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1. 发明授权

US07810915B2 Actuator device, liquid-jet head and liquid-jet apparatus 有权
标题翻译：执行器装置，喷液头和液体喷射装置
公开(公告)号：US07810915B2
公开(公告)日：2010-10-12
申请号：US11730645
申请日：2007-04-03
申请人： Motoki Takabe , Koji Sumi , Motohisa Noguchi , Naoto Yokoyama , Takeshi Saito
发明人： Motoki Takabe , Koji Sumi , Motohisa Noguchi , Naoto Yokoyama , Takeshi Saito
IPC分类号： B41J2/045 , H01L41/00
CPC分类号： B41J2/1629 , B41J2/14233 , B41J2/161 , B41J2/1623 , B41J2/1631 , B41J2/1632 , B41J2002/14241 , B41J2002/14419 , B41J2002/14491
摘要： Disclosed is an actuator device that includes a piezoelectric element provided as being freely displaceable on a substrate. The piezoelectric element includes a lower electrode, a piezoelectric layer and an upper electrode. In the actuator device, the Young's modulus of the lower electrode is not less than 200 GPa.
摘要翻译：公开了一种致动器装置，其包括被设置为可在基板上自由移位的压电元件。压电元件包括下电极，压电层和上电极。在致动器装置中，下电极的杨氏模量不小于200GPa。

2. 发明申请

US20080012911A1 Actuator device, liquid-jet head and liquid-jet apparatus 有权
标题翻译：执行器装置，喷液头和液体喷射装置
公开(公告)号：US20080012911A1
公开(公告)日：2008-01-17
申请号：US11730644
申请日：2007-04-03
申请人： Motoki Takabe , Koji Sumi , Motohisa Noguchi , Naoto Yokoyama , Takeshi Saito
发明人： Motoki Takabe , Koji Sumi , Motohisa Noguchi , Naoto Yokoyama , Takeshi Saito
IPC分类号： B41J2/045
CPC分类号： B41J2/14233 , B41J2002/14241 , B41J2002/14419 , B41J2002/14491
摘要： Disclosed is an actuator device which includes a vibration plate and a piezoelectric element. The vibration plate includes an elastic film which is made of silicon oxide (SiO2) and which is formed on a substrate while the piezoelectric element is formed on the vibration plate and including a lower electrode, a piezoelectric layer and an upper electrode. The vibration plate has such a stress as to give a tensile stress between 300 MPa and 500 MPa, inclusive, to the piezoelectric element that is in a state of being displaced.
摘要翻译：公开了一种致动器装置，其包括振动板和压电元件。振动板包括由氧化硅（SiO 2）构成的弹性膜，并且形成在基板上，同时压电元件形成在振动板上并且包括下电极，压电层和上电极。该振动板具有这样的应力，即对处于移动状态的压电元件产生在300MPa至500MPa之间的拉伸应力。

3. 发明授权

US07740345B2 Actuator device, liquid-jet head and liquid-jet apparatus 有权
标题翻译：执行器装置，喷液头和液体喷射装置
公开(公告)号：US07740345B2
公开(公告)日：2010-06-22
申请号：US11730644
申请日：2007-04-03
申请人： Motoki Takabe , Koji Sumi , Motohisa Noguchi , Naoto Yokoyama , Takeshi Saito
发明人： Motoki Takabe , Koji Sumi , Motohisa Noguchi , Naoto Yokoyama , Takeshi Saito
IPC分类号： B41J2/045
CPC分类号： B41J2/14233 , B41J2002/14241 , B41J2002/14419 , B41J2002/14491
摘要： Disclosed is an actuator device which includes a vibration plate and a piezoelectric element. The vibration plate includes an elastic film which is made of silicon oxide (SiO2) and which is formed on a substrate while the piezoelectric element is formed on the vibration plate and including a lower electrode, a piezoelectric layer and an upper electrode. The vibration plate has such a stress as to give a tensile stress between 300 MPa and 500 MPa, inclusive, to the piezoelectric element that is in a state of being displaced.
摘要翻译：公开了一种致动器装置，其包括振动板和压电元件。振动板包括由氧化硅（SiO 2）制成的弹性膜，并且形成在基板上，同时压电元件形成在振动板上并且包括下电极，压电层和上电极。该振动板具有这样的应力，即对处于移动状态的压电元件产生在300MPa至500MPa之间的拉伸应力。

4. 发明申请

US20080074473A1 Actuator device, liquid-jet head and liquid-jet apparatus 有权
标题翻译：执行器装置，喷液头和液体喷射装置
公开(公告)号：US20080074473A1
公开(公告)日：2008-03-27
申请号：US11730645
申请日：2007-04-03
申请人： Motoki Takabe , Koji Sumi , Motohisa Noguchi , Naoto Yokoyama , Takeshi Saito
发明人： Motoki Takabe , Koji Sumi , Motohisa Noguchi , Naoto Yokoyama , Takeshi Saito
IPC分类号： B41J2/045
CPC分类号： B41J2/1629 , B41J2/14233 , B41J2/161 , B41J2/1623 , B41J2/1631 , B41J2/1632 , B41J2002/14241 , B41J2002/14419 , B41J2002/14491
摘要： Disclosed is an actuator device that includes a piezoelectric element provided as being freely displaceable on a substrate. The piezoelectric element includes a lower electrode, a piezoelectric layer and an upper electrode. In the actuator device, the Young's modulus of the lower electrode is not less than 200 GPa.
摘要翻译：公开了一种致动器装置，其包括被设置为可在基板上自由移位的压电元件。压电元件包括下电极，压电层和上电极。在致动器装置中，下电极的杨氏模量不小于200GPa。

5. 发明授权

US07717546B2 Piezoelectric device and liquid jet head 有权
标题翻译：压电元件和液体喷头
公开(公告)号：US07717546B2
公开(公告)日：2010-05-18
申请号：US11879628
申请日：2007-07-18
申请人： Motohisa Noguchi , Koji Sumi , Motoki Takabe , Naoto Yokoyama
发明人： Motohisa Noguchi , Koji Sumi , Motoki Takabe , Naoto Yokoyama
IPC分类号： B41J2/045
CPC分类号： B41J2/14233 , H01L41/0973 , H01L41/1876 , H01L41/317 , H01L41/319
摘要： A piezoelectric device including: a substrate; a lower electrode formed over the substrate; a piezoelectric layer formed over the lower electrode and including lead zirconate titanate; and an upper electrode formed over the piezoelectric layer, the lead zirconate titanate having a half-width of a peak of a (100) plane measured by an X-ray diffraction rocking curve method of 10 degrees or more and 25 degrees or less.
摘要翻译：一种压电装置，包括：基板; 形成在所述基板上的下电极; 形成在下电极上并包括锆钛酸铅的压电层; 和形成在压电层上的上电极，通过X射线衍射摇摆曲线法测量的具有（100）面的峰的半值宽度为10度以上且25度以下的钛酸铅钛酸铅。

6. 发明申请

US20080018716A1 Piezoelectric device and liquid jet head 有权
标题翻译：压电元件和液体喷头
公开(公告)号：US20080018716A1
公开(公告)日：2008-01-24
申请号：US11879628
申请日：2007-07-18
申请人： Motohisa Noguchi , Koji Sumi , Motoki Takabe , Naoto Yokoyama
发明人： Motohisa Noguchi , Koji Sumi , Motoki Takabe , Naoto Yokoyama
IPC分类号： B41J2/045 , H01L41/187
CPC分类号： B41J2/14233 , H01L41/0973 , H01L41/1876 , H01L41/317 , H01L41/319
摘要： A piezoelectric device including: a substrate; a lower electrode formed over the substrate; a piezoelectric layer formed over the lower electrode and including lead zirconate titanate; and an upper electrode formed over the piezoelectric layer, the lead zirconate titanate having a half-width of a peak of a (100) plane measured by an X-ray diffraction rocking curve method of 10 degrees or more and 25 degrees or less.
摘要翻译：一种压电装置，包括：基板; 形成在所述基板上的下电极; 形成在下电极上并包括锆钛酸铅的压电层; 和形成在压电层上的上电极，通过X射线衍射摇摆曲线法测量的具有（100）面的峰的半值宽度为10度以上且25度以下的钛酸铅钛酸铅。

7. 发明申请

US20060230590A1 Method for producing dielectric film, method for producing piezoelectric element, method for producing liquid-jet head, dielectric film, piezoelectric element, and liquid-jet apparatus 有权
标题翻译：电介质膜的制造方法，压电元件的制造方法，液体喷射头的制造方法，电介质膜，压电元件，液体喷射装置
公开(公告)号：US20060230590A1
公开(公告)日：2006-10-19
申请号：US11392757
申请日：2006-03-30
申请人： Akira Kuriki , Koji Sumi , Hironobu Kazama , Motoki Takabe , Motohisa Noguchi
发明人： Akira Kuriki , Koji Sumi , Hironobu Kazama , Motoki Takabe , Motohisa Noguchi
IPC分类号： H04R17/00
CPC分类号： H01L41/318 , B41J2/14233 , B41J2/161 , B41J2/1623 , B41J2/1629 , B41J2/1632 , B41J2/1646 , B41J2002/14241 , B41J2002/14419 , C23C18/1216 , C23C18/1283 , H01L41/0973 , H01L41/1876 , Y10T29/42 , Y10T29/435 , Y10T29/49155
摘要： A method for producing a dielectric film, comprising: a coating step of coating a colloidal solution containing an organometallic compound containing a metal constituting a dielectric film containing at least a lead component to form a dielectric precursor film; a drying step of drying the dielectric precursor film; a degreasing step of degreasing the dielectric precursor film; and a sintering step of sintering the dielectric precursor film to form a dielectric film, and wherein the drying step includes a first drying step of heating the dielectric precursor film to a temperature lower than the boiling point of a solvent, which is a main solvent of the material, and holding the dielectric precursor film at the temperature for a certain period of time to dry the dielectric precursor film, and a second drying step of drying the dielectric precursor film at a temperature in the range of 140° C. to 170° C., the degreasing step is performed at a degreasing temperature of 350° C. to 450° C. and at a heating-up rate of 15 [° C./sec] or higher, and the sintering step is performed at a heating-up rate of 100 [° C/sec] to 150 [° C./sec].
摘要翻译：一种电介质膜的制造方法，其特征在于，包括：涂布包含含有构成含有至少含有铅成分的电介质膜的金属的有机金属化合物的胶体溶液以形成电介质前体膜的涂布步骤; 干燥所述电介质前体膜的干燥步骤; 脱脂步骤，使所述电介质前体膜脱脂; 以及烧结所述电介质前体膜以形成电介质膜的烧结步骤，其中所述干燥步骤包括将所述电介质前体膜加热到低于作为主要溶剂的溶剂的沸点的温度的第一干燥步骤并将电介质前体膜在该温度下保持一定时间以干燥电介质前体膜;以及第二干燥步骤，在140℃至170℃的温度下干燥该电介质前体膜在脱脂温度为350℃〜450℃，升温速度为15℃/秒以上的条件下进行脱脂工序，烧结工序在加热升速率为100 [℃/秒]至150℃/秒。

8. 发明授权

US07757362B2 Method for producing dielectric film, method for producing piezoelectric element, method for producing liquid-jet head, dielectric film, piezoelectric element, and liquid-jet apparatus 有权
标题翻译：电介质膜的制造方法，压电元件的制造方法，液体喷射头的制造方法，电介质膜，压电元件，液体喷射装置
公开(公告)号：US07757362B2
公开(公告)日：2010-07-20
申请号：US12167930
申请日：2008-07-03
申请人： Akira Kuriki , Koji Sumi , Hironobu Kazama , Motoki Takabe , Motohisa Noguchi
发明人： Akira Kuriki , Koji Sumi , Hironobu Kazama , Motoki Takabe , Motohisa Noguchi
IPC分类号： H01L41/22 , H04R17/00
CPC分类号： H01L41/318 , B41J2/14233 , B41J2/161 , B41J2/1623 , B41J2/1629 , B41J2/1632 , B41J2/1646 , B41J2002/14241 , B41J2002/14419 , C23C18/1216 , C23C18/1283 , H01L41/0973 , H01L41/1876 , Y10T29/42 , Y10T29/435 , Y10T29/49155
摘要： A method for producing a dielectric film, comprising: a coating step of coating a colloidal solution containing an organometallic compound containing a metal constituting a dielectric film containing at least a lead component to form a dielectric precursor film; a drying step of drying the dielectric precursor film; a degreasing step of degreasing the dielectric precursor film; and a firing step of firing the dielectric precursor film to form a dielectric film, and wherein the drying step includes a first drying step of heating the dielectric precursor film to a temperature lower than the boiling point of a solvent, which is a main solvent of the material, and holding the dielectric precursor film at the temperature for a certain period of time to dry the dielectric precursor film, and a second drying step of drying the dielectric precursor film at a temperature in the range of 140° C., to 170° C., the degreasing step is performed at a degreasing temperature of 350° C. to 450° C. and at a heating-up rate of 15 [° C./sec] or higher, and the firing step is performed at a heating-up rate of 100 [° C./sec] to 150 [° C./sec].
摘要翻译：一种电介质膜的制造方法，其特征在于，包括：涂布包含含有构成含有至少含有铅成分的电介质膜的金属的有机金属化合物的胶体溶液以形成电介质前体膜的涂布步骤; 干燥所述电介质前体膜的干燥步骤; 脱脂步骤，使所述电介质前体膜脱脂; 以及烧制电介质前体膜以形成电介质膜的烧制步骤，其中干燥步骤包括将电介质前体膜加热至低于作为主要溶剂的溶剂的沸点的温度的第一干燥步骤并且将介电前体膜在该温度下保持一定时间以干燥电介质前体膜;以及第二干燥步骤，在140℃的温度下将电介质前体膜干燥至170℃ ℃，脱脂步骤在350℃至450℃的脱脂温度和15℃/秒以上的加热速率下进行，并且烧成步骤在升温速度为100 [℃/秒]至150℃/秒。

9. 发明授权

US07819508B2 Dielectric film and piezoelectric element 有权
标题翻译：电介质膜和压电元件
公开(公告)号：US07819508B2
公开(公告)日：2010-10-26
申请号：US11392757
申请日：2006-03-30
申请人： Akira Kuriki , Koji Sumi , Hironobu Kazama , Motoki Takabe , Motohisa Noguchi
发明人： Akira Kuriki , Koji Sumi , Hironobu Kazama , Motoki Takabe , Motohisa Noguchi
IPC分类号： B41J2/45 , H01L41/08 , C04B35/00
CPC分类号： H01L41/318 , B41J2/14233 , B41J2/161 , B41J2/1623 , B41J2/1629 , B41J2/1632 , B41J2/1646 , B41J2002/14241 , B41J2002/14419 , C23C18/1216 , C23C18/1283 , H01L41/0973 , H01L41/1876 , Y10T29/42 , Y10T29/435 , Y10T29/49155
摘要： A method for producing a dielectric film, comprising: a coating step of coating a colloidal solution containing an organometallic compound containing a metal constituting a dielectric film containing at least a lead component to form a dielectric precursor film; a drying step of drying the dielectric precursor film; a degreasing step of degreasing the dielectric precursor film; and a sintering step of sintering the dielectric precursor film to form a dielectric film, and wherein the drying step includes a first drying step of heating the dielectric precursor film to a temperature lower than the boiling point of a solvent, which is a main solvent of the material, and holding the dielectric precursor film at the temperature for a certain period of time to dry the dielectric precursor film, and a second drying step of drying the dielectric precursor film at a temperature in the range of 140° C. to 170° C., the degreasing step is performed at a degreasing temperature of 350° C. to 450° C. and at a heating-up rate of 15 [° C./sec] or higher, and the sintering step is performed at a heating-up rate of 100 [° C./sec] to 150 [° C./sec].
摘要翻译：一种电介质膜的制造方法，其特征在于，包括：涂布包含含有构成含有至少含有铅成分的电介质膜的金属的有机金属化合物的胶体溶液以形成电介质前体膜的涂布步骤; 干燥所述电介质前体膜的干燥步骤; 脱脂步骤，使所述电介质前体膜脱脂; 以及烧结所述电介质前体膜以形成电介质膜的烧结步骤，其中所述干燥步骤包括将所述电介质前体膜加热到低于作为主要溶剂的溶剂的沸点的温度的第一干燥步骤并将电介质前体膜在该温度下保持一定时间以干燥电介质前体膜;以及第二干燥步骤，在140℃至170℃的温度下干燥该电介质前体膜在脱脂温度为350℃〜450℃，升温速度为15℃/秒以上的条件下进行脱脂工序，烧结工序在加热升速率为100 [℃/秒]至150℃/秒。

10. 发明申请

US20070007860A1 Actuator device, liquid-jet head and liquid-jet apparatus 失效
标题翻译：执行器装置，喷液头和液体喷射装置
公开(公告)号：US20070007860A1
公开(公告)日：2007-01-11
申请号：US11482689
申请日：2006-07-10
申请人： Motoki Takabe , Koji Sumi , Naoto Yokoyama
发明人： Motoki Takabe , Koji Sumi , Naoto Yokoyama
IPC分类号： H01L41/187
CPC分类号： B41J2/14233 , B41J2002/14241 , B41J2002/14419 , B41J2202/03 , B41J2202/20 , H01L41/0973 , H01L41/1876 , H01L41/318 , H01L41/319
摘要： An actuator device includes: a layer provided on a single crystal silicon (Si) substrate, and made of silicon dioxide (SiO2); at least one buffer layer provided on the layer made of silicon dioxide (SiO2); a base layer provided on the buffer layer, and made of lanthanum nickel oxide (LNO) having the (100) plane orientation; and a piezoelectric element. The piezoelectric element includes: a lower electrode provided on the base layer, and made of platinum (Pt) having the (100) plane orientation; a piezoelectric layer made of a ferroelectric layer whose plane orientation is the (100) orientation, the piezoelectric layer formed on the lower electrode by epitaxial growth where a crystal system of at least one kind selected from a group consisting of a tetragonal system, a monoclinic system and a rhombohedral system dominates the other crystal systems; and an upper electrode provided on the piezoelectric layer.
摘要翻译：致动器装置包括：设置在单晶硅（Si）衬底上的由二氧化硅（SiO 2）构成的层; 设置在由二氧化硅（SiO 2）构成的层上的至少一个缓冲层; 设置在缓冲层上的由具有（100）面取向的氧化镧（LNO）制成的基层; 和压电元件。压电元件包括：设置在基底层上并由具有（100）面取向的铂（Pt）制成的下电极; 由平面取向为（100）取向的铁电体层构成的压电层，通过外延生长在下部电极上形成的压电体，其中选自四方晶系，单斜晶系系统和菱方系统主导其他晶体系统; 以及设置在压电层上的上电极。

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