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1. 发明授权

US06354913B1 Abrasive and method for polishing semiconductor substrate 有权
标题翻译：磨料和抛光半导体衬底的方法
公开(公告)号：US06354913B1
公开(公告)日：2002-03-12
申请号：US09214431
申请日：1999-01-06
申请人： Naoto Miyashita , Yoshihiro Minami , Kenji Doi , Jun Takayasu , Hiroyuki Kohno , Hiroshi Kato , Kazuhiko Hayashi
发明人： Naoto Miyashita , Yoshihiro Minami , Kenji Doi , Jun Takayasu , Hiroyuki Kohno , Hiroshi Kato , Kazuhiko Hayashi
IPC分类号： B24B100
CPC分类号： B24B37/24 , B24B37/0056 , B24B37/044 , B24D3/20 , B24D3/344 , C09G1/02 , H01L21/3212
摘要： A semiconductor wafer or a film formed thereon is polished by using a polishing agent comprising abrasive containing silica particles as the main component, water as a solvent, and a water-soluble cellulose, an alkali metal impurity content of the polishing agent being 5C ppm or less where the polishing agent contains C % by weight of the water-soluble cellulose, so as to flatten the semiconductor wafer without doing damage to the wafer or the film formed thereon and without bringing about a dishing problem in the polished surface.
摘要翻译：通过使用包含二氧化硅颗粒作为主要成分的研磨剂，作为溶剂的水和水溶性纤维素，研磨剂的碱金属杂质含量为5ppm或以下，研磨半导体晶片或其上形成的膜抛光剂含有C％（重量）的水溶性纤维素，以使得半导体晶片平坦化，而不会对晶片或其上形成的膜造成损害，而不会在抛光表面产生凹陷问题。

2. 发明授权

US6045605A Abrasive material for polishing a semiconductor wafer, and methods for manufacturing and using the abrasive material 失效
标题翻译：用于研磨半导体晶片的研磨材料，以及制造和使用研磨材料的方法
公开(公告)号：US6045605A
公开(公告)日：2000-04-04
申请号：US78668
申请日：1998-05-14
申请人： Kenji Doi , Naoto Miyashita , Masahiro Abe , Hiroyuki Kohno , Hiroshi Kato , Kazuhiko Hayashi
发明人： Kenji Doi , Naoto Miyashita , Masahiro Abe , Hiroyuki Kohno , Hiroshi Kato , Kazuhiko Hayashi
IPC分类号： B24B37/00 , B24B57/02 , C09G1/02 , C09K3/14 , H01L21/304 , B24B1/00
CPC分类号： B24B57/02 , B24B37/04 , C09G1/02 , C09K3/1463
摘要： An abrasive material is prepared by dispersing silicon nitride particles acting as abrasive particles in a solvent such as a pure water or an ultra pure water, followed by adding an adsorptive stickable to the abrasive particles to the dispersion. The resultant abrasive material permits diminishing the polishing rate of a silicon nitride film used as a stopper film, with the result that a CVD SiO.sub.2 film to be polished is selectively polished relative to the Si.sub.3 N.sub.4 film used as the stopper film. This makes it possible to make the stopper film as thin as possible and permits the CVD SiO.sub.2 film to be flattened efficiently without bringing about a dishing problem.
摘要翻译：研磨材料通过将作为磨料颗粒的氮化硅颗粒分散在诸如纯水或超纯水的溶剂中，然后向分散体中添加粘附到磨料颗粒上的吸附剂来制备。所得的研磨材料允许减少用作阻挡膜的氮化硅膜的抛光速率，结果是相对于用作阻挡膜的Si 3 N 4膜选择性地抛光待抛光的CVD SiO 2膜。这使得可以使阻挡膜尽可能薄，并且可以有效地使CVD SiO 2膜平坦化，而不会产生凹陷问题。

3. 发明授权

US5904159A Polishing slurries and a process for the production thereof 失效
标题翻译：抛光浆料及其生产工艺
公开(公告)号：US5904159A
公开(公告)日：1999-05-18
申请号：US751769
申请日：1996-11-08
申请人： Hiroshi Kato , Kazuhiko Hayashi , Hiroyuki Kohno
发明人： Hiroshi Kato , Kazuhiko Hayashi , Hiroyuki Kohno
IPC分类号： C09G1/02 , B08B7/00
CPC分类号： C09G1/02
摘要： A polishing slurry is formed of a silica-dispersed solution obtained by dispersing, in an aqueous solvent, a fumed silica having an average primary particle size of from 5 to 30 nm, the silica-dispersed solution exhibiting a light scattering index (n) of from 3 to 6 at a silica concentration of 1.5% by weight, and the fumed silica dispersed therein having an average secondary particle size of from 30 to 100 nm on the weight basis. The polishing slurry is produced by pulverizing, using a high-pressure homogenizer, a silica-dispersed solution obtained by dispersing a fumed silica in an aqueous solvent, so that the fumed silica possesses an average secondary particle size of from 30 to 100 nm on the weight basis. The polishing slurry is used for polishing semiconductor wafers and inter-layer dielectric in an IC process.
摘要翻译：抛光浆料由二氧化硅分散溶液形成，其通过在水性溶剂中分散平均一次粒径为5〜30nm的热解法二氧化硅，显示出光散射指数（n）的二氧化硅分散溶液 3〜6，二氧化硅浓度为1.5重量％，分散在其中的热解法二氧化硅的重均分子量为30〜100nm。抛光浆料通过使用高压均化器将通过将热解法二氧化硅分散在水性溶剂中获得的二氧化硅分散溶液进行粉碎来制备，使得煅制二氧化硅的平均二次粒径为30〜100nm，重量基础。抛光浆料用于在IC工艺中研磨半导体晶片和层间电介质。

4. 发明授权

US06338744B1 Polishing slurry and polishing method 有权
标题翻译：抛光浆和抛光方法
公开(公告)号：US06338744B1
公开(公告)日：2002-01-15
申请号：US09481573
申请日：2000-01-11
申请人： Yoshikuni Tateyama , Katsumi Yamamoto , Hiroshi Kato , Kazuhiko Hayashi , Hiroyuki Kono
发明人： Yoshikuni Tateyama , Katsumi Yamamoto , Hiroshi Kato , Kazuhiko Hayashi , Hiroyuki Kono
IPC分类号： B24D302
CPC分类号： C09K3/1463 , C09G1/02
摘要： Provided is a high purity polishing slurry which provides a material to be polished with a high scratch resistance and has a high polishing efficiency and which less contaminates the material to be polished. The polishing slurry comprises water and silica particles dispersed in water, wherein the above silica particles have an average primary particle size of 50 to 300 nm and a refractive index of 1.41 to 1.44 and are synthesized in a liquid phase and produced without passing through a drying step; and the K value is 5×10−6 mol/m2 or more. Further, a polishing process for a semiconductor wafer using the above polishing slurry is provided.
摘要翻译：提供了一种高纯度抛光浆料，其提供具有高耐刮擦性并且具有高抛光效率并且较少污染待抛光材料的待抛光材料。抛光浆料包含分散在水中的水和二氧化硅颗粒，其中上述二氧化硅颗粒的平均一次粒径为50〜300nm，折射率为1.41〜1.44，合成液相，不经过干燥步; K值为5×10 -6 mol / m 2以上。此外，提供了使用上述抛光浆料的半导体晶片的抛光工艺。

5. 发明授权

US10544425B2 Plant having increased resistance or susceptibility to 4-HPPD inhibitor 有权
公开(公告)号：US10544425B2
公开(公告)日：2020-01-28
申请号：US13976526
申请日：2011-12-26
申请人： Hiroshi Kato , Hideo Maeda , Yoshihiro Sunohara , Ikuo Ando , Masahiro Oshima , Motoshige Kawata , Hitoshi Yoshida , Sakiko Hirose , Makiko Kawagishi , Yojiro Taniguchi , Kazumasa Murata , Hiroaki Maeda , Yuji Yamada , Keisuke Sekino , Akihiko Yamazaki
发明人： Hiroshi Kato , Hideo Maeda , Yoshihiro Sunohara , Ikuo Ando , Masahiro Oshima , Motoshige Kawata , Hitoshi Yoshida , Sakiko Hirose , Makiko Kawagishi , Yojiro Taniguchi , Kazumasa Murata , Hiroaki Maeda , Yuji Yamada , Keisuke Sekino , Akihiko Yamazaki
IPC分类号： C12N15/82 , C12Q1/6895
摘要： By a QTL analysis and so forth using 4-HPPD inhibitor-susceptible rice and 4-HPPD inhibitor-resistant rice, a hypothetical gene (HIS1 gene) of an iron/ascorbate-dependent oxidoreductase gene located on a short arm of chromosome 2 of rice has been identified as a 4-HPPD inhibitor-resistance gene. Further, it has also been revealed that a homologous gene (HSL1 gene) of the HIS1 gene is located on chromosome 6 of rice. Furthermore, it has been found out that utilizations of these genes make it possible to efficiently produce a plant having increased resistance or susceptibility to a 4-HPPD inhibitor and to efficiently determine whether a plant has resistance or susceptibility to a 4-HPPD inhibitor.

6. 发明授权

US09749785B2 Information providing system and information providing method 有权
公开(公告)号：US09749785B2
公开(公告)日：2017-08-29
申请号：US15066825
申请日：2016-03-10
申请人： Tatsuo Nishimura , Hiroshi Kato
发明人： Tatsuo Nishimura , Hiroshi Kato
IPC分类号： G06K19/00 , H04W4/02 , H04W4/04
CPC分类号： H04W4/02 , H04W4/04
摘要： A portable terminal obtains a first code used to obtain provision information and a second code, different from the first code, from a communication device. The portable terminal transmits the first and second codes to an information processing device, receives the provision information from the information processing device as a response to the transmission, and outputs the received provision information. The information processing device includes a first storage unit storing the first code and a second storage unit storing, by associating, the second code and the provision information. The information processing device receives the first and second codes from the portable terminal, obtains provision information associated with the received second code from the second storage unit when the received first code is stored in the first storage unit, and transmits the obtained provision information to the portable terminal. The first code is deleted in exiting from a specific area.

7. 发明授权

US09385020B2 Substrate holding and rotating device, substrate treatment apparatus including the device, and substrate treatment method 有权
标题翻译：基板保持和旋转装置，包括该装置的基板处理装置和基板处理方法
公开(公告)号：US09385020B2
公开(公告)日：2016-07-05
申请号：US13596848
申请日：2012-08-28
申请人： Hiroshi Kato
发明人： Hiroshi Kato
IPC分类号： H01L21/67 , H01L21/687
CPC分类号： H01L21/68728 , H01L21/68792
摘要： A substrate holding and rotating device includes: a turntable rotatable; a rotative drive unit which rotates the turntable; a holding member which is provided on the turntable and horizontally holds a substrate in upwardly spaced relation to the turntable; a vertically movable protection disk disposed between the turntable and a substrate holding position; and a magnetic levitation mechanism including a first magnet attached to the protection disk, an annular second magnet which generates a repulsive force with respect to the first magnet, a support member which non-rotatably supports the second magnet, and a relative movement mechanism which moves the support member and the turntable relative to each other.
摘要翻译：基板保持旋转装置包括：转盘，旋转驱动单元，其使转盘旋转; 保持构件，其设置在转台上并水平地保持与转台成向上间隔开的基板; 设置在所述转盘和基板保持位置之间的可垂直移动的保护盘; 以及磁悬浮机构，其包括附接到保护盘的第一磁体，相对于第一磁体产生排斥力的环形第二磁体，不可旋转地支撑第二磁体的支撑部件，以及相对移动机构，其移动支撑构件和转台相对于彼此。

8. 发明授权

US09223193B2 Projection type display apparatus and method of cooling light source 有权
标题翻译：投影式显示装置及冷却光源的方法
公开(公告)号：US09223193B2
公开(公告)日：2015-12-29
申请号：US13813404
申请日：2010-08-02
申请人： Hiroshi Kato
发明人： Hiroshi Kato
IPC分类号： G03B21/16 , G03B21/20
CPC分类号： G03B21/16 , G03B21/2033
摘要： There is provided a projection-type display apparatus which solves the problem that when an amount of electric power applied to light sources is adjusted, the amount of electric power involved in the cooling of LEDs becomes greater than necessary. Coolers (107R, 107G, 107B) cool light sources (103R, 103G, 103B). Light sensor (111) detects the brightness of a surrounding area. Light case temperature detectors (112R, 112G, 112B) detect case temperatures which are the temperatures of cases of light sources (103R, 103G, 103B). Light source forward voltage detectors (113R, 113G, 113B) detect forward voltages of light sources (103R, 103G, 103B). Light source forward current detectors (114R, 114G, 114B) detect forward currents of light sources (103R, 103G, 103B). Adjuster (117) adjusts the amount of cooling power of coolers (107R, 107G, 107B) based on the forward voltage, the forward current, and the case temperatures.
摘要翻译：提供一种投影型显示装置，其解决了当调整施加到光源的电力的量时，LED的冷却所涉及的电力的量变得大于必要的问题。冷却器（107R，107G，107B）冷却光源（103R，103G，103B）。光传感器（111）检测周围区域的亮度。光箱温度检测器（112R，112G，112B）检测作为光源（103R，103G，103B）的情况的温度的外壳温度。光源正向电压检测器（113R，113G，113B）检测光源（103R，103G，103B）的正向电压。光源正向电流检测器（114R，114G，114B）检测光源（103R，103G，103B）的正向电流。调节器（117）根据正向电压，正向电流和外壳温度调节冷却器（107R，107G，107B）的冷却功率。

9. 发明授权

US09000202B2 Method for producing inorganic oxide particles 有权
标题翻译：无机氧化物粒子的制造方法
公开(公告)号：US09000202B2
公开(公告)日：2015-04-07
申请号：US13579798
申请日：2011-02-18
申请人： Takayuki Maehara , Tadaharu Komatsubara , Yuya Yamano , Kenichi Ishizu , Makoto Sato , Hiroaki Taira , Hiroshi Kato
发明人： Takayuki Maehara , Tadaharu Komatsubara , Yuya Yamano , Kenichi Ishizu , Makoto Sato , Hiroaki Taira , Hiroshi Kato
IPC分类号： C07F7/02 , C01B33/146 , C01B13/36 , C01B33/18
CPC分类号： C01B33/146 , C01B13/36 , C01B13/363 , C01B33/141 , C01B33/148 , C01B33/154 , C01B33/18 , C01G23/04 , C01G25/02 , C01P2004/52 , C01P2004/62 , C01P2004/64 , C07F7/08 , C07F7/10 , C09C1/3081
摘要： The present invention relates to a method for producing inorganic oxide particles, comprising at least the following steps of: coagulating a dispersion obtained by carrying out the hydrolysis reaction and the polycodensation reaction of a metal alkoxide in the presence of a basic catalyst; filtering the dispersion to obtain particles; and drying the particles, wherein the step of coagulating the dispersion is carried out by adding a coagulant comprising at least one compound selected from the group consisting of carbon dioxide, ammonium carbonate, ammonium hydrogen carbonate and ammonium carbamate to the dispersion. The inorganic oxide particles obtained by the method of the present invention have high purity and are excellent in flowability.
摘要翻译：本发明涉及一种无机氧化物粒子的制造方法，其至少包括以下步骤：在碱性催化剂的存在下使通过进行水解反应和金属醇盐的多缩聚反应得到的分散液凝结; 过滤分散体以获得颗粒; 并干燥所述颗粒，其中通过将至少一种选自二氧化碳，碳酸铵，碳酸氢铵和氨基甲酸铵的化合物的凝结剂加入到分散体中来进行凝固分散体的步骤。通过本发明的方法获得的无机氧化物颗粒具有高纯度并且流动性优异。

10. 发明授权

US08821332B2 Power transmission device 有权
标题翻译：动力传动装置
公开(公告)号：US08821332B2
公开(公告)日：2014-09-02
申请号：US13983911
申请日：2012-02-29
申请人： Kazuya Kawamura , Takayoshi Kato , Toshihiko Aoki , Hiroshi Kato , Satoru Kasuya
发明人： Kazuya Kawamura , Takayoshi Kato , Toshihiko Aoki , Hiroshi Kato , Satoru Kasuya
IPC分类号： F16H57/04 , F16D3/76 , F16H57/027
CPC分类号： F16H57/027 , F16H57/0421 , F16H57/0424 , F16H57/0426 , F16H57/0471 , Y10T464/10
摘要： In a power transmission device, a breather chamber having an opening on its one end side and extending coaxially with the countershaft is formed in a countershaft that transmits power from an output shaft of an automatic transmission to a differential mechanism. An inner end of a vent pipe placed so as to extend through a transmission case and that includes the inner end and an outer end each having an opening is inserted in the opening of the breather chamber. A plug, which closes a gap between an inner peripheral surface of the breather chamber and an outer peripheral surface of the inner end of the vent pipe so as to allow air to flow between the inside of the transmission case and the breather chamber and so as to restrict entrance of hydraulic oil into the breather chamber, is placed in the opening of the breather chamber.
摘要翻译：在动力传递装置中，在其一端侧具有与中间轴同轴延伸的通气孔的通气室形成在从自动变速器的输出轴向差速机构传递动力的中间轴。排气管的内端部，其布置成贯穿变速箱，并且包括内端和各自具有开口的外端插入到通气室的开口中。一个塞子，其封闭通气室的内周表面和通气管的内端的外周表面之间的间隙，以允许空气在变速箱的内部和通气室之间流动，从而将液压油的入口限制在通气室中，被放置在通气室的开口中。

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