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1. 发明申请

WO2004092833A2 ENVIRONMENTAL SYSTEM INCLUDING A TRANSPORT REGION FOR AN IMMERSION LITHOGRAPHY APPARATUS 审中-公开
标题翻译：环境系统，其中包括一个静态地图设备的运输区域
公开(公告)号：WO2004092833A2
公开(公告)日：2004-10-28
申请号：PCT/US2004/009994
申请日：2004-04-01
申请人： NIKON CORPORATION , NOVAK, Thomas, W. , HAZELTON, Andrew, J. , WATSON, Douglas, C.
发明人： NOVAK, Thomas, W. , HAZELTON, Andrew, J. , WATSON, Douglas, C.
IPC分类号： G03F
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254), an immersion fluid system (252), and a transport region (256). The fluid barrier (254) is positioned near the device (30) and maintains the transport region (256) near the gap (246). The immersion fluid system (252) delivers an immersion fluid (248) that fills the gap (246). The transport region (256) transports at least a portion of the immersion fluid (248) that is near the fluid barrier (254) and the device (30) away from the device (30). The immersion fluid system (252) can include a fluid removal system (282) that is in fluid communication with the transport region (256). The transport region (256) can be made of a porous material.
摘要翻译：用于控制光学组件（16）和装置（30）之间的间隙（246）中的环境的环境系统（26）包括流体屏障（254），浸没流体系统（252）和输送区域 256）。流体屏障（254）位于装置（30）附近，并将输送区域（256）保持在间隙（246）附近。浸没流体系统（252）输送填充间隙（246）的浸没流体（248）。输送区域（256）将流体屏障（254）和装置（30）附近的浸没流体（248）的至少一部分输送离开装置（30）。浸没流体系统（252）可以包括与输送区域（256）流体连通的流体移除系统（282）。运输区域（256）可由多孔材料制成。

2. 发明申请

WO2009151154A1 APPARATUS AND METHOD FOR EXPOSING ADJACENT SITES ON A SUBSTRATE 审中-公开
标题翻译：用于在基板上暴露邻接位点的装置和方法
公开(公告)号：WO2009151154A1
公开(公告)日：2009-12-17
申请号：PCT/JP2009/061150
申请日：2009-06-12
申请人： NIKON CORPORATION , NOVAK, Thomas, W. , BINNARD, Michael, B
发明人： NOVAK, Thomas, W. , BINNARD, Michael, B
IPC分类号： G03F7/20
CPC分类号： G03F7/70358 , G03F7/70425
摘要： An exposure apparatus (10) for transferring a mask pattern (352) from a mask (12) to a substrate (14) includes an illumination system (18), a mask stage assembly (22), a substrate stage assembly (24), and a control system (28). The substrate (14) includes a first site (1) and a second site (2) that are adjacent to each other and that are aligned with each other along a first axis. The illumination system (18) generates an illumination beam (35) that is directed at the mask (12). The mask stage assembly (22) retains and positions the mask (12) relative to the illumination beam (35). The substrate stage assembly (24) retains and positions the substrate (14). The control system (28) controls the illumination system (18) and the substrate stage assembly (24) so that the mask pattern (352) is sequentially transferred to the first site (1) and then the second site (2) while the substrate stage assembly (24) is moving the substrate (24) in a first mask direction along the first axis. With this design, the substrate (14) is being moved in the same direction along the first axis during the exposure of successive sites (1) (2) and there is no need to stop the substrate (14) and/or reverse the direction of the substrate (14) during the exposure of successive sites (1) (2). This allows the exposure apparatus (1) to have improved throughput for a given acceleration and deceleration profile.
摘要翻译：一种用于将掩模图案（352）从掩模（12）传送到基板（14）的曝光装置（10）包括照明系统（18），掩模台组件（22），基底台组件（24）和控制系统（28）。基板（14）包括彼此相邻并且沿着第一轴线彼此对准的第一位置（1）和第二位置（2）。照明系统（18）产生指向掩模（12）的照明光束（35）。掩模台组件（22）相对于照明光束（35）保持并定位掩模（12）。衬底台组件（24）保持并定位衬底（14）。控制系统（28）控制照明系统（18）和衬底台组件（24），使得掩模图案（352）顺序地转移到第一位置（1），然后第二位置（2），同时衬底台架组件（24）沿着第一轴线沿着第一掩模方向移动基板（24）。通过这种设计，在连续的位置（1）（2）的曝光期间，衬底（14）沿着第一轴在相同的方向上移动，并且不需要停止衬底（14）和/或反向在连续部位（1）（2）的曝光期间的衬底（14）。这允许曝光装置（1）对于给定的加速和减速曲线具有改进的吞吐量。

3. 发明申请

WO2008143327A8 KINEMATIC CHUCKS FOR RETICLES AND OTHER PLANAR BODIES 审中-公开
公开(公告)号：WO2008143327A8
公开(公告)日：2008-11-27
申请号：PCT/JP2008/059483
申请日：2008-05-15
申请人： NIKON CORPORATION , NOVAK, Thomas, W. , WATSON, Douglas, C. , PHILLIPS, Alton, H.
发明人： NOVAK, Thomas, W. , WATSON, Douglas, C. , PHILLIPS, Alton, H.
IPC分类号： G03F7/20
摘要： Devices are disclosed for holding and moving a planar body such as a reticle (25) as used, for example, in microlithography. An exemplary device includes a stage (12) and a body chuck (10). The stage has a movable support surface (17a, 17b). A proximal region (18a, 18b) of a first membrane (16a, 16b) is mounted to the support surface. A distal region (20a, 20b) of the first membrane extends from the support surface and is coupled to the chuck such that the first membrane at least partially supports the chuck. The chuck includes a surface (28) from wh'ich multiple pins (38,40,44) extend. The surface is situated at the distal region. The pins are arrayed to contact and support a respective region of the body. The pin arrangement is configured such that, during- movements of the chuck imparted by the support surface, body slippage relative to the pins due to forces caused by the movement is substantially uniform at each pin.

4. 发明申请

WO2008004646A1 EXPOSURE APPARATUS THAT INCLUDES A PHASE CHANGE CIRCULATION SYSTEM FOR MOVERS 审中-公开
标题翻译：包括用于移动器的相变循环系统的曝光装置
公开(公告)号：WO2008004646A1
公开(公告)日：2008-01-10
申请号：PCT/JP2007/063532
申请日：2007-06-29
申请人： NIKON CORPORATION , NOVAK, Thomas, W. , BINNARD, Michale, B. , POON, Alex Ka Tim , TOTSU, Masahiro , KHO, Leonard Wai Fung , KESWANI, Gaurav
发明人： NOVAK, Thomas, W. , BINNARD, Michale, B. , POON, Alex Ka Tim , TOTSU, Masahiro , KHO, Leonard Wai Fung , KESWANI, Gaurav
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70758 , H01L21/67248 , H01L21/68 , H02K9/20 , H02K41/02
摘要： A mover combination (226) for moving and positioning a device (34) includes a mover (328) that defines a fluid passageway (370) and a circulation system (330) having a passageway inlet (374) and a passageway outlet (376). The circulation system (330) directs a circulation fluid (378) into the fluid passageway (370). The circulation system (330) can include a liquid/gas separator (384) that is in fluid communication with the fluid passageway (370). With this design, the plumbing for the liquid (378A) and the gas (378B) can each be optimized. Additionally, the circulation system (330) can include a pressure control device (388) that controls the pressure of the circulation fluid (378) in at least a portion of the fluid passageway (370). With this design, the pressure control device (388) controls the pressure of the circulation fluid (378) near the fluid passageway (370) so that the temperature of the circulation fluid (378) at the passageway outlet (376) is approximately equal to the temperature of the circulation fluid (378) at the passageway inlet (374). Moreover, the circulation system (930) can include a pump assembly (980) that directs the circulation fluid (978) into the passageway inlet (974), and a pressure control device (996) that precisely controls a state of the circulation fluid (978) near the passageway inlet (974). With this design, the phase of the circulation fluid (978) at the passageway inlet (974) can be precisely controlled without restricting the flow of the circulation fluid (978).
摘要翻译：用于移动和定位装置（34）的移动器组合（226）包括限定流体通道（370）的移动器（328）和具有通道入口（374）和通道出口（376）的循环系统（330）。循环系统（330）将循环流体（378）引导到流体通道（370）中。循环系统（330）可以包括与流体通道（370）流体连通的液体/气体分离器（384）。通过这种设计，可以优化液体（378A）和气体（378B）的管道。另外，循环系统（330）可以包括控制流体通道（370）的至少一部分中的循环流体（378）的压力的压力控制装置（388）。通过该设计，压力控制装置（388）控制流体通道（370）附近的循环流体（378）的压力，使得通道出口（376）处的循环流体（378）的温度近似等于在通道入口（374）处的循环流体（378）的温度。此外，循环系统（930）可以包括引导循环流体（978）进入通道入口（974）的泵组件（980）和精确地控制循环流体状态的压力控制装置（996） 978）在通道入口附近（974）。通过这种设计，可以精确地控制在通道入口（974）处的循环流体（978）的相位，而不限制循环流体（978）的流动。

5. 发明申请

WO2004093160A2 RUN-OFF PATH TO COLLECT LIQUID FOR AN IMMERSION LITHOGRAPHY APPARATUS 审中-公开
标题翻译：运行路径收集液体用于静态光刻设备
公开(公告)号：WO2004093160A2
公开(公告)日：2004-10-28
申请号：PCT/US2004/009993
申请日：2004-04-01
申请人： NIKON CORPORATION , NOVAK, Thomas, W.
发明人： NOVAK, Thomas, W.
IPC分类号： H01L
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/7095
摘要： An exposure apparatus (10) for transferring an image to a device (30) includes an optical assembly (16), an immersion fluid system (252), and a device stage assembly (20). The optical assembly (16) is positioned a gap (246) above the device (30). The immersion fluid system (252) fills the gap (246) with an immersion fluid (248). The device stage assembly (20) includes a sloped region (282) that facilitates movement of the immersion fluid (248) that exits the gap (246) away from the device (30). The device stage assembly (20) can include a collection region (284) and a recovery system (286) that recovers immersion fluid (248) from the collection region (284).
摘要翻译：用于将图像传送到装置（30）的曝光装置（10）包括光学组件（16），浸没流体系统（252）和装置台组件（20）。光学组件（16）定位在装置（30）上方的间隙（246）。浸没流体系统（252）用浸没流体（248）填充间隙（246）。装置级组件（20）包括倾斜区域（282），其有助于离开间隙（246）的浸没流体（248）远离装置（30）的运动。装置级组件（20）可以包括从收集区域（284）回收浸没流体（248）的收集区域（284）和回收系统（286）。

6. 发明公开

EP1611482A2 RUN-OFF PATH TO COLLECT LIQUID FOR AN IMMERSION LITHOGRAPHY APPARATUS 有权
标题翻译： FOR USE内流体流动的浸没式光刻设备
公开(公告)号：EP1611482A2
公开(公告)日：2006-01-04
申请号：EP04759084.9
申请日：2004-04-01
申请人： NIKON CORPORATION
发明人： NOVAK, Thomas, W.
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/7095
摘要： An exposure apparatus (10) for exposing a substrate (30) to light through an optical assembly (16) and liquid, the exposure apparatus comprising: a stage (42) for holding the substrate so that the substrate is exposed via the optical assembly and the liquid in a gap between the optical assembly and the substrate on the stage, the stage being movable relative to the optical assembly; and a liquid supply system for supplying liquid into the gap between the optical assembly and the substrate on the stage from an outlet, wherein the stage comprises: a support for supporting the substrate; and a channel for recovering the liquid supplied from the outlet and flowed outwardly from the top surface of the substrate supported by the support.

7. 发明授权

EP1611482B1 RUN-OFF PATH TO COLLECT LIQUID FOR AN IMMERSION LITHOGRAPHY APPARATUS 有权
标题翻译： FOR USE内流体流动的浸没式光刻设备
公开(公告)号：EP1611482B1
公开(公告)日：2015-06-03
申请号：EP04759084.9
申请日：2004-04-01
申请人： NIKON CORPORATION
发明人： NOVAK, Thomas, W.
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/7095
摘要： An exposure apparatus (10) for exposing a substrate (30) to light through an optical assembly (16) and liquid, the exposure apparatus comprising: a stage (42) for holding the substrate so that the substrate is exposed via the optical assembly and the liquid in a gap between the optical assembly and the substrate on the stage, the stage being movable relative to the optical assembly; and a liquid supply system for supplying liquid into the gap between the optical assembly and the substrate on the stage from an outlet, wherein the stage comprises: a support for supporting the substrate; and a channel for recovering the liquid supplied from the outlet and flowed outwardly from the top surface of the substrate supported by the support.

8. 发明公开

EP2158520A1 KINEMATIC CHUCKS FOR RETICLES AND OTHER PLANAR BODIES 审中-公开
标题翻译：对于标线和其它面体KINEMATIC夹具
公开(公告)号：EP2158520A1
公开(公告)日：2010-03-03
申请号：EP08753093.7
申请日：2008-05-15
申请人： Nikon Corporation
发明人： COAKLEY, Scott , NOVAK, Thomas, W. , WATSON, Douglas, C. , PHILLIPS, Alton, H.
IPC分类号： G03F7/20
CPC分类号： G03F7/70783 , G03F7/707
摘要： Devices are disclosed for holding and moving a planar body such as a reticle as used, for example, in microlithography. An exemplary device includes a stage and a body chuck. The stage has a movable support surface. A proximal region of a first membrane is mounted to the support surface. A distal region of the first membrane extends from the support surface and is coupled to the chuck such that the first membrane at least partially supports the chuck. The chuck includes a surface from which multiple pins extend. The surface is situated at the distal region. The pins are arrayed to contact and support a respective region of the body. The pin arrangement is configured such that, during movements of the chuck imparted by the support surface, body slippage relative to the pins due to forces caused by the movement is substantially uniform at each pin.

9. 发明授权

EP1611486B1 ENVIRONMENTAL SYSTEM INCLUDING A TRANSPORT REGION FOR AN IMMERSION LITHOGRAPHY APPARATUS 有权
标题翻译：与传输地区的环境系统，其用于浸没式光刻设备
公开(公告)号：EP1611486B1
公开(公告)日：2016-03-16
申请号：EP04759085.6
申请日：2004-04-01
申请人： Nikon Corporation
发明人： NOVAK, Thomas, W. , HAZELTON, Andrew, J. , WATSON, Douglas, C.
IPC分类号： G03F7/20 , G03B27/32 , G03B27/42
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254), an immersion fluid system (252), and a transport region (256). The fluid barrier (254) is positioned near the device (30) and maintains the transport region (256) near the gap (246). The immersion fluid system (252) delivers an immersion fluid (248) that fills the gap (246). The transport region (256) transports at least a portion of the immersion fluid (248) that is near the fluid barrier (254) and the device (30) away from the device (30). The immersion fluid system (252) can include a fluid removal system (282) that is in fluid communication with the transport region (256). The transport region (256) can be made of a porous material.

10. 发明公开

EP2035896A1 EXPOSURE APPARATUS THAT INCLUDES A PHASE CHANGE CIRCULATION SYSTEM FOR MOVERS 审中-公开
标题翻译：有相变循环系统功率器件的曝光装置
公开(公告)号：EP2035896A1
公开(公告)日：2009-03-18
申请号：EP07745572.3
申请日：2007-06-29
申请人： Nikon Corporation
发明人： NOVAK, Thomas, W. , BINNARD, Michale, B. , POON, Alex Ka Tim , TOTSU, Masahiro , KHO, Leonard Wai Fung , KESWANI, Gaurav
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70758 , H01L21/67248 , H01L21/68 , H02K9/20 , H02K41/02
摘要： A mover combination ( 226 ) for moving and positioning a device ( 34 ) includes a mover ( 328 ) that defines a fluid passageway ( 370 ) and a circulation system ( 330 ) having a passageway inlet ( 374 ) and a passageway outlet ( 376 ). The circulation system ( 330 ) directs a circulation fluid ( 378 ) into the fluid passageway ( 370 ). The circulation system ( 330 ) can include a liquid/gas separator ( 384 ) that is in fluid communication with the fluid passageway ( 370 ). With this design, the plumbing for the liquid ( 378 A) and the gas ( 378 B) can each be optimized. Additionally, the circulation system ( 330 ) can include a pressure control device ( 388 ) that controls the pressure of the circulation fluid ( 378 ) in at least a portion of the fluid passageway ( 370 ). With this design, the pressure control device ( 388 ) controls the pressure of the circulation fluid ( 378 ) near the fluid passageway ( 370 ) so that the temperature of the circulation fluid ( 378 ) at the passageway outlet ( 376 ) is approximately equal to the temperature of the circulation fluid ( 378 ) at the passageway inlet ( 374 ). Moreover, the circulation system ( 930 ) can include a pump assembly ( 980 ) that directs the circulation fluid ( 978 ) into the passageway inlet ( 974 ), and a pressure control device ( 996 ) that precisely controls a state of the circulation fluid ( 978 ) near the passageway inlet ( 974 ). With this design, the phase of the circulation fluid ( 978 ) at the passageway inlet ( 974 ) can be precisely controlled without restricting the flow of the circulation fluid ( 978 ).

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