保持器定位成使得其表面与阴极的侧表面相对或包围。阴极保持在阴极保持器中，使得阴极的前表面将位于与内壁表面相同的平面上，从内壁表面向外或向内定位。阴极保持器设置有围绕阴极的管状第一热屏蔽件，其具有设置在第一隔热罩和阴极之间的空间，第一热屏蔽的表面被定位成与阴极的侧表面相对或围绕。在阴极的后端设有细丝。阴极保持器和等离子体发生室之间的间隙填充有电绝缘材料。

8. 发明申请

US20080073579A1 Ion beam measuring method and ion implanting apparatus 有权
标题翻译：离子束测量方法和离子注入装置
公开(公告)号：US20080073579A1
公开(公告)日：2008-03-27
申请号：US11583830
申请日：2006-10-20
申请人： Sei Umisedo , Nariaki Hamamoto , Tadashi Ikejiri , Kohei Tanaka
发明人： Sei Umisedo , Nariaki Hamamoto , Tadashi Ikejiri , Kohei Tanaka
IPC分类号： H01J37/08
CPC分类号： H01J37/3171 , H01J37/244 , H01J37/304 , H01J2237/24405 , H01J2237/24507 , H01J2237/24535 , H01J2237/24564 , H01J2237/24578 , H01J2237/3045 , H01J2237/30483 , H01J2237/31703
摘要： A change of a beam current of an ion beam which passes an outside of the side of a forestage beam restricting shutter, and which is incident on a forestage multipoints Faraday is measured while the forestage beam restricting shutter is driven in a y direction by a forestage shutter driving apparatus in order to obtain a beam current density distribution in the y direction of the ion beam at a position of the forestage beam restricting shutter. A change of a beam current of the ion beam which passes an outside of the side of a poststage beam restricting shutter, and which is incident on a poststage multipoints Faraday is measured while the poststage beam restricting shutter is driven in the y direction by a poststage shutter driving apparatus in order to obtain a beam current density distribution in the y direction of the ion beam at a position of the poststage beam restricting shutter. By using these results, an angle deviation, a diverging angle, and/or a beam size in the y direction of the ion beam can be obtained.
摘要翻译：测量通过森林梁限制快门侧的外侧并入射在森林多点法拉第的离子束的射束电流的变化，同时森林光束限制快门通过森林遮挡板沿ay方向驱动驱动装置，以便在森林光束限制快门的位置处获得离子束的y方向上的束电流密度分布。在后级光束限制快门通过后台沿y方向驱动时，测量通过舞台前限制快门侧的外侧并且入射到后台多点法拉第的离子束的束电流的变化快门驱动装置，以便在后级束限制快门的位置处获得离子束的y方向上的束电流密度分布。通过使用这些结果，可以获得离子束的y方向上的角度偏差，发散角度和/或光束尺寸。

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