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    • 6. 发明申请
    • ANALYSIS SYSTEM
    • 分析系统
    • US20150036880A1
    • 2015-02-05
    • US14386078
    • 2013-02-14
    • NEC Corportion
    • Kazuya KoyamaTakeshi ArikumaYoichi NagaiRyoma Oami
    • G06K9/00G06K9/46
    • G06K9/00973G06K9/46H04N7/0127H04N7/183
    • An analysis system 200 of the present invention includes: an engine controlling part 210 configured to control an analysis operation of an analysis engine accepting input of analysis target data and executing an analysis process on the analysis target data. The engine controlling part 210 includes: an input data judging part 211 configured to judge whether or not the content of analysis target data inputted into the analysis engine meets a preset judgment criterion; and a load change controlling part 212 configured to, when the input data judging part judges the content of the analysis target data meets the preset judgment criterion, execute a load change process set for the judgment criterion. The load change process is changing a load on the analysis engine in the analysis process by the analysis engine.
    • 本发明的分析系统200包括:发动机控制部210,被配置为控制分析引擎的分析操作,所述分析引擎接受分析对象数据的输入,并对分析目标数据执行分析处理。 发动机控制部210包括:输入数据判定部211,被配置为判断输入到分析引擎中的分析目标数据的内容是否满足预设的判断基准; 以及负载变更控制部212,对输入数据判定部判定分析对象数据的内容满足预先设定的判断基准时,执行对判定基准设定的负荷变更处理。 负载变化过程是在分析引擎的分析过程中改变分析引擎上的负载。
    • 7. 发明申请
    • Reticle fabrication method
    • 标线制造方法
    • US20040044981A1
    • 2004-03-04
    • US10652026
    • 2003-09-02
    • NEC CORPORTION
    • Takashi YoshimuraTakeshi Bashomatsu
    • G06F017/50
    • G03F1/78G03F1/68G03F1/84H01J37/3023H01J2237/30455H01J2237/3175
    • CAD (Computer Aided Design) data which is reticle design data is input to first and second data conversion devices which respectively convert the CAD data to electron beam (EB) write data and inspection data. The EB write data and inspection data output are input to a data verification device to verify whether or not there is a data conversion error. If no data conversion error is detected by the data verification device, an EB writing device writes a pattern on an unwritten reticle with an electron beam based on the EB write data and develops the reticle, after which the fabricated developed reticle is inspected by a reticle inspection device. As a defect, such as a data conversion error contained in EB write data is detected before fabrication of a reticle, the reticle inspection process is simplified, the effective availability factors of the EB writing device and reticle inspection device and the time needed to fabricate a reticle is made shorter, thereby reducing the fabrication cost.
    • 将作为标线设计数据的CAD(计算机辅助设计)数据输入到分别将CAD数据转换为电子束(EB)写入数据和检查数据的第一和第二数据转换装置。 EB写入数据和检查数据输出被输入到数据验证装置,以验证是否存在数据转换错误。 如果数据验证装置没有检测到数据转换错误,则EB写装置基于EB写入数据将电子束写入具有电​​子束的未写入的掩模版上,并且形成掩模版,之后通过掩模版检查制作的显影掩模版 检查装置 作为缺陷,例如在制作掩模版之前检测到EB写入数据中包含的数据转换错误,简化了掩模检查过程,EB写入装置和掩模版检查装置的有效可用性因素以及制造 掩模版较短,从而降低制造成本。