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1. 发明申请

US20040044981A1 Reticle fabrication method 有权
标题翻译：标线制造方法
公开(公告)号：US20040044981A1
公开(公告)日：2004-03-04
申请号：US10652026
申请日：2003-09-02
申请人： NEC CORPORTION
发明人： Takashi Yoshimura , Takeshi Bashomatsu
IPC分类号： G06F017/50
CPC分类号： G03F1/78 , G03F1/68 , G03F1/84 , H01J37/3023 , H01J2237/30455 , H01J2237/3175
摘要： CAD (Computer Aided Design) data which is reticle design data is input to first and second data conversion devices which respectively convert the CAD data to electron beam (EB) write data and inspection data. The EB write data and inspection data output are input to a data verification device to verify whether or not there is a data conversion error. If no data conversion error is detected by the data verification device, an EB writing device writes a pattern on an unwritten reticle with an electron beam based on the EB write data and develops the reticle, after which the fabricated developed reticle is inspected by a reticle inspection device. As a defect, such as a data conversion error contained in EB write data is detected before fabrication of a reticle, the reticle inspection process is simplified, the effective availability factors of the EB writing device and reticle inspection device and the time needed to fabricate a reticle is made shorter, thereby reducing the fabrication cost.
摘要翻译：将作为标线设计数据的CAD（计算机辅助设计）数据输入到分别将CAD数据转换为电子束（EB）写入数据和检查数据的第一和第二数据转换装置。 EB写入数据和检查数据输出被输入到数据验证装置，以验证是否存在数据转换错误。如果数据验证装置没有检测到数据转换错误，则EB写装置基于EB写入数据将电子束写入具有电子束的未写入的掩模版上，并且形成掩模版，之后通过掩模版检查制作的显影掩模版检查装置作为缺陷，例如在制作掩模版之前检测到EB写入数据中包含的数据转换错误，简化了掩模检查过程，EB写入装置和掩模版检查装置的有效可用性因素以及制造掩模版较短，从而降低制造成本。

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