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    • 1. 发明申请
    • Chemical vapor deposition devices and methods
    • 化学气相沉积装置及方法
    • US20060289675A1
    • 2006-12-28
    • US10467139
    • 2001-12-27
    • Miodrag OljacaTrifon TomovGeorge NeumanDoug DanielsonAndrew HuntTravis NeumullerFred FortunatoHenry LutenFrank Witbrod
    • Miodrag OljacaTrifon TomovGeorge NeumanDoug DanielsonAndrew HuntTravis NeumullerFred FortunatoHenry LutenFrank Witbrod
    • B05B1/24
    • C23C16/45595B05B1/14B05B7/066B05B7/201C23C16/453
    • Apparatus is described for rapidly coating a large area, or for rapidly producing a powder. In one embodiment, a liquid having a coating chemical is pumped from a liquid reservoir to a distribution manifold. From the distribution manifold, the liquid is carried under pressure to a geometric array, e.g., linear, of atomization nozzles. Flow equalization means are provided for equalizing the flow of the liquid delivered to each nozzle, and, preferably, means are provided for equalizing the temperature of the liquid delivered to each nozzle. The liquid, upon exiting the nozzles with the attendant pressure drop atomizes. The atomized liquid coats a substrate either in non-reacted or reacted form, or forms a powder. In a preferred embodiment, a solution of precursor chemical is reacted in a geometric array of flames produced at the nozzles, and a coating material produced in the flame coats the substrate, or a powder is formed. In another embodiment, vaporized precursor and vaporized are fed to a burner chamber having a linear exit slit. The vapor exiting the slit is burned, and material produced in a flame reaction are deposited on a substrate, or the powder formed is collected.
    • 描述了用于快速涂覆大面积或用于快速生产粉末的装置。 在一个实施例中,具有涂料化学品的液体从液体储存器泵送到分配歧管。 从分配歧管中,将液体在压力下承载到几何阵列,例如线性的雾化喷嘴。 提供流量均衡装置用于均衡输送到每个喷嘴的液体的流动,并且优选地,提供用于均衡输送到每个喷嘴的液体的温度的装置。 液体在离开喷嘴时伴随着压力降雾化。 雾化液体以未反应或反应形式涂覆基材,或形成粉末。 在优选的实施方案中,前体化学品的溶液在喷嘴处产生的几何阵列的火焰中反应,并且在火焰中产生的涂层材料涂覆基底,或形成粉末。 在另一个实施方案中,蒸发的前驱体并蒸发,被送入具有线性出口狭缝的燃烧室。 离开狭缝的蒸汽被燃烧,并且在火焰反应中产生的材料沉积在基底上,或者收集所形成的粉末。