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    • 3. 发明申请
    • SOLID-STATE IMAGING DEVICE INCLUDING A MULTILAYER WIRING LAYER, COLOR FILTERS, AND LENSES, AND MANUFACTURING METHOD FOR THE SAME
    • 包括多层布线层,彩色滤光片和透镜的固态成像装置及其制造方法
    • US20110309460A1
    • 2011-12-22
    • US13162092
    • 2011-06-16
    • Shoichiro TSUJIKazuhiro YAMASHITA
    • Shoichiro TSUJIKazuhiro YAMASHITA
    • H01L31/0232H01L31/18
    • H01L27/14685H01L27/14621H01L27/14627H01L27/14687
    • The present invention provides a solid-state imaging device comprising: a semiconductor substrate having a pixel region and a peripheral circuit region; a multilayer wiring layer including layers of wiring and an interlayer film interposed therebetween, and disposed above the semiconductor substrate to cover the pixel region and the peripheral circuit region except areas above the photoelectric conversion elements; a waveguide member filling the areas above the photoelectric conversion elements (waveguides) and covering the multilayer wiring layer at least within the pixel region; and an optical structure (composed of a color filter material and a lens material) disposed above the waveguide member within the pixel region, wherein a groove is formed by removing a portion of the waveguide member from an area within the pixel region that is in a border between the pixel region and the peripheral circuit region.
    • 本发明提供了一种固态成像装置,包括:具有像素区域和外围电路区域的半导体衬底; 多层布线层,其包括布线层和介于其间的层间膜,并且设置在所述半导体基板的上方以覆盖除了所述光电转换元件之上的区域以外的像素区域和外围电路区域; 波导部件,其填充所述光电转换元件(波导)上方的区域,并且至少在所述像素区域内覆盖所述多层布线层; 以及设置在像素区域内的波导构件上方的光学结构(由滤色器材料和透镜材料组成),其中通过从位于像素区域内的像素区域内的区域去除波导构件的一部分而形成凹槽 边界在像素区域和外围电路区域之间。
    • 4. 发明申请
    • SOLID-STATE IMAGING DEVICE
    • 固态成像装置
    • US20120037960A1
    • 2012-02-16
    • US13238537
    • 2011-09-21
    • Haruhisa YOKOYAMAHiroshi SAKOHKazuhiro YAMASHITAMitsuo YASUHIRAYuichi HIROFUJI
    • Haruhisa YOKOYAMAHiroshi SAKOHKazuhiro YAMASHITAMitsuo YASUHIRAYuichi HIROFUJI
    • H01L27/142
    • H01L27/14623H01L27/14627H01L27/1464H01L27/14656
    • A solid-state imaging device according to the present invention is of a MOS type and includes a plurality of pixels arranged in rows and columns, and includes: a semiconductor substrate; a photodiode which is formed in the semiconductor substrate and converts, into a signal charge, light that is incident from a first main surface of the semiconductor substrate; a transfer transistor which is formed in a second main surface of the semiconductor substrate and transfers the signal charge converted by the photodiode; a light shielding film which is conductive and formed on a boundary between the pixels, above the first main surface of the semiconductor substrate; an overflow drain region electrically connected to the light shielding film and formed in the first main surface of the semiconductor substrate; and an overflow barrier region formed between the overflow drain region and the photodiode.
    • 根据本发明的固态成像装置是MOS型的,并且包括排列成行和列的多个像素,并且包括:半导体衬底; 形成在所述半导体衬底中并将从所述半导体衬底的第一主表面入射的光转换为信号电荷的光电二极管; 传输晶体管,其形成在半导体衬底的第二主表面中并传送由光电二极管转换的信号电荷; 在半导体衬底的第一主表面之上的像素之间的边界上导电并形成的遮光膜; 与所述遮光膜电连接并形成在所述半导体衬底的所述第一主表面中的溢出漏极区域; 以及形成在溢出漏极区域和光电二极管之间的溢出阻挡区域。