会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 8. 发明申请
    • Adapting Word Line Pulse Widths in Memory Systems
    • 适应内存系统中的字线脉冲宽度
    • US20090158101A1
    • 2009-06-18
    • US12328156
    • 2008-12-04
    • Mohamed Hassan Abu-RahmaSei Seung Yoon
    • Mohamed Hassan Abu-RahmaSei Seung Yoon
    • G11C29/12G06F11/00
    • G11C29/50G11C7/22G11C8/08G11C29/028G11C29/50012G11C2029/0407G11C2029/1202
    • Systems, circuits and methods for adapting word line (WL) pulse widths used in memory systems are disclosed. One embodiment of the invention is directed to an apparatus comprising a memory system. The memory system comprises: a memory operating according to a wordline (WL) pulse with an associated WL pulse width; a built-in self-test (BIST) unit that interfaces with the memory, the BIST unit being configured to run a self-test of the internal functionality of the memory and provide a signal indicating if the memory passed or failed the self-test; and an adaptive WL control circuit that interfaces with the BIST unit and the memory, the adaptive WL control circuit being configured to adjust the WL pulse width of the memory based on the signal provided by the BIST unit.
    • 公开了用于适应存储器系统中使用的字线(WL)脉冲宽度的系统,电路和方法。 本发明的一个实施例涉及一种包括存储器系统的装置。 存储器系统包括:根据具有相关联的WL脉冲宽度的字线(WL)脉冲操作的存储器; 与内存接口的内置自检(BIST)单元,BIST单元被配置为对存储器的内部功能进行自检,并提供一个信号,指示存储器是否通过或失败自检 ; 以及与所述BIST单元和所述存储器接口的自适应WL控制电路,所述自适应WL控制电路被配置为基于由所述BIST单元提供的信号来调整所述存储器的WL脉冲宽度。
    • 10. 发明授权
    • Method of fabricating a fin field effect transistor (FinFET) device
    • 制造鳍式场效应晶体管(FinFET)器件的方法
    • US07829951B2
    • 2010-11-09
    • US12266183
    • 2008-11-06
    • Seung-Chul SongMohamed Hassan Abu-RahmaBeom-Mo Han
    • Seung-Chul SongMohamed Hassan Abu-RahmaBeom-Mo Han
    • H01L29/76H01L29/94H01L31/062H01L31/113H01L31/119
    • H01L29/66795H01L29/785
    • A method of fabricating a semiconductor using a fin field effect transistor (FINFET) is disclosed. In a particular embodiment, a method includes depositing, on a silicon substrate, a first dummy structure having a first sidewall and a second sidewall separated by a first width. The method also includes depositing, on the silicon substrate, a second dummy structure concurrently with depositing the first dummy structure. The second dummy structure has a third sidewall and a fourth sidewall that are separated by a second width. The second width is substantially greater than the first width. The first dummy structure is used to form a first pair of fins separated by approximately the first width. The second dummy structure is used to form a second pair of fins separated by approximately the second width.
    • 公开了一种使用鳍状场效应晶体管(FINFET)制造半导体的方法。 在特定实施例中,一种方法包括在硅衬底上沉积第一虚设结构,该第一虚设结构具有由第一宽度分隔的第一侧壁和第二侧壁。 该方法还包括在沉积第一虚拟结构的同​​时在硅衬底上沉积第二虚拟结构。 第二虚拟结构具有分隔第二宽度的第三侧壁和第四侧壁。 第二宽度基本上大于第一宽度。 第一虚拟结构用于形成以大约第一宽度分开的第一对散热片。 第二虚拟结构用于形成分开大约第二宽度的第二对散热片。