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1. 发明公开

EP3176130A1 TREATMENT DEVICE, STERILIZATION DEVICE, STERILIZATION WATER, AND STERILIZATION METHOD 审中-公开
标题翻译：灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器灭火器
公开(公告)号：EP3176130A1
公开(公告)日：2017-06-07
申请号：EP15826471.3
申请日：2015-07-17
申请人： NGK Insulators, Ltd.
发明人： SHIMIZU Hideki , IMANISHI Yuichiro , YAMADA Kazunari , YOKOYAMA Takashi
IPC分类号： C02F1/50 , B01F3/04 , B01F5/04 , B01F15/02 , B01J19/08 , H05H1/24
CPC分类号： A61L2/18 , A23L3/00 , A23V2002/00 , A61L2/26 , B01F3/04 , B01F3/04503 , B01F5/04 , B01F5/0413 , B01F15/02 , B01J19/08 , B01J19/088 , B01J2219/0833 , B01J2219/0884 , B01J2219/0896 , C02F1/4608 , C02F1/50 , C02F2201/46175 , C02F2301/046 , C02F2303/04 , C02F2305/023 , H05H1/24
摘要： The present invention relates to a treatment device, sterilization device, sterile water, and sterilization method. Treatment devices (10A, 10B) and a sterilization device (70) comprise a liquid reservoir part (14) having a liquid to be treated (12), a plasma generating part (16) for generating plasma on a liquid surface (12a) of the liquid to be treated (12), and a gas bubble feed part (20) for producing gas bubbles (18) encapsulating the generated plasma on the liquid surface (12a) and feeding the bubbles into the liquid to be treated (12). Moreover, plasma is generated on the liquid surface (12a) of the liquid to be treated (12) and the gas bubbles (18) encapsulating the generated plasma are generated and fed into the liquid to be treated (12).
摘要翻译：本发明涉及治疗装置，灭菌装置，无菌水和灭菌方法。治疗装置（10A，10B）和灭菌装置（70）包括具有待处理液体（12）的储液部分（14），用于在液体表面（12a）上产生等离子体的等离子体产生部分待处理的液体（12）和用于产生将所产生的等离子体封装在液体表面（12a）上并将气泡供入待处理液体（12）中的气泡（18）的气泡供给部分（20）。此外，在待处理液体（12）的液面（12a）上产生等离子体，并且产生封装产生的等离子体的气泡（18），并将其供给到待处理液体（12）中。

2. 发明公开

EP2506689A1 PLASMA PROCESSING DEVICE 审中-公开
标题翻译：等离子体处理装置
公开(公告)号：EP2506689A1
公开(公告)日：2012-10-03
申请号：EP10833018.4
申请日：2010-10-26
申请人： NGK Insulators, Ltd.
发明人： SHIONOYA Wataru , SHIMIZU Naohiro , IMANISHI Yuichiro , HOTTA Sozaburo
IPC分类号： H05H1/24 , B01J19/08
CPC分类号： B01J19/088 , B01J2219/0811 , B01J2219/0813 , B01J2219/0815 , B01J2219/083 , B01J2219/0835 , B01J2219/0841 , B01J2219/0875 , B01J2219/0894 , H05H1/2406 , H05H2001/2412 , H05H2240/10
摘要： There is provided a plasma treating apparatus in which an efficiency of a treatment through plasma is enhanced and a durability of an electrode is improved. A first electrode, a second electrode and a third electrode are provided in a middle of a passage. The second electrode is provided on an upstream side of the first electrode, and the third electrode is provided on a downstream side of the first electrode. A connecting line connects the first electrode to a first pole of a pulsed power supply, and connects the second electrode and the third electrode to a second pole of the pulsed power supply. The first electrode crosses a first gas passing surface and occupies a part of the first gas passing surface. The second electrode and the third electrode cross a second gas passing surface and a third gas passing surface and occupy a part of the second gas passing surface and the third gas passing surface respectively.
摘要翻译：提供了一种等离子体处理装置，其中通过等离子体的处理效率得到提高并且电极的耐久性得到改善。第一电极，第二电极和第三电极设置在通道的中间。第二电极设置在第一电极的上游侧，并且第三电极设置在第一电极的下游侧。连接线将第一电极连接到脉冲电源的第一极，并将第二电极和第三电极连接到脉冲电源的第二极。第一电极穿过第一气体通过表面并占据第一气体通过表面的一部分。第二电极和第三电极分别与第二气体通过表面和第三气体通过表面相交，并分别占据第二气体通过表面和第三气体通过表面的一部分。

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