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1. 发明授权

US08592776B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US08592776B2
公开(公告)日：2013-11-26
申请号：US12554577
申请日：2009-09-04
申请人： Momoyo Enyama , Hiroya Ohta , Osamu Kamimura
发明人： Momoyo Enyama , Hiroya Ohta , Osamu Kamimura
IPC分类号： H01J3/16
CPC分类号： H01J37/153 , H01J37/1472 , H01J2237/151 , H01J2237/1534
摘要： With a multi-beam type charged particle beam apparatus, and a projection charged particle beam apparatus, in the case of off-axial aberration corrector, there is the need for preparing a multitude of multipoles, and power supply sources in numbers corresponding to the number of the multipoles need be prepared. In order to solve this problem as described, a charged particle beam apparatus is provided with at least one aberration corrector wherein the number of the multipoles required in the past is decreased by about a half by disposing an electrostatic mirror in an electron optical system.
摘要翻译：使用多光束型带电粒子束装置和投影带电粒子束装置，在离轴像差校正器的情况下，需要准备多个多极，并且与数字对应的数量的电源的多极需要准备。为了解决上述问题，带电粒子束装置设置有至少一个像差校正器，其中通过在电子光学系统中设置静电镜，过去所需的多极数减少约一半。

2. 发明申请

US20090001267A1 Charged particle beam apparatus and specimen inspection method 有权
标题翻译：带电粒子束装置和试样检查方法
公开(公告)号：US20090001267A1
公开(公告)日：2009-01-01
申请号：US12213905
申请日：2008-06-26
申请人： Momoyo Enyama , Hiroya Ohta
发明人： Momoyo Enyama , Hiroya Ohta
IPC分类号： G01N23/00
CPC分类号： G01N23/22 , H01J37/28
摘要： In a multi-charged-particle-beam apparatus, when an electric field and voltage on a surface of a specimen are varied according to characteristics of the specimen, a layout of plural primary beams on the surface of the specimen and a layout of plural secondary beams on each detector vary. Then, calibration is executed to adjust the primary beams on the surface of the specimen to an ideal layout corresponding to the variation of operating conditions including inspecting conditions such as an electric field on the surface and voltage applied to the specimen. The layout of the primary beams on the surface of the specimen is acquired as images displayed on a display of reference marks on the stage. Variance with an ideal state of the reference marks is measured based upon these images and is corrected by the adjustment of a primary electron optics system and others.
摘要翻译：在多电荷粒子束装置中，当试样的表面的电场和电压根据试样的特性而变化时，试样表面上的多个主光束的布局和多个次级的布局每个探测器上的光束变化。然后，执行校准以将样品表面上的主光束调整为与包括诸如表面上的电场和施加到样本的电压的检查条件的操作条件的变化相对应的理想布局。获取样品表面上的主光束的布局作为在舞台上的参考标记的显示器上显示的图像。基于这些图像测量具有参考标记的理想状态的方差，并且通过一次电子光学系统等的调整来校正。

3. 发明申请

US20120061565A1 CHARGED PARTICLE BEAM DEVICE AND SAMPLE OBSERVATION METHOD 有权
标题翻译：充电颗粒光束装置和样品观测方法
公开(公告)号：US20120061565A1
公开(公告)日：2012-03-15
申请号：US13321583
申请日：2010-05-18
申请人： Momoyo Enyama , Hiroya Ohta , Taku Ninomiya , Mari Nozoe
发明人： Momoyo Enyama , Hiroya Ohta , Taku Ninomiya , Mari Nozoe
IPC分类号： H01J37/26
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/2446 , H01J2237/2817
摘要： Disclosed is a charged particle beam device, wherein multibeam secondary electron detectors (121a, 121b, 121c) and a single beam detector (140; 640) are provided, and under the control of a system control unit (135), an optical system control circuit (139) controls a lens and a beam selecting diaphragm (141) and switches the electrooptical conditions between those for multibeam mode and those for single beam mode, thereby one charged particle beam device can be operated as a multibeam charged particle device and a single beam charged particle device by switching. Thus, observation conditions are flexibly changed in accordance with an object to be observed, and a sample can be observed with a high accuracy and high efficiency.
摘要翻译：公开了一种带电粒子束装置，其中提供多波束二次电子检测器（121a，121b，121c）和单光束检测器（140; 640），并且在系统控制单元（135）的控制下，光学系统控制电路（139）控制透镜和选择光阑（141），并将电光条件切换到用于多光束模式的光学条件和单光束模式之间，从而一个带电粒子束装置可以作为多光束带电粒子装置和单个光束带电粒子装置通过切换。因此，观察条件根据待观察的目标灵活地变化，并且可以高精度和高效率地观察样品。

4. 发明授权

US08552373B2 Charged particle beam device and sample observation method 有权
标题翻译：带电粒子束装置和样品观察方法
公开(公告)号：US08552373B2
公开(公告)日：2013-10-08
申请号：US13321583
申请日：2010-05-18
申请人： Momoyo Enyama , Hiroya Ohta , Taku Ninomiya , Mari Nozoe
发明人： Momoyo Enyama , Hiroya Ohta , Taku Ninomiya , Mari Nozoe
IPC分类号： H01J37/26 , H01J37/28 , G01N23/22 , G01N23/225
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/2446 , H01J2237/2817
摘要： Disclosed is a charged particle beam device, wherein multibeam secondary electron detectors (121a, 121b, 121c) and a single beam detector (140; 640) are provided, and under the control of a system control unit (135), an optical system control circuit (139) controls a lens and a beam selecting diaphragm (141) and switches the electrooptical conditions between those for multibeam mode and those for single beam mode, thereby one charged particle beam device can be operated as a multibeam charged particle device and a single beam charged particle device by switching. Thus, observation conditions are flexibly changed in accordance with an object to be observed, and a sample can be observed with a high accuracy and high efficiency.
摘要翻译：公开了一种带电粒子束装置，其中提供多波束二次电子检测器（121a，121b，121c）和单光束检测器（140; 640），并且在系统控制单元（135）的控制下，光学系统控制电路（139）控制透镜和选择光阑（141），并将电光条件切换到用于多光束模式的光学条件和单光束模式之间，从而一个带电粒子束装置可以作为多光束带电粒子装置和单个光束带电粒子装置通过切换。因此，观察条件根据待观察的目标灵活地变化，并且可以高精度和高效率地观察样品。

5. 发明授权

US08350214B2 Charged particle beam applied apparatus 有权
标题翻译：带电粒子束施加装置
公开(公告)号：US08350214B2
公开(公告)日：2013-01-08
申请号：US13143404
申请日：2010-01-04
申请人： Hiroki Otaki , Momoyo Enyama , Hiroya Ohta
发明人： Hiroki Otaki , Momoyo Enyama , Hiroya Ohta
IPC分类号： H01L21/66 , G01N23/225
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , G01R31/305 , H01J37/3023 , H01J2237/004 , H01J2237/0044
摘要： Provided is a multi-beam type charged particle beam applied apparatus in an implementable configuration, capable of achieving both high detection accuracy of secondary charged particles and high speed of processing characteristically different specimens. An aperture array (111) includes plural aperture patterns. A deflector (109) for selecting an aperture pattern through which a primary beam passes is disposed at the position of a charged particle source image created between an electron gun (102), i.e., a charged particle source, and the aperture array (111). At the time of charge-control beam illumination and at the time of signal-detection beam illumination, an aperture pattern of the aperture array (111) is selected, and conditions of a lens array (112), surface electric-field control electrode (118) and the like are switched in synchronization with each beam scanning. Thus, the charges are controlled and the signals are detected at different timings under suitable conditions, respectively.
摘要翻译：提供了一种可实现的多束式带电粒子束施加装置，能够实现二次带电粒子的高检测精度和加工特性不同的试样的高速度。孔径阵列（111）包括多个孔径图案。用于选择主光束通过的孔径图案的偏转器（109）设置在电子枪（102）（即带电粒子源）与孔径阵列（111）之间产生的带电粒子源图像的位置处，。在充电控制光束照明时，在信号检测光束照射时，选择孔径阵列（111）的孔径图案，透镜阵列（112），表面电场控制电极（ 118）等与每个波束扫描同步地切换。因此，控制电荷并且在合适的条件下分别在不同的定时检测信号。

6. 发明授权

US08330103B2 Charged particle beam apparatus and specimen inspection method 有权
标题翻译：带电粒子束装置和试样检查方法
公开(公告)号：US08330103B2
公开(公告)日：2012-12-11
申请号：US12213905
申请日：2008-06-26
申请人： Momoyo Enyama , Hiroya Ohta
发明人： Momoyo Enyama , Hiroya Ohta
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： G01N23/22 , H01J37/28
摘要： In a multi-charged-particle-beam apparatus, when an electric field and voltage on a surface of a specimen are varied according to characteristics of the specimen, a layout of plural primary beams on the surface of the specimen and a layout of plural secondary beams on each detector vary. Then, calibration is executed to adjust the primary beams on the surface of the specimen to an ideal layout corresponding to the variation of operating conditions including inspecting conditions such as an electric field on the surface and voltage applied to the specimen. The layout of the primary beams on the surface of the specimen is acquired as images displayed on a display of reference marks on the stage. Variance with an ideal state of the reference marks is measured based upon these images and is corrected by the adjustment of a primary electron optics system and others.
摘要翻译：在多电荷粒子束装置中，当试样的表面的电场和电压根据试样的特性而变化时，试样表面上的多个主光束的布局和多个次级的布局每个探测器上的光束变化。然后，执行校准以将样品表面上的主光束调整为与包括诸如表面上的电场和施加到样本的电压的检查条件的操作条件的变化相对应的理想布局。获取样品表面上的主光束的布局作为在舞台上的参考标记的显示器上显示的图像。基于这些图像测量具有参考标记的理想状态的方差，并且通过一次电子光学系统等的调整来校正。

7. 发明申请

US20110272576A1 CHARGED PARTICLE BEAM APPLIED APPARATUS 有权
标题翻译：充电颗粒应用装置
公开(公告)号：US20110272576A1
公开(公告)日：2011-11-10
申请号：US13143404
申请日：2010-01-04
申请人： Hiroki Otaki , Momoyo Enyama , Hiroya Ohta
发明人： Hiroki Otaki , Momoyo Enyama , Hiroya Ohta
IPC分类号： G01N23/00
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , G01R31/305 , H01J37/3023 , H01J2237/004 , H01J2237/0044
摘要： Provided is a multi-beam type charged particle beam applied apparatus in an implementable configuration, capable of achieving both high detection accuracy of secondary charged particles and high speed of processing characteristically different specimens. An aperture array (111) includes plural aperture patterns. A deflector (109) for selecting an aperture pattern through which a primary beam passes is disposed at the position of a charged particle source image created between an electron gun (102), i.e., a charged particle source, and the aperture array (111). At the time of charge-control beam illumination and at the time of signal-detection beam illumination, an aperture pattern of the aperture array (111) is selected, and conditions of a lens array (112), surface electric-field control electrode (118) and the like are switched in synchronization with each beam scanning. Thus, the charges are controlled and the signals are detected at different timings under suitable conditions, respectively.
摘要翻译：提供了一种可实现的多束式带电粒子束施加装置，能够实现二次带电粒子的高检测精度和加工特性不同的试样的高速度。孔径阵列（111）包括多个孔径图案。用于选择主光束通过的孔径图案的偏转器（109）设置在电子枪（102）（即带电粒子源）与孔径阵列（111）之间产生的带电粒子源图像的位置处，。在充电控制光束照明时，在信号检测光束照射时，选择孔径阵列（111）的孔径图案，透镜阵列（112），表面电场控制电极（ 118）等与每个波束扫描同步地切换。因此，控制电荷并且在合适的条件下分别在不同的定时检测信号。

8. 发明申请

US20080073533A1 Inspection system and inspection method 有权
标题翻译：检验制度和检验方法
公开(公告)号：US20080073533A1
公开(公告)日：2008-03-27
申请号：US11703154
申请日：2007-02-07
申请人： Hiroshi Makino , Masaki Hasegawa , Momoyo Enyama
发明人： Hiroshi Makino , Masaki Hasegawa , Momoyo Enyama
IPC分类号： G21K7/00
CPC分类号： G03F7/70616 , H01J37/20 , H01J37/222 , H01J37/265 , H01J37/29 , H01J2237/0048 , H01J2237/223 , H01J2237/226 , H01J2237/24578 , H01J2237/24592 , H01J2237/2583
摘要： There is a need for inspecting a heightwise variation in a sample. A holder holds a sample. A charge control unit charges the sample held by the holder. A retarding power supply applies a voltage to the sample held by the holder. An electro-optic system radiates an electron beam to the sample applied with a voltage by the retarding power supply and images a mirror electron returning near the surface of the sample. An image processing unit processes a mirror image resulting from imaging the mirror electron. The image processing unit outputs information corresponding to a difference between mirror images, i.e., a mirror image acquired by imaging the mirror electron and a mirror image for a prepared standard preparation, as a heightwise variation in a sample.
摘要翻译：需要检查样品的高度变化。持有人持有样本。收费控制单元收取由持有人持有的样本。延迟电源对由保持器保持的样品施加电压。电光系统通过延迟电源将电子束辐射到施加有电压的样品，并对在样品表面附近返回的镜电子进行成像。图像处理单元处理由镜电子成像产生的镜像。图像处理单元输出与镜像相对应的信息，即通过将镜像电子成像获得的镜像和准备的标准品的镜像作为样品的高度变化。

9. 发明申请

US20070181808A1 Electron microscope and electron bean inspection system. 审中-公开
标题翻译：电子显微镜和电子豆检查系统。
公开(公告)号：US20070181808A1
公开(公告)日：2007-08-09
申请号：US11701386
申请日：2007-02-02
申请人： Hisaya Murakoshi , Hideo Todokoro , Hiroyuki Shinada , Masaki Hasegawa , Momoyo Enyama
发明人： Hisaya Murakoshi , Hideo Todokoro , Hiroyuki Shinada , Masaki Hasegawa , Momoyo Enyama
IPC分类号： G21K7/00
CPC分类号： H01J37/29 , H01J2237/057 , H01J2237/1508 , H01J2237/24592 , H01J2237/2538 , H01J2237/2817
摘要： While an image obtained by a general electron microscope is affected by the shape and material of an object specimen, an image obtained from mirror electrons is affected by the shape of an equipotential surface on which the mirror electrons are reflected, thereby the image interpretation is complicated. A mirror electron microscope of the present invention is provided with the following means for controlling a reflecting plane of the mirror electrons according to the structure of an object pattern to be measured or a concerned defect.1) Means for controlling a potential difference between a specimen and an electron source equivalent to a height of a reflecting plane of a mirror electron beam according to a type, an operation condition of an electron source, and a type of a pattern on a specimen. 2) Means for controlling an energy distribution of an illuminating beam with an energy filter 9 disposed in an illuminating system. It is thus possible to inspect a specimen according to a size and a potential of a pattern, which are distinguished from others.
摘要翻译：当通过一般电子显微镜获得的图像受目标样本的形状和材料的影响时，由镜电子获得的图像受到反射镜电子反射的等电位面的形状的影响，从而图像解释复杂。本发明的镜电子显微镜具备以下用于根据被测量对象图案的结构或相关缺陷来控制镜电子的反射面的装置。 1）根据类型，电子源的操作条件和样品上的图案的类型来控制样品和电子源之间的电位差与电子束的反射面的高度的电位差的装置。 2）用于通过设置在照明系统中的能量过滤器9来控制照明光束的能量分布的装置。因此，可以根据区别于其他图案的尺寸和电位来检查样本。

10. 发明授权

US08907278B2 Charged particle beam applied apparatus, and irradiation method 有权
标题翻译：带电粒子束施加装置和照射方法
公开(公告)号：US08907278B2
公开(公告)日：2014-12-09
申请号：US13993822
申请日：2011-12-02
申请人： Momoyo Enyama , Hiroya Ota , Taku Ninomiya , Mari Nozoe
发明人： Momoyo Enyama , Hiroya Ota , Taku Ninomiya , Mari Nozoe
IPC分类号： G01N23/00 , G21K7/00 , H01J37/147 , H01J37/12 , H01J37/28 , H01J37/04
CPC分类号： H01J37/045 , H01J37/12 , H01J37/147 , H01J37/28 , H01J2237/083 , H01J2237/0835 , H01J2237/24465 , H01J2237/2817
摘要： Provided is a charged particle beam applied apparatus for observing a sample, provided with: a beam-forming section that forms a plurality of charged particle beams on a sample; an energy control unit that controls the incident energy of the plurality of charged particle beams that are irradiated onto the sample; a beam current control unit that controls the beam current of the plurality of charged particle beams that are irradiated onto the sample; and a beam arrangement control unit that controls the arrangement in which the plurality of charged particle beams is irradiated onto the sample. The beam-forming section includes a beam splitting electrode, a lens array upper electrode, a lens array middle electrode, a lens array lower electrode and a movable stage, and functions as the beam current control unit or the beam arrangement control unit through selection, by the movable stage, of a plurality of aperture pattern sets.
摘要翻译：提供了一种用于观察样品的带电粒子束施加装置，其具有：在样品上形成多个带电粒子束的束形成部分; 能量控制单元，其控制照射到所述样本上的所述多个带电粒子束的入射能量; 束电流控制单元，其控制照射到样品上的多个带电粒子束的束电流; 以及光束布置控制单元，其控制将多个带电粒子束照射到样本上的布置。束形成部分包括分束电极，透镜阵列上电极，透镜阵列中间电极，透镜阵列下电极和可移动台，并且通过选择用作光束电流控制单元或光束布置控制单元，通过可动台，具有多个孔径图案组。

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