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1. 发明授权

US4824218A Optical modulation apparatus using ferroelectric liquid crystal and low-resistance portions of column electrodes 失效
标题翻译：使用铁电液晶的光调制装置和列电极的低电阻部分
公开(公告)号：US4824218A
公开(公告)日：1989-04-25
申请号：US33578
申请日：1987-04-02
申请人： Mitsutoshi Kuno , Masahiko Enari , Hitoshi Shindo , Isamu Shimoda , Seishiro Yoshioka , Shuzo Kaneko , Tsutomu Toyono
发明人： Mitsutoshi Kuno , Masahiko Enari , Hitoshi Shindo , Isamu Shimoda , Seishiro Yoshioka , Shuzo Kaneko , Tsutomu Toyono
IPC分类号： G02F1/1343 , G02F1/141 , G09G3/20 , G09G3/36 , G02F1/13
CPC分类号： G02F1/13439 , G09G3/3607 , G09G3/3637 , G09G3/3685 , G09G3/3696 , G02F1/141 , G02F2203/30 , G09G2310/0297 , G09G2310/06 , G09G2310/061 , G09G2310/063 , G09G2320/0209 , G09G2320/0223 , G09G3/2011 , G09G3/2014 , G09G3/207
摘要： A driving system is disclosed, wherein a potential gradient is formed in a pixel and is utilized for driving. Particularly, there is disclosed an optical modulation apparatus, comprising: a first substrate having thereon a conductor film, and a plurality of transmission lines disposed electrically connected to the conductor film; a second substrate; an optical modulation material disposed between the first and second substrate; and means for supplying a pair of electric signals in mutually opposite transmission directions to neighboring transmission lines among the plurality of transmission lines.
摘要翻译：公开了一种驱动系统，其中在像素中形成电位梯度并用于驱动。特别地，公开了一种光调制装置，包括：第一基板，其上具有导体膜，以及多个传输线，其设置为电连接到导体膜; 第二基板; 设置在第一和第二基板之间的光调制材料; 以及用于将相互相对的传输方向的一对电信号提供给多个传输线中的相邻传输线的装置。

2. 发明授权

US5498501A Exposure method 失效
标题翻译：曝光方法
公开(公告)号：US5498501A
公开(公告)日：1996-03-12
申请号：US416503
申请日：1995-04-04
申请人： Isamu Shimoda , Takao Kariya , Nobutoshi Mizusawa , Kunitaka Ozawa , Shunichi Uzawa
发明人： Isamu Shimoda , Takao Kariya , Nobutoshi Mizusawa , Kunitaka Ozawa , Shunichi Uzawa
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70066 , G03F7/2022 , G03F7/7045 , Y10S438/949
摘要： A method of manufacturing of semiconductor devices, includes exposing different portions of a semiconductor substrate with a first exposure apparatus having a first exposure range; placing and aligning the semiconductor substrate with respect to a second exposure range of a second exposure apparatus, which range is larger than the first exposure range of the first exposure apparatus; detecting an alignment error of each of the portions of the semiconductor substrate as covered by the second exposure range of the second exposure apparatus; calculating an overall alignment error of those portions of the semiconductor substrate with respect to the entire second exposure range of the second exposure apparatus, on the basis of the detected alignment errors; and controlling the exposure operation of the second exposure apparatus on the basis of the calculated overall alignment error.
摘要翻译：一种半导体器件的制造方法，包括用具有第一曝光范围的第一曝光装置曝光半导体衬底的不同部分; 将半导体衬底相对于第二曝光装置的第二曝光范围放置和对准，该范围大于第一曝光装置的第一曝光范围; 检测由第二曝光装置的第二曝光范围所覆盖的半导体衬底的每个部分的对准误差; 基于检测到的对准误差，计算半导体衬底的这些部分相对于第二曝光装置的整个第二曝光范围的总体对准误差; 并根据计算的整体对准误差来控制第二曝光装置的曝光操作。

3. 发明授权

US5355127A Method and apparatus for transferring information by utilizing electron beam 失效
标题翻译：利用电子束传送信息的方法和装置
公开(公告)号：US5355127A
公开(公告)日：1994-10-11
申请号：US902783
申请日：1992-06-24
申请人： Fumitaka Kan , Kenji Nakamura , Masanori Takenouchi , Naoji Hayakawa , Isamu Shimoda , Masahiko Okunuki
发明人： Fumitaka Kan , Kenji Nakamura , Masanori Takenouchi , Naoji Hayakawa , Isamu Shimoda , Masahiko Okunuki
IPC分类号： G11C7/00 , G11C11/23 , H03K19/14 , H04Q1/00
CPC分类号： H03K19/14 , G11C11/23 , G11C7/005
摘要： In a method and apparatus for transferring information in a form of electron beam, an electron beam detector detects the electron beam, and emission of the electron beam from a predetermined electron beam source is controlled in accordance with a signal from the detector upon detection of the electron beam. In the method and apparatus, a deflection electrode is also used to deflect the electron beams according to an electric or magnetic field to perform charge shifting, logical additions, Logical multiplications, image formation, and the like.
摘要翻译：在用于以电子束形式传送信息的方法和装置中，电子束检测器检测电子束，并且在检测到电子束时根据来自检测器的信号来控制来自预定电子束源的电子束的发射电子束。在该方法和装置中，偏转电极还用于根据电场或磁场偏转电子束，以执行电荷转移，逻辑加法，逻辑乘法，图像形成等。

4. 发明授权

US5131022A Exposure method and apparatus 失效
标题翻译：曝光方法和装置
公开(公告)号：US5131022A
公开(公告)日：1992-07-14
申请号：US769493
申请日：1991-10-01
申请人： Shigeru Terashima , Mitsuaki Amemiya , Isamu Shimoda , Shunichi Uzawa , Takao Kariya
发明人： Shigeru Terashima , Mitsuaki Amemiya , Isamu Shimoda , Shunichi Uzawa , Takao Kariya
IPC分类号： G03F7/20
CPC分类号： G03F7/70558 , G03F7/2008 , G03F7/70875
摘要： An exposure apparatus for lithographically transferring a pattern of a mask onto a workpiece coated with a radiation sensitive material includes a first filter made the same material as of the substrate of the mask, a second filter formed by a base member made of the same material as the mask substrate and being coated with a radiation sensitive material, an illuminometer for measuring illuminance of light passed through the first and second filters, respectively, and a control device for determining an exposure time for lithographic transfer of the pattern of the mask onto the wafer, on the basis of a difference between a measured value as measured through the first filter and a measured value as measured through the second filter.

5. 发明授权

US4969168A Wafer supporting apparatus 失效
标题翻译：晶圆支撑装置
公开(公告)号：US4969168A
公开(公告)日：1990-11-06
申请号：US401654
申请日：1989-08-31
申请人： Eiji Sakamoto , Shinichi Hara , Isamu Shimoda , Shunichi Uzawa
发明人： Eiji Sakamoto , Shinichi Hara , Isamu Shimoda , Shunichi Uzawa
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30 , H01L21/683
CPC分类号： G03F7/707 , G03F7/70866 , G03F7/70875 , H01L21/6833 , H01L21/6838
摘要： A wafer chuck usable with a semiconductor exposure apparatus wherein a mask and a semiconductor wafer are placed in a vacuum ambience or a pressure-reduced gas ambience, and wherein the wafer is exposed through the mask to radiation energy such as X-rays contained in a synchrotron radiation beam, by which the pattern of the mask is transferred onto the wafer. The wafer is first attracted on the wafer supporting surface of the chuck by vacuum attraction, and thereafter, the wafer is attracted by the electrostatic attraction force. Thereafter, the vacuum attraction is broken by supplying a gas. When the pattern of the mask is transferred onto the wafer, the wafer is retained on the wafer supporting surface by the electrostatic attraction force only. By this, the sheet-like member (wafer) supporting apparatus can correctly contact the wafer supporting surface to the wafer without being influenced by the undulation of the wafer. In addition, the heat produced in the wafer during exposure can be removed efficiently by temperature controlled water supplied to the wafer supporting apparatus.

6. 发明授权

US4904895A Electron emission device 失效
标题翻译：电子发射装置
公开(公告)号：US4904895A
公开(公告)日：1990-02-27
申请号：US189216
申请日：1988-05-02
申请人： Takeo Tsukamoto , Mamoru Miyawaki , Tetsuya Kaneko , Akira Suzuki , Isamu Shimoda , Toshihiko Takeda , Masahiko Okunuki
发明人： Takeo Tsukamoto , Mamoru Miyawaki , Tetsuya Kaneko , Akira Suzuki , Isamu Shimoda , Toshihiko Takeda , Masahiko Okunuki
IPC分类号： H01J1/304 , H01J3/02
CPC分类号： B82Y10/00 , H01J1/3042 , H01J3/022
摘要： An electron emission device comprises an electron emission electrode with a pointed end and a counter electrode positioned opposite to the pointed end, both formed by fine working of a conductive layer laminated on an insulating substrate.

7. 发明授权

US4810934A Electron emission device 失效
标题翻译：电子发射装置
公开(公告)号：US4810934A
公开(公告)日：1989-03-07
申请号：US50028
申请日：1987-05-15
申请人： Isamu Shimoda , Takeo Tsukamoto , Akira Shimizu , Akira Suzuki , Masao Sugata , Masahiko Okunuki
发明人： Isamu Shimoda , Takeo Tsukamoto , Akira Shimizu , Akira Suzuki , Masao Sugata , Masahiko Okunuki
IPC分类号： H01J1/13 , H01J19/24 , H01L29/00
CPC分类号： H01J1/135
摘要： An electron emission device for attracting electrons emitted from an electron emission element to an anode, includes a current detector for detecting a flow-in current to said electron emission element and a flow-out current from the electron emission element. The difference between the flow-in current and the flow-out current is calculated and the voltage applied to the electron emission element is adjusted in accordance with the difference between the flow-in current and the flow-out cuttent.
摘要翻译：用于吸引从电子发射元件发射到阳极的电子的电子发射装置包括用于检测到电子发射元件的流入电流的电流检测器和来自电子发射元件的流出电流。计算流入电流和流出电流之间的差异，并且根据流入电流和流出电流之间的差来调节施加到电子发射元件的电压。

8. 发明授权

US5627111A Electron emitting device and process for producing the same 失效
标题翻译：电子发射器件及其制造方法
公开(公告)号：US5627111A
公开(公告)日：1997-05-06
申请号：US472111
申请日：1995-06-07
申请人： Takeo Tsukamoto , Akira Shimizu , Akira Suzuki , Masao Sugata , Isamu Shimoda , Masahiko Okunuki
发明人： Takeo Tsukamoto , Akira Shimizu , Akira Suzuki , Masao Sugata , Isamu Shimoda , Masahiko Okunuki
IPC分类号： H01J1/14 , H01J1/316 , H01J9/04 , H01L21/465
CPC分类号： H01J1/316 , H01J1/14 , H01J9/042 , H01J2201/3165
摘要： An electron emitting device causes electron emission by a current supply in a coarse resistor film. The coarse thin resistor film is composed at least of a coarse thin silicon film.
摘要翻译：电子发射器件通过粗电阻膜中的电流源引起电子发射。粗糙的薄电阻膜至少由粗的薄膜构成。

9. 发明授权

US5574438A Method for transferring information, and in particular for performing a logic operation, using electron beams 失效
标题翻译：用于使用电子束传送信息，特别是用于执行逻辑操作的方法
公开(公告)号：US5574438A
公开(公告)日：1996-11-12
申请号：US242236
申请日：1994-05-13
申请人： Fumitaka Kan , Kenji Nakamura , Masanori Takenouchi , Naoji Hayakawa , Isamu Shimoda , Masahiko Okunuki
发明人： Fumitaka Kan , Kenji Nakamura , Masanori Takenouchi , Naoji Hayakawa , Isamu Shimoda , Masahiko Okunuki
IPC分类号： G11C7/00 , G11C11/23 , H03K19/14 , H04Q1/00
CPC分类号： H03K19/14 , G11C11/23 , G11C7/005
摘要： In a method for transferring information in a form of electron beam, an electron beam detector detects the electron beam, and emission of the electron beam from a predetermined electron beam source is controlled in accordance with a signal from the detector upon detection of the electron beam. A deflection electrode is also used to deflect the electron beams according to an electric or magnetic field to perform charge shifting, logical additions, logical multiplications, image formation, and the like.
摘要翻译：在以电子束形式传送信息的方法中，电子束检测器检测电子束，并且在检测到电子束时根据来自检测器的信号来控制来自预定电子束源的电子束的发射。偏转电极也用于根据电场或磁场偏转电子束，以执行电荷转移，逻辑加法，逻辑乘法，图像形成等。

10. 发明授权

US5559342A Electron emitting device having a polycrystalline silicon resistor coated with a silicide and an oxide of a work function reducing material 失效
标题翻译：具有涂覆有硅化物的多晶硅电阻器和功函数减少材料的氧化物的电子发射器件
公开(公告)号：US5559342A
公开(公告)日：1996-09-24
申请号：US418091
申请日：1995-04-06
申请人： Takeo Tsukamoto , Akira Shimizu , Akira Suzuki , Masao Sugata , Isamu Shimoda , Masahiko Okunuki
发明人： Takeo Tsukamoto , Akira Shimizu , Akira Suzuki , Masao Sugata , Isamu Shimoda , Masahiko Okunuki
IPC分类号： H01J1/14 , H01J1/316 , H01J9/04 , H01J19/24 , H01L29/12
CPC分类号： H01J1/316 , H01J1/14 , H01J9/042 , H01J2201/3165
摘要： An electron emitting device causes electron emission by a current supply in a coarse resistor film. The coarse thin resistor film is composed at least of a coarse thin silicon film.
摘要翻译：电子发射器件通过粗电阻膜中的电流源引起电子发射。粗糙的薄电阻膜至少由粗的薄膜构成。

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