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    • 4. 发明授权
    • Gas separating member and method for manufacture thereof
    • 气体分离部件及其制造方法
    • US4594079A
    • 1986-06-10
    • US682145
    • 1984-12-17
    • Minoru YamamotoJiro Sakata
    • Minoru YamamotoJiro Sakata
    • B01D53/22B01D69/00B01D69/12B01D71/70
    • B01D69/00B01D69/127Y10T428/249978
    • A gas separation member comprises a porous substrate, e.g., a membrane or a wall, and a polymer film deposited by plasma polymerization on the surface of the substrate and composed of at least two layers, i.e., a first layer contiguous with the substrate and a second layer superimposed on the first layer. The polymer film of the first layer possesses a uniform chemical composition or chemical structure in the direction of film thickness, while the polymer film of the second layer has a chemical composition or chemical structure which changes continuously or stepwise in the direction of film thickness. The gas separation member combines high gas separation factor and a high gas permeation rate, permitting separation of a specific gas in a concentrated form from a mixed gas. It also excels in weatherability.
    • 气体分离构件包括多孔基底,例如膜或壁,以及通过等离子体聚合沉积在基底表面上并由至少两个层构成的聚合物膜,即至少两层,即与基底邻接的第一层和 第二层叠加在第一层上。 第一层的聚合物膜在膜厚方向上具有均匀的化学组成或化学结构,而第二层的聚合物膜具有在膜厚度方向上连续或逐步变化的化学组成或化学结构。 气体分离部件结合高气体分离因子和高气体渗透速率,允许浓缩形式的特定气体与混合气体分离。 它还具有耐候性。
    • 7. 发明申请
    • SUPPORT SYSTEM FOR SETTING EQUIPMENT PARAMETERS
    • 用于设置设备参数的支持系统
    • US20120323350A1
    • 2012-12-20
    • US13055334
    • 2010-06-16
    • Minoru YamamotoTatsushi ImoriShinobu Hirano
    • Minoru YamamotoTatsushi ImoriShinobu Hirano
    • G05B19/18
    • G05B11/42G05B13/042G05B17/02
    • An object is to provide an equipment parameter setting support system for supporting the setting of parameters in various processing equipment. The equipment parameter setting support system has an execution results acquisition unit for acquiring, from an equipment controller or EES of the equipment design and manufacturing support system, execution results of a real equipment at any two points in time; a parameter calculation unit for calculating PID parameters at each time point on the basis of the acquired execution results; a difference calculation unit for calculating the difference between the calculated PID parameters; and a variation value calculation unit for calculating a variation value for a unit interval in relation to the calculated difference, wherein, in the equipment design and manufacturing support system, the calculated variation value and a PID parameters stored in the equipment simulator are computed to calculate a new PID parameter, and PID control is executed in the equipment simulator using the new PID parameter.
    • 目的是提供一种用于支持各种处理设备中参数设置的设备参数设置支持系统。 设备参数设置支持系统具有执行结果获取单元,用于从设备控制器或设备设计制造支持系统的EES获取任意两点的实际设备的执行结果; 参数计算单元,用于基于所获取的执行结果来计算每个时间点的PID参数; 差分计算单元,用于计算所计算的PID参数之间的差; 以及变化值计算单元,用于计算与计算出的差异相关的单位间隔的变化值,其中,在设备设计和制造支持系统中,计算计算的变化值和存储在设备模拟器中的PID参数,以计算 使用新的PID参数在设备模拟器中执行新的PID参数和PID控制。