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    • 2. 发明授权
    • Vertical furnace for the growth of single crystals
    • 立式炉用于生长单晶
    • US5698029A
    • 1997-12-16
    • US659013
    • 1996-06-04
    • Takao FujikawaKatsuhiro UeharaYoshihiko SakashitaHiroshi OkadaTakao Kawanaka
    • Takao FujikawaKatsuhiro UeharaYoshihiko SakashitaHiroshi OkadaTakao Kawanaka
    • C30B11/00C30B35/00
    • C30B11/003C30B11/002C30B29/40Y10T117/10Y10T117/1016
    • A high-pressure container 1 as a furnace casing is equipped with insulating cylinder 2 of an inverted glass shape, and heater elements 18 individually mounted on heater mounting plates 16 arranged in parallel to section vertically the space for arranging the heater elements 18 at a given interval in the insulating cylinder 2. For the procedures of single crystal growth by heating in a high-pressure gas atmosphere, the insulating cylinder 2 and the heater mounting plates 16 can suppress the effects of spontaneous convection of a high-pressure gas and the effects of the radiation heat from an adjacent heater element, as less as possible, so that the temperature controllability of each heating zone can be improved whereby the vertical temperature distribution in the furnace can be controlled appropriately. Also, a heater element 18 of a larger aperture size can be maintained at a stably supported state, whereby a single crystal of a larger dimension can be grown.
    • 作为炉壳的高压容器1配备有倒置玻璃形状的绝缘筒体2和加热器元件18,其单独地安装在加热器安装板16上,该加热器安装板16垂直地布置在用于将加热器元件18布置在给定的空间 绝缘筒2的间隔。对于通过在高压气体气氛中加热而实现单晶生长的步骤,绝缘筒2和加热器安装板16可以抑制高压气体的自发对流的效果和效果 的相邻加热器元件的辐射热量越少越好,从而可以提高每个加热区域的温度可控性,从而可以适当地控制炉内的垂直温度分布。 此外,可以将较大孔径的加热器元件18保持在稳定的支撑状态,从而可以生长更大尺寸的单晶。
    • 3. 发明授权
    • Method for growing single crystal
    • 生长单晶的方法
    • US5679151A
    • 1997-10-21
    • US604663
    • 1996-02-21
    • Seiichiro OhmotoKatsuhiro UeharaHiroshi OkadaYoshihiko SakashitaTakao Kawanaka
    • Seiichiro OhmotoKatsuhiro UeharaHiroshi OkadaYoshihiko SakashitaTakao Kawanaka
    • C30B11/00C30B15/00C30B11/12
    • C30B11/00C30B15/00C30B29/48Y10T117/1016Y10T117/1024
    • Method of forming a single crystal of ZnSe. A charge of material is loaded in a container. The charge of material is melted to create a melt of material. A single crystal is grown from the melt of material. Then, the grown crystal is brought out of contact with the wall surface of the container. The temperature of the crystal is varied across its phase transition temperature range while establishing a temperature gradient from one end of the grown crystal to the other end. This method is carried out, using a crystal grower comprising the container and an elevation member. The container is disposed inside a high-pressure vessel. The container tapers off downward and is provided with a hole extending from its lower end. The elevation member is inserted into the hole from below to push the grown crystal in a crucible upward. The container is composed of plural separable parts. After the growth of the crystal, the assembled parts are moved substantially horizontally outwardly so that the parts are separated from each other.
    • 形成ZnSe单晶的方法。 物料装入容器中。 材料的充电被熔化以产生材料熔体。 从材料的熔体中生长单晶。 然后,将生长的晶体与容器的壁表面脱离接触。 晶体的温度在其相变温度范围内变化,同时建立从生长晶体的一端到另一端的温度梯度。 使用包括容器和升降构件的结晶器进行该方法。 容器设置在高压容器内。 容器向下逐渐变细并且设有从其下端延伸的孔。 升降构件从下方插入孔中,将生长的晶体向上推入坩埚中。 容器由多个可分离部分组成。 在晶体生长之后,组装的部件基本上水平地向外移动,使得部件彼此分离。
    • 4. 发明授权
    • Apparatus for preparing compound single crystals
    • 复合单晶制备装置
    • US5685907A
    • 1997-11-11
    • US586825
    • 1996-01-31
    • Takao FujikawaKatsuhiro UeharaYoshihiko SakashitaKazuya SuzukiHiroshi OkadaTakao KawanakaSeiichiro Ohmoto
    • Takao FujikawaKatsuhiro UeharaYoshihiko SakashitaKazuya SuzukiHiroshi OkadaTakao KawanakaSeiichiro Ohmoto
    • C30B11/00C30B35/00
    • C30B11/00C30B29/48Y10T117/102
    • A method and apparatus for the preparation of single crystals of group II-VI compounds such as ZnSe and CdTe and group III-V compounds such as InP and GaP or of ternary compounds thereof, from which some of their components are likely to be dissociated and evaporated during crystal growth at high temperatures. Single crystals are prepared which enable the preparation of high quality compound single crystals and prevent the contamination of furnace structures. The method includes melting a source material in a container by heating in a furnace body and solidifying the melt by cooling from the bottom to grow a single crystal. The container is enclosed by an airtight chamber communicating to the outside with a pressure equalizing passage. Heating is performed while the passage is held at a low temperature equal to or lower than the melting point of a high-dissociation-pressure component of the source material. The apparatus includes a container for holding the source material, a hermetical furnace body including a heater to heat the container, an airtight chamber inside the heater which encloses the container and a pressure equalizing passage communicating with the airtight chamber and forming a lower portion of the chamber.
    • PCT No.PCT / JP95 / 01069 Sec。 371日期1996年1月31日 102(e)日期1996年1月31日PCT归档1995年6月1日PCT公布。 WO95 / 33873 PCT出版物 日期:1995年12月14日一种用于制备诸如ZnSe和CdTe的II-VI族化合物的单晶和InP和GaP的III-V族化合物或其三元化合物的方法和装置,其一些组分为 在高温下晶体生长期间可能会被解离和蒸发。 制备单晶,其可制备高质量的复合单晶并防止炉结构的污染。 该方法包括通过在炉体中加热熔化容器中的源材料并通过从底部冷却来固化熔体以生长单晶。 容器由与压力平衡通道连通的气密室封闭。 当通道保持在等于或低于源材料的高解离压分量的熔点的低温时进行加热。 该装置包括用于保持源材料的容器,包括用于加热容器的加热器的密封炉体,包围容器的加热器内的气密室和与气密室连通的压力平衡通道,并形成 房间。