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    • 9. 发明专利
    • PHOTOMASK AND METHOD FOR PROCESSING MASK PATTERN DATA
    • JPH0667403A
    • 1994-03-11
    • JP7078692
    • 1992-03-27
    • NIPPON TELEGRAPH & TELEPHONE
    • KOMATSU KAZUHIKOTAMECHIKA EMIWATANABE TOSHIBUMI
    • G03F1/34G03F1/68G03F7/20H01L21/027H01L21/30G03F1/08
    • PURPOSE:To easily and automatic cally form the mask patterns in a multiple transfer method and further to decrease the influence of mis-registration between plural masks. CONSTITUTION:An exposing region is divided to a region having fine patterns 1100 where phase shifters are necessary and a region 3 where these patterns are not necessary (103) in the formation of patterns by plural times of exposing including the exposing using a mask M1 including phase shift patterns 1500 and the exposing to erase the unnecessary patterns formed by this exposing. One sheet of the mask is provided with the shifters and is automatically so formed that the mask has the mask shifter patterns having the edges corresponding to the fine patterns and the patterns corresponding to the other patterns 1600 in the region 1 and that the region 3 is formed as shielding mask patterns. Another sheet of the mask without the shifters is so automatically formed as to have the ordinary patterns forming the patterns 2600 existing in the region 3 and the patterns for removing the unnecessary patterns in the patterns of the shifter forming regions. Further, the patterns of one sheet of the mask are made bold in one axial direction and the mask patterns of the other mask are made bold in the direction orthogonal therewith.