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1. 发明授权

US08080109B2 Film formation apparatus and method for using the same 有权
标题翻译：成膜装置及其使用方法
公开(公告)号：US08080109B2
公开(公告)日：2011-12-20
申请号：US12149537
申请日：2008-05-02
申请人： Mitsuhiro Okada , Satoshi Takagi , Ryou Son , Masahiko Tomita , Yamato Tonegawa , Toshiharu Nishimura
发明人： Mitsuhiro Okada , Satoshi Takagi , Ryou Son , Masahiko Tomita , Yamato Tonegawa , Toshiharu Nishimura
IPC分类号： B08B9/08
CPC分类号： B08B5/00 , C23C16/345 , C23C16/4405 , H01L21/0217 , H01L21/0228 , H01L21/3185 , Y02C20/30 , Y02P70/605 , Y10S438/905
摘要： A method for using a film formation apparatus for a semiconductor process includes setting an idling state where a reaction chamber of the film formation apparatus accommodates no product target substrate therein, and then, performing a purging process of removing a contaminant present in an inner surface of the reaction chamber by causing radicals to act on the inner surface of the reaction chamber. The radicals are generated by activating a purging process gas containing oxygen and hydrogen as elements.
摘要翻译：使用半导体工艺的成膜装置的方法包括设定成膜装置的反应室不含有产品目标基板的空转状态，然后进行除去存在于内部表面的污染物的清洗处理反应室通过使自由基作用在反应室的内表面上。通过激活含有氧和氢作为元素的吹扫工艺气体来产生自由基。

2. 发明申请

US20080282976A1 Film formation apparatus and method for using the same 有权
标题翻译：成膜装置及其使用方法
公开(公告)号：US20080282976A1
公开(公告)日：2008-11-20
申请号：US12149537
申请日：2008-05-02
申请人： Mitsuhiro Okada , Satoshi Takagi , Ryou Son , Masahiko Tomita , Yamato Tonegawa , Toshiharu Nishimura
发明人： Mitsuhiro Okada , Satoshi Takagi , Ryou Son , Masahiko Tomita , Yamato Tonegawa , Toshiharu Nishimura
IPC分类号： C23C16/56 , B08B5/00 , H01L21/469 , B08B9/00
CPC分类号： B08B5/00 , C23C16/345 , C23C16/4405 , H01L21/0217 , H01L21/0228 , H01L21/3185 , Y02C20/30 , Y02P70/605 , Y10S438/905
摘要： A method for using a film formation apparatus for a semiconductor process includes setting an idling state where a reaction chamber of the film formation apparatus accommodates no product target substrate therein, and then, performing a purging process of removing a contaminant present in an inner surface of the reaction chamber by causing radicals to act on the inner surface of the reaction chamber. The radicals are generated by activating a purging process gas containing oxygen and hydrogen as elements.
摘要翻译：使用半导体工艺的成膜装置的方法包括设定成膜装置的反应室不含有产品目标基板的空转状态，然后进行除去存在于内部表面的污染物的清洗处理反应室通过使自由基作用在反应室的内表面上。通过激活含有氧和氢作为元素的吹扫工艺气体来产生自由基。

3. 发明申请

US20050227459A1 Film formation method and apparatus for semiconductor process 失效
标题翻译：用于半导体工艺的成膜方法和装置
公开(公告)号：US20050227459A1
公开(公告)日：2005-10-13
申请号：US11091414
申请日：2005-03-29
申请人： Yutaka Takahashi , Satoshi Takagi , Masahiko Tomita
发明人： Yutaka Takahashi , Satoshi Takagi , Masahiko Tomita
IPC分类号： C23C16/24 , C23C16/455 , C23C16/56 , H01L21/20 , H01L21/205 , H01L21/28 , H01L21/285 , H01L21/324 , H01L29/423 , H01L29/49 , H01L29/78
CPC分类号： C23C16/24 , C23C16/45557 , C23C16/56 , H01L21/02381 , H01L21/02488 , H01L21/02532 , H01L21/02595 , H01L21/0262 , H01L21/02667 , H01L21/28035 , H01L21/324 , H01L29/78
摘要： A film formation method for a semiconductor process is arranged to form an amorphous silicon film on a target substrate by CVD in a process field within a reaction container, while supplying a first process gas containing silicon into the process field, and setting the process field at a first temperature of 550° C. or more and at a first pressure. The method is arranged to subsequently poly-crystallize the amorphous silicon film by a heat process in the process field to form a poly-silicon film, while supplying a second process gas different from the first process gas into the process field, and setting the process field at a second temperature higher than the first temperature and at a second pressure.
摘要翻译：半导体工艺的成膜方法被布置成在反应容器内的工艺场中通过CVD在目标衬底上形成非晶硅膜，同时在工艺领域中提供含有硅的第一工艺气体，并将工艺场设定在第一温度为550℃以上且处于第一压力。该方法被布置成随后在工艺领域中通过热处理多晶结晶非晶硅膜以形成多晶硅膜，同时将不同于第一工艺气体的第二工艺气体供应到工艺领域中，并且将工艺在比第一温度高的第二温度和第二压力下进行。

4. 发明授权

US07354858B2 Film formation method and apparatus for semiconductor process 失效
标题翻译：用于半导体工艺的成膜方法和装置
公开(公告)号：US07354858B2
公开(公告)日：2008-04-08
申请号：US11091414
申请日：2005-03-29
申请人： Yutaka Takahashi , Satoshi Takagi , Masahiko Tomita
发明人： Yutaka Takahashi , Satoshi Takagi , Masahiko Tomita
IPC分类号： H01L21/44
CPC分类号： C23C16/24 , C23C16/45557 , C23C16/56 , H01L21/02381 , H01L21/02488 , H01L21/02532 , H01L21/02595 , H01L21/0262 , H01L21/02667 , H01L21/28035 , H01L21/324 , H01L29/78
摘要： A film formation method for a semiconductor process is arranged to form an amorphous silicon film on a target substrate by CVD in a process field within a reaction container, while supplying a first process gas containing silicon into the process field, and setting the process field at a first temperature of 550° C. or more and at a first pressure. The method is arranged to subsequently poly-crystallize the amorphous silicon film by a heat process in the process field to form a poly-silicon film, while supplying a second process gas different from the first process gas into the process field, and setting the process field at a second temperature higher than the first temperature and at a second pressure.
摘要翻译：半导体工艺的成膜方法被布置成在反应容器内的工艺场中通过CVD在目标衬底上形成非晶硅膜，同时在工艺领域中提供含有硅的第一工艺气体，并将工艺场设定在第一温度为550℃以上且处于第一压力。该方法被布置成随后在工艺领域中通过热处理多晶结晶非晶硅膜以形成多晶硅膜，同时将不同于第一工艺气体的第二工艺气体供应到工艺领域中，并且将工艺在比第一温度高的第二温度和第二压力下进行。

5. 发明申请

US20050136693A1 Thermal processing unit and thermal processing method 审中-公开
标题翻译：热处理单元和热处理方法
公开(公告)号：US20050136693A1
公开(公告)日：2005-06-23
申请号：US10942103
申请日：2004-09-16
申请人： Kazuhide Hasebe , Yutaka Takahashi , Kota Umezawa , Satoshi Takagi , Mitsuhiro Okada , Takashi Chiba , Jun Ogawa
发明人： Kazuhide Hasebe , Yutaka Takahashi , Kota Umezawa , Satoshi Takagi , Mitsuhiro Okada , Takashi Chiba , Jun Ogawa
IPC分类号： C23C16/34 , C23C16/455 , H01L21/205 , H01L21/314 , H01L21/318 , H01L21/324 , H01L21/336 , H01L21/31 , H01L21/469
CPC分类号： H01L21/0217 , C23C16/345 , C23C16/45531 , C23C16/45546 , H01L21/022 , H01L21/02271 , H01L21/3141 , H01L21/3185
摘要： The present invention is a thermal processing method of conducting a thermal process to an object to be processed, a base film having been formed on a surface of the object to be processed, the base film consisting of a SiO2 film or a SiON film. The method includes: an arranging step of arranging the object to be processed in a processing container; and a laminating step of supplying a source gas and an ammonia gas alternatively and repeatedly, so as to form a silicon nitride film on the base film repeatedly, the source gas being selected from a group consisting of dichlorosilane, hexachlorodisilane and tetrachlorosilane.
摘要翻译：本发明是对待处理物体进行热处理的热处理方法，在被处理物的表面上形成的基膜，由SiO 2 2 电影或SiON电影。该方法包括：将处理对象物置于处理容器内的布置步骤; 以及层叠步骤，交替重复地供给源气体和氨气，以在所述基膜上重复形成氮化硅膜，所述源气体选自二氯硅烷，六氯二硅烷和四氯硅烷。

6. 发明授权

US08296801B2 Asset management system and asset management method 失效
标题翻译：资产管理制度和资产管理办法
公开(公告)号：US08296801B2
公开(公告)日：2012-10-23
申请号：US10009152
申请日：2001-04-10
申请人： Satoshi Takagi , Noboru Yanagita , Keiko Abe
发明人： Satoshi Takagi , Noboru Yanagita , Keiko Abe
IPC分类号： H04N5/445
CPC分类号： H04H60/04 , G11B27/031 , G11B27/032 , G11B27/034 , G11B27/11 , G11B2220/2562 , G11B2220/2587 , G11B2220/41 , G11B2220/90
摘要： A program preparation and distribution system, in which metadata indicating variable information is generated from project to project, from medium to medium, from scene to scene or from frame to frame, to realize an asset management by controlling an archive system depending on the metadata. A database is constructed in which the archive system manages metadata in a concentrated fashion along with the essence such as video and audio data. By a distributed program editing system, the metadata inputted at the planning processing and at the casting processing is registered in the database managed in a concentrated fashion by an archival manager, at the same time as a tag specifying the registered metadata is issued. This tag is co-packed with the video and audio information obtained on acquisition by an acquisition system. In a production system, the timing to flow the staff roll is specified during the off-line processing in the production system.
摘要翻译：一种程序准备和分发系统，其中从项目到项目，从中间到中等，从现场到帧或从帧到帧生成从变量信息到元数据的元数据，通过根据元数据控制归档系统实现资产管理。构建数据库，其中归档系统以集中的方式管理元数据以及诸如视频和音频数据的本质。通过分布式程序编辑系统，在规划处理和投射处理中输入的元数据被归档管理器集中管理的数据库中，同时发布指定注册的元数据的标签。该标签与采集系统采集获得的视频和音频信息相结合。在生产系统中，在生产系统的脱机处理过程中指定流动员工卷的时间。

7. 发明授权

US4746999A Eject mechanism for cassette player 失效
标题翻译：盒式播放机的弹出机制
公开(公告)号：US4746999A
公开(公告)日：1988-05-24
申请号：US843065
申请日：1986-03-24
申请人： Toshihiro Ikahata , Satoshi Takagi , Hideki Hayashi , Masahiro Uno
发明人： Toshihiro Ikahata , Satoshi Takagi , Hideki Hayashi , Masahiro Uno
IPC分类号： G11B15/093 , G11B15/00 , G11B21/02
CPC分类号： G11B15/093
摘要： An eject mechanism for ejecting automatically the tape cassette in a tape player, in which one of two switching gears disposed on both the sides of a gear plate and engaging with a forward/backward rotating gear is selectively engaged with an intermittent gear by said forward/backward rotating gear and said intermittent gear drives the driven mechanism for the eject operation, said intermittent gear being so constructed that it is locked only in the forward rotational direction.
摘要翻译：一种弹出机构，用于自动弹出磁带播放机中的磁带盒，其中设置在齿轮板的两侧并与前/后旋转齿轮啮合的两个切换齿轮中的一个选择性地与所述前进/后退旋转齿轮的间歇齿轮啮合，向后旋转的齿轮和所述间歇齿轮驱动从动机构进行弹出操作，所述间歇齿轮被构造成仅在正向旋转方向上被锁定。

8. 发明授权

US4538753A Tape recorder 失效
标题翻译：磁带录音机
公开(公告)号：US4538753A
公开(公告)日：1985-09-03
申请号：US398257
申请日：1982-07-14
申请人： Hideki Hayashi , Satoshi Takagi , Yukio Ito , Sadayoshi Endo
发明人： Hideki Hayashi , Satoshi Takagi , Yukio Ito , Sadayoshi Endo
IPC分类号： G11B15/44 , G11B15/10 , G11B15/32 , G11B19/02
CPC分类号： G11B15/442
摘要： A fast-forwarding and rewinding levers operating mechanism in a tape recorder comprisig an FF (fast forward) lever element having formed therein a hook-shaped guide recess, a REW (rewinding) lever element superposed on the FF lever element and which has formed therein a hook-shaped recess so positioned in a direction opposite to said guide recess in the FF lever element as to intersect the latter guide recess, an oscillating member located under said FF and REW lever elements and having an oscillating portion provided at the intersection between said two guide recesses, and a transmission means to oscillate said oscillating member for a rotary medium to engage a reel base, said oscillating portion of the oscillating member being oscillated, by pressing said FF or REW lever element, to put said transmission means into action, thus revolving said reel base for FF or REW operation.
摘要翻译：一种录像机中的快进和倒带杆操作机构，其特征在于，具有形成有钩形导向凹槽的FF（快进）杠杆元件，叠置在FF杠杆元件上并形成在其中的REW（重绕）杠杆元件钩状凹部，其位于与所述FF杠杆元件中的与所述引导凹槽相反的方向上，以与所述引导凹槽相交;摆动构件，位于所述FF和REW杠杆元件下方，并具有摆动部分，所述摆动部分设置在所述两个引导凹槽，以及传动装置，用于使用于旋转介质的所述摆动构件摆动以接合卷轴底座，所述摆动构件的所述摆动部分通过按压所述FF或REW杆元件而摆动，以使所述传动装置起作用，从而使所述卷轴基座旋转以进行FF或REW操作。

9. 发明授权

US4497001A Auto-reverse mechanism for use in magnetic recording/reproducing apparatus 失效
标题翻译：用于磁记录/再现装置的自动反转机构
公开(公告)号：US4497001A
公开(公告)日：1985-01-29
申请号：US396186
申请日：1982-07-08
申请人： Hideki Hayashi , Sadayoshi Endo , Yukio Ito , Satoshi Takagi
发明人： Hideki Hayashi , Sadayoshi Endo , Yukio Ito , Satoshi Takagi
IPC分类号： G11B15/093 , G11B15/44
CPC分类号： G11B15/093 , G11B15/44
摘要： An auto-reverse mechanism intended for use in a magnetic recording/reproducing apparatus, comprising a means of changing driving force to reel base, means of detecting stopped rotation of said reel base, means of rotating, in response to the operation of said detection means, a power gear provided with intermittent gear section, means of actuating the driving-force changing means and a change plate under the effect of the rotation of said power gear, claw formed integrally with said change plate and having the effect of a spring, and a control hole in which the claw is fitted, the reaction force developed at said claw when the change plate is actuated being utilized as attractive force to the intermittent gear section for making the power gear engage with the other gears.
摘要翻译：一种用于磁记录/再现装置的自动反转机构，包括将驱动力改变为卷轴底座的装置，检测所述卷轴基座的停止旋转的装置，响应于所述检测装置的操作而旋转的装置设置有间歇齿轮部的动力齿轮，在与所述换板一体形成并且具有弹簧效果的动力齿轮与所述动力齿轮的旋转作用下致动所述驱动力改变装置的装置和换板，以及控制孔，其中爪被装配在其中，当换板被致动时在所述爪处产生的反作用力被用作用于使动力齿轮与其它齿轮接合的间歇齿轮部分的吸引力。

10. 发明申请

US20140235827A1 MOUSE ANTI-AGGRUS MONOCLONAL ANTIBODIES 有权
标题翻译：鼠单抗单克隆抗体
公开(公告)号：US20140235827A1
公开(公告)日：2014-08-21
申请号：US14006498
申请日：2012-03-09
申请人： Naoya Fujita , Yuya Nakazawa , Satoshi Takagi
发明人： Naoya Fujita , Yuya Nakazawa , Satoshi Takagi
IPC分类号： C07K16/28
CPC分类号： C07K16/28 , C07K16/30 , C07K2317/24 , C07K2317/34 , C12N5/163
摘要： The present invention provides a monoclonal antibody or a functional fragment thereof, capable of recognizing Aggrus epitope comprising an amino-acid sequence represented by a sequence ID 1, 3, or 4, and the monoclonal antibody or the functional fragment thereof produced from a hybridoma with deposit ID of FERM BP-11446, FERM BP-11447, FERM BP-11448 or FERM BP-11449. The present invention provides the hybridoma, and further an Aggrus-CLEC-2 binding inhibitor and a pharmaceutical composition for inhibition of platelet aggregation, prevention of cancer metastasis, or treatment of tumor or cancer, comprising the monoclonal antibody or the functional fragment thereof.
摘要翻译：本发明提供能够识别包含由序列ID 1,3或4所示的氨基酸序列的Aggrus表位的单克隆抗体或其功能片段，以及由杂交瘤产生的单克隆抗体或其功能片段， FERM BP-11446，FERM BP-11447，FERM BP-11448或FERM BP-11449的存款编号。本发明提供了包含单克隆抗体或其功能片段的杂交瘤，以及Aggrus-CLEC-2结合抑制剂和抑制血小板聚集，预防癌症转移或治疗肿瘤或癌症的药物组合物。

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