会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明申请
    • Formation of CIGS Absorber Layer by Atomic Layer Deposition
    • 通过原子层沉积形成CIGS吸收层
    • WO2005081789A3
    • 2007-02-08
    • PCT/US2005003748
    • 2005-02-07
    • NANOSOLAR INCSAGER BRIAN MROSCHEISEN MARTIN RLEIDHOLM CRAIG
    • SAGER BRIAN MROSCHEISEN MARTIN RLEIDHOLM CRAIG
    • C23C16/00
    • An absorber layer may be formed on a substrate using atomic layer deposition reactions. An absorber layer containing elements of groups IB, IIIA and VIB may be formed by placing a substrate in a treatment chamber and performing atomic layer deposition of a group IB element and/or one or more group IIIA elements from separate sources onto a substrate to form a film. A group VIA element is then incorporated into the film and annealed to form the absorber layer. The absorber layer may be greater than about 25 nm thick. The substrate may be coiled into one or more coils in such a way that adjacent turns of the coils do not touch one another. The coiled substrate may be placed in a treatment chamber where substantially an entire surface of the one or more coiled substrates may be treated by an atomic layer deposition process. One or more group IB elements and/or one or more group IIIA elements may be deposited onto the substrate in a stoichiometrically controlled ratio by atomic layer deposition using one or more self limiting reactions.
    • 可以使用原子层沉积反应在衬底上形成吸收层。 包含IB,IIIA和VIB族元素的吸收层可以通过将基底放置在处理室中并且将IB族元素和/或一种或多种IIIA族元素从单独的源原子层沉积到基底上形成,以形成 一个电影。 然后将VIA族元素并入膜中并退火以形成吸收层。 吸收层可以大于约25nm厚。 衬底可以被卷绕成一个或多个线圈,使得线圈的相邻匝不彼此接触。 卷绕的基板可以放置在处理室中,其中可以通过原子层沉积工艺来处理一个或多个卷绕的基板的基本上整个表面。 可以通过使用一个或多个自限制反应的原子层沉积以化学计量控制的比例将一个或多个IB族元素和/或一个或多个IIIA族元素沉积到基底上。
    • 5. 发明申请
    • SOLAR CELL ABSORBER LAYER FORMED FROM METAL ION PRECURSORS
    • 从金属离子前驱体形成的太阳能电池吸收层
    • WO2008095146A2
    • 2008-08-07
    • PCT/US2008052730
    • 2008-01-31
    • VAN DUREN JEROEN K JROBINSON MATTHEW RSAGER BRIAN M
    • VAN DUREN JEROEN K JROBINSON MATTHEW RSAGER BRIAN M
    • H01L31/04
    • H01L31/03928H01L31/06H01L31/0749Y02E10/541Y02P70/521
    • Methods and devices are provided for forming an absorber layer. In one embodiment, a method is provided comprising of depositing a solution on a substrate to form a precursor layer. The solution comprises of at least one polar solvent, at least one binder, and at least one Group IB and/or IIIA hydroxide. The precursor layer is processed in one or more steps to form a photovoltaic absorber layer. In one embodiment, the absorber layer may be created by processing the precursor layer into a solid film and then thermally reacting the solid film in an atmosphere containing at least an element of Group VIA of the Periodic Table to form the photovoltaic absorber layer. Optionally, the absorber layer may be processed by thermal reaction of the precursor layer in an atmosphere containing at least an element of Group VIA of the Periodic Table to form the photovoltaic absorber layer.
    • 提供了用于形成吸收层的方法和装置。 在一个实施方案中,提供了一种方法,其包括在基底上沉积溶液以形成前体层。 溶液包含至少一种极性溶剂,至少一种粘合剂和至少一种IB族和/或IIIA型氢氧化物。 在一个或多个步骤中处理前体层以形成光伏吸收层。 在一个实施方案中,吸收层可以通过将前体层加工成固体膜,然后在至少含有元素周期表第VIA族元素的气氛中使固体膜热反应形成光伏吸收层来产生。 任选地,吸收层可以通过前体层在至少含有周期表第VIA族元素的气氛中进行热反应来加工,以形成光伏吸收层。